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    • 93. 发明申请
    • COMPOSITION FOR ANTIREFLECTION OR LIGHT ABSORPTION FILM AND COMPOUNDS FOR USE IN THE SAME
    • 用于抗反射或光吸收膜的组合物及其使用的化合物
    • WO98054619A1
    • 1998-12-03
    • PCT/JP1998/002234
    • 1998-05-21
    • G03F7/11C08F220/34C08G18/28C08G18/72C08G18/81C09D4/00C09D5/32G03F7/004G03F7/09C08F20/10C08F20/34C08F20/38C08F22/04C08F22/40H01L21/027
    • G03F7/091C08F220/34C08G18/2825C08G18/2865C08G18/728C08G18/8116C09D4/00C09D5/32G03F7/0045
    • A composition capable of forming an antireflection or light absorption film which satisfactorily absorbs radiations having wavelengths of 100 to 450 nm, is free from the diffusion of a photo-generated acid into the film or the intermixing of a resist with the film, and is excellent in storage stability and step coverage properties; and novel compounds and novel polymers useful for the composition. The composition contains a compound which is a (meth)acrylic monomer or polymer having at least one isocyanate or thioisocyanate group bonded to a side chain thereof through an alkylene group, etc., or contains the compound or polymer which has an aminated or hydroxylated organic chromophore which absorbs light in the wavelength region of 100 to 450 nm and is bonded to the isocyanate or thioisocyanate group. The composition is applied to a substrate and baked to form a film serving as, e.g., an antireflection film. A chemical-amplification-type resist is applied to this film, and the resist film is exposed to light and then developed to form a resist image with high resolution. Due to the presence of the isocyanate or thioisocyanate group in the compound, the film serving as, e.g., an antireflection film is cured through cross-linking during baking. Due to the presence of the organic chromophore, the film absorbs exposure light in the wavelength region of 100 to 450 nm.
    • 能够形成能够令人满意地吸收波长为100〜450nm的辐射的抗反射或光吸收膜的组合物不会使光产生的酸扩散到膜中或抗蚀剂与膜的混合,并且是优异的 在储存稳定性和阶梯覆盖性方面; 以及可用于该组合物的新型化合物和新型聚合物。 该组合物含有具有至少一个异氰酸酯或硫代异氰酸酯基团的(甲基)丙烯酸单体或聚合物的化合物,该异氰酸酯或硫代异氰酸酯基通过亚烷基等与其侧链键合,或含有具有胺化或羟基化有机物的化合物或聚合物 吸收100〜450nm的波长区域的光并与异氰酸酯或硫代异氰酸酯基团结合的发色团。 将组合物施加到基底上并烘烤以形成用作例如抗反射膜的膜。 对该膜施加化学放大型抗蚀剂,将抗蚀剂膜曝光,然后显影,形成高分辨率的抗蚀剂图像。 由于化合物中异氰酸酯或硫代异氰酸酯基团的存在,用作例如抗反射膜的膜在烘烤期间通过交联固化。 由于有机发色团的存在,该膜吸收了在100至450nm的波长区域中的曝光光。