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1. 发明申请

US20130276983A1 INJECTION MEMBER FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PLASMA PROCESSING APPARATUS HAVING THE SAME 审中-公开
标题翻译：用于制造半导体器件的注射部件和具有该半导体器件的等离子体处理装置
公开(公告)号：US20130276983A1
公开(公告)日：2013-10-24
申请号：US13993277
申请日：2012-01-12
申请人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim , Kazuyuki Toyoda , Osamu Kasahara , Tetsuaki Inada
发明人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim , Kazuyuki Toyoda , Osamu Kasahara , Tetsuaki Inada
IPC分类号： H01L21/203 , H01L21/3065
CPC分类号： H01L21/203 , C23C16/45563 , C23C16/45591 , C23C16/4584 , C23C16/4585 , C23C16/50 , H01J37/3244 , H01J37/32449 , H01J37/32633 , H01J37/32733 , H01L21/3065
摘要： A plasma processing apparatus may include a process chamber configured to perform a plasma using process and contain a plurality of substrates, a support member provided in the process chamber, the substrates being laid on the same level of the support member, an injection member provided to face the support member and include a plurality of baffles, such that at least one reaction gas and a purge gas can be injected onto the substrates in an independent manner, and a driving part configured to rotate the support member or the injection member, such that the baffles of the injection member can orbit with respect to the plurality of the substrates laid on the support member. The injection member may include a plasma generator, which may be provided on at least one, configured to inject the reaction gas, of the baffles to turn the reaction gas into plasma.
摘要翻译：等离子体处理装置可以包括处理室，其被配置为执行等离子体使用过程并且容纳多个基板，设置在处理室中的支撑构件，基板被放置在支撑构件的同一水平面上，面对支撑构件并且包括多个挡板，使得可以以独立的方式将至少一个反应气体和吹扫气体注入到基板上，以及驱动部件，其构造成使支撑构件或注射构件旋转，使得注射构件的挡板可以相对于布置在支撑构件上的多个基板进行轨道运动。注射构件可以包括等离子体发生器，其可以设置在至少一个构造成用于注入反应气体的挡板上，以将反应气体转化为等离子体。

2. 发明授权

US09567673B2 Substrate susceptor and deposition apparatus having same 有权
标题翻译：衬底感受器及其沉积设备
公开(公告)号：US09567673B2
公开(公告)日：2017-02-14
申请号：US13811989
申请日：2011-03-16
申请人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim
发明人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim
IPC分类号： C23C16/46 , C23C16/455 , C23C16/458 , H01L21/67 , H01L21/687
CPC分类号： C23C16/46 , C23C16/45551 , C23C16/45565 , C23C16/4581 , C23C16/4584 , H01L21/67109 , H01L21/68764 , H01L21/68771
摘要： The present disclosure relates to a deposition apparatus used to manufacture a semiconductor device including a process chamber; a substrate susceptor installed in the process chamber and including a plurality of concentrically arranged stages on which substrates are positioned; a plurality of members for supplying reaction gas; a member for supplying purge gas; a spray member including a plurality of baffles for independently spraying reaction gas and purge gas, supplied from the plurality of members supplying reaction gas and the member supplying purge gas, on the entirety of the treating surfaces of the substrate, in positions corresponding respectively to the substrates positioned on the stages; and a driving unit for rotating the substrate susceptor or the spray member in order for the baffles of the spray member to sequentially revolve each of the plurality of substrates positioned on the stages.
摘要翻译：本公开涉及一种用于制造包括处理室的半导体器件的沉积设备; 衬底基座，安装在所述处理室中并且包括多个同心布置的阶段，基板被放置在所述阶段上; 多个用于提供反应气体的构件; 供应吹扫气体的成员; 喷射构件，其包括多个挡板，用于独立地喷射反应气体和吹扫气体，所述反应气体和吹扫气体从供给反应气体的多个构件和供给吹扫气体的构件供给到基板的整个处理表面上，分别对应于位于台架上的基板; 以及驱动单元，用于旋转基板基座或喷射构件，以便喷射构件的挡板顺序地旋转位于台上的多个基板中的每一个。

3. 发明申请

US20140224177A1 INJECTION MEMBER IN FABRICATION OF SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME 审中-公开
标题翻译：半导体器件的制造注入部件和具有该半导体器件的基板处理装置
公开(公告)号：US20140224177A1
公开(公告)日：2014-08-14
申请号：US14126656
申请日：2012-05-30
申请人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim , Hong Joo Bang , Min Seok Kim
发明人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim , Hong Joo Bang , Min Seok Kim
IPC分类号： H01L21/02 , B05B1/00
CPC分类号： H01L21/02104 , B05B1/005 , H01J37/3244 , H01L21/68764 , H01L21/68771
摘要： Provided is a substrate processing apparatus which include a process chamber in which a plurality of substrates are accommodated to be processed, a support member mounted at the process chamber and having the same plane on which a plurality of substrate are placed, an injection member mounted opposite to the support member and including a plurality of independent baffles to independently inject the least one reactive gas and the purge gas at positions respectively corresponding to the plurality of substrates placed on the support member, and a driving unit adapted to rotate the support member or the injection member such that the baffles of the injection member sequentially revolve around the plurality of respective substrates. The injection member includes a plasma generator mounted at least one of the baffles to plasmatize a reactive gas injected to a substrate.
摘要翻译：提供了一种基板处理装置，其包括处理室，多个基板被容纳在待处理中，支撑构件安装在处理室处，并且具有放置多个基板的相同平面;注射构件安装成相对并且包括多个独立的挡板，以在分别对应于放置在支撑构件上的多个基板的位置处独立地注入至少一个反应气体和吹扫气体;以及驱动单元，其适于使支撑构件或注射构件，使得注射构件的挡板顺序围绕多个相应的基底旋转。注射构件包括安装至少一个挡板的等离子体发生器，以等离子体化注入衬底的反应气体。

4. 发明申请

US20130118407A1 SUBSTRATE SUSCEPTOR AND DEPOSITION APPARATUS HAVING SAME 有权
标题翻译：基板不锈钢和沉积装置
公开(公告)号：US20130118407A1
公开(公告)日：2013-05-16
申请号：US13811989
申请日：2011-03-16
申请人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim
发明人： Yong Sung Park , Sung Kwang Lee , Dong Yeul Kim
IPC分类号： C23C16/46
CPC分类号： C23C16/46 , C23C16/45551 , C23C16/45565 , C23C16/4581 , C23C16/4584 , H01L21/67109 , H01L21/68764 , H01L21/68771
摘要： The present disclosure relates to a deposition apparatus used to manufacture a semiconductor device including a process chamber; a substrate susceptor installed in the process chamber and including a plurality of concentrically arranged stages on which substrates are positioned; a plurality of members for supplying reaction gas; a member for supplying purge gas; a spray member including a plurality of baffles for independently spraying reaction gas and purge gas, supplied from the plurality of members supplying reaction gas and the member supplying purge gas, on the entirety of the treating surfaces of the substrate, in positions corresponding respectively to the substrates positioned on the stages; and a driving unit for rotating the substrate susceptor or the spray member in order for the baffles of the spray member to sequentially revolve each of the plurality of substrates positioned on the stages.
摘要翻译：本公开涉及一种用于制造包括处理室的半导体器件的沉积设备; 衬底基座，安装在所述处理室中并且包括多个同心布置的阶段，基板被放置在所述阶段上; 多个用于提供反应气体的构件; 供应吹扫气体的成员; 喷射构件，其包括多个挡板，用于独立地喷射反应气体和吹扫气体，所述反应气体和吹扫气体从供给反应气体的多个构件和供给吹扫气体的构件供给到基板的整个处理表面上，分别对应于位于台架上的基板; 以及驱动单元，用于旋转基板基座或喷射构件，以便喷射构件的挡板顺序地旋转位于台上的多个基板中的每一个。

5. 发明申请

US20120084012A1 METHOD FOR PREDICTING ACTIVATION ENERGY USING ATOMIC FINGERPRINT DESCRIPTOR OR ATOMIC DESCRIPTOR 有权
标题翻译：使用原子指纹描述符或原子描述符预测激活能量的方法
公开(公告)号：US20120084012A1
公开(公告)日：2012-04-05
申请号：US13277929
申请日：2011-10-20
申请人： Ky Youb Nam , Kyoung Tai No , Doo Nam Kim , Won Seok Oh , Sung Kwang Lee , Ji Hoon Jung , Kwang Hwi Cho , Chang Joon Lee
发明人： Ky Youb Nam , Kyoung Tai No , Doo Nam Kim , Won Seok Oh , Sung Kwang Lee , Ji Hoon Jung , Kwang Hwi Cho , Chang Joon Lee
IPC分类号： G06F19/10
CPC分类号： G06F19/704 , G06F19/702 , G06F19/706 , G06F19/709
摘要： The present invention provides a method for constructing a database of atomic fingerprint descriptors. The invention provides a method for predicting activation energy using an atomic fingerprint descriptor and an atomic descriptor, the method comprising the steps of: (i) calculating the atomic fingerprint descriptor of a substrate; (ii) comparing the calculated atomic fingerprint descriptor with the constructed atomic fingerprint descriptor database to select an atomic position where cytochrome P450-mediated metabolism occurs; and (iii) predicting activation energy for the selected atomic position using an atomic descriptor. Also, the invention provides a method of predicting the activation energy of CYP450-mediated phase I metabolism using effective atomic descriptors. Specifically, the invention provides a method of predicting the activation energy either for cytochrome P450-mediated hydrogen abstraction or for tetrahedral intermediate formation in cytochrome P450-aromatic hydroxylation using equations including effective atomic descriptors.
摘要翻译：本发明提供了一种构建原子指纹描述符数据库的方法。本发明提供一种使用原子指纹描述符和原子描述符来预测激活能的方法，该方法包括以下步骤：（i）计算衬底的原子指纹描述符; （ii）将计算的原子指纹描述符与构建的原子指纹描述符数据库进行比较，以选择细胞色素P450介导代谢发生的原子位置; 和（iii）使用原子描述符预测所选原子位置的活化能。此外，本发明提供了使用有效原子描述符预测CYP450介导的I期代谢的活化能的方法。具体地，本发明提供了一种使用包括有效原子描述符的方程式来预测细胞色素P450介导的氢提取或细胞色素P450-芳族羟基化中的四面体中间体形成的活化能的方法。

6. 发明授权

US08793078B2 Method for predicting activation energy using atomic fingerprint descriptor or atomic descriptor 有权
标题翻译：使用原子指纹描述符或原子描述符预测活化能的方法
公开(公告)号：US08793078B2
公开(公告)日：2014-07-29
申请号：US13277929
申请日：2011-10-20
申请人： Ky Youb Nam , Kyoung Tai No , Doo Nam Kim , Won Seok Oh , Sung Kwang Lee , Ji Hoon Jung , Kwang Hwi Cho , Chang Joon Lee
发明人： Ky Youb Nam , Kyoung Tai No , Doo Nam Kim , Won Seok Oh , Sung Kwang Lee , Ji Hoon Jung , Kwang Hwi Cho , Chang Joon Lee
IPC分类号： G01N33/00 , G01N33/50 , G06G7/58 , G06F19/00
CPC分类号： G06F19/704 , G06F19/702 , G06F19/706 , G06F19/709
摘要： The present invention provides a method for constructing a database of atomic fingerprint descriptors. The invention provides a method for predicting activation energy using an atomic fingerprint descriptor and an atomic descriptor, the method comprising the steps of: (i) calculating the atomic fingerprint descriptor of a substrate; (ii) comparing the calculated atomic fingerprint descriptor with the constructed atomic fingerprint descriptor database to select an atomic position where cytochrome P450-mediated metabolism occurs; and (iii) predicting activation energy for the selected atomic position using an atomic descriptor. Also, the invention provides a method of predicting the activation energy of CYP450-mediated phase I metabolism using effective atomic descriptors. Specifically, the invention provides a method of predicting the activation energy either for cytochrome P450-mediated hydrogen abstraction or for tetrahedral intermediate formation in cytochrome P450-aromatic hydroxylation using equations including effective atomic descriptors.
摘要翻译：本发明提供了一种构建原子指纹描述符数据库的方法。本发明提供一种使用原子指纹描述符和原子描述符来预测激活能的方法，该方法包括以下步骤：（i）计算衬底的原子指纹描述符; （ii）将计算的原子指纹描述符与构建的原子指纹描述符数据库进行比较，以选择细胞色素P450介导代谢发生的原子位置; 和（iii）使用原子描述符预测所选原子位置的活化能。此外，本发明提供了使用有效原子描述符预测CYP450介导的I期代谢的活化能的方法。具体地，本发明提供了一种使用包括有效原子描述符的方程式来预测细胞色素P450介导的氢提取或细胞色素P450-芳族羟基化中的四面体中间体形成的活化能的方法。

7. 发明申请

US20110213558A1 METHOD FOR PREDICTING ACTIVATION ENERGY USING AN ATOMIC FINGERPRINT DESCRIPTOR OR AN ATOMIC DESCRIPTOR 审中-公开
公开(公告)号：US20110213558A1
公开(公告)日：2011-09-01
申请号：US13001579
申请日：2009-11-12
申请人： Ky Youb Nam , Kyoung Tai No , Doo Nam Kim , Won Seok Oh , Sung Kwang Lee , Ji Hoon Jung , Kwang Hwi Cho , Chang Joon Lee
发明人： Ky Youb Nam , Kyoung Tai No , Doo Nam Kim , Won Seok Oh , Sung Kwang Lee , Ji Hoon Jung , Kwang Hwi Cho , Chang Joon Lee
IPC分类号： G06F19/00
CPC分类号： G16C20/30 , G16C20/10 , G16C20/50 , G16C20/90
摘要： The present invention provides a method for constructing a database of atomic fingerprint descriptors. The invention provides a method for predicting activation energy using an atomic fingerprint descriptor and an atomic descriptor, the method comprising the steps of: (i) calculating the atomic fingerprint descriptor of a substrate; (ii) comparing the calculated atomic fingerprint descriptor with the constructed atomic fingerprint descriptor database to select an atomic position where cytochrome P450-mediated metabolism occurs; and (iii) predicting activation energy for the selected atomic position using an atomic descriptor. Also, the invention provides a method of predicting the activation energy of CYP450-mediated phase I metabolism using effective atomic descriptors. Specifically, the invention provides a method of predicting the activation energy either for cytochrome P450-mediated hydrogen abstraction or for tetrahedral intermediate formation in cytochrome P450-aromatic hydroxylation using equations including effective atomic descriptors. The method of the invention can rapidly predict activation energy for phase I metabolites at a practical level without having to perform a docking experiment between any additional CYP450 and the substrate, or a quantum mechanical calculation, thereby making it easier to develop new drugs using a computer. Also, the present invention may propose a strategy for increasing the bioavailability of drugs through the avoidance of metabolites based on the possibility of drug metabolism. Furthermore, the method of the present invention proposes new empirical approaches which can also be easily applied to activation energies for various chemical reactions, and makes it possible to explain physical and chemical factors that determine activation energy. In addition, through the prediction of activation energy according to the present invention, it is possible to predict i) metabolic products, ii) the relative rate of metabolism, iii) metabolic regioselectivity, iv) metabolic inhibition, v) drug-drug interactions, and vi) the toxicity of a metabolite.

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