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    • 16. 发明申请
    • SEMICONDUCTORS BASED ON SUBSTITUTED [1]BENZOTHIENO[3,2-b] [1]-BENZOTHIOPHENES
    • 基于取代的[1]苯并[3,2-b] [1] - 苯并噻吩的半导体
    • WO2012010292A1
    • 2012-01-26
    • PCT/EP2011/003605
    • 2011-07-19
    • HERAEUS CLEVIOS GMBHMEYER-FRIEDRICHSEN, TimoREUTER, KnudELSCHNER, AndreasHALIK, Marcus
    • MEYER-FRIEDRICHSEN, TimoREUTER, KnudELSCHNER, AndreasHALIK, Marcus
    • C07D495/04H01L51/00
    • H01L51/0074C07D495/04C07F9/655354H01L51/0002H01L51/0558Y02E10/549Y02P70/521
    • The present invention relates to compounds of the general formula (I) wherein Z corresponds to - a C 1 -C 22 -alkyl radical substituted by halogen, phosphonic acid or phosphonic acid ester groups -P(O)(OR 1 ) 2 (wherein the radicals R 1 can be identical or different and correspond to a hydrogen atom or C 1 -C 12 -alkyl), sulphonic acid groups -SO 3 H, halosilyl radicals -SiHal n R 2 3-n (R 2 = C 1 -C 18 - alkyl, n = an integer from 1 to 3), thiol groups or trialkoxysilyl radicals -Si(OR 3 ) 3 (R 3 = C 1 -C 18 -alkyl), - a C 5 -C 12 -cycloalkyl radical substituted by halogen, phosphonic acid or phosphonic acid ester groups— P(O)(OR 1 ) 2 (wherein the radicals R 1 can be identical or different and correspond to a hydrogen atom or C 1 -C 12 -alkyl), sulphonic acid groups -SO 3 H, halosilyl radicals -SiHal n R 2 3-n (R 2 = C 1 -C 18 - alkyl, n = an integer from 1 to 3), thiol groups or trialkoxysilyl radicals -Si(OR 3 ) 3 (R 3 = C 1 -C 18 -alkyl), - a C 6 -C 14 -aryl radical or heteroaryl radical from the group of the thienyl, pyrryl, furyl or pyridyl radicals substituted by halogen, phosphonic acid or phosphonic acid ester groups -P(O)(OR 1 ) 2 (wherein the radicals R 1 can be identical or different and correspond to a hydrogen atom or C 1 -C 12 -alkyl), sulphonic acid groups -S0 3 H, halosilyl radicals -SiHal n R 2 3-n (R 2 = C 1 -C 18 - alkyl, n = an integer from 1 to 3), thiol groups or trialkoxysilyl radicals -Si(OR 3 ) 3 (R 3 = C 1 -C 18 -alkyl), or - a C 7 -C 30 -aralkyl radical optionally substituted by halogen, phosphonic acid or phosphonic acid ester groups -P(O)(OR 1 ) 2 (wherein the radicals R 1 can be identical or different and correspond to a hydrogen atom or C 1 -C 12 -alkyl), sulphonic acid groups -SO 3 H, halosilyl radicals -SiHal n R 2 3-n (R 2 = C 1 -C 18 - alkyl, n = an integer from 1 to 3), thiol groups or trialkoxysilyl radicals -Si(OR 3 ) 3 (R 3 = C 1 -C 18 -alkyl) or a trialkylsilyl radical R 5 R 6 R 7 Si, in which R 5 , R 6 , R 7 independently of each other are identical or different C 1 -C 18 -alkyl radicals. The present invention also relates to a semiconductor layer, an electronic component, a process for the production of an electronic component, the electronic component obtainable by this process and the use of compounds of the general formula (I).
    • 本发明涉及通式(I)的化合物,其中Z对应于被卤素,膦酸或膦酸酯基-P(O)(OR 1)2取代的C 1 -C 22 - 烷基(其中基团R 1 可以相同或不同,并且对应于氢原子或C 1 -C 12烷基),磺酸基-SO 3 H,卤代甲硅烷基-SiHalnR 2 3-n(R 2 = C 1 -C 18烷基,n = 1至3的整数) ,硫醇基或三烷氧基甲硅烷基-Si(OR 3)3(R 3 = C 1 -C 18烷基), - 被卤素,膦酸或膦酸酯基-P(O)(OR 1)2取代的C 5 -C 12环烷基 (其中基团R 1可以相同或不同并且对应于氢原子或C 1 -C 12 - 烷基),磺酸基-SO 3 H,卤代甲硅烷基-SiHaln R 3-n(R 2 = C 1 -C 18烷基,n =整数 1至3),硫醇基或三烷氧基甲硅烷基-Si(OR 3)3(R 3 = C 1 -C 18 - 烷基), - 来自噻吩基,吡咯基,呋喃基或吡啶基的C 6 -C 14 - 芳基或杂芳基 由卤素,膦酸或膦酸酯基-P(O)(OR 1)2(其中基团R 1可以相同或不同并且对应于氢原子或C 1 -C 12 - 烷基)取代的基团,磺酸基-S03H ,卤代甲硅烷基-SiHalnR2 3-n(R2 = C1-C18烷基,n = 1-3的整数),硫醇基或三烷氧基甲硅烷基-Si(OR3)3(R3 = C1-C18-烷基) 任选被卤素,膦酸或膦酸酯基团-P(O)(OR 1)2取代的C 7 -C 30 - 芳烷基(其中基团R 1可以相同或不同并且对应于氢原子或C 1 -C 12 - 烷基 ),磺酸基-SO 3 H,卤代甲硅烷基-SiHalnR 2 3-n(R 2 = C 1 -C 18烷基,n = 1至3的整数),硫醇基或三烷氧基甲硅烷基-Si(OR 3)3(R 3 = C18烷基)或三烷基甲硅烷基R5R6R7Si,其中R5,R6,R7彼此独立地是相同或不同的C1-C18-烷基。 本发明还涉及半导体层,电子部件,电子部件的制造方法,通过该方法得到的电子部件和通式(I)的化合物的用途。