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    • 6. 发明授权
    • Integrated circuit device and method of producing the same
    • 集成电路装置及其制造方法
    • US07332810B2
    • 2008-02-19
    • US11448805
    • 2006-06-08
    • Yuji Awano
    • Yuji Awano
    • H01L23/48
    • H01L29/7784B82Y10/00H01L21/28562H01L21/28581H01L21/76838H01L21/76879H01L23/53276H01L29/42316H01L29/475H01L29/66431H01L29/66454H01L29/7783H01L51/0048H01L2221/1094H01L2924/0002Y10S977/742Y10S977/762Y10S977/765Y10S977/766H01L2924/00
    • An integrated circuit device having vias having good resistance to migration causing the breaking of a wiring line, or an integrated circuit device having a wiring structure that is fined by breaking the limit of lithography technique is provided. The former device comprises a plurality of elements fabricated on a semiconductor substrate, wiring lines for making the elements and the integrated circuit device function, and vias for interconnecting wiring lines in separate layers, the via being formed of one or more cylindrical structures made up of carbon atoms. The latter device comprises a plurality of elements fabricated on a semiconductor substrate and wiring members for making the elements and the integrated circuit device function, at least part of the wiring members being formed of one or more cylindrical structures made up of carbon atoms. The latter device is preferably manufactured by a method comprising using a CVD process for the formation of the cylindrical structures, while applying a direct current electric field so as to grow the cylindrical structures in one direction, or applying an alternating current electric field so as to grow the cylindrical structures in two directions. A semiconductor device using a carbon nanotube and a method of forming a pattern using a carbon nanotube as a mask are also disclosed.
    • 提供一种集成电路装置,其具有具有良好的抗迁移性的通孔,导致布线的断裂,或具有通过破坏光刻技术的极限而被罚款的布线结构的集成电路器件。 前一种器件包括制造在半导体衬底上的多个元件,用于制造元件和集成电路器件功能的布线,以及用于将不同层中的布线互连的通孔,该通孔由一个或多个由 碳原子。 后一种装置包括制造在半导体衬底上的多个元件和用于使元件和集成电路器件起作用的布线构件,至少部分布线构件由一个或多个由碳原子组成的圆柱形结构形成。 后一种装置优选通过包括使用CVD工艺来形成圆柱形结构的方法制造,同时施加直流电场以使圆柱形结构沿一个方向生长,或施加交流电场,以便 在两个方向上生长圆柱形结构。 还公开了使用碳纳米管的半导体器件和使用碳纳米管作为掩模形成图案的方法。