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1. 发明授权

US10692686B2 Surface treatment apparatus using plasma 有权
公开(公告)号：US10692686B2
公开(公告)日：2020-06-23
申请号：US15655548
申请日：2017-07-20
申请人： JEHARA CORPORATION
发明人： Hongseub Kim
IPC分类号： C23C16/00 , H01J37/02 , H01J37/32
摘要： The present invention relates to a surface treatment apparatus for cleaning or treating (micro etching, etc.) a surface of a TEM sample (substrate) by converting plasma ions into a neutral beam and a separator including an RF cathode connected to an RF supply unit and accelerating ions by self bias is disposed between a plasma generating chamber and a neutral chamber and the ions generated in the plasma generating chamber are converted into a neutral beam through a separator and accelerated and irradiated to a neutral chamber to enable surface treatment without damaging a sample.

2. 发明申请

US20110133650A1 APPARATUS FOR GENERATING PLASMA 失效
标题翻译：用于产生等离子体的装置
公开(公告)号：US20110133650A1
公开(公告)日：2011-06-09
申请号：US12941234
申请日：2010-11-08
申请人： Hongseub KIM
发明人： Hongseub KIM
IPC分类号： H05B31/26
CPC分类号： H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32174 , H01J37/32577
摘要： An apparatus for generating plasma is provided. The apparatus may include a vacuum chamber and a plasma source part. The plasma source part may include a dielectric part, an upper electrode, and an inductive coil. The dielectric part may be installed to protrude upward along a circumference of a through-hole provided at a top of the vacuum chamber. The upper electrode may be coupled to seal an opened top of the dielectric part. The inductive coil may spirally extend along an outer circumference surface of the dielectric part.
摘要翻译：提供了一种用于产生等离子体的装置。该装置可以包括真空室和等离子体源部分。等离子体源部分可以包括电介质部分，上电极和感应线圈。电介质部件可以安装成沿着设置在真空室顶部的通孔的圆周向上突出。上电极可以联接以密封电介质部分的开口顶部。感应线圈可以沿着电介质部分的外周表面螺旋地延伸。

3. 发明授权

US10115569B2 Plasma generator 有权
公开(公告)号：US10115569B2
公开(公告)日：2018-10-30
申请号：US15487985
申请日：2017-04-14
申请人： JEHARA CORPORATION
发明人： Hongseub Kim
IPC分类号： H01J7/24 , H05B31/26 , H01J37/32
摘要： Provided is a plasma generator for improving uniformity of plasma. The plasma generator which includes a pair of source electrode unit 110 and bias electrode unit 120 disposed to face each other in a vacuum chamber and an RF power unit 132 and a bias RF power unit 142 supplying RF power to the source electrode unit 110 and the bias electrode unit 120, respectively, comprises a common contact point cc which is connected with a plurality of contact points cp disposed along the edge of the source electrode unit 110; and an impedance controller 150 which is connected with the common contact point cc to control the impedance.

4. 发明授权

US08604697B2 Apparatus for generating plasma 失效
标题翻译：用于产生等离子体的装置
公开(公告)号：US08604697B2
公开(公告)日：2013-12-10
申请号：US12941234
申请日：2010-11-08
申请人： Hongseub Kim
发明人： Hongseub Kim
IPC分类号： H01J7/24 , H05B31/26 , C23F1/00 , C03C15/00 , C03C25/68 , H01L21/306
CPC分类号： H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32174 , H01J37/32577
摘要： An apparatus for generating plasma is provided. The apparatus may include a vacuum chamber and a plasma source part. The plasma source part may include a dielectric part, an upper electrode, and an inductive coil. The dielectric part may be installed to protrude upward along a circumference of a through-hole provided at a top of the vacuum chamber. The upper electrode may be coupled to seal an opened top of the dielectric part. The inductive coil may spirally extend along an outer circumference surface of the dielectric part.
摘要翻译：提供了一种用于产生等离子体的装置。该装置可以包括真空室和等离子体源部分。等离子体源部分可以包括电介质部分，上电极和感应线圈。电介质部件可以安装成沿着设置在真空室顶部的通孔的圆周向上突出。上电极可以联接以密封电介质部分的开口顶部。感应线圈可以沿着电介质部分的外周表面螺旋地延伸。

5. 发明授权

US08425719B2 Plasma generating apparatus 有权
标题翻译：等离子体发生装置
公开(公告)号：US08425719B2
公开(公告)日：2013-04-23
申请号：US12852727
申请日：2010-08-09
申请人： Hongseub Kim
发明人： Hongseub Kim
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01J37/321 , H01J37/32091 , H01J37/3211 , H01J37/3244 , H01J37/32697 , H01J37/32715
摘要： A plasma generating apparatus is provided. The plasma generating apparatus may include a vacuum chamber, an ElectroStatic Chuck (ESC), a first antenna part including a first antenna and a first antenna cover, and a second antenna part including a second antenna and a second antenna cover. The vacuum chamber has a vacant interior and a top sealed by an insulation vacuum plate. The ESC is disposed at a center of the inside of the vacuum chamber. The first antenna is coupled to a through-hole of the second antenna. The first antenna cover airtightly covers a top of the first antenna. The second antenna is coupled to the through-hole of the insulation vacuum plate. The second antenna cover airtightly covers a top of the first antenna part and the second antenna.
摘要翻译：提供了一种等离子体产生装置。等离子体发生装置可以包括真空室，静电卡盘（ESC），包括第一天线和第一天线盖的第一天线部分和包括第二天线和第二天线盖的第二天线部分。真空室具有空的内部和由绝缘真空板密封的顶部。 ESC设置在真空室内部的中心。第一天线耦合到第二天线的通孔。第一个天线罩气密地覆盖第一个天线的顶部。第二天线耦合到绝缘真空板的通孔。第二天线罩气密地覆盖第一天线部分和第二天线的顶部。

6. 发明授权

US08264153B2 Plasma source for large size substrate 有权
标题翻译：等离子源用于大尺寸基板
公开(公告)号：US08264153B2
公开(公告)日：2012-09-11
申请号：US12852804
申请日：2010-08-09
申请人： Hongseub Kim
发明人： Hongseub Kim
IPC分类号： H01J7/24 , H01J17/26 , H01J61/28 , H05B31/26
CPC分类号： H05H1/46 , H01J37/32091 , H01J37/32183 , H05H2001/4682
摘要： A plasma source for a substrate is provided. The plasma source may include a source electrode and an impedance box. The source electrode receives a source Radio Frequency (RF) from the external and generates plasma based on capacitive coupling within a vacuum chamber. The impedance box connects at one end to an outer circumference surface of the source electrode, and is grounded at the other end to the vacuum chamber, and controls an electric current flowing from the source electrode to the vacuum chamber by the source RF.
摘要翻译：提供了一种用于衬底的等离子体源。等离子体源可以包括源电极和阻抗盒。源电极从外部接收源射频（RF），并根据真空室内的电容耦合产生等离子体。阻抗箱的一端与源电极的外周面连接，另一端与真空室接地，通过源RF控制从源电极流向真空室的电流。

7. 发明授权

US08181597B2 Plasma generating apparatus having antenna with impedance controller 有权
标题翻译：具有带有阻抗控制器的天线的等离子体发生装置
公开(公告)号：US08181597B2
公开(公告)日：2012-05-22
申请号：US12599799
申请日：2008-04-18
申请人： Hong-Seub Kim , Hyeon-Dong Shin
发明人： Hong-Seub Kim , Hyeon-Dong Shin
IPC分类号： H01L21/3065 , C23C16/00
CPC分类号： H01J37/321 , H01J37/32082 , H01J37/32091
摘要： Provided is a plasma generating apparatus. The apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna holder. The vacuum chamber has a hollow interior and is sealed at its top by a vacuum plate that has a through-hole at its center. The ESC is disposed at an internal center of the vacuum chamber. The antenna unit is disposed within the vacuum chamber under the vacuum plate. The antenna cover covers and is coupled to a top of the antenna unit and receives and forwards an external source RF to the antenna unit. The cover holder is caught by an upper surface of the vacuum plate and suspends and holds the antenna unit.
摘要翻译：提供了一种等离子体产生装置。该装置包括一个真空室，一个静电卡盘（ESC），一个天线座。真空室具有中空的内部，并通过在其中心具有通孔的真空板在其顶部被密封。 ESC设置在真空室的内部中心。天线单元设置在真空室下的真空室内。天线盖覆盖并耦合到天线单元的顶部，并接收并转发外部源RF到天线单元。盖保持器被真空板的上表面卡住并悬挂并保持天线单元。

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