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1. 发明授权

US11309529B2 Photolithographic patterning of organic electronic devices 有权
公开(公告)号：US11309529B2
公开(公告)日：2022-04-19
申请号：US17082655
申请日：2020-10-28
申请人： ORTHOGONAL, INC.
发明人： John Andrew DeFranco , Terrence Robert O'Toole , Frank Xavier Byrne , Diane Carol Freeman
IPC分类号： H01L21/00 , H01L29/08 , H01L51/56 , H01L51/00 , H01L27/32 , H01L51/52 , H01L51/50
摘要： A method of making an OLED device includes providing a first undercut lift-off structure over the device substrate having a first array of bottom electrodes. Next, one or more first organic EL medium layers including at least a first light-emitting layer are deposited over the first undercut lift-off structure and over the first array of bottom electrodes. The first undercut lift-off structure and overlying first organic EL medium layer(s) are removed by treatment with a first lift-off agent comprising a fluorinated solvent to form a first intermediate structure. The process is repeated using a second undercut lift-off structure to deposit one or more second organic EL medium layers over a second array of bottom electrodes. After removal of the second undercut lift-off structure, a common top electrode is provided in electrical contact with the first and second organic EL medium layers.

2. 发明授权

US10503065B2 Photolithographic patterning of devices 有权
公开(公告)号：US10503065B2
公开(公告)日：2019-12-10
申请号：US15501128
申请日：2015-07-31
申请人： ORTHOGONAL, INC.
发明人： Terrence Robert O'Toole , John Andrew DeFranco , Frank Xavier Byrne
IPC分类号： G03F7/00 , H01L51/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/32 , G03F7/40 , C11D7/50 , H01L51/56
CPC分类号： G03F7/0035 , C11D7/505 , G03F7/0002 , G03F7/0046 , G03F7/038 , G03F7/0392 , G03F7/0397 , G03F7/325 , G03F7/40 , H01L51/0016 , H01L51/0018 , H01L51/56
摘要： A method of patterning a device is disclosed using a resist precursor structure having at least two fluoropolymer layers. A first fluoropolymer layer includes a first fluoropolymer material having a fluorine content of at least 50% by weight and is substantially soluble in a first hydrofluoroether solvent or in a first perfluorinated solvent, but substantially less soluble in a second hydrofluoroether solvent relative to both the first hydrofluoroether and the first perfluorinated solvent. The second fluoropolymer layer includes a second fluoropolymer material having a fluorine content less than that of the first fluoropolymer material and is substantially soluble in the first or second hydrofluoroether solvents, but substantially less soluble in the first perfluorinated solvent relative to both the first and second hydrofluoroether solvents.

3. 发明授权

US09541829B2 Cross-linkable fluorinated photopolymer 有权
标题翻译：可交联的氟化光聚合物
公开(公告)号：US09541829B2
公开(公告)日：2017-01-10
申请号：US14335406
申请日：2014-07-18
申请人： Orthogonal, Inc.
发明人： Douglas Robert Robello , Charles Warren Wright
IPC分类号： G03F7/004 , G03F7/038 , G03F7/32 , C08F220/18 , H01L21/027 , C08F222/18 , G03F7/40 , C08F220/22 , C08F220/24 , G03F7/00
CPC分类号： G03F7/0388 , C08F220/18 , C08F220/22 , C08F220/24 , C08F222/18 , C08F2222/185 , C09B1/00 , C09B57/02 , C09B69/008 , C09B69/101 , C09B69/109 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/32 , G03F7/40 , H01L21/0274 , C08F2220/325 , C08F2220/1891
摘要： A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
摘要翻译：光敏组合物包含氟化溶剂，光酸产生剂和共聚物。该共聚物包含至少三个不同的重复单元，包括具有含氟基团的第一重复单元，具有酸催化的可交联基团的第二重复单元和具有敏化染料的第三重复单元。该组合物可用于制造电子器件，特别是有机电子和生物电子器件。

4. 发明授权

US09298088B2 Fluorinated photopolymer with fluorinated sensitizer 有权
标题翻译：氟化光敏聚合物与氟化敏化剂
公开(公告)号：US09298088B2
公开(公告)日：2016-03-29
申请号：US14335476
申请日：2014-07-18
申请人： Orthogonal, Inc.
发明人： Douglas Robert Robello , Charles Warren Wright
IPC分类号： G03F7/004 , G03F7/40 , G03F7/027 , G03F7/038 , G03F7/20 , G03F7/30 , G03F7/32 , H01L21/027 , C08F220/18 , C08F220/24 , C08F222/18
CPC分类号： G03F7/027 , C08F220/18 , C08F220/24 , C08F222/18 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/0392 , G03F7/0758 , G03F7/11 , G03F7/2002 , G03F7/30 , G03F7/32 , G03F7/40 , G03F7/425 , H01L21/0274
摘要： A photosensitive composition useful for fabricating organic electronic devices comprises a fluorinated solvent a fluorinated sensitizing dye and a copolymer. The copolymer comprises at least two distinct repeating units, including a first repeating unit having a fluorine-containing group and a second repeating unit having a solubility-altering reactive group. The presence of the fluorinated sensitizing dye improves photosensitivity.
摘要翻译：用于制造有机电子器件的光敏组合物包括含氟溶剂氟化增感染料和共聚物。共聚物包含至少两个不同的重复单元，包括具有含氟基团的第一重复单元和具有溶解度改变的反应性基团的第二重复单元。氟化感光染料的存在提高了光敏性。

5. 发明申请

US20210043877A1 PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES 有权
公开(公告)号：US20210043877A1
公开(公告)日：2021-02-11
申请号：US17082655
申请日：2020-10-28
申请人： ORTHOGONAL, INC.
发明人： John Andrew DEFRANCO , Terrence Robert O'TOOLE , Frank Xavier BYRNE , Diane Carol FREEMAN
IPC分类号： H01L51/56 , H01L51/00 , H01L27/32 , H01L51/52 , H01L51/50
摘要： A method of making an OLED device includes providing a first undercut lift-off structure over the device substrate having a first array of bottom electrodes. Next, one or more first organic EL medium layers including at least a first light-emitting layer are deposited over the first undercut lift-off structure and over the first array of bottom electrodes. The first undercut lift-off structure and overlying first organic EL medium layer(s) are removed by treatment with a first lift-off agent comprising a fluorinated solvent to form a first intermediate structure. The process is repeated using a second undercut lift-off structure to deposit one or more second organic EL medium layers over a second array of bottom electrodes. After removal of the second undercut lift-off structure, a common top electrode is provided in electrical contact with the first and second organic EL medium layers.

6. 发明申请

US20180159089A1 PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES 审中-公开
公开(公告)号：US20180159089A1
公开(公告)日：2018-06-07
申请号：US15867019
申请日：2018-01-10
申请人： ORTHOGONAL, INC.
发明人： John Andrew DEFRANCO , Terrence Robert O'TOOLE , Frank Xavier BYRNE , Diane Carol FREEMAN
IPC分类号： H01L51/56 , H01L51/52 , H01L51/50 , H01L27/32 , H01L51/00
摘要： A method of making an OLED device includes providing a first undercut lift-off structure over the device substrate having a first array of bottom electrodes. Next, one or more first organic EL medium layers including at least a first light-emitting layer are deposited over the first undercut lift-off structure and over the first array of bottom electrodes. The first undercut lift-off structure and overlying first organic EL medium layer(s) are removed by treatment with a first lift-off agent comprising a fluorinated solvent to form a first intermediate structure. The process is repeated using a second undercut lift-off structure to deposit one or more second organic EL medium layers over a second array of bottom electrodes. After removal of the second undercut lift-off structure, a common top electrode is provided in electrical contact with the first and second organic EL medium layers.

7. 发明申请

US20170287694A1 PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES 有权
公开(公告)号：US20170287694A1
公开(公告)日：2017-10-05
申请号：US15631616
申请日：2017-06-23
申请人： ORTHOGONAL, INC.
发明人： Douglas Robert ROBELLO , Terrence Robert O'TOOLE , Frank Xavier BYRNE , Diane Carol FREEMAN
IPC分类号： H01L21/027 , C09D4/00 , C08F214/18 , H01L51/00 , C08K3/16
CPC分类号： H01L21/0272 , C08F214/18 , C08K3/16 , C09D4/00 , G03F7/0046 , G03F7/038 , G03F7/0388 , G03F7/0392 , G03F7/0397 , G03F7/325 , H01L51/0011 , C08F222/10
摘要： A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.

8. 发明授权

US09530976B2 Organic electrochemical transistor 有权
标题翻译：有机电化学晶体管
公开(公告)号：US09530976B2
公开(公告)日：2016-12-27
申请号：US14943634
申请日：2015-11-17
申请人： Orthogonal, Inc.
发明人： Marc Ferro , George Malliaras
IPC分类号： H01L51/05 , H01L51/10 , G01N27/00 , G03F7/20 , H01L51/00 , G03F7/30 , G03F7/00 , G03F7/004 , G03F7/38
CPC分类号： H01L51/0541 , G01N27/00 , G03F7/00 , G03F7/0046 , G03F7/2022 , G03F7/30 , G03F7/38 , H01L51/0018 , H01L51/102 , H01L51/105
摘要： A method of making a structure having a patterned a base layer and useful in the fabrication of optical and electronic devices including bioelectronic devices includes, in one embodiment, the steps of: a) providing a layer of a radiation-sensitive resin; b) exposing the layer of radiation-sensitive resin to patterned radiation to form a base layer precursor having a first pattern of exposed radiation-sensitive resin and a second pattern of unexposed radiation-sensitive resin; c) providing a layer of fluoropolymer in a third pattern over the base layer precursor to form a first intermediate structure; d) treating the first intermediate structure to form a second intermediate structure; and e) selectively removing either the first or second pattern of resin by contacting the second intermediate structure with a resin developing agent, thereby forming the patterned base layer. The method is capable of providing multilayer articles having almost any shape at high resolution without the need for expensive or damaging mechanical or laser cutting.
摘要翻译：制造具有图案化基底层并且可用于制造包括生物电子器件的光学和电子器件的结构的方法包括在一个实施例中的步骤：a）提供辐射敏感树脂层; b）将辐射敏感树脂层暴露于图案化辐射以形成具有暴露的辐射敏感树脂的第一图案和未曝光的辐射敏感树脂的第二图案的基底层前体; c）在基层前体上提供第三图案的氟聚合物层以形成第一中间结构; d）处理所述第一中间结构以形成第二中间结构; 和e）通过使第二中间结构与树脂显影剂接触来选择性地去除第一或第二图案，从而形成图案化的基层。该方法能够以高分辨率提供具有几乎任何形状的多层制品，而不需要昂贵或破坏性的机械或激光切割。

9. 发明申请

US20130236999A1 METHOD FOR FORMING A MULTICOLOR OLED DEVICE 有权
标题翻译：用于形成多媒体OLED器件的方法
公开(公告)号：US20130236999A1
公开(公告)日：2013-09-12
申请号：US13638062
申请日：2011-04-27
申请人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
发明人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
IPC分类号： H01L51/56
CPC分类号： H01L51/0016 , G03F7/0046 , G03F7/325 , H01L27/3206 , H01L27/3211 , H01L27/3281 , H01L51/0018 , H01L51/504 , H01L51/56 , H05B33/10
摘要： A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.
摘要翻译：提供了一种用于形成多色OLED器件的方法，其包括提供衬底，用氟化光致抗蚀剂溶液涂覆衬底以形成第一可光刻图层并使其暴露以产生暴露的氟化光致抗蚀剂材料的第一图案，并且第二未曝光的氟化光致抗蚀剂材料的图案，用氟化溶剂显影光图案层以除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，将第一有机发光材料沉积在衬底上形成用于发射第一颜色的光的第一有机发光层，并施加暴露的氟化光致抗蚀剂材料的第一图案以控制去除第一有机发光层的一部分。然后将第二氟化光致抗蚀剂溶液涂覆在第一光刻的有机发光层上并暴露以形成具有不同于第一图案的图案和未曝光的氟化光致抗蚀剂材料的第四图案的暴露的氟化光致抗蚀剂材料的第三图案，在氟化溶剂中的光图案化层，以去除未曝光的氟化光致抗蚀剂材料的第四图案，而不去除暴露的氟化光致抗蚀剂材料的第三图案，沉积至少第二发光材料以形成第二发光层，用于发射第二与第一颜色的光不同的光的颜色，并施加暴露的氟化光致抗蚀剂材料的第三图案，以控制第二有机发光层的一部分的去除。

10. 发明申请

US20200301276A1 CROSS-LINKABLE FLUORINATED PHOTOPOLYMER 审中-公开
公开(公告)号：US20200301276A1
公开(公告)日：2020-09-24
申请号：US16893713
申请日：2020-06-05
申请人： Orthogonal, Inc.
发明人： Charles Warren WRIGHT , Douglas Robert ROBELLO , John Andrew DEFRANCO , Diane Carol FREEMAN , Frank Xavier BYRNE
IPC分类号： G03F7/038 , G03F7/40 , G03F7/20 , G03F7/30 , H01L21/027 , C08F220/34 , G03F7/004 , G03F7/075 , H01L21/3105 , H01L21/311 , G03F7/11
摘要： A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

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