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1. 发明授权

US5228206A Cluster tool dry cleaning system 失效
标题翻译：集群工具干洗系统
公开(公告)号：US5228206A
公开(公告)日：1993-07-20
申请号：US820985
申请日：1992-01-15
申请人： Robert W. Grant , Richard E. Novak
发明人： Robert W. Grant , Richard E. Novak
IPC分类号： C23F4/00 , F26B3/28 , F26B21/08 , F26B21/14 , H01L21/00 , H01L21/302 , H01L21/304
CPC分类号： H01L21/67028 , F26B21/08 , F26B21/14 , F26B3/283
摘要： A cluster tool module for dry process cleaning of substrates. A substrate process reactor body assembly includes a gas inlet and gas outlet on opposing sides of a ceramic reactor body. A linear xenon flash lamp in a light bar provides a UV source for uniform distribution over a substrate by use of a light filter. Infrared heating is also provided by a plurality of infrared lamps in the light box. A moisturizer is provided for safe introduction of water vapor into the gas flow.

2. 发明授权

US5807408A Industrial robot safety device that shuts down operation in reponse to variation in tension of a rope 失效
标题翻译：工业机器人安全装置，可以根据绳索张力的变化关闭操作
公开(公告)号：US5807408A
公开(公告)日：1998-09-15
申请号：US851668
申请日：1997-05-06
申请人： Carlos M. Ruiz
发明人： Carlos M. Ruiz
IPC分类号： B25J19/06 , F16P3/12 , F16P7/02
CPC分类号： F16P3/12 , B25J19/06
摘要： An industrial robot safety device and method for use in wet stations. A shutdown circuit is operative to deactivate the robot in response to operation of any one of two switches. Each switch responds to variations in tension that are beyond acceptable limits of an associated tensionable element, such as ropes or cables. The tensionable elements are respectively mounted on the left and right side of the robot in the paths of its travel.
摘要翻译：一种用于湿站的工业机器人安全装置和方法。关闭电路可操作以响应于两个开关中的任一个的操作来停用机器人。每个开关响应于张力的变化，其超出了相关联的可张紧元件（例如绳索或电缆）的可接受限度。可张紧元件分别安装在机器人的行进路径的左侧和右侧。

3. 发明授权

US5100190A Wafer carrier holder for wafer carriers 失效
标题翻译：晶圆载体的晶圆载体架
公开(公告)号：US5100190A
公开(公告)日：1992-03-31
申请号：US438024
申请日：1989-11-20
申请人： James Molinaro
发明人： James Molinaro
IPC分类号： H01L21/673 , H01L21/687
CPC分类号： H01L21/68707 , H01L21/67326
摘要： Low profile self-draining wafer carrier holder for gripping and carriage of semiconductor wafer carriers through robotically, automated or manual processing equipment. Opposing members extend horizontally from a central base with gripping fingers at outer extremities to grip wafer carriers for automatic processing. A handle member extends vertically from the central base member, and includes a handle member for accommodation by robotic end effectors. Beveled and angled surfaces in a preferred one-piece construction aid in accelerated fluid chemical runoff.
摘要翻译：薄型自排水晶片承载架，用于通过机器人，自动或手动加工设备夹持和运输半导体晶片载体。相对的构件从中心基座水平延伸，夹持手指在外端，以夹持晶片载体进行自动处理。手柄构件从中心基座构件垂直延伸，并且包括用于由机器人末端执行器调节的手柄构件。在加速流体化学品流失中，优选的单件结构辅助件中的斜面和倾斜表面。

4. 发明授权

US5332271A High temperature ceramic nut 失效
标题翻译：高温陶瓷螺母
公开(公告)号：US5332271A
公开(公告)日：1994-07-26
申请号：US769778
申请日：1991-10-02
申请人： Robert W. Grant , Richard E. Novak , James S. Molinaro
发明人： Robert W. Grant , Richard E. Novak , James S. Molinaro
IPC分类号： F16L19/02 , F16L19/04 , F16L15/04 , F16L25/00
CPC分类号： F16L19/0283 , F16L19/04 , F16L47/04 , Y10S285/911 , Y10S411/02 , Y10S411/904
摘要： High temperature ceramic nut of aluminum oxide for use in coupling a flared tube to a flare fitting.
摘要翻译：高温陶瓷螺母氧化铝，用于将喇叭管连接到火炬配件。

5. 发明授权

US5247954A Megasonic cleaning system 失效
标题翻译：超声波清洗系统
公开(公告)号：US5247954A
公开(公告)日：1993-09-28
申请号：US791094
申请日：1991-11-12
申请人： Robert W. Grant , Richard E. Novak
发明人： Robert W. Grant , Richard E. Novak
IPC分类号： B08B3/12 , H01L21/00
CPC分类号： H01L21/67057 , B08B3/12
摘要： Megasonic cleaning system for use in cleaning of electronic or other items such as semiconductor wafers or semiconductor substrates in a wafer carrier. Formed piezoelectric transducers are bonded to a tubular envelope at a low temperature and are excited at a first frequency or a second higher frequency for cleaning of items in a cleaning tank. A novel sealing assembly accommodates tubular envelopes of varying diameters.
摘要翻译：用于清洁晶片载体中的诸如半导体晶片或半导体衬底的电子或其它物品的超声波清洗系统。形成的压电换能器在低温下被结合到管状外壳上，并以第一频率或第二较高频率被激发以清洁清洗槽中的物品。新颖的密封组件适应不同直径的管状包络。

6. 发明授权

US5082518A Sparger plate for ozone gas diffusion 失效
标题翻译：用于臭氧气体扩散的分布板
公开(公告)号：US5082518A
公开(公告)日：1992-01-21
申请号：US604510
申请日：1990-10-29
申请人： James S. Molinaro
发明人： James S. Molinaro
IPC分类号： B08B3/10 , H01L21/00
CPC分类号： H01L21/67028 , B08B3/102
摘要： A gas diffusion system for evenly distributing injected gas in a bath including a diffusion sparger plate for spreading and distributing the gas. Gas moves horizontally under the plate, and is relayed upward through a set of gas passages in the plate.
摘要翻译：一种气体扩散系统，用于将喷射气体均匀分布在包括用于扩散和分配气体的扩散喷射器板的浴中。气体在板下水平移动，并通过板中的一组气体通道向上传播。

7. 发明授权

US5625249A Megasonic cleaning system 失效
标题翻译：超声波清洗系统
公开(公告)号：US5625249A
公开(公告)日：1997-04-29
申请号：US277792
申请日：1994-07-20
申请人： Robert Grant
发明人： Robert Grant
IPC分类号： B08B3/12 , H01L21/00 , H01L41/08
CPC分类号： H01L21/67023 , B08B3/12
摘要： A megasonic cleaning system utilizes a transducer positioned outside of a cleaning tank to transmit acoustical energy into the cleaning tank. A liquid layer is used to couple the acoustical energy from the transducer to the cleaning tank. An acoustical impedance matching layer, having an acoustical impedance in between that of the transducer and the cleaning fluid, is used to match the impedance of the transducer to that of the cleaning fluid. In one embodiment, the system utilizes at least two transducer arrays and power is switched back and forth between the two arrays. When one array is not being powered, it can be used to listen to the other array.
摘要翻译：兆声波清洗系统利用位于清洁槽外部的换能器将声能传递到清洗槽中。液体层用于将来自换能器的声能耦合到清洗槽。使用具有在换能器和清洁流体之间的声阻抗的声阻抗匹配层来将换能器的阻抗与清洁流体的阻抗相匹配。在一个实施例中，系统利用至少两个换能器阵列，并且功率在两个阵列之间来回切换。当一个数组没有被供电时，它可以用来监听另一个数组。

8. 发明授权

US5454677A High temperature ceramic nut 失效
标题翻译：高温陶瓷螺母
公开(公告)号：US5454677A
公开(公告)日：1995-10-03
申请号：US271863
申请日：1994-07-07
申请人： Robert H. Grant , Richard E. Novak , James S. Molinaro
发明人： Robert H. Grant , Richard E. Novak , James S. Molinaro
IPC分类号： F16L19/02 , F16L19/04 , F16B37/00
CPC分类号： F16L19/0283 , F16L19/04 , F16L47/04 , Y10S285/911 , Y10S411/02 , Y10S411/904
摘要： High temperature ceramic nut of aluminum oxide for use in coupling a flared tube to a flare fitting.
摘要翻译：高温陶瓷螺母氧化铝，用于将喇叭管连接到火炬配件。

9. 发明授权

US5437710A Chemical processing system for maintaining concentration of semiconductor processing solution 失效
标题翻译：用于保持半导体处理溶液浓度的化学处理系统
公开(公告)号：US5437710A
公开(公告)日：1995-08-01
申请号：US356048
申请日：1994-12-14
申请人： Robert W. Grant , Richard E. Novak
发明人： Robert W. Grant , Richard E. Novak
IPC分类号： B01J19/00 , B01D46/54 , C30B25/14 , B01D46/46
CPC分类号： B01D46/0058 , B01D46/543 , C30B25/14 , Y10S134/902
摘要： A chemical processing system for generating ultra-pure chemicals near the site of use. The system includes in series a supply of chemical or the site of use which may be a tank or drum and may be a point of use for semiconductor manufacturing, a concentrate sensor, a pump, a filter, a reactor vessel, and an optional heat exchanger, all connected by Kel-F tubing. Sources of pure filtered gas connect to the reactor vessel. An ozone generator can likewise connect to the reactor vessel. An optional isolation coil can likewise connect between the gas source and the reactor vessel.
摘要翻译：用于在使用场所附近生成超纯化学品的化学处理系统。该系统包括一系列化学品或使用场所，其可以是罐或桶，并且可以是半导体制造的使用点，浓缩物传感器，泵，过滤器，反应器容器和可选的热量交换器，全部由Kel-F管连接。纯过滤气体的来源连接到反应堆容器。臭氧发生器也可以连接到反应堆容器。可选的隔离线圈也可以连接在气体源和反应器容器之间。

10. 发明授权

US5234540A Process for etching oxide films in a sealed photochemical reactor 失效
标题翻译：在密封的光化学反应器中蚀刻氧化膜的方法
公开(公告)号：US5234540A
公开(公告)日：1993-08-10
申请号：US876043
申请日：1992-04-30
申请人： Robert W. Grant , Kevin Torek , Richard E. Novak , Jerzy Ruzyllo
发明人： Robert W. Grant , Kevin Torek , Richard E. Novak , Jerzy Ruzyllo
IPC分类号： H01L21/302 , H01L21/311
CPC分类号： H01L21/31116
摘要： A process for etching oxide films on the semiconductor, or other substrates, in a sealed photochemical reactor. Anhydrous hydrogen fluoride (AHF) gas, or other halogen containing gases, and alcohol vapor carried by an inert gas, such as nitrogen, are passed over the oxides to be etched. The UV radiation shines through a window, which passes the UV radiation onto the oxides while the gases are flowing, and enhances and controls etching of the oxides. The UV window is impervious to the etch process gases. The etch rates are modified, providing for improved oxide etching characteristics.
摘要翻译：一种用于在密封的光化学反应器中在半导体或其它基底上蚀刻氧化膜的方法。无水氟化氢（AHF）气体或其它含卤素气体，以及惰性气体如氮气携带的醇蒸气通过待蚀刻的氧化物。 UV辐射通过窗口照射，该窗口在气体流动时将UV辐射传递到氧化物上，并增强和控制氧化物的蚀刻。 UV窗口不受蚀刻工艺气体的影响。修改蚀刻速率，提供改善的氧化物蚀刻特性。

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