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1. 发明申请

US20030181349A1 Detergent composition 失效
标题翻译：洗涤剂组成
公开(公告)号：US20030181349A1
公开(公告)日：2003-09-25
申请号：US10240608
申请日：2002-09-30
发明人： Junichi Maeno , Shugo Kawakami , Kazutaka Zenfuku
IPC分类号： C11D001/00
CPC分类号： C11D11/0047 , C11D1/345 , C11D1/44 , C11D1/72 , C11D1/86 , C11D3/2034 , C11D3/28 , C23G5/036
摘要： The cleaning composition of this invention comprises, as effective components, a compound (A) represented by the formula (1) and a nonionic surfactant (B): 1 wherein R1 represents a hydrogen atom or a straight-chain or branched-chain alkyl group having 1 to 5 carbon atoms and R2 represents a hydrogen atom or a straight-chain or branched-chain alkyl group having 1 to 5 carbon atoms. The cleaning composition of the invention is excellent in detergency and is satisfactory in respect of environmental protection properties, odor and flammability. An article to be cleaned can be cleaned by coming into contact with this cleaning composition.
摘要翻译：本发明的清洗组合物含有作为有效成分的由式（1）表示的化合物（A）和非离子表面活性剂（B）：其中R1表示氢原子或具有直链或支链烷基的直链或支链烷基， 1至5个碳原子，R 2表示氢原子或具有1至5个碳原子的直链或支链烷基。本发明的清洗组合物在洗涤性方面优异，在环保性，气味和可燃性方面是令人满意的。可以通过与该清洁组合物接触来清洁待清洁的物品。

2. 发明授权

US06607605B2 Cleaning of semiconductor process equipment chamber parts using organic solvents 有权
公开(公告)号：US06607605B2
公开(公告)日：2003-08-19
申请号：US09945259
申请日：2001-08-31
申请人： Samantha Tan
发明人： Samantha Tan
IPC分类号： C23G102
CPC分类号： C23G5/00 , C23C16/4407 , C23G5/02 , C23G5/02877 , C23G5/0289 , C23G5/036 , Y10S438/905
摘要： A system and method are provided for using an organic solvent to clean chamber parts used in semiconductor manufacturing. The chamber parts are exposed to the solvent using a dipping system or a vapor contact system in order to soften or dissolve the organic polymers. The solvent may be heated up to a temperature of 100° C. The organic cleaning solvent may be a pyrrole-based, amine-based, fluoro/ether-based or ether-based solvent. Additionally, a system and method are provided for establishing criteria to verify that the chamber parts are clean with respect to organic, metallic and particulate impurities and establishing criteria to verify that the physical surface morphology remains intact.

3. 发明申请

US20030144164A1 Method and composition for removing organic coatings from a substrate 审中-公开
标题翻译：从基材中除去有机涂层的方法和组合物
公开(公告)号：US20030144164A1
公开(公告)日：2003-07-31
申请号：US10058675
申请日：2002-01-29
申请人： Kolene Corporation
发明人： John F. Pilznienski , James C. Malloy
IPC分类号： C23G001/00 , C23D017/00 , B08B003/00 , B08B007/00 , F23J001/00 , C03C023/00 , C11D001/00 , C09D009/04
CPC分类号： C11D3/044 , C09D9/04 , C11D1/72 , C11D3/30 , C23G5/036
摘要： A method and composition for removing organic coatings or residues from a substrate is provided, which composition includes an organic carrier of ethanolamines and non-ionic alkylphenol ethoxylate surfactants and mixtures thereof and potassium hydroxide and being free of water. In use, the composition is formed by mixing the ethanolamines and the surfactants and adding the potassium hydroxide. The composition is maintained above the boiling point of water in liquid state, preferably from about 225null F. to about 350null F., and the workpieces having organic coatings or residues thereon, are immersed in the heated composition. If the composition is maintained essentially free of water, the alkali metal hydroxide will not attack substrates that would normally be attacked by alkali metal hydroxides when sufficient water is present to ionize the potassium hydroxide, such as zinc, aluminum and magnesium.
摘要翻译：提供了用于从底物中除去有机涂层或残留物的方法和组合物，该组合物包括乙醇胺和非离子烷基酚乙氧基化物表面活性剂及其混合物的有机载体和氢氧化钾并且不含水。在使用中，通过混合乙醇胺和表面活性剂并加入氢氧化钾来形成组合物。将组合物保持在液态沸点以上，优选约225°F至约350°F，并将其上具有有机涂层或残留物的工件浸入加热的组合物中。如果组合物基本上不含水，则当存在足够的水以使氢氧化钾如锌，铝和镁离子化时，碱金属氢氧化物不会侵蚀通常被碱金属氢氧化物侵蚀的底物。

4. 发明授权

US5753601A Organic stripping composition 失效
公开(公告)号：US5753601A
公开(公告)日：1998-05-19
申请号：US954421
申请日：1997-10-27
申请人： Irl E. Ward , Francis W. Michelotti
发明人： Irl E. Ward , Francis W. Michelotti
IPC分类号： C09D9/00 , C11D3/20 , C11D3/30 , C11D3/34 , C11D3/43 , C11D11/00 , C23G5/036 , G03F7/42 , C11D7/26 , B08B3/08 , C11D7/32 , C11D7/60
CPC分类号： C09D9/00 , C09D9/005 , C11D11/0023 , C11D3/2086 , C11D3/30 , C11D3/3445 , C11D3/43 , C23G5/036 , G03F7/425
摘要： Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

5. 发明申请

US20130206166A1 ALUMINUM SAFE COMPOSITIONS FOR REMOVING CURED POLYSULFIDE RESINS 有权
标题翻译：用于去除固化的聚四氟乙烯树脂的铝安全组合物
公开(公告)号：US20130206166A1
公开(公告)日：2013-08-15
申请号：US13586108
申请日：2012-08-15
申请人： John Cleaon Moorre
发明人： John Cleaon Moorre
IPC分类号： C23G1/22
CPC分类号： C23G1/22 , C23G5/036 , C23G5/06
摘要： A metal-safe dissolving composition for cured resins, comprising a solvent blend that includes a metal safe solvent mixture with addition of a soluble alkali that exhibits a pKa value ≧12. The solvent mixture may include the preferred solvent for metal safety, gamma-butyrolactone (GBL), and the preferred soluble amine, 1,8-diazabicyclo(5.4.0)undec-7-ene (DBU). The solvent, n,n-dimethylacetamide (DMAC) or others, are chosen for high penetration and solvency to polar resins. To this mixture, a surfactant, inhibitor, and cellulose derivative may be added to produce a gel-form property. The product may be used to remove coatings and sealants present on vertical and horizontal surfaces and hard to reach areas commonly encountered when performing maintenance on aviation fuel tanks and similar equipment. Of key importance for the remover is its safety to aluminum and aluminum alloy substrates as demonstrated by modified test methods for sandwich corrosion, for example, ASTM F1110.
摘要翻译：一种用于固化树脂的金属安全溶解组合物，其包含溶剂共混物，其包含金属安全溶剂混合物，加入显示pKa值> = 12的可溶性碱。溶剂混合物可以包括用于金属安全性的优选溶剂，γ-丁内酯（GBL）和优选的可溶性胺1,8-二氮杂双环（5.4.0）十一碳-7-烯（DBU）。选择溶剂，n，正二甲基乙酰胺（DMAC）或其他，以便极性树脂的高渗透性和溶剂能力。可以向该混合物中加入表面活性剂，抑制剂和纤维素衍生物以产生凝胶形式。该产品可用于去除垂直和水平表面上存在的涂层和密封剂，并且难以到达在航空油箱和类似设备上进行维护时通常遇到的区域。对于去除剂来说，重要的是其对铝和铝合金基材的安全性，如通过夹心腐蚀的改进测试方法所证明的，例如ASTM F1110。

6. 发明授权

US08128755B2 Cleaning solvent and cleaning method for metallic compound 有权
标题翻译：金属化合物的清洗溶剂和清洗方法
公开(公告)号：US08128755B2
公开(公告)日：2012-03-06
申请号：US12817777
申请日：2010-06-17
申请人： Yoichi Sakata
发明人： Yoichi Sakata
IPC分类号： B08B3/04
CPC分类号： C11D11/0047 , C11D7/264 , C11D7/267 , C11D7/32 , C11D7/3209 , C11D7/5013 , C11D7/5022 , C23F1/10 , C23G5/032 , C23G5/036
摘要： Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning methods disclosed not only selectively remove the metallic compound without corroding the equipment, but also improve the ordinary cleaning process. Moreover, the cleaning solvents and the cleaning methods disclosed improve maintenance costs for the supply system because the equipment may be cleaned without being detached from the supply system.
摘要翻译：公开了用于向在光伏工业或半导体工业中的制造工具供应有机金属化合物的设备上沉积的金属化合物的清洁溶剂和清洁方法。所公开的清洗溶剂和清洁方法不仅选择性地除去金属化合物而不会腐蚀设备，而且还改善了普通的清洁工艺。此外，所公开的清洁溶剂和清洁方法提高了供应系统的维护成本，因为可以在不从供应系统脱离的情况下清洁设备。

7. 发明授权

US07879533B2 Etching residue removal method and semiconductor device fabrication method using this method 失效
标题翻译：蚀刻残渣去除方法和使用该方法的半导体器件制造方法
公开(公告)号：US07879533B2
公开(公告)日：2011-02-01
申请号：US11429217
申请日：2006-05-08
申请人： Takeshi Itou
发明人： Takeshi Itou
IPC分类号： H01L21/00
CPC分类号： C23G5/036 , C23G5/032 , G03F7/425 , H01L21/02071
摘要： An etching residue removal method includes a cleaning sequence. Preferably, the cleaning sequence has a first washing processing, first drying processing, stripper processing, rinsing processing, second washing processing and second drying processing. In the first washing processing, an insulation film and metal lines thereon are washed by pure water. In the first drying processing, the insulation film and metal lines are dried in a nitrogen atmosphere at room temperature, for example. In the stripper processing, the etching residue on the insulation film and metal lines are stripped by amine stripper, for example. In the rinsing processing, the insulation film and metal lines are rinsed with an IPA rinse solution, for example. In the second washing processing, the insulation film and metal lines are washed with pure water. In the second drying processing, the insulation film and metal lines are dried in the nitrogen atmosphere at room temperature, for example.
摘要翻译：蚀刻残渣除去方法包括清洗顺序。优选地，清洁顺序具有第一洗涤处理，第一干燥处理，汽提器处理，漂洗处理，第二洗涤处理和第二干燥处理。在第一洗涤处理中，绝缘膜及其上的金属线用纯水洗涤。在第一干燥处理中，例如在室温下，在氮气气氛中干燥绝缘膜和金属线。在汽提器处理中，绝缘膜和金属管线上的蚀刻残留物例如由胺剥离剂剥离。在漂洗处理中，绝缘膜和金属线例如用IPA冲洗溶液冲洗。在第二次洗涤处理中，绝缘膜和金属线用纯水洗涤。在第二次干燥处理中，例如在室温下，在氮气气氛中干燥绝缘膜和金属线。

8. 发明授权

US5988186A Aqueous stripping and cleaning compositions 失效
标题翻译：水性剥离和清洁组合物
公开(公告)号：US5988186A
公开(公告)日：1999-11-23
申请号：US951424
申请日：1997-10-16
申请人： Irl E. Ward , Francis Michelotti
发明人： Irl E. Ward , Francis Michelotti
IPC分类号： B08B3/08 , C09D9/00 , C11D3/20 , C11D3/30 , C11D3/34 , C11D3/43 , C11D7/26 , C11D7/32 , C11D7/50 , C11D11/00 , C23G5/036 , G03F7/42 , B08B3/04
CPC分类号： C09D9/005 , C09D9/00 , C11D11/0023 , C11D11/0035 , C11D11/0047 , C11D3/2086 , C11D3/30 , C11D3/3445 , C11D3/43 , C11D7/265 , C11D7/5009 , C11D7/5013 , C23G5/036 , G03F7/425
摘要： An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.
摘要翻译：包含极性胺，有机或无机胺和作为没食子酸的腐蚀抑制剂，其酯或类似物的混合物的水性剥离组合物。剥离组合物有效地在低温下剥离光致抗蚀剂，与等离子体工艺产生的有机，金属 - 有机材料，无机盐，氧化物，氢氧化物或络合物的残留物或不相关的有机光致抗蚀剂膜，而不再沉积任何大量的金属离子。

9. 发明授权

US5536327A Removal of hydrocarbon or fluorocarbon residues using coupling agent additives 失效
标题翻译：使用偶联剂添加剂去除烃或碳氟化合物残留物
公开(公告)号：US5536327A
公开(公告)日：1996-07-16
申请号：US342831
申请日：1994-11-21
申请人： Robert Kaiser
发明人： Robert Kaiser
IPC分类号： C11D7/24 , C11D7/50 , C23G5/028 , C23G5/036 , B08B3/08 , B08B3/12 , B08B7/02 , C23G5/02
CPC分类号： C23G5/02803 , C11D7/5018 , C11D7/5027 , C23G5/036 , C11D7/24
摘要： Fluorocarbon/hydrocarbon coupling agents are used in conjunction with highly fluorinated or, alternatively, hydrocarbon carrier liquids to remove refractory soils from solid substrates. To remove hydrocarbon soils, such as oils and greases, the coupling agent is combined with a highly fluorinated carrier liquid and the substrate exposed thereto. To remove fluorocarbon soils, a hydrocarbon carrier is used instead.
摘要翻译：氟烃/烃偶合剂与高度氟化的或可选择的烃载体液体结合使用，以从固体基质中除去难熔土壤。为了去除诸如油和油脂之类的烃污染物，将偶联剂与高度氟化的载体液体和暴露于其中的基质结合。为了除去碳氟土，代替使用烃载体。

10. 发明授权

US2854361A Method of removing foreign coatings from tinplate and the like 失效
标题翻译：从马口铁等中除去异物涂层的方法
公开(公告)号：US2854361A
公开(公告)日：1958-09-30
申请号：US53327655
申请日：1955-09-09
申请人： MORRIS HORWITZ
发明人： FULKERSON WILLIAM S
IPC分类号： C23G5/036
CPC分类号： C23G5/036

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