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    • 7. 发明申请
    • APPARATUS FOR PLASMA TREATING
    • 等离子体处理设备
    • US20160217974A1
    • 2016-07-28
    • US15009264
    • 2016-01-28
    • Stephen J. Motosko
    • Stephen J. Motosko
    • H01J37/32
    • H01J37/32009H01J37/3244H05H2240/10
    • An apparatus for plasma treating a powder and/or granules is provided herein. The apparatus includes a plasma generator, the plasma generator configured to alter the surface characteristics of the powder and/or granules, a gas injector in fluid communication with the plasma generator, the gas injector injecting air into the powder and/or granules while the powder and/or granules is being treated with plasma so as to aerate the powder and/or granules prior to and/or during plasma treatment and a reaction portion housing the plasma generator, the powder and/or granules treated by the plasma within the reaction portion.
    • 本文提供了用于等离子体处理粉末和/或颗粒的装置。 该装置包括等离子体发生器,等离子体发生器被配置为改变粉末和/或颗粒的表面特性,与等离子体发生器流体连通的气体注射器,气体注射器将空气注入粉末和/或颗粒,同时粉末 和/或颗粒正在用等离子体处理,以便在等离子体处理之前和/或期间使粉末和/或颗粒充气,以及容纳等离子体发生器的反应部分,由反应部分内的等离子体处理的粉末和/或颗粒 。