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1. 发明申请

WO2008106379A1 COMPOSITIONS, COATINGS AND FILMS FOR TRI-LAYER PATTERNING APPLICATIONS AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：三层布置方法的组合物，涂料和薄膜及其制备方法
公开(公告)号：WO2008106379A1
公开(公告)日：2008-09-04
申请号：PCT/US2008/054814
申请日：2008-02-23
申请人： HONEYWELL INTERNATIONAL INC. , KENNEDY, Joseph , XIE, Songyuan , DO, Kim , MUKHOPADHYAY, Sudip
发明人： KENNEDY, Joseph , XIE, Songyuan , DO, Kim , MUKHOPADHYAY, Sudip
IPC分类号： C08L83/04 , C08G77/18 , C08G77/20 , C09D183/04 , G03F7/09 , H01L21/312 , C08K3/28 , C08K5/101 , C08K5/17 , C08K5/18 , C08K5/3432
CPC分类号： G03F7/0752 , C08G77/20 , C08G77/70 , C08L83/04 , C08L83/06 , C09D183/04 , G03F7/091 , G03F7/11 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , C08L2666/44
摘要： Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent.. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.
摘要翻译：本文描述了用于三层应用的组合物，其中所述组合物具有基质，并且包括：配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，多个与基质偶联的乙烯基聚合物的多个苯基，以及耦合到聚合物基质，多个至少一个缩合催化剂和至少一种溶剂的多个苯基。本文还涵盖三层结构，其包含有机底层（第一层），抗反射本文考虑的组合物和/或膜（第二层）和彼此耦合的光致抗蚀剂材料（第三层）。制备用于三层图案化应用的组合物的方法包括：提供配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，与聚合物基体偶联的多个乙烯基，以及多个提供至少一种缩合催化剂，提供至少一种溶剂，提供至少一种pH调节剂，将配制的聚合物和部分至少一种溶剂混合在反应容器中以形成反应性混合物并将至少一种pH调节剂，至少一种缩合催化剂和剩余的至少一种溶剂掺入到反应混合物中以形成组合物。

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