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1. 发明授权

US08771918B2 Lithographic printing plate precursor 有权
标题翻译：平版印刷版前体
公开(公告)号：US08771918B2
公开(公告)日：2014-07-08
申请号：US13378025
申请日：2010-06-03
申请人： Xavier André , Philippe Moriamé , Hubertus Van Aert
发明人： Xavier André , Philippe Moriamé , Hubertus Van Aert
IPC分类号： B41M5/00 , B41N1/00 , G03F7/00 , G03F7/26
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent and a compound including a benzoxazine group.
摘要翻译：公开了一种正性平版印刷版原版，其包括在具有亲水表面的支持体上，或者设置有亲水层，包含红外吸收剂和包含苯并恶嗪基团的化合物的热和/或感光涂层。

2. 发明授权

US08468942B2 Method for treating a lithographic printing plate 失效
标题翻译：平版印刷版的处理方法
公开(公告)号：US08468942B2
公开(公告)日：2013-06-25
申请号：US12743414
申请日：2008-11-07
申请人： Peter Maessen , Patrick Albert Mertens
发明人： Peter Maessen , Patrick Albert Mertens
IPC分类号： B41F35/00
CPC分类号： B41N3/06 , B41N3/006
摘要： Method for cleaning a lithographic printing plate comprising the step of applying a liquid to the plate including an aqueous phase, a solvent phase and at least one alkyl (poly) glucoside, said solvent phase including a mixture comprising aliphatic and/or aromatic hydrocarbons, characterized in that the amount of solvent phase in the liquid is ≦40% wt.
摘要翻译：一种用于清洁平版印刷版的方法，包括将液体施加到包括水相，溶剂相和至少一种烷基（多）葡糖苷的平板的步骤，所述溶剂相包括包含脂族和/或芳族烃的混合物，其特征在于因为液体中溶剂相的量为40％wt。

3. 发明授权

US07795324B2 Radiation curable compositions 有权
标题翻译：辐射固化组合物
公开(公告)号：US07795324B2
公开(公告)日：2010-09-14
申请号：US11169250
申请日：2005-06-28
申请人： Johan Loccufier , Luc Vanmaele , Jaymes Van Luppen , Roland Claes , Yu Chen , Holger Frey
发明人： Johan Loccufier , Luc Vanmaele , Jaymes Van Luppen , Roland Claes , Yu Chen , Holger Frey
IPC分类号： C08F2/50 , C08J3/28
CPC分类号： C08F2/46 , C09D11/101 , Y10S522/904 , Y10S522/905 , Y10T428/31504 , Y10T428/31678 , Y10T428/31725 , Y10T428/31786 , Y10T428/31826 , Y10T428/31855 , Y10T428/31971 , Y10T428/31989 , Y10T428/31993
摘要： A novel polymeric initiator is disclosed comprising a dendritic polymer core with at least one initiating functional group as an end group. The dendritic polymeric core is preferably a hyperbranched polymer.The polymeric initiators are useful in radiation curable compositions such as varnishes, lacquers and printing inks and are especially useful in radiation curable inkjet inks.
摘要翻译：公开了一种新颖的聚合引发剂，其包含具有至少一个起始官能团作为端基的树枝状聚合物核。树枝状聚合物芯优选为超支化聚合物。聚合物引发剂可用于可辐射固化组合物如清漆，油漆和印刷油墨中，并且特别适用于可辐射固化的喷墨油墨。

4. 发明授权

US07575314B2 Dotsize control fluid for radiation curable ink-jet printing process 有权
标题翻译：用于辐射固化喷墨印刷工艺的多孔控制流体
公开(公告)号：US07575314B2
公开(公告)日：2009-08-18
申请号：US11280929
申请日：2005-11-16
申请人： Guido Desie , Dirk Quintens
发明人： Guido Desie , Dirk Quintens
IPC分类号： G01D11/00
CPC分类号： C09D11/101
摘要： A radiation curable ink-jet printing process is disclosed, exhibiting consistent image quality on a wide variety of different ink-receivers. The ink-jet printing process includes the steps of: a) providing an ink-receiver; b) providing a surface layer on at least a portion of the ink-receiver with a dotsize control fluid; c) jetting at least one radiation curable ink-jet ink droplet to the surface layer on the ink-receiver; characterized in that the dotsize control fluid contains a surfactant, a film forming polymeric resin and an inorganic filler, wherein the ratio P/F is greater than 3.0, with P being the weight % of film forming polymeric resin and F being the weight % of inorganic filler, both based on the total weight of the dotsize control fluid, and the surfactant is present in the surface layer in the range of 0.1 to 20% by weight based on the total dry weight of the surface layer.
摘要翻译：公开了一种可辐射固化喷墨印刷方法，其在各种不同的墨水接收器上表现出一致的图像质量。喷墨印刷方法包括以下步骤：a）提供墨水接收器; b）在吸墨器的至少一部分上提供带有点状控制流体的表面层; c）将至少一个辐射固化喷墨墨滴喷射到墨水接收器上的表面层上; 其特征在于，所述点化控制流体含有表面活性剂，成膜聚合树脂和无机填料，其中P / F大于3.0，P为成膜聚合物树脂的重量％，F为重量％无机填料，均基于点化控制流体的总重量，表面活性剂以表面层的总干重为0.1〜20重量％的范围存在。

5. 发明授权

US07538144B2 Photoreactive polymers 有权
标题翻译：光反应性聚合物
公开(公告)号：US07538144B2
公开(公告)日：2009-05-26
申请号：US11170349
申请日：2005-06-29
申请人： Luc Vanmaele , Johan Loccufoer , Yu Chen , Holger Frey
发明人： Luc Vanmaele , Johan Loccufoer , Yu Chen , Holger Frey
IPC分类号： C08J3/28 , C08F2/46
CPC分类号： C08F2/46 , Y10S522/904
摘要： A novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group. The photoreactive polymers are useful in radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.
摘要翻译：公开了一种新颖的光反应性聚合物，其包含具有至少一个起始官能团和至少一个共起始官能团的树枝状聚合物核。光反应性聚合物可用于可辐射固化的组合物中是清漆，漆，印刷油墨和可辐射固化喷墨油墨。树枝状聚合物芯优选为超支化聚合物。

6. 发明授权

US07467587B2 Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material 有权
标题翻译：在热敏正性平版印刷版材料上精确曝光小点的方法
公开(公告)号：US07467587B2
公开(公告)日：2008-12-23
申请号：US11114210
申请日：2005-04-21
申请人： Joan Vermeersch , Wim Sap , Marc Van Damme
发明人： Joan Vermeersch , Wim Sap , Marc Van Damme
IPC分类号： B41C1/10 , B41M1/06 , G03F7/00
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.
摘要翻译：公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上的物理区域的能量密度，由在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。从而避免由于过度曝光导致的微点损失。

7. 发明授权

US07455949B2 Polymer for heat-sensitive lithographic printing plate precursor 失效
标题翻译：用于热敏平版印刷版前体的聚合物
公开(公告)号：US07455949B2
公开(公告)日：2008-11-25
申请号：US10531629
申请日：2003-09-25
申请人： Johan Loccufier , Bert Groenendaal , Huub Van Aert , Marc Van Damme
发明人： Johan Loccufier , Bert Groenendaal , Huub Van Aert , Marc Van Damme
IPC分类号： G03F7/012 , C08G61/00
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08G8/28 , C08L61/14
摘要： A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit of which the phenyl group is substituted by a group A characterised in that the group A comprises an imide or thioimide group and wherein the modification of the polymer increases the chemical resistance of the coating of the printing plate precursor.
摘要翻译：公开了一种用于热敏平版印刷版前体的聚合物，其中所述聚合物包含酚基单体，其中苯基被基团A所取代，其特征在于基团A包含酰亚胺或硫代酰亚胺基，并且其中聚合物增加了印版前体的涂层的耐化学性。

8. 发明授权

US07678533B2 Heat-sensitive lithographic printing plate precursor 失效
标题翻译：热敏平版印刷版前体
公开(公告)号：US07678533B2
公开(公告)日：2010-03-16
申请号：US11478252
申请日：2006-06-29
申请人： Hubertus Van Aert , Stefaan Lingier
发明人： Hubertus Van Aert , Stefaan Lingier
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a support having a hydrophilic surface and a coating which does not dissolve in an aqueous alkaline developer in the unexposed areas and which becomes soluble in an aqueous alkaline developer in the exposed areas, and an intermediate layer between said hydrophilic surface or said hydrophilic layer and said coating, wherein the intermediate layer comprises a first polymer having a first monomeric unit of formula I wherein R1, R2 and R3 are independently a hydrogen atom or an optionally substituted alkyl group, R4 and R5 are independently an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl group. The precursor exhibits an excellent differentiation in dissolution kinetics between the exposed and non-exposed areas of the coating and a high chemical resistance against printing liquids and press chemicals.
摘要翻译：公开了一种热敏平版印刷版原版，其包括具有亲水表面的支持体和不溶于未曝光区域中的含水碱性显影剂并且易溶于暴露区域中的含水碱性显影剂的涂层，所述亲水表面或所述亲水层与所述涂层之间的中间层，其中所述中间层包含具有式I的第一单体单元的第一聚合物，其中R 1，R 2和R 3独立地为氢原子或任选取代的烷基，R 4和 R5独立地是任选取代的烷基，环烷基，芳基或芳基烷基。该前体在涂层的暴露区域和非曝光区域之间的溶出动力学表现出极好的分化性，并且对印刷液体和印刷化学品具有高耐化学腐蚀性。

9. 发明授权

US07507773B2 Radiation curable compositions 有权
标题翻译：辐射固化组合物
公开(公告)号：US07507773B2
公开(公告)日：2009-03-24
申请号：US11170016
申请日：2005-06-29
申请人： Johan Loccufier , Luc Vanmaele , Roland Claes , Jaymes Van Luppen , Yu Chen , Holger Frey
发明人： Johan Loccufier , Luc Vanmaele , Roland Claes , Jaymes Van Luppen , Yu Chen , Holger Frey
IPC分类号： C08F2/46 , C08J3/28
CPC分类号： C09D11/101 , C08F2/46 , Y10S522/904 , Y10S522/909
摘要： A radiation curable composition comprising a novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group.Suitable radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.
摘要翻译：公开了包含新型光反应性聚合物的可辐射固化组合物，其包含具有至少一个起始官能团和至少一个共起始官能团的树枝状聚合物核。合适的可辐射固化组合物是清漆，油漆，印刷油墨和可辐射固化喷墨油墨。树枝状聚合物芯优选为超支化聚合物。

10. 发明授权

US07425402B2 Heat-sensitive lithographic printing plate precursor 失效
标题翻译：热敏平版印刷版前体
公开(公告)号：US07425402B2
公开(公告)日：2008-09-16
申请号：US10916154
申请日：2004-08-11
申请人： Johan Loccufier , Bert Groenendaal , Marc Van Damme , Huub Van Aert
发明人： Johan Loccufier , Bert Groenendaal , Marc Van Damme , Huub Van Aert
IPC分类号： G03C1/77 , G03F7/09 , G03F7/038 , G03F7/039
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145
摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.
摘要翻译：公开了一种热敏平版印刷版前体，其包含亲水性载体和亲油性涂层，其包含红外吸收剂和显影剂可溶性聚合物，其包含酚单体单元，其中酚单体单元的苯基被基团Q 其中Q具有结构并共价连接到苯基的碳原子上，其中L 1，L 2和L 3 3是连接基团a，b和c分别是0或1，T 1，T 2和T 3是末端基团。由Q组取代的聚合物增加了涂层的耐化学性。

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