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    • 3. 发明申请
    • CHARGED PARTICLE BEAM DEVICE, VACUUM VALVE THEREFOR AND OPERATION THEREOF
    • 充电颗粒光束装置,真空阀及其操作
    • US20130118586A1
    • 2013-05-16
    • US13296885
    • 2011-11-15
    • Thomas JASINSKI
    • Thomas JASINSKI
    • F15D1/00F16K27/00F16K31/00
    • F16K3/188F16K51/02Y10T137/0318
    • A valve unit configured for a charged particle beam device having a beam path 2 is described. The valve unit includes a vacuum sealed valve housing 102 configured for a pressure difference between the inside of the valve housing and the outside of the valve housing, wherein the housing provides a beam path portion 103 for having a charged particle beam pass therethrough along the beam path, a valve positioning unit adapted for selectively providing a first movement of the valve housing such that the beam path portion is selectively moved into and out of the beam path, and at least one sealing element 122 configured for a second movement, wherein the second movement is different from the first movement.
    • 描述了构造成具有光束路径2的带电粒子束装置的阀单元。 阀单元包括真空密封阀壳体102,该真空密封阀壳体构造用于在阀壳体的内部和阀壳体的外部之间的压力差,其中壳体提供用于使带电粒子束沿着光束通过的光束路径部分103 阀门定位单元,其适于选择性地提供阀壳体的第一运动,使得光束路径部分被选择性地移入和移出光束路径;以及至少一个构造成用于第二运动的密封元件122,其中第二 运动与第一动作不同。
    • 5. 发明授权
    • Apparatus and method for inspecting a sample of a specimen by means of an electron beam
    • 通过电子束检查试样样品的装置和方法
    • US07586093B2
    • 2009-09-08
    • US10554572
    • 2004-04-26
    • Hans-Peter Feuerbaum
    • Hans-Peter Feuerbaum
    • A61N5/00G21G5/00G01N23/00G21K7/00
    • G01N1/32H01J37/28H01J37/3056H01J2237/20H01J2237/31745
    • The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within said vacuum chamber (18); an electron beam device (30) having a scanning unit (32) for scanning the electron beam (34) across said specimen (14) within said vacuum chamber (18); said electron beam device (30) having a first detector (36) positioned to detect electrons (38) that are released from the specimen (14) in a backward direction with respect to the direction of the electron beam (34); and said electron beam device (30) having a second detector (40) positioned to detect electrons (42) that are released from the sample (12) of the specimen (14) in a forward direction with respect to the direction of the electron beam (34); and separation means (50; 52) within said vacuum chamber (18) to separate the sample (12) from the specimen (14) for the inspection of the sample (12) by means of the second detector (40). With the apparatus according to the invention, it is possible to perform a transmission inspection of a sample of a specimen, e.g. a thin slice of a semiconductor wafer, at a high throughput at comparably low costs.
    • 本发明涉及一种用于通过包括真空室(18)的电子束(34)检查试样(14)的样品(12)的装置(10)。 用于产生用于在所述真空室(18)内从样品(14)蚀刻样品(12)的离子束(22)的离子束装置(20); 具有扫描单元(32)的电子束装置(30),用于在所述真空室(18)内扫过所述试样(14)上的电子束(34)。 所述电子束装置(30)具有第一检测器(36),所述第一检测器(36)定位成检测相对于所述电子束(34)的方向从所述样品(14)沿相反方向释放的电子(38)。 并且所述电子束装置(30)具有第二检测器(40),所述第二检测器(40)定位成检测相对于电子束的方向从样品(14)的样品(12)向前方释放的电子(42) (34); 以及在所述真空室(18)内的分离装置(50; 52),以将样品(12)与样品(14)分离,以便通过第二检测器(40)检查样品(12)。 利用根据本发明的装置,可以对样本的样本进行透射检查,例如, 半导体晶片的薄片,在相当低的成本下处于高产量。
    • 6. 发明申请
    • DUAL MODE GAS FIELD ION SOURCE
    • 双模气体场源
    • US20090200484A1
    • 2009-08-13
    • US12366390
    • 2009-02-05
    • Juergen FROSIEN
    • Juergen FROSIEN
    • H01J3/14
    • H01J37/08H01J27/26H01J37/241H01J37/243H01J2237/002H01J2237/006H01J2237/061H01J2237/0807H01J2237/0827H01J2237/28H01J2237/317
    • A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.
    • 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱,其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器的外壳,用于从气体离子源发射器提取离子的电极,适于引入离子源的一个或多个气体入口 将第一气体和第二气体输送到发射器区域,用于聚焦由第一气体或第二气体产生的离子束的物镜,用于在电极和气体离子源发射器之间提供电压的电压源,以及 控制器,用于在电压源的第一电压和第二电压之间切换,用于产生第一气体的离子离子束或第二气体的离子离子束。
    • 7. 发明授权
    • Multiple electron beam device
    • 多电子束装置
    • US07282711B2
    • 2007-10-16
    • US10491939
    • 2002-10-04
    • Dieter WinklerPavel AdamecAchim GöhlHelmut Banzhof
    • Dieter WinklerPavel AdamecAchim GöhlHelmut Banzhof
    • H01J37/21
    • H01J37/28B82Y10/00B82Y40/00H01J37/21H01J37/304H01J37/3174H01J2237/216H01J2237/2446H01J2237/2826H01J2237/30433H01J2237/3045
    • The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.
    • 本发明提供了用于用具有电子束源阵列(3)的一次电子束(14)探测或构造非透明样品(20)以产生多个一次电子束(14)的电子多光束装置(1), 电子传感器(12),其具有用于检测一次电子束(14)的电子和至少一个阳极(7)的电子传感器段(12a),以将一次电子束(14)引向电子传感器(12)。 电子传感器(12)用于检查一次电子束(14),校准一次电子束(14)的位置,并可能在探测之前或之后校准一次电子束的最终聚焦长度(13)和电流 构造不透明样品(20)的上表面(20a)。 此外,提供了检查一次电子束(14),调整最终聚焦长度(13)和校准多个电子束装置(1)的方法。