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    • 3. 发明申请
    • System for unbalanced magnetron sputtering with AC power
    • 交流电源不平衡磁控溅射系统
    • US20040149575A1
    • 2004-08-05
    • US10720602
    • 2003-11-24
    • Isoflux, Inc.
    • David A. GlockerMark Romach
    • C23C014/35
    • C23C14/352
    • An array of unbalanced magnetrons arranged around a centrally-located space for sputter coating of material from target electrodes in the magnetrons onto a substrate disposed in the space. The electrodes are powered in pairs by an alternating voltage and current source. The unbalanced magnetrons, which may be planar, cylindrical, or conical, are arranged in mirror configuration such that like poles are opposed across the substrate space or are adjacent on the same side of the substrate space. The magnetrons are all identical in magnetic polarity, such that there is no magnetic coupling between either opposed or adjacent magnetrons. A positive plasma potential produced by the AC driver prevents electrons from escaping to ground along the unclosed field lines, increasing plasma density in the background working gas and thereby improving the quality of coating being deposited on the substrate.
    • 一个不平衡磁控管阵列,其布置在中心位置的空间周围,用于将材料从磁控管中的目标电极溅射到设置在该空间中的衬底上。 电极通过交流电压和电流成对地供电。 可以是平面的,圆柱形的或圆锥形的不平衡磁控管被布置成镜面结构,使得类似的极在衬底空间上相对或者在衬底空间的同一侧相邻。 磁控管在磁极性方面都是相同的,使得在相对或相邻的磁控管之间不存在磁耦合。 由AC驱动器产生的正等离子体电位器防止电子沿着未闭合的场线逸出到地面,增加背景工作气体中的等离子体密度,从而提高沉积在基片上的涂层质量。