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    • 2. 发明申请
    • FIBER BRAGG GRATING INTERROGATOR ASSEMBLY AND METHOD FOR THE SAME
    • 光纤布拉格光栅中央处理器组件及其相关方法
    • US20170075064A1
    • 2017-03-16
    • US15265439
    • 2016-09-14
    • Technobis Group B. V.
    • Vincent Johannes DocterMohammad Saeed Tahvili
    • G02B6/12G01B11/16G02B6/02
    • G02B6/12023G01B11/165G01B11/168G01B11/18G01D5/35316G02B6/02195G02B6/12019G02B6/12033
    • A fiber Bragg grating interrogator assembly, comprising: an optical fiber including a fiber Bragg grating (FBG; 122) having a variable Bragg wavelength (λB) and a dynamic range of interest (Δλdyn,B) over which the Bragg wavelength (λB) can shift during use; —a light source operably connected to the optical fiber, and configured to illuminate the fiber Bragg grating to solicit a response therefrom; and an response analyzer, including: a spectrally selective device having an input port and a plurality of output ports (149-n), wherein the input port is operably connected to the optical fiber and wherein each of the output ports is associated with a respective spectral range (Δλn), said spectrally selective device being configured to provide a spectral energy distribution of a response of the fiber Bragg grating received on the input port onto said output ports.
    • 一种光纤布拉格光栅询问器组件,包括:光纤,其包括具有可变布拉格波长(λB)和感兴趣的动态范围(Δλdyn,B)的光纤布拉格光栅(FBG; 122),布拉格波长(λB) 使用期间转移; - 光源,其可操作地连接到所述光纤,并且被配置为照亮所述光纤布拉格光栅以征求其响应; 以及响应分析器,包括:具有输入端口和多个输出端口(149-n)的光谱选择性器件,其中所述输入端口可操作地连接到所述光纤,并且其中每个所述输出端口与相应的 光谱范围(Δλn),所述光谱选择性装置被配置为提供在输入端口上接收到的光纤布拉格光栅的响应的光谱能量分布到所述输出端口上。
    • 8. 发明授权
    • Photoelastic coating for structural monitoring
    • 用于结构监测的光弹性涂层
    • US08432537B2
    • 2013-04-30
    • US12481573
    • 2009-06-10
    • Duhane LamMark William Ellens
    • Duhane LamMark William Ellens
    • G01B11/16
    • G01B11/168
    • A photoelastic coating for structural monitoring of bridges, buildings, and other structures comprises an optically translucent or transparent photoelastic layer. The photoelastic coating is applied to the structure as a solvent-based liquid or gel. The photoelastic properties of the photoelastic layer are used to detect stress and strain or plastic deformation in the structure using photoelastic techniques. Also described is a method of structural monitoring comprising applying a photoelastic coating to a structure as a solvent-based liquid or gel. Presence of fringe patterns in the reflected light from the photoelastic layer indicates the presence of stress and strain in the photoelastic layer. Stress and strain in the photoelastic layer indicates stress and strain or plastic deformation in the underlying structure. The invention can be used for detecting when structures have been overloaded or when stress limits have been exceeded.
    • 用于桥梁,建筑物和其他结构的结构监测的光弹性涂层包括光学半透明或透明的光弹性层。 将光弹性涂层作为溶剂型液体或凝胶施加到结构上。 使用光弹性技术,光弹性层的光弹性能用于检测结构中的应力和应变或塑性变形。 还描述了一种结构监测的方法,包括将光弹性涂层施加到作为溶剂基液体或凝胶的结构。 来自光弹性层的反射光中的条纹图案的存在表明光弹性层中存在应力和应变。 光弹性层中的应力和应变表明底层结构中的应力和应变或塑性变形。 本发明可用于检测何时结构已经过载或超过应力极限时。
    • 9. 发明授权
    • Polariscope stress measurement tool and method of use
    • Polariscope应力测量工具及使用方法
    • US08264675B1
    • 2012-09-11
    • US13233973
    • 2011-09-15
    • Steven DanylukFang Li
    • Steven DanylukFang Li
    • G01B11/16G01J4/00
    • G01B11/168G01L1/241G01L5/0047
    • The present invention provides a tool for and method of using an infrared transmission technique to extract the full stress components of the in-plane residual stresses in thin, multi crystalline silicon wafers including in situ measurement of residual stress for large cast wafers. The shear difference method is used to obtain full stress components by integrating the shear stress map from the boundaries. System ambiguity at the boundaries is resolved completely by introducing a new analytical function. A new anisotropic stress optic law is provided, and stress optic coefficients are calibrated for different crystal grain orientations and stress orientations.
    • 本发明提供了一种使用红外透射技术提取薄多晶硅晶片中的平面内残余应力的全应力分量的工具和方法,包括原位测量大型晶圆的残余应力。 剪切差法用于通过从边界积分剪切应力图来获得全应力分量。 通过引入新的分析功能,完全解决了边界的系统模糊。 提供了新的各向异性应力光学定律,并且针对不同的晶粒取向和应力取向校准了应力光学系数。