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    • 1. 发明授权
    • Processing gas supplying system and processing gas supplying method
    • 加工气体供应系统和加工气体供应方法
    • US08261762B2
    • 2012-09-11
    • US12093491
    • 2007-08-10
    • Kiyoshi KomiyamaAkitoshi TsujiTakuya Fujiwara
    • Kiyoshi KomiyamaAkitoshi TsujiTakuya Fujiwara
    • H01L21/30B05C11/00
    • F17C7/00F17C5/06F17C2205/0326F17C2205/0335F17C2205/0352F17C2221/016F17C2223/0123F17C2227/044F17C2227/045F17C2250/032F17C2250/0443F17C2250/0626F17C2250/0636F17C2250/0673F17C2260/044F17C2260/053F17C2270/0518Y10T137/0419Y10T137/4259
    • A gas supplying system includes a processing gas supply pipe for supplying a processing gas from a gas cylinder 210 into a processing apparatus and a nonreactive gas supply source 230 for supplying a nonreactive gas into the gas supply pipe. While the system is in operation, the gas supply pipe is charged with the nonreactive gas and a control unit is in a standby state. If a processing gas use start signal is received from the processing apparatus, the system exhausts the nonreactive gas from the gas supply pipe to create a vacuum therein; charges the gas supply pipe with the processing gas; and starts a supply of the processing gas from the processing gas supply source. If a processing gas use finish signal is received from the processing apparatus, the system stops the supply of the processing gas from the processing gas supply source; exhausts the processing gas from the gas supply pipe to create a vacuum therein; and charges the gas supply pipe with the nonreactive gas. Accordingly, the gas pipe from the processing gas supply source to the processing apparatus can be kept charged with the nonreactive gas when the processing gas is not used in the processing apparatus. Therefore, a deposit generation inside the gas pipe can be prevented during that period.
    • 气体供给系统包括用于将来自气瓶210的处理气体供给到处理装置中的处理气体供给管和用于向气体供给管供给非反应性气体的非反应性气体供给源230。 当系统运行时,气体供给管上装有非反应气体,控制单元处于待机状态。 如果从处理装置接收到处理气体使用开始信号,则系统从气体供给管排出非反应性气体,以在其中产生真空; 用加气处理供气管; 并开始从处理气体供应源供应处理气体。 如果从处理装置接收到处理气体使用完成信号,则系统停止从处理气体供应源供应处理气体; 从气体供给管排出处理气体以在其中产生真空; 并用非反应性气体对气体供给管进行充电。 因此,当在处理装置中不使用处理气体时,从处理气体供给源到处理装置的气体管道可以保持充满非反应性气体。 因此,能够防止在该期间内的气体管内的沉积物。
    • 4. 发明授权
    • Method and apparatus for pressure filling and sealing a vessel
    • 压力填充和密封容器的方法和装置
    • US5495699A
    • 1996-03-05
    • US336764
    • 1994-11-09
    • Thomas I. Buckley, Jr.
    • Thomas I. Buckley, Jr.
    • F17C5/00F17C13/06F17C13/12B65B31/02B65B7/28
    • F17C5/005F17C13/06F17C13/123F17C2205/037F17C2209/221F17C2227/0121F17C2227/04F17C2250/0636F17C2250/0673F17C2260/036F17C2270/059
    • The invention is directed to an apparatus for filling and sealing a canister having a weldable end wall. A weld head assembly includes a head having a welding electrode disposed within an opening for receiving a pressurized gas and defining a terminal end. The head further has a seal operably associated with the terminal end for engaging the end wall of the canister. A ball shuttle assembly includes a shuttle block having a passage for receiving the weld ball. The ball shuttle assembly further includes a device for positioning the shuttle block whereby the weld ball is in substantially coaxial alignment with the opening, and moving the weld ball into the opening of the weld head. The passage of the shuttle block is fluidly disassociated from the opening in the weld head when the seal is engaged with the end wall of the canister. The present invention further is directed to an apparatus for pressure testing a weldable vessel, which properly aligns a top flange of the vessel with an end face of the apparatus to thereby ensure proper sealing therebetween during the pressure testing operation.
    • 本发明涉及一种用于填充和密封具有可焊接端壁的罐的设备。 焊头组件包括具有设置在用于接收加压气体并限定终端的开口内的焊接电极的头部。 头部还具有可操作地与终端连接的密封件,用于接合罐的端壁。 球形梭组件包括具有用于接收焊球的通道的梭块。 球形梭组件还包括用于定位梭子块的装置,由此焊球与开口基本上同轴对准,并且将焊球移动到焊接头的开口中。 当密封件与罐的端壁接合时,穿梭块的通道与焊接头中的开口流体地分离。 本发明还涉及一种用于对可焊容器进行压力测试的装置,其将容器的顶部凸缘与设备的端面正确对准,从而在压力测试操作期间确保其间的适当密封。
    • 6. 发明授权
    • Cryogen delivery apparatus
    • 低温输送装置
    • US5018358A
    • 1991-05-28
    • US496397
    • 1990-03-20
    • Ron C. LeeMark J. Kirschner
    • Ron C. LeeMark J. Kirschner
    • F17C9/00F17C13/02
    • F17C13/02F17C9/00F17C2203/0329F17C2203/0391F17C2205/0332F17C2221/013F17C2221/014F17C2223/0161F17C2225/0123F17C2225/0161F17C2250/061F17C2250/0673F17C2270/05
    • The present invention relates to an apparatus for delivery of pure gaseous and liquid forms of cryogen. The apparatus includes a pressure vessel for receiving a liquid form of the cryogen. A liquid-vapor interface is maintained within the pressure vessel by a liquid level detector and a cut-off valve connected to the level detector to vent the gaseous form of the cryogen to the atmosphere when the liquid form falls below a predetermined level. A heated overflow tube projects into the pressure vessel and is positioned at the predetermined level of the liquid. When the liquid rises above the predetermined level, it flowws into the overflow tube and is heated to vapor to add to the gaseous form of the cryogen within the pressure vessel. An outlet conduit is provided for delivering the gas and liquid forms of the cryogen from the pressure vessel. The conduit has a moveable end section located within the pressure vessel. When the movable end section is moved above the level of a liquid-vapor interface, the gas form of the material is delivered from the conduit; and when the moveable end section is positioned below the liquid-vapor interface, a pure liquid form of the cryogen is delivered from the pressure vessel. Movement of the moveable end section of the conduit is preferably controlled by a solenoid connected to a timing circuit.
    • 本发明涉及用于输送纯气体和液体形式的冷冻剂的装置。 该装置包括用于接收液体形式的冷冻剂的压力容器。 通过液位检测器和连接到液位检测器的截止阀将液体 - 蒸汽界面保持在压力容器内,以在液体形式下降到预定水平以下时将气态形式的冷冻剂排放到大气中。 加热的溢流管伸入压力容器中并且位于液体的预定水平。 当液体升高到高于预定水平时,它流入溢流管并被加热至蒸气以加压至压力容器内的气态形式的冷冻剂。 提供出口导管,用于从压力容器输送冷冻剂的气体和液体形式。 导管具有位于压力容器内的可移动端部。 当可移动端部移动到高于液 - 液界面的高度时,材料的气体形式从导管输送; 并且当可移动端部位于液 - 蒸汽界面下方时,冷却剂的纯液体形式从压力容器输送。 导管的可移动端部的移动优选地由连接到定时电路的螺线管控制。
    • 7. 发明授权
    • Process for delivering liquid cryogen
    • 输送液体冷冻剂的方法
    • US4336689A
    • 1982-06-29
    • US282256
    • 1981-07-10
    • Robert B. Davis
    • Robert B. Davis
    • F17C9/00F17C7/02
    • F17C9/00F17C2205/0355F17C2221/014F17C2221/017F17C2223/0161F17C2225/0161F17C2250/0636F17C2250/0673F17C2250/0694Y10T137/0396
    • A process for delivering a liquid cryogen to a use point in an essentially liquid phase at an about constant flow rate in the range of about 1 to about 40 pounds per hour, said use point having a variable internal pressure drop, comprising the following steps:(i) providing said liquid cryogen at a line pressure in the range of about 4 to about 10 times the maximum use point operating pressure;(ii) subcooling the liquid cryogen of step (i) to an equilibrium pressure of no greater than about one atmosphere while maintaining said ine pressure;(iii) passing the liquid cryogen of step (ii) through a device having a flow coefficient in the range of about 0.0002 to about 0.005 while cooling said device externally to a temperature, which will maintain the liquid cryogen in essentially the liquid phase; and(iv) passing the liquid cryogen exiting the device in step (iii) through an insulated tube having an internal diameter in the range of about 0.020 inch to about 0.200 inch to the use point.
    • 一种将液体冷冻剂以约1至约40磅/小时范围内的约恒定流速输送到基本上液相中的使用点的方法,所述使用点具有可变的内部压降,包括以下步骤: (i)在最大使用点操作压力的约4至约10倍的管线压力下提供所述液体冷冻剂; (ii)将步骤(i)的液体致冷剂过冷至不大于约一个大气压的平衡压力,同时保持所述压力; (iii)将步骤(ii)的液体冷冻剂通过流动系数在约0.0002至约0.005范围内的装置,同时将所述装置外部冷却至将使液体冷冻剂基本保持液相的温度; 和(iv)使步骤(iii)中离开装置的液体冷冻剂通过内径在约0.020英寸至约0.200英寸范围内的绝缘管。
    • 8. 发明授权
    • Method for purging a high purity manifold
    • 吹扫高纯度歧管的方法
    • US07290572B2
    • 2007-11-06
    • US11160801
    • 2005-07-10
    • David James Silva
    • David James Silva
    • B65B1/04
    • F17C13/04F17C2205/0146F17C2205/0323F17C2221/05F17C2227/0302F17C2227/044F17C2227/045F17C2250/0631F17C2250/0636F17C2250/0673F17C2260/048F17C2270/0518
    • A method for purging a manifold for the delivery of a high purity chemical by injecting of a purge gas into the manifold under vacuum conditions. In one embodiment, the method comprises a first step of injecting a purge gas into the manifold at a first end while applying vacuum at a second end; a second step of closing the first end and evacuating the manifold by applying vacuum at the second end; and a third step of opening the first end and injecting purge gas into the manifold at the first end while applying vacuum at the second end, causing a turbulent flow of the purge gas along the internal walls of the manifold due to the pressure differential between the purge gas and the evacuated manifold. An effective removal of residuals of the high purity chemical within the manifold is thereby achieved.
    • 一种用于通过在真空条件下将吹扫气体注入到歧管中来吹扫用于输送高纯度化学品的歧管的方法。 在一个实施例中,该方法包括第一步骤,其在第一端处将净化气体注入到歧管中,同时在第二端施加真空; 第二步骤,通过在第二端施加真空来关闭第一端并排出歧管; 以及第三步骤,在第一端处打开第一端并将吹扫气体注入到歧管中,同时在第二端处施加真空,由于第二端部之间的压力差导致吹扫气体沿着歧管内壁的紊流 吹扫气体和抽真空歧管。 从而实现了在歧管内高效清除高纯度化学物质的有效去除。