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    • 101. 发明申请
    • THIN FILM Hg-BASED SUPERCONDUCTORS, THERMOELECTRIC MATERIALS AND METHODS OF FABRICATION THEREOF
    • 基于Hg,热电材料的薄膜超导体及其制备方法
    • WO01031659A2
    • 2001-05-03
    • PCT/US2000/029818
    • 2000-10-25
    • C30B1/04C30B29/22C30B33/02H01L35/14H01L35/18H01L35/22H01L35/34H01L39/24H01B
    • H01L39/2451H01L35/225H01L35/34
    • Improved Hg-containing superconducting films and thermoelectric materials are provided. The films are fabricated by annealing starting T1-containing films (e.g., T1-1212 or T1-2212) in an Hg-vapor environment so as to cause a substitution of T1 by Hg without substantial alteration of the crystalline structure of the starting films. Preferably, a body comprising a substrate having an epitaxial T1-containing film thereon is annealed under vacuum conditions with a Hg-based bulk; typical annealing conditions are 600-900 DEG C for a period of from about 1-20 hours. The final Hg-containing film products have a Jc of at least about 10 A/cm (100 K, OT) and a Xmin of up to about 50 %. The thermoelectric materials are prepared by perturbing a crystalline precursor having a structure similar to the final material so as to cause a first molecule to be released from the precursor. A vapor is introduced into the reaction system simultaneous to or shortly after the perturbation step so as to cause molecules which are within the vapor and are different than the first molecules to replace the first molecules in the precursor.
    • 本发明提供了对超导含汞(Hg)膜和热电材料的改进。 这些膜通过在Hg蒸气的环境下使含铊起始膜(例如T1-1212或T1-2122)退火以使Hg被Tl取代而不显着改变晶体结构来制备。 开始看电影。 优选地,将包含涂覆有包含T1的外延膜的衬底的主体用Hg基衬底进行真空退火; 通常,退火在600至900℃的温度下进行约1至20小时的时间。 所得到的含Hg膜具有至少约10 6 A / cm 2(100K,OT)的Jc值和至多约50%的Xmin值。 热电材料通过干扰与最终材料结构类似的结晶前体来制备,以便引起形成前体部分的第一分子的释放。 在破坏步骤期间或破裂步骤之后不久,将蒸汽引入反应系统中,以使前体中的第一分子被存在于蒸气中并且不同于第一分子的分子所取代。