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    • 3. 发明授权
    • Mask complementary multiple exposure technique
    • 面膜互补多重曝光技术
    • US07387871B2
    • 2008-06-17
    • US10927564
    • 2004-08-26
    • Jianxin ZhuLance Eugene Stover
    • Jianxin ZhuLance Eugene Stover
    • G03F7/20
    • G03F7/70466
    • A method for creating a pattern on an exposure site of a material blank using an exposure apparatus includes providing a mask having a first mask pattern. The mask is positioned between the exposure apparatus and the material blank. The exposure site of the material blank is exposed. One or more additional exposure events are performed for patterning the exposure site of the material blank. Between each exposure event, the exposure site of the material blank is repositioned in a lateral direction with respect to the mask. Between successive exposure events involving the first mask pattern, there is a relative movement between the mask and the material blank of a distance less than or equal to a length of the first mask pattern.
    • 使用曝光装置在坯料的曝光部位上形成图案的方法包括提供具有第一掩模图案的掩模。 掩模位于曝光装置和材料坯料之间。 暴露材料坯料的暴露部位。 执行一个或多个额外的曝光事件以对材料坯料的曝光部位进行图案化。 在每个曝光事件之间,材料坯料的曝光位置相对于掩模在横向方向上重新定位。 在涉及第一掩模图案的连续曝光事件之间,在掩模和材料空白之间存在距离小于或等于第一掩模图案的长度的距离的相对移动。
    • 4. 发明授权
    • Method of fabricating structures
    • 制造结构的方法
    • US07897515B2
    • 2011-03-01
    • US12426332
    • 2009-04-20
    • Jianxin Zhu
    • Jianxin Zhu
    • H01L29/82H01L21/02
    • H01L21/0332H01L43/12
    • A method of processing a stack, the method including depositing a fusible material on a first hardmask layer, the first hardmask layer disposed on a surface of a pre-processed stack, the pre-processed stack being disposed on at least a portion of a substrate; heating the fusible material layer to a temperature at or above its melting point to cause it to form a fusible material sphere, the fusible material sphere disposed on less than the entire first hardmask layer; etching the first hardmask layer, wherein the fusible material sphere prevents a portion of the first hardmask layer from etching, thereby forming a second hardmask layer; and etching the pre-processed stack, wherein at least the second hardmask layer prevents a portion of the pre-processed stack from etching, thereby forming a stack.
    • 一种处理堆叠的方法,所述方法包括在第一硬掩模层上沉积可熔材料,所述第一硬掩模层设置在预处理堆叠的表面上,所述预处理堆叠设置在基板的至少一部分上 ; 将可熔材料层加热到其熔点以上的温度,使其形成易熔材料球,所述易熔材料球设置在小于整个第一硬掩模层上; 蚀刻所述第一硬掩模层,其中所述可熔材料球防止所述第一硬掩模层的一部分被蚀刻,从而形成第二硬掩模层; 并蚀刻预处理的堆叠,其中至少第二硬掩模层防止预处理的堆叠的一部分被蚀刻,从而形成堆叠。
    • 5. 发明授权
    • Slider having recessed corner features
    • 滑块具有凹入的角部特征
    • US07433155B2
    • 2008-10-07
    • US11000554
    • 2004-12-01
    • Jianxin ZhuZine-Eddine BoutaghouZheng Shi
    • Jianxin ZhuZine-Eddine BoutaghouZheng Shi
    • G11B5/60
    • G11B5/6082
    • One aspect of the present invention relates to a slider having a slider body. The slider body includes a bearing surface defining a bearing surface plane, a leading edge, a trailing edge, first side edge, a second side edge and at least one corner. A corner feature is positioned proximate the at least one corner. The corner feature includes a first portion oriented in a first direction and a second portion oriented in a second direction that is different then the first direction. At least one of the first direction and the second direction is toward the trailing edge and is oblique to the bearing surface plane.
    • 本发明的一个方面涉及具有滑块体的滑块。 滑块主体包括限定支承表面平面,前缘,后缘,第一侧边缘,第二侧边缘和至少一个角部的支承表面。 拐角特征位于至少一个角附近。 角部特征包括沿第一方向定向的第一部分和沿与第一方向不同的第二方向定向的第二部分。 第一方向和第二方向中的至少一个朝向后缘并且倾斜于支承面平面。
    • 8. 发明申请
    • Mask complementary multiple exposure technique
    • 面膜互补多重曝光技术
    • US20060046210A1
    • 2006-03-02
    • US10927564
    • 2004-08-26
    • Jianxin ZhuLance Stover
    • Jianxin ZhuLance Stover
    • G03F7/20
    • G03F7/70466
    • A method for creating a pattern on an exposure site of a material blank using an exposure apparatus includes providing a mask having a first mask pattern. The mask is positioned between the exposure apparatus and the material blank. The exposure site of the material blank is exposed. One or more additional exposure events are performed for patterning the exposure site of the material blank. Between each exposure event, the exposure site of the material blank is repositioned in a lateral direction with respect to the mask. Between successive exposure events involving the first mask pattern, there is a relative movement between the mask and the material blank of a distance less than or equal to a length of the first mask pattern.
    • 使用曝光装置在坯料的曝光部位上形成图案的方法包括提供具有第一掩模图案的掩模。 掩模位于曝光装置和材料坯料之间。 暴露材料坯料的暴露部位。 执行一个或多个额外的曝光事件以对材料坯料的曝光部位进行图案化。 在每个曝光事件之间,材料坯料的曝光位置相对于掩模在横向方向上重新定位。 在涉及第一掩模图案的连续曝光事件之间,在掩模和材料空白之间存在距离小于或等于第一掩模图案的长度的距离的相对移动。