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1. 发明公开

US20230168478A1 Lens and Optical System Device 审中-公开
公开(公告)号：US20230168478A1
公开(公告)日：2023-06-01
申请号：US17916061
申请日：2021-03-30
申请人： SCIVAX CORPORATION
发明人： Akifumi Nawata , Satoru Tanaka
IPC分类号： G02B13/18 , G02B3/02 , G02B5/02 , G02B5/30
CPC分类号： G02B13/18 , G02B3/02 , G02B5/0273 , G02B5/3025
摘要： A lens and an optical system device are provided which can measure optical characteristics of a light source or an optical element with a simple structure. A lens 1 has an optical axis, and includes an incident surface F and an emit surface B. The incident surface F and the emit surface B are formed so as to emit incident light to the incident surface F from a first position O at an irradiation angle θ relative to the optical axis from the emit surface B at an emit angle θ/m (where m>1) relative to the optical axis by refraction at the incident surface F and at the emit surface B, and formed in such a way that apparent positions of lights emitted from the emit surface B all begin from a second position P. Moreover, an optical system device includes the lens 1 and a diffuser panel that diffuses emitted light from the lens 1.

2. 发明申请

US20150217506A1 Roller Pressing Device, Imprinting Device, and Roller Pressing Method 有权
标题翻译：辊压装置，压印装置和压辊方法
公开(公告)号：US20150217506A1
公开(公告)日：2015-08-06
申请号：US14400824
申请日：2013-06-19
申请人： SCIVAX CORPORATION
发明人： Hirosuke Kawaguchi , Yutaka Taniguchi , Satoru Tanaka
IPC分类号： B29C59/04
CPC分类号： B29C59/04 , B29C35/0805 , B29C2059/023 , B29L2007/001 , G03F7/0002
摘要： A roller-type depressing device, an imprint device and an imprint method utilizing the same which can depress an object like a die or a molding target by controlling the depressing force of a roller is provided. A roller-type depressing device to depress the object with a roller includes a pressure adjusting plate provided with the roller, a roller moving unit moving the roller relative to the object, a pressure adjusting unit holding the pressure adjusting plate in such a way that force produced by a pressure difference in fluid applied to both faces of the pressure adjusting plate acts on the roller, a pressure receiving stage receiving the pressure of the roller via the object, and a pressure adjuster adjusting the pressure difference in fluid applied to both faces of the pressure adjusting plate.
摘要翻译：提供了一种辊式压下装置，压印装置和使用该压印装置的压印方法，其通过控制辊的压下力来压制像模具或模制对象物体。用辊压住物体的滚筒式按压装置包括设置有辊的压力调节板，相对于物体移动辊的滚动移动单元，以压力调节板的方式保持压力调节板由压力调节板的两面施加的流体的压差产生的压力作用在辊上，压力接收台通过物体接收辊的压力，以及压力调节器，调节施加在压力调节板的两个面上的流体的压力差压力调节板。

3. 发明申请

US20140319718A1 IMPRINTING DEVICE AND IMPRINTING METHOD 有权
标题翻译：印刷装置和印刷方法
公开(公告)号：US20140319718A1
公开(公告)日：2014-10-30
申请号：US14359647
申请日：2012-11-21
申请人： SCIVAX CORPORATION
发明人： Hirosuke Kawaguchi , Satoru Tanaka
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C59/02 , B29C59/022 , B29C2059/023 , B29C2791/006 , H01L21/565
摘要： An imprinting device to transfer the mold pattern on a die to a molding target includes a casing forming a pressure-adjusting chamber, a stage supporting the die and the molding target, a frame encircling a circumference of the stage, first moving means moving the casing and the stage in a direction coming close to each other or becoming distant from each other, second moving means moving the casing and the frame in a direction coming close to each other or becoming distant from each other, pressure-adjusting means that adjusts the pressure of a fluid in the pressure-adjusting chamber, and decompression means which decompresses a decompression chamber formed by the stage, a frame, and the die or the molding target, and which eliminates a fluid present between the die and the molding target.
摘要翻译：将模具上的模具图案转印到模制品上的压印装置包括形成压力调节室的壳体，支撑模具和成型目标的支架，围绕平台的周边的框架，移动壳体的第一移动装置并且在彼此靠近或彼此远离的方向上的台阶，第二移动装置使壳体和框架沿彼此靠近或彼此远离的方向移动;调节装置，其调节压力压力调节室中的流体的减压装置，以及减压装置，其对由载物台，框架和模具或模制目标物形成的减压室进行减压，并且消除了模具和模制目标之间存在的流体。

4. 发明申请

US20140147543A1 FLUID PRESSURE IMPRINTING DEVICE PROVIDED WITH PRESSURIZATION UNIT SECURING TOOL 审中-公开
标题翻译：流体压力加压装置提供加压装置工具
公开(公告)号：US20140147543A1
公开(公告)日：2014-05-29
申请号：US14232081
申请日：2012-07-06
申请人： Hirosuke Kawaguchi , Hironobu Tamura , Satoru Tanaka
发明人： Hirosuke Kawaguchi , Hironobu Tamura , Satoru Tanaka
IPC分类号： B29C59/02
CPC分类号： B29C59/02 , G11B5/855
摘要： An imprinting device is provided which is capable of using small an opening/closing device even when a transfer area increases. The imprinting device that transfers a molding pattern of a die to a molding target includes a pressurization unit that includes a pressurization chamber to pressurize the die and the molding target by a fluid, a stage that supports the die and the molding target pressurized by the pressurization unit, a pressurization device for adjusting the pressure of the fluid inside the pressurization chamber, an opening/closing device for relatively moving the pressurization unit and the stage, and a securing tool that secures the pressurization unit and the stage so as to prevent or suppress an application of force generated by the pressurization unit to the opening/closing device.
摘要翻译：提供一种即使当传送区域增加时也能够使用小的打开/关闭装置的压印装置。将模具的成形图案转印到模制对象的压印装置包括加压单元，该加压单元包括通过流体对模具和成型目标物进行加压的加压室，支撑模具的阶段和通过加压加压的模制对象单元，用于调节加压室内的流体的压力的加压装置，用于使加压单元和载物台相对移动的开闭装置，以及固定加压单元和载物台以防止或抑制的固定工具施加由加压单元产生的力到打开/关闭装置。

5. 发明申请

US20130045500A1 CELL EVALUATION METHOD 审中-公开
标题翻译：细胞评估方法
公开(公告)号：US20130045500A1
公开(公告)日：2013-02-21
申请号：US13212817
申请日：2011-08-18
申请人： Satoru Tanaka , Ruriko Sakamoto , Tetsuya Nakatsura , Manami Shimomura
发明人： Satoru Tanaka , Ruriko Sakamoto , Tetsuya Nakatsura , Manami Shimomura
IPC分类号： C12Q1/02
CPC分类号： G01N33/5011
摘要： The present invention provides a method of figuring out an effect of a medicine exerting on the same cell quantitatively over a time. A cell evaluation method includes a step of culturing cells on a cell-culture base material that is capable of culturing spheroids, and a step of measuring a change over a time in the number of the spheroids formed through the former step or a percentage of the spheroids formed through the former step relative to an entire cultured cell.
摘要翻译：本发明提供一种在一定时间内定量地计算出在同一细胞上施用的药物的效果的方法。细胞评价方法包括在能够培养球体的细胞培养基材上培养细胞的步骤，以及测定通过前述步骤形成的球状体数目的时间变化的步骤，或者相对于整个培养细胞，通过前一步形成的球体。

6. 发明授权

US11489091B2 Semiconductor light emitting device and method of manufacturing semiconductor light emitting device having pattered light extraction surface 有权
公开(公告)号：US11489091B2
公开(公告)日：2022-11-01
申请号：US16370791
申请日：2019-03-29
申请人： NIKKISO CO., LTD. , SCIVAX Corporation
发明人： Noritaka Niwa , Tetsuhiko Inazu , Yasumasa Suzaki , Akifumi Nawata , Satoru Tanaka
IPC分类号： H01L33/32 , H01L33/22 , H01L33/00 , H01L21/3065 , H01L33/40
摘要： A semiconductor light emitting device includes a light extraction layer having a light extraction surface. The light extraction layer includes: a plurality of cone-shaped parts formed in an array on the light extraction surface, and a plurality of granular parts formed both on a side part of the cone-shaped part and in a space between adjacent cone-shaped parts. A method of manufacturing the semiconductor light emitting device includes: forming a mask having an array pattern on the light extraction layer; and etching the mask and the light extraction layer from above the mask. The etching includes first dry-etching performed until an entirety of the mask is removed and second dry-etching performed to further dry-etch the light extraction layer after the mask is removed.

7. 发明申请

US20210373217A1 FINE PATTERN FORMING METHOD, IMPRINT MOLD MANUFACTURING METHOD, IMPRINT MOLD, AND OPTICAL DEVICE 有权
公开(公告)号：US20210373217A1
公开(公告)日：2021-12-02
申请号：US17285992
申请日：2019-10-15
申请人： SCIVAX CORPORATION
发明人： Daiji Tanabe , Nobuyoshi Awaya , Satoru Tanaka
IPC分类号： G02B5/30 , B29C33/38 , G03F7/00
摘要： A forming method of forming a micropattern which has a direction and a position controlled for each predetermined position on an object subjected to pattern formation, and an imprinting mold producing method, an imprinting mold and an optical device to which such a forming method is applied. A first mask pattern forming process of forming, by imprinting, a first mask pattern for forming the micropattern on a surface of an object subjected to pattern formation, the surface including a region where at least the micropattern is not formed yet; a second mask pattern forming process of forming a resist film on the object subjected to pattern formation and on the first mask pattern, exposing and developing such a film by light emission to form a second mask pattern that causes a region where the micropattern is not formed but the first mask patten is formed to appear in an uncovered manner; and a micropattern forming process of performing etching on the object subjected to pattern formation to form the micropattern. The first mask pattern forming process, the second mask pattern forming process and the micropattern forming process are repeated in this sequence.

8. 发明授权

US10343312B2 Imprint device and imprint method 有权
公开(公告)号：US10343312B2
公开(公告)日：2019-07-09
申请号：US14407510
申请日：2013-08-23
申请人： SCIVAX CORPORATION
发明人： Hirosuke Kawaguchi , Tatsuya Hagino , Satoru Tanaka
IPC分类号： B29C59/02 , B29C43/10 , B29D11/00 , B29C43/12 , B82Y40/00 , G03F7/00 , B29C43/36 , B29C43/02 , B29C43/32 , B29C51/28
摘要： An imprint device and an imprint method which form mold patterns on both surfaces of a molding target. An imprint device transfers mold patterns on both surfaces of a molding target using flexible first and second dies and includes first and second casings which each apply pressure of first and second pressurizing rooms respectively, to the first and second dies respectively and the molding target, a pressurizer that adjusts the pressures of the pressurizing rooms, first and second moving units that move the first and second dies respectively and the molding target in a direction coming close to or distant from each other, a depressurizer that depressurizes a depressurizing room formed between the first and second casings, and eliminates fluids present between the dies and the molding target, and a pressure adjuster that adjusts pressures to reduce pressure differences between the depressurizing room and the pressurizing rooms.

9. 发明授权

US08324332B2 Resin for thermal imprint 有权
标题翻译：用于热压印的树脂
公开(公告)号：US08324332B2
公开(公告)日：2012-12-04
申请号：US11992625
申请日：2006-08-25
申请人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
发明人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
IPC分类号： C08G61/08 , C08F8/04 , C08F32/08
CPC分类号： B29C59/005 , B29C59/026 , B29K2045/00 , C08F232/08 , C08G61/06 , C08G61/08 , H05K1/032 , H05K3/0014 , H05K3/107 , H05K2201/0158 , H05K2203/0108
摘要： A resin for thermal imprint including a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.)
摘要翻译：一种用于热压印的树脂，其包含在主链中包含由以下化学方程式1或以下化学式2表示的骨架中的至少一种的环状烯烃类热塑性树脂。玻璃化转变温度Tg（℃）和MFR在260℃下的值（[M]）满足下列等式1，[M]> 10。热压印特性（转印性，脱模特性等）优异，生产率（生产率）提高。 Tg（℃）<219×log [M] -104 [等式1]

10. 发明申请

US20120223461A1 IMPRINTING DEVICE AND IMPRINTING METHOD 审中-公开
标题翻译：印刷装置和印刷方法
公开(公告)号：US20120223461A1
公开(公告)日：2012-09-06
申请号：US13471573
申请日：2012-05-15
申请人： Yoshiaki Takaya , Yuji Hashima , Yoshihisa Hayashida , Hirosuke Kawaguchi , Satoru Tanaka , Akihiko Kanai , Kazuaki Uehara
发明人： Yoshiaki Takaya , Yuji Hashima , Yoshihisa Hayashida , Hirosuke Kawaguchi , Satoru Tanaka , Akihiko Kanai , Kazuaki Uehara
IPC分类号： B29C59/02 , B29C35/08
CPC分类号： B29C59/022 , B29C33/42 , B29C2035/0822 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object, and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.
摘要翻译：本发明提供能够均匀地在模具和成型体之间施加压力并且可以以快速的速度增加和降低温度的压印装置和压印方法。压印装置用于将模具上的图案转印到薄膜成型体上，并且包括用于保持模具的台，与成型对象一起构成加压室的加压室壳体，气密地密封空间的密封装置在加压室壳体和成型体之间，开闭装置，其对加压室壳体与成型体之间的空间进行打开和关闭;加压装置，其对加压室内的大气压进行调节;加热单元，模具和模制对象中的一个或两个，以及消除在模具和模制对象之间存在的任何气体的脱气装置。

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