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1. 发明授权

US12129422B2 Abrasive articles and methods of forming same 有权
公开(公告)号：US12129422B2
公开(公告)日：2024-10-29
申请号：US17132138
申请日：2020-12-23
申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.
发明人： Samuel S. Marlin , Ralph Bauer , Stefan Vujcic , Paul W. Rehrig , Marie-Camille Auscher , Mark Hampden-Smith , Brahmanandam V. Tanikella
IPC分类号： C09K3/14 , B24D18/00
CPC分类号： C09K3/1427 , B24D18/0063
摘要： A coated abrasive article comprising a substrate and a plurality of abrasive particles having an average solidity of at least 0.87 and less than 0.97, wherein each of the abrasive particles of the plurality of abrasive particles comprises a body and striations extending along an exterior surface of the body in a direction of a length of the body. Further directed to a plurality of extruded shaped abrasive particles comprising an average solidity of at least 0.87.

2. 发明授权

US07815496B2 Polishing pad of a chemical mechanical polishing apparatus and method of manufacturing the same 有权
标题翻译：化学机械抛光装置的抛光垫及其制造方法
公开(公告)号：US07815496B2
公开(公告)日：2010-10-19
申请号：US11706241
申请日：2007-02-15
申请人： Young-Sam Lim , Young-Nam Kim , Gi-Jung Kim
发明人： Young-Sam Lim , Young-Nam Kim , Gi-Jung Kim
IPC分类号： B24D11/00
CPC分类号： B24B37/24 , B24D18/0063
摘要： The surface(s) of a polishing pad for polishing an object has a first portion including hydrophilic material and a second portion including hydrophobic material. The first portion of the polishing surface is located in a first region of the polishing pad and the second portion of the polishing surface is located in a second region of the polishing pad juxtaposed with the first region in the radial direction of the pad. The hydrophilic material may be a polymer resin that contains hydrophilic functional groups having OH and/or ═O at bonding sites of the polymer. The hydrophobic material may be a polymer resin that contains hydrophobic functional groups having H and/or F at bonding sites of the polymer. The polishing pad is manufactured by extruding respective lines of the hydrophilic and hydrophobic materials. The extruders and a backing are moved relative to each other such that the lines form concentric rings of the hydrophilic and hydrophobic materials.
摘要翻译：用于抛光物体的抛光垫的表面具有包括亲水材料的第一部分和包括疏水材料的第二部分。抛光表面的第一部分位于抛光垫的第一区域中，并且抛光表面的第二部分位于抛光垫的与垫的径向方向上与第一区域并置的第二区域中。亲水材料可以是在聚合物的键合位置处含有OH和/或= O的亲水性官能团的聚合物树脂。疏水性材料可以是在聚合物的结合位置含有H和/或F的疏水官能团的聚合物树脂。抛光垫通过挤出亲水和疏水材料的相应线来制造。挤出机和背衬相对于彼此移动，使得线形成亲水和疏水材料的同心环。

3. 发明申请

US20050276967A1 Surface textured microporous polishing pads 审中-公开
标题翻译：表面纹理微孔抛光垫
公开(公告)号：US20050276967A1
公开(公告)日：2005-12-15
申请号：US11207964
申请日：2005-08-19
申请人： Abaneshwar Prasad
发明人： Abaneshwar Prasad
IPC分类号： B24D3/32 , B24D13/14 , B29C44/34 , B29C44/56 , B32B3/26
CPC分类号： B24D18/0063 , B24B37/24 , B24D3/32 , B29C44/348 , B29C44/5627 , Y10T428/24479 , Y10T428/24496 , Y10T428/24512 , Y10T428/249976 , Y10T428/249977
摘要： A surface-textured polishing pad suitable for chemical-mechanical polishing comprises a porous polymeric foam having an average pore cell size in the range of about 60 μm or less. At least about 75% of the pores in the foam have a pore cell size within about 30 μm of the average pore cell size. The pad has at least one textured surface that includes divots having a depth in the range of about 25 μm to about 1150 μm, a width in the range of about 0.25 μm to about 380 μm, and a length-to-width aspect ratio of about 1 to about 1000. In addition, the at least one textured surface of the pad includes at least about 10 divots per square centimeter of surface area, and has an average surface roughness of at least about 5 μm. Preferably, at least one textured surface has at least one pattern of spaced, parallel grooves imprinted thereon.
摘要翻译：适用于化学机械抛光的表面纹理抛光垫包括平均孔隙尺寸在约60μm或更小范围内的多孔聚合物泡沫。泡沫中至少约75％的孔具有在平均孔隙尺寸的约30μm范围内的孔隙尺寸。衬垫具有至少一个纹理表面，其包括深度在约25μm至约1150μm之间的深度，宽度在约0.25μm至约380μm的范围内，并且长宽比纵横比约1至约1000.此外，垫的至少一个织构表面包括每平方厘米表面积至少约10个切片，并且具有至少约5μm的平均表面粗糙度。优选地，至少一个有纹理的表面具有至少一个间隔开的平行凹槽的图案。

4. 发明授权

US06688956B1 Substrate polishing device and method 失效
标题翻译：基材抛光装置及方法
公开(公告)号：US06688956B1
公开(公告)日：2004-02-10
申请号：US09934780
申请日：2001-08-22
申请人： Edward M. Yokley , Yaw S. Obeng
发明人： Edward M. Yokley , Yaw S. Obeng
IPC分类号： B24D1100
CPC分类号： B24B37/24 , B24D3/26 , B24D18/0063 , B29C44/56 , B29C59/14 , Y10T428/24967
摘要： To address the deficiencies of the prior art, the present invention provides a polishing pad comprising a thermoplastic polymer and a method of manufacturing therefor. More specifically, the present invention polishing pad fabricated from an extruded amorphous thermoplastic and free of a gate vestige. The invention also provides a method of manufacturing a polishing pad that is free from a gate vestige pad from an extruded amorphous thermoplastic.
摘要翻译：为了解决现有技术的缺点，本发明提供一种包含热塑性聚合物的抛光垫及其制造方法。更具体地说，本发明的抛光垫由挤出的非晶态热塑性塑料制成并且没有浇口痕迹。本发明还提供了一种制造抛光垫的方法，所述抛光垫与挤出的非晶态热塑性材料不相隔离。

5. 发明授权

US6080482A Undrawn, tough, durably melt-bondable, macodenier, thermoplastic, multicomponent filaments 失效
标题翻译：未拉伸，坚韧，持久的可熔融粘合，宏观，热塑性，多组分长丝
公开(公告)号：US6080482A
公开(公告)日：2000-06-27
申请号：US869393
申请日：1997-05-05
申请人： Philip G. Martin , Gary L. Olson , Dennis G. Welygan
发明人： Philip G. Martin , Gary L. Olson , Dennis G. Welygan
IPC分类号： B24D11/00 , B24D18/00 , B32B5/02 , C08L23/08 , C08L23/10 , C08L33/06 , C09K3/10 , D01D5/34 , D01F8/04 , D01F8/06 , D01F8/10 , D01F8/12 , D04H1/42 , D04H1/54 , D04H3/14 , D02G3/00
CPC分类号： D01D5/0885 , B24D11/005 , B24D18/0063 , C09K3/10 , D01D5/22 , D01F8/04 , D01F8/06 , D01F8/12 , D04H1/42 , D04H1/54 , D04H3/03 , D04H3/14 , D04H3/16 , C08L33/068 , C09K2200/06 , C09K2200/0635 , Y10T428/23979 , Y10T428/23986 , Y10T428/2929 , Y10T428/2931 , Y10T442/181 , Y10T442/627 , Y10T442/637 , Y10T442/638 , Y10T442/641
摘要： Undrawn, tough, durably melt-bondable, macrodenier, thermoplastic, multicomponent filaments, such as sheath-core and side-by-side filaments, comprising a first plastic component and a second lower-melting component defining all or at least part of the material-air boundary of the filaments. The filaments can be made by melt-extruding thermoplastics to form hot filaments, cooling and solidifying the hot filaments, and recovering the solidified filaments without any substantial tension being placed thereon. Aggregations of the filaments can be made in the form of floor matting and abrasive articles.
摘要翻译：包括第一塑料组分和第二较低熔点组分的限定全部或至少部分材料的未拉伸，韧性，耐久熔融粘合的，较重的，热塑性的多组分长丝，例如皮芯和并列细丝细丝的边界。长丝可以通过熔融挤出热塑性塑料来形成热丝，冷却和固化热丝，并且回收固化的长丝，而不会在其上放置任何显着的张力。长丝的聚集可以以地板垫和磨料制品的形式制成。

6. 发明授权

US2328998A Attrition product and method for making same 失效
标题翻译：磨损产品及其制造方法
公开(公告)号：US2328998A
公开(公告)日：1943-09-07
申请号：US31107039
申请日：1939-12-27
申请人： RADFORD GEORGE S
发明人： RADFORD GEORGE S
IPC分类号： A61C15/04 , B24D11/00 , B24D13/08 , B24D13/10 , B24D18/00
CPC分类号： B24D11/00 , A61C15/041 , B24D13/08 , B24D13/10 , B24D18/0063 , Y10T428/2982

7. 发明申请

US20170274503A1 Grinding element, method for producing the grinding element and injection-molding tool for carrying out the method 审中-公开
公开(公告)号：US20170274503A1
公开(公告)日：2017-09-28
申请号：US15503797
申请日：2014-08-14
申请人： AUGUST RÜGGEBERG GMBH & CO. KG
发明人： Bernd STUCKENHOLZ , Nicolas HUTH
IPC分类号： B24D7/02 , B24D18/00
CPC分类号： B24D7/02 , B24D18/0063
摘要： A grinding element consists of a disk-shaped main body and blades formed as a unit therewith, wherein the main body and the blades are made of sintered hard material. An opening passing through the main body is arranged immediately in front of each blade with respect to a direction of rotation of the grinding element about a center axis. Each blade has a rake face that is partially cylindrical with a rake angle α=0° or partially conical with a rake angle α≠0°.

8. 发明申请

US20160270626A1 PROCESS FOR MANUFACTURING SCRUBBY SUBSTRATES AND SUBSTRATES MADE THEREFROM 审中-公开
标题翻译：用于制造SCRUBBY基板的工艺及其制造的基板
公开(公告)号：US20160270626A1
公开(公告)日：2016-09-22
申请号：US15073438
申请日：2016-03-17
申请人： THE CLOROX COMPANY
发明人： EDWARD JASON WHITE , SAMUEL HUGLEY
IPC分类号： A47L13/28 , B08B1/00 , B24D18/00
CPC分类号： B24D18/0063 , A47L13/17 , B32B3/10 , B32B3/30 , B32B5/02 , B32B5/022 , B32B5/26 , B32B7/05 , B32B7/12 , B32B23/10 , B32B27/12 , B32B27/283 , B32B27/302 , B32B27/306 , B32B27/32 , B32B27/34 , B32B27/36 , B32B27/38 , B32B27/40 , B32B27/42 , B32B37/153 , B32B37/24 , B32B2037/243 , B32B2262/0223 , B32B2262/0253 , B32B2262/0261 , B32B2262/0276 , B32B2262/0292 , B32B2262/04 , B32B2262/062 , B32B2264/102 , B32B2270/00 , B32B2307/4026 , B32B2307/536 , B32B2307/538 , B32B2432/00 , B32B2555/00 , D04H1/413 , D04H1/559 , D04H1/56
摘要： In-line processes for producing scrubby substrates, and related scrubby substrate cleaning articles. The process may include melting a polymer resin material, and extruding or otherwise dispensing the molten polymer resin material through one or more orifices of a heated nozzle, into a stream of hot inert gas, which attenuates the molten resin, so that the resin forms into elongated globules (rather than fibers or filaments). Such globules may have irregular cross-section and/or irregular thickness along a length of the globules. Alternatively, the molten resin may be formed into substantially continuous or discontinuous string or chain pattern of abrasive fibers, exhibiting a high frequency, low amplitude substantially linear pattern on the base substrate. In either case the globules or abrasive fibers are collected onto at least a portion of a base substrate layer to form a scrubby substrate that is more abrasive than typical meltblown materials.
摘要翻译：用于生产洗涤基材的在线方法以及相关的擦洗基质清洁制品。该方法可以包括熔融聚合物树脂材料，以及将熔融聚合物树脂材料通过一个或多个加热喷嘴的孔口挤出或以其他方式分配到热惰性气体流中，这使得熔融树脂衰减，使得树脂形成细长的小球（而不是纤维或细丝）。这样的小球可以沿着球的长度具有不规则的横截面和/或不规则的厚度。或者，熔融树脂可以形成为在基底基底上呈现高频，低振幅基本线性图案的研磨纤维的基本连续或不连续的线或链形图案。在任一种情况下，将小球或磨料纤维收集在基底层的至少一部分上以形成比典型的熔喷材料更具磨蚀性的擦洗衬底。

9. 发明申请

US20160136778A1 POLISHING PAD AND METHOD FOR MAKING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20160136778A1
公开(公告)日：2016-05-19
申请号：US14738307
申请日：2015-06-12
申请人： San Fang Chemical Industry Co., Ltd.
发明人： CHUNG-CHIH FENG , I-PENG YAO , CHIH-YI LIN , TAI-YUN FU , YUNG-CHANG HUNG , JHIH-GONG LIN
IPC分类号： B24B37/24 , B24D18/00 , B24D3/28 , B24B37/22
CPC分类号： B24B37/24 , B24B37/22 , B24D3/28 , B24D18/0027 , B24D18/0063
摘要： The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of second fibers, a polymeric elastomer and a plurality of pores. The second fibers are arranged irregularly and cross each other to form the pores, and the polymeric elastomer is attached to the second fibers and does not fill the pores.
摘要翻译：抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。抛光垫包括基底层和抛光层。基层具有第一表面和第二表面。抛光层设置在基层的第一表面上，并具有多个第二纤维，聚合物弹性体和多个孔。第二纤维不规则地布置并且彼此交叉以形成孔，并且聚合弹性体附着到第二纤维上，并且不填充孔。

10. 发明申请

US20070197143A1 Polishing pad of a chemical mechanical polishing apparatus and method of manufacturing the same 有权
标题翻译：化学机械抛光装置的抛光垫及其制造方法
公开(公告)号：US20070197143A1
公开(公告)日：2007-08-23
申请号：US11706241
申请日：2007-02-15
申请人： Young-Sam Lim , Young-Nam Kim , Gi-Jung Kim
发明人： Young-Sam Lim , Young-Nam Kim , Gi-Jung Kim
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24B37/24 , B24D18/0063
摘要： The surface(s) of a polishing pad for polishing an object has a first portion including hydrophilic material and a second portion including hydrophobic material. The first portion of the polishing surface is located in a first region of the polishing pad and the second portion of the polishing surface is located in a second region of the polishing pad juxtaposed with the first region in the radial direction of the pad. The hydrophilic material may be a polymer resin that contains hydrophilic functional groups having OH and/or ═O at bonding sites of the polymer. The hydrophobic material may be a polymer resin that contains hydrophobic functional groups having H and/or F at bonding sites of the polymer. The polishing pad is manufactured by extruding respective lines of the hydrophilic and hydrophobic materials. The extruders and a backing are moved relative to each other such that the lines form concentric rings of the hydrophilic and hydrophobic materials.
摘要翻译：用于抛光物体的抛光垫的表面具有包括亲水材料的第一部分和包括疏水材料的第二部分。抛光表面的第一部分位于抛光垫的第一区域中，并且抛光表面的第二部分位于抛光垫的与垫的径向方向上与第一区域并置的第二区域中。亲水材料可以是聚合物树脂，其在聚合物的键合位置含有具有OH和/或-O的亲水性官能团。疏水性材料可以是在聚合物的结合位置含有H和/或F的疏水官能团的聚合物树脂。抛光垫通过挤出亲水和疏水材料的相应线来制造。挤出机和背衬相对于彼此移动，使得线形成亲水和疏水材料的同心环。

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