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1. 发明申请

WO02093624A3 APPARATUS FOR REGULATING TEMPERATURE OF A PROCESS KIT IN A SEMICONDUCTOR WAFER-PROCESSING CHAMBER 审中-公开
标题翻译：用于在半导体加热室中调节工艺温度的装置
公开(公告)号：WO02093624A3
公开(公告)日：2003-01-09
申请号：PCT/US0214957
申请日：2002-05-13
申请人： APPLIED MATERIALS INC
发明人： GRIMARD DENNIS , KHOLODENKO ARNOLD , VEYTSER ALEX , THACH SENH , CHENG WING
IPC分类号： H01L21/00
CPC分类号： H01L21/67109 , H01L21/67103
摘要： Apparatus for reducing by-product formation in a semiconductor wafer-processing chambers. In a first embodiment, the apparatus comprises a chuck having a chucking electrode and a radially extending peripheral flange. A collar is disposed over the peripheral flange defining a gap therebetween, and circumscribes the chuck. A heater element is embedded within the collar and adapted for connection to a power source. In a second embodiment, the apparatus comprises a chuck having a chucking electrode and a radially extending periperal flange, and a collar having a heater element embedded therein. The collar is disposed over the peripheral flange to define a gap therebetween, and circumscribes the chuck. Moreover, a pedestal having a gas delivery system therein is disposed below the chuck and collar. In a third embodiment, the apparatus comprises a chuck having a chucking electrode and a radially extending peripheral flange, a collar, and a waste ring having a heater element embedded therein. The waste ring is disposed over the peripheral flange defining a gap therebetween, and circumscribes the chuck. The collar is chucked to the waste ring, and the waste ring is chucked to a pedestal support. Moreover, the waste ring and pedestal each have a gas delivery system therein for regulating the temperature of the collar.
摘要翻译：用于减少半导体晶片处理室中副产物形成的装置。在第一实施例中，该装置包括具有夹紧电极和径向延伸的周边凸缘的卡盘。套环设置在周边凸缘之上，限定了它们之间的间隙，并限制卡盘。加热器元件嵌入在轴环内并且适于连接到电源。在第二实施例中，该装置包括具有夹紧电极和径向延伸的凸缘的卡盘，以及具有嵌入其中的加热器元件的套环。套环设置在周边凸缘上方以在其间形成间隙并限制卡盘。此外，其中具有气体输送系统的基座设置在卡盘和轴环的下方。在第三实施例中，该装置包括具有夹紧电极和径向延伸的周边凸缘，套环和具有嵌入其中的加热器元件的废料环的卡盘。废环设置在周边凸缘之上，限定了它们之间的间隙，并且围绕卡盘。将衣领卡在废物环上，将废物环卡在基座支架上。此外，废环和底座各自具有用于调节套环温度的气体输送系统。

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