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1. 发明授权

US5747202A Projection exposure method 失效
标题翻译：制造半导体器件的方法和投影曝光方法，包括以下步骤：将二维栅格图案或图案暴露在其不同焦点位置的晶片上
公开(公告)号：US5747202A
公开(公告)日：1998-05-05
申请号：US927261
申请日：1997-09-11
申请人： Hiroshi Tanaka
发明人： Hiroshi Tanaka
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/66 , C03C5/02 , G01B11/03
CPC分类号： G03F7/70591 , G03F7/70641 , G03F9/70
摘要： A method for manufacturing semiconductor devices includes the steps of exposing a pattern for focus measurement, formed on a surface of a reticle and comprising a two-dimensional grid pattern, to radiation and projecting the pattern for focus measurement onto a plurality of regions of an inspection wafer, on which a resist has been coated by a resist coating apparatus, using a projection exposure apparatus; developing the pattern for focus measurement projected on the inspection wafer with a developing apparatus; measuring the developed pattern for focus measurement on a plurality of regions of the inspection wafer with the projection exposure apparatus to obtain the focus position and the inclination of the plane of projection of the image of the pattern for focus measurement of the reticle, and setting the focus position and the inclination of the plane of projection in the projection exposure apparatus as a focus offset and an amount of correction of the inclination of the plane of projection; and coating the surface of the wafer with resist using the resist coating apparatus, exposing a pattern formed on the surface of the reticle to radiation and projecting the pattern onto the resist on the surface of the wafer using the projection exposure apparatus and using the set focus offset and the set amount of correction, and developing the resist using the developing apparatus.
摘要翻译：一种制造半导体器件的方法包括以下步骤：将形成在掩模版表面上并包括二维栅格图案的聚焦测量图案曝光，以将用于焦点测量的图案放射和投影到检查的多个区域使用投影曝光装置在抗蚀剂涂布装置上涂布抗蚀剂的晶片; 用显影装置展开投影在检查晶片上的聚焦测量图案; 利用投影曝光装置，在检查晶片的多个区域上测量用于焦点测量的显影图案，以获得焦点位置和用于掩模版的焦点测量的图案的图像的投影平面的倾斜度，并将聚焦位置和投影平面投影的倾斜度作为聚焦偏移和投影平面倾斜度的校正量; 并使用抗蚀剂涂覆装置用抗蚀剂涂覆晶片的表面，将形成在掩模版表面上的图案曝光，并使用投影曝光装置将图案投影到晶片表面上的抗蚀剂上，并使用设定焦点偏移和设定的校正量，以及使用显影装置显影抗蚀剂。

2. 发明授权

US4395505A Ascension pipe and ascension pipe cap sealers for by-product coke ovens 失效
标题翻译：用于副产品焦炉的升压管和升管管盖密封件
公开(公告)号：US4395505A
公开(公告)日：1983-07-26
申请号：US387914
申请日：1982-06-14
申请人： Ronald S. Doles
发明人： Ronald S. Doles
IPC分类号： C03C3/064 , C03C3/089 , C10B25/16 , C10B27/06 , C03C5/02 , C04B35/00
CPC分类号： C03C3/089 , C03C3/064 , C10B25/16 , C10B27/06
摘要： A water-based paste which is curable to a flowing glass which is made generally from boric acid, silica flour, or diatomite silica. Generally, silica flour is added for pipe sealer or diatomite-type silica for cap sealers. Optional additives are latex and Kelzan for modifying rheology and trisodium phosphate to fine control the softening point. These compositions may be utilized in standpipes and collecting mains in coke ovens. The softening point of the composition is selected so that it is compatible with the operation of the coke oven. Softening temperatures for these compositions range from about 400.degree. C. to about 750.degree. C. and the boric acid and silica components were selected with a particle size ranging from about 44-210 microns.
摘要翻译：一种可通过硼酸，二氧化硅粉或硅藻土二氧化硅制成的流动玻璃固化的水性糊剂。一般来说，加入二氧化硅粉末用于封口剂或硅藻土型二氧化硅用于封口机。任选的添加剂是胶乳和Kelzan，用于改变流变性和磷酸三钠以精细控制软化点。这些组合物可用于立管中并在焦炉中收集干管。选择组合物的软化点，使其与焦炉的操作相容。这些组合物的软化温度范围为约400℃至约750℃，硼酸和二氧化硅组分的粒径选自约44-210微米。

3. 发明授权

US4158080A Glass enamel fluxes 失效
标题翻译：玻璃搪瓷助焊剂
公开(公告)号：US4158080A
公开(公告)日：1979-06-12
申请号：US949445
申请日：1978-10-10
申请人： Dale R. Wexell
发明人： Dale R. Wexell
IPC分类号： C03C8/12 , C03C17/02 , B32B7/02 , B32B17/06 , C03C5/02
CPC分类号： C03C8/12 , C03C17/02 , C03C2205/00 , Y10T428/24942
摘要： The invention disclosed is a family of enamel fluxes that forms the basis for enamels used in decorating opal glasses where the glasses have softening points in excess of 760.degree. C. and coefficients of thermal expansion (25.degree.-300.degree. C.) of 70-85.times.10.sup.-7 /.degree. C. The enamel fluxes have softening points in the range of 550.degree.-575.degree. C., toxic metal release values below FDA prescribed standards, coefficients of thermal expansion in the range of 65-75.times.10.sup.-7 /.degree. C. and preferably at least 5 units below the coefficient of the opal glass, and fire to a high gloss in a firing cycle of less than 10 minutes having a maximum temperature below 720.degree. C. They have compositions that form a family in the Li.sub.2 O-Na.sub.2 O-B.sub.2 O.sub.3 -TiO.sub.2 -CdO-ZrO.sub.2 -PbO-SiO.sub.2 system.
摘要翻译：所公开的发明是一种搪瓷助熔剂，其形成用于装饰眼镜的搪瓷的基础，其中玻璃的软化点超过760℃，热膨胀系数（25-300℃）为70- 85-107 /℃。搪瓷助熔剂的软化点在550°-575℃范围内，有毒金属释放值低于FDA规定的标准，热膨胀系数在65-75×10-7 /℃范围内并且优选在蛋白石玻璃的系数之下至少5个单位，并且在最低温度低于720℃的低于10分钟的烧制循环中发射到高光泽度。它们具有在Li 2 O- Na2O-B2O3-TiO2-CdO-ZrO2-PbO-SiO2体系。

4. 发明授权

US4110098A Molten glass refining apparatus 失效
标题翻译：熔炼玻璃精炼设备
公开(公告)号：US4110098A
公开(公告)日：1978-08-29
申请号：US767390
申请日：1977-02-10
申请人： Rene Mattmuller
发明人： Rene Mattmuller
IPC分类号： C03B3/02 , C03B5/12 , C03B5/14 , C03B5/173 , C03B5/185 , C03B5/225 , C03B5/235 , C03C1/00 , C03C5/02
CPC分类号： C03B5/225 , C03B3/02 , C03B5/12 , C03B5/14 , C03B5/173 , C03B5/185 , C03B5/2353 , C03C1/004 , Y02P40/55
摘要： The improvement in an apparatus for refining glass being fed along a channel wherein the molten glass is foamed throughout its thickness, the improvement involving an increase in the width of the channel at the location of foaming. Also, the channel is provided with submerged electrodes disposed on opposite sides of the channel adjacent the bottom for heating the molten mass to produce the foaming.
摘要翻译：用于精炼玻璃的装置的改进沿着通道进料，其中熔融玻璃在其整个厚度上发泡，改进涉及在发泡位置处的通道宽度的增加。此外，通道设置有设置在邻近底部的通道的相对侧上的浸没电极，用于加热熔融物料以产生发泡。

5. 发明授权

US3776764A METHOD FOR SEALING GLASS, METAL OR CERAMICS WITH MIXTURE OF PbO GLASS AND {62 -EUCRYPTITE CONTAINING GLASS 失效
标题翻译：密封玻璃，金属或陶瓷与PbO玻璃和{62-含有玻璃的混合物的方法
公开(公告)号：US3776764A
公开(公告)日：1973-12-04
申请号：US3776764D
申请日：1970-08-24
申请人： NIPPON ELECTRIC GLASS CO
发明人： TAKAGI K , KAWAMURA S , FUJII H
IPC分类号： C04B37/00 , C03C3/072 , C03C8/22 , C03C8/24 , C03C10/00 , C03C10/12 , C03C27/00 , C03C27/10 , H01L23/10 , C03C5/00 , C03C5/02 , C03C7/02
CPC分类号： C03C27/00 , C03C8/245 , C03C10/0054
摘要： A sealing glass comprising a primary composition suitable as a solder, having a rapid rate of crystallization at a low temperature, a high melting point and a high coefficient of expansion, and a secondary glass composition having an extremely low coefficient of expansion crystallizing at a high temperature. The two compositions are mixed in predetermined ratio and placed under sealing heat conditions where they are caused to react to produce a third composition having a crystal which is higher in melting point and sealing resistance to reheating but which is lower in coefficient of expansion.
摘要翻译：一种密封玻璃，其包含适合作为焊料的初级组合物，其在低温下具有快速结晶速率，高熔点和高膨胀系数，以及具有极低膨胀系数的二次玻璃组合物在高温下结晶温度。将两种组合物以预定比例混合并置于密封加热条件下，在这些条件下使它们反应以产生具有较高熔点和耐再密封性但晶体膨胀系数较低的晶体的第三组合物。

6. 发明授权

US3755723A Novel glasses, silver compositions and capacitors therefrom 失效
标题翻译：新型玻璃，银组合物和电容器
公开(公告)号：US3755723A
公开(公告)日：1973-08-28
申请号：US3755723D
申请日：1970-09-22
申请人： DU PONT
发明人： SHORT O
IPC分类号： C03C3/14 , H01B1/16 , H01G4/008 , H01G1/00 , C03C5/02 , H01B1/02
CPC分类号： H01G4/0085 , C03C3/142 , H01B1/16
摘要： The glass comprises critical proportionate amounts of PbO, Bi2O3 and B2O3. Silver compositions, adapted to be applied to and fired on a reduced titanate ceramic substrate to form thereon electrically conductive, adherent fired on films, comprise 1-10 percent of the novel glass and 90-99 percent finely divided silver dispersed in an inert vehicle. Reduced titanate capacitors are prepared from the silver compositions.
摘要翻译：该玻璃包含PbO，Bi 2 O 3和B 2 O 3的关键成分量。银组合物适用于在还原的钛酸盐陶瓷基材上并在其上形成的在导电的，粘附的膜上烧制的组合物，其包含分散在惰性载体中的1-10％的新型玻璃和90-99％的细分散的银。由银组合物制备还原钛酸电容器。

7. 发明授权

US3540896A Ceramic coating composition 失效
标题翻译：陶瓷涂料组合物
公开(公告)号：US3540896A
公开(公告)日：1970-11-17
申请号：US3540896D
申请日：1967-01-20
申请人： AIRCRAFT PLATING INC
发明人： FLICKER HOWARD D
IPC分类号： C03C3/108 , C23C24/00 , C03C5/02
CPC分类号： C03C3/108 , C23C24/00 , Y10S501/90

8. 发明授权

US3498804A Ceramic glaze 失效
标题翻译：陶瓷玻璃
公开(公告)号：US3498804A
公开(公告)日：1970-03-03
申请号：US3498804D
申请日：1963-03-25
申请人： LOCKHEED AIRCRAFT CORP
发明人： HEAD CLARENCE M JR
IPC分类号： C03C3/089 , C03C5/00 , C03C5/02
CPC分类号： C03C3/089

9. 发明授权

US3928048A Enamel glaze composition 失效
标题翻译：搪瓷釉料组成
公开(公告)号：US3928048A
公开(公告)日：1975-12-23
申请号：US31466572
申请日：1972-12-13
申请人： NIPPON STEEL CORP
发明人： KITAYAMA MINORU , TANIGUCHI KASUYUKI , KANETA KYOICHI , HIROSE KIKUZI
IPC分类号： C03C4/00 , C03C5/02
CPC分类号： C03C4/00
摘要： An enamel glaze composition containing the first component comprising an inorganic carbonaceous material or one or more selected from the group consisting of Al, Si, Ti, V, Cr, Mn and Fe and the second component consisting of a high valency oxide of poly-valent metal or a double oxide thereof with an oxide of alkali or alkaline-earth metal to provide an excellent enamel having no defect of fishscale on a steel sheet.
摘要翻译：一种含有第一成分的搪瓷釉料组合物，其含有无机碳质材料或选自Al，Si，Ti，V，Cr，Mn和Fe中的一种或多种，第二组分由高价多价氧化物金属或其双氧化物与碱金属或碱土金属的氧化物，以提供在钢板上没有鱼鳞缺陷的优异搪瓷。

10. 发明授权

US3898092A Method for reducing acid lead solubility of a lead-containing glaze or frit 失效
标题翻译：含铅釉料或玻璃料的酸铅溶解度降低的方法
公开(公告)号：US3898092A
公开(公告)日：1975-08-05
申请号：US19402871
申请日：1971-10-29
申请人： REA ROBERT F
发明人： REA ROBERT F
IPC分类号： C03C3/07 , C03C5/02 , C03C15/00
CPC分类号： C03C3/07 , Y02A30/14
摘要： A method for reducing the acid lead solubility of a leadcontaining glaze or frit. A lead-containing glass consisting essentially of not more than 70 percent by weight of lead oxide and at least 30 percent of silica is ground to the desired degree of fineness and leached in a dilute aqueous acid solution. A slip is formed by suspending the leached glass particles in a liquid, most commonly water. Further reduction in lead solubility may be accomplished by removal of glass particles finer than 5 microns, either before or after leaching of the glass particles.
摘要翻译：含铅釉料或玻璃料的酸铅溶解度降低的方法。基本上由不超过70重量％的氧化铅和至少30重量％的二氧化硅组成的含铅玻璃被研磨成所需的细度，并在稀酸水溶液中浸出。通过将浸出的玻璃颗粒悬浮在液体中，最常见的是水来形成滑移。铅溶解度的进一步降低可以通过在玻璃颗粒浸出之前或之后去除比5微米更细的玻璃颗粒来实现。

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