专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

2. 发明申请

US20160227612A1 MICROWAVE ASSISTED PARALLEL PLATE E-FIELD APPLICATOR 审中-公开
标题翻译：微波辅助平板电子场应用
公开(公告)号：US20160227612A1
公开(公告)日：2016-08-04
申请号：US15009070
申请日：2016-01-28
申请人： DSG TECHNOLOGIES
发明人： JEFFREY EDWARD KOWALSKI
IPC分类号： H05B6/80 , H05B6/64
摘要： A system and method for annealing a target substrate such as a semiconductor using industrial microwave heating and parallel plate reaction. Using a uniform microwave field, with the target substrate located between parallel plates controls application of eddy currents to the target substrate. The system may include a uniform microwave field generator, support elements, two plates held in parallel to each other, and a turntable device configured to rotate the two plates and the target substrate within the uniform microwave field. The rotating of the plates and target substrate in the uniform microwave field creates a periodic change in polarity of the microwaves applied to the target substrate. The eddy currents in the uniform microwave field react by flowing perpendicular to the plates, and not parallel to the surface as in traditional microwave reactions of metals. This redirection of the eddy currents provides even heating of the target substrate.
摘要翻译：一种使用工业微波加热和平行板反应来退火诸如半导体的目标衬底的系统和方法。使用均匀的微波场，目标衬底位于平行板之间，控制对目标衬底的涡流施加。该系统可以包括均匀的微波场发生器，支撑元件，彼此平行地保持的两个板以及被配置成在均匀的微波场内旋转两个板和目标衬底的转台装置。在均匀的微波场中板和目标衬底的旋转产生施加到目标衬底的微波的极性的周期性变化。均匀微波场中的涡流通过垂直于板的流动而反应，与金属的传统微波反应不平行。涡流的这种重定向提供了目标衬底的均匀加热。

IPRDB

热门服务

关于我们

友情链接

联系方式