会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Condensed memory cell structure using a FinFET
    • 使用FinFET的冷凝存储单元结构
    • US08665629B2
    • 2014-03-04
    • US11864575
    • 2007-09-28
    • Human ParkUlrich KlostermannRainer Leuschner
    • Human ParkUlrich KlostermannRainer Leuschner
    • G11C11/00
    • H01L27/228H01L27/2436H01L29/66795H01L29/785
    • An integrated circuit and method for manufacturing an integrated circuit are described. In one embodiment, the integrated circuit includes a memory cell that includes a resistivity changing memory element. The resistivity changing memory element is electrically coupled to a select transistor that includes a FinFET including a source, a drain, and a fin structure formed above a surface of a substrate between the source and the drain. The fin structure includes a channel area extending in a direction substantially parallel to the surface of the substrate, and a dielectric layer formed around at least a portion of the channel area such that an effective channel width of the select transistor depends at least in part on a height of the fin structure.
    • 对集成电路的集成电路及其制造方法进行说明。 在一个实施例中,集成电路包括包括电阻率变化存储元件的存储单元。 电阻率变化存储元件电耦合到选择晶体管,该选择晶体管包括在源极和漏极之间形成在衬底表面上方的源极,漏极和鳍状结构的FinFET。 翅片结构包括在基本上平行于衬底的表面的方向上延伸的沟道区,以及围绕沟道区的至少一部分形成的介电层,使得选择晶体管的有效沟道宽度至少部分依赖于 翅片结构的高度。