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1. 发明授权

US10658161B2 Method and apparatus for reducing particle defects in plasma etch chambers 有权
公开(公告)号：US10658161B2
公开(公告)日：2020-05-19
申请号：US13174090
申请日：2011-06-30
申请人： Xikun Wang , Andrew Nguyen , Changhun Lee , Xiaoming He , Meihua Shen
发明人： Xikun Wang , Andrew Nguyen , Changhun Lee , Xiaoming He , Meihua Shen
IPC分类号： H01L21/3213 , H01J37/32
摘要： In-situ low pressure chamber cleans and gas nozzle apparatus for plasma processing systems employing in-situ deposited chamber coatings. Certain chamber clean embodiments for conductor etch applications include an NF3-based plasma clean performed at pressures below 30 mT to remove in-situ deposited SiOx coatings from interior surfaces of a gas nozzle hole. Embodiments include a gas nozzle with bottom holes dimensioned sufficiently small to reduce or prevent the in-situ deposited chamber coatings from building up a SiOx deposits on interior surfaces of a nozzle hole.

2. 发明申请

US20090221150A1 ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS RING MATERIAL 审中-公开
标题翻译：通过选择聚焦材料的蚀刻速率和关键尺寸均匀性
公开(公告)号：US20090221150A1
公开(公告)日：2009-09-03
申请号：US12395465
申请日：2009-02-27
申请人： Edward P. Hammond, IV , Jing Zou , Rodolfo P. Belen , Meihua Shen , Nicolas Gani , Andrew Nguyen , David Palagashvili , Michael D. Willwerth
发明人： Edward P. Hammond, IV , Jing Zou , Rodolfo P. Belen , Meihua Shen , Nicolas Gani , Andrew Nguyen , David Palagashvili , Michael D. Willwerth
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01J37/32642 , H01J37/321 , H01J37/3244 , H01J37/32623 , H01J2237/334 , H01L21/67069 , H01L21/68735
摘要： A method and apparatus are provided for plasma etching a substrate in a processing chamber. A focus ring assembly circumscribes a substrate support, providing uniform processing conditions near the edge of the substrate. The focus ring assembly comprises two rings, a first ring and a second ring, the first ring comprising quartz, and the second ring comprising monocrystalline silicon, silicon carbide, silicon nitride, silicon oxycarbide, silicon oxynitride, or combinations thereof. The second ring is disposed above the first ring near the edge of the substrate, and creates a uniform electric field and gas composition above the edge of the substrate that results in uniform etching across the substrate surface.
摘要翻译：提供了一种用于等离子体蚀刻处理室中的衬底的方法和装置。聚焦环组件围绕衬底支撑件，在衬底的边缘附近提供均匀的加工条件。聚焦环组件包括两个环，第一环和第二环，第一环包括石英，第二环包括单晶硅，碳化硅，氮化硅，碳氧化硅，氮氧化硅或其组合。第二环设置在基板边缘附近的第一环上方，并且在衬底的边缘上方产生均匀的电场和气体组成，导致穿过衬底表面的均匀蚀刻。

3. 发明申请

US20100018648A1 WORKPIECE SUPPORT FOR A PLASMA REACTOR WITH CONTROLLED APPORTIONMENT OF RF POWER TO A PROCESS KIT RING 审中-公开
标题翻译：用于等离子体反应器的工作支持，具有控制的RF功率分配到工艺套件环
公开(公告)号：US20100018648A1
公开(公告)日：2010-01-28
申请号：US12178032
申请日：2008-07-23
申请人： KENNETH S. COLLINS , Douglas A. Buchberger, JR. , Kartik Ramaswamy , Shahid Rauf , Hiroji Hanawa , Jennifer Y. Sun , Andrew Nguyen , Thorsten B. Lill , Meihua Shen
发明人： KENNETH S. COLLINS , Douglas A. Buchberger, JR. , Kartik Ramaswamy , Shahid Rauf , Hiroji Hanawa , Jennifer Y. Sun , Andrew Nguyen , Thorsten B. Lill , Meihua Shen
IPC分类号： H01L21/3065
CPC分类号： H01J37/32642 , H01J37/32082 , H01J37/32174 , H01J37/32623 , H01J2237/2001 , H01L21/6833
摘要： In an electrostatic chuck, RF bias power is separately applied to a workpiece and to a process kit collar surrounding the workpiece. At least one variable impedance element governed by a system controller adjusts the apportionment of RF bias power between the workpiece and the process kit collar, allowing dynamic adjustment of the plasma sheath electric field at the extreme edge of the workpiece, for optimum electric field uniformity under varying plasma conditions, for example.
摘要翻译：在静电卡盘中，RF偏置功率分别施加到工件和围绕工件的处理套件套环。由系统控制器控制的至少一个可变阻抗元件调节工件和工艺套件套环之间的RF偏置功率的分配，允许动态调整工件最末端处的等离子体护套电场，以获得最佳的电场均匀度改变等离子体条件。

4. 发明申请

US20090302002A1 METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE 审中-公开
标题翻译：从基板上去除聚合物的方法和装置
公开(公告)号：US20090302002A1
公开(公告)日：2009-12-10
申请号：US12395057
申请日：2009-02-27
申请人： Kenneth Collins , Martin Salinas , Walter Merry , Jie Yuan , Andrew Nguyen , Kartik Ramaswamy , Jennifer Sun , Ren-Guan Duan , Xiaoming He , Nancy Fung
发明人： Kenneth Collins , Martin Salinas , Walter Merry , Jie Yuan , Andrew Nguyen , Kartik Ramaswamy , Jennifer Sun , Ren-Guan Duan , Xiaoming He , Nancy Fung
IPC分类号： B44C1/22 , C23F1/08
CPC分类号： H01J37/321 , G03F7/427 , H01J37/32357 , H01L21/02063 , H01L21/02087 , H01L21/0209 , H01L21/31138
摘要： A method and an apparatus for removing polymer from a substrate are provided. In one embodiment, an apparatus utilized to remove polymer from a substrate includes a processing chamber having a chamber wall and a chamber lid defining a process volume, a substrate support assembly disposed in the processing chamber, and a remote plasma source coupled to the processing chamber through an outlet port formed within the chamber wall, the outlet port having an opening pointing toward an periphery region of a substrate disposed on the substrate support assembly, wherein the remote plasma source is fabricated from a material resistant to hydrogen species.
摘要翻译：提供了从基板上除去聚合物的方法和装置。在一个实施方案中，用于从基材中除去聚合物的装置包括具有室壁和限定处理体积的室盖的处理室，设置在处理室中的基板支撑组件和耦合到处理室的远程等离子体源通过形成在室壁内的出口，出口具有指向设置在基板支撑组件上的基板的周边区域的开口，其中远程等离子体源由耐氢物质的材料制成。

5. 发明授权

US10408849B2 Method of determining consumption of decayed drug through drug taggants 有权
公开(公告)号：US10408849B2
公开(公告)日：2019-09-10
申请号：US15494089
申请日：2017-04-21
申请人： David R. Hall , Dan Allen , Conrad Rosenbrock , Daniel Hendricks , Andrew Nguyen , Steven J. M. Butala , Travis Niederhauser , Terrece Pearman , Joe Fox
发明人： David R. Hall , Dan Allen , Conrad Rosenbrock , Daniel Hendricks , Andrew Nguyen , Steven J. M. Butala , Travis Niederhauser , Terrece Pearman , Joe Fox
IPC分类号： G01N33/94 , G01N33/493 , G01N33/58 , G01N33/15 , G01N21/88 , A61B10/00 , A61B5/15
摘要： We disclose a method of using taggants to assess how and to what extent a drug in a drug composition that a user has consumed has decayed in response to storage conditions and time. The taggants may decay in response to environmental conditions which cause different drugs to lose their efficacy. These environmental conditions may include light, temperature, oxidation, and age. The taggants may be detected in biological samples, including urine and feces. By identifying the taggants, the drug composition and other information relating to the drug may be identified. Additionally, quantification of the different taggants may be used to determine whether the drug in the drug composition has been exposed to environmental conditions which may reduce its efficacy.

6. 发明申请

US20170232781A1 DEVICE FOR JOINING TWO WRITING INSTRUMENTS 审中-公开
公开(公告)号：US20170232781A1
公开(公告)日：2017-08-17
申请号：US15041680
申请日：2016-02-11
申请人： Andrew Nguyen
发明人： Andrew Nguyen
IPC分类号： B43K23/06 , F16B2/22
CPC分类号： B43K23/06 , F16B2/22
摘要： This invention provides a device for removably connecting two different styles of writing instruments, such as pens with different colored inks or different size nibs, pencils, markers, or crayons.

7. 发明申请

US20160367860A1 SWIMMING AID DEVICE 审中-公开
标题翻译：游泳设备
公开(公告)号：US20160367860A1
公开(公告)日：2016-12-22
申请号：US15257848
申请日：2016-09-06
申请人： Andrew Nguyen
发明人： Andrew Nguyen
IPC分类号： A63B31/11
CPC分类号： A63B31/11 , A63B2209/00 , A63B2210/50
摘要： A swimming aid device in the form of a monofi is contemplated. The swimming aid device may include first and second fins formed of a resilient material, each fin including an elongated internal space within a fin body, an opening leading to the elongated internal space, a fin blade coupled to and extending away from the elongated internal space, a first and second side heel connectors on opposing sides of the opening leading to the elongated internal space and sized and shaped to mate with each other, a fin blade connector and a fin blade connector receiver on the fin blade and sized and shaped to mate with each other, the combination of the first and second fins forming a monofin.
摘要翻译：考虑到单体形式的游泳辅助装置。游泳辅助装置可以包括由弹性材料形成的第一和第二鳍片，每个翼片包括翅片体内的细长内部空间，通向细长内部空间的开口，联接到并延伸远离细长内部空间的翅片叶片，在所述开口的相对侧上的通向所述细长内部空间的第一和第二侧跟部连接器，其尺寸和形状相互配合，翅片叶片连接器和鳍片连接器接收器，其尺寸和形状适于配合彼此之间形成单峰的第一和第二鳍片的组合。

8. 发明授权

US09267742B2 Apparatus for controlling the temperature uniformity of a substrate 有权
标题翻译：用于控制基板的温度均匀性的装置
公开(公告)号：US09267742B2
公开(公告)日：2016-02-23
申请号：US12886255
申请日：2010-09-20
申请人： Kallol Bera , Xiaoping Zhou , Douglas A. Buchberger, Jr. , Andrew Nguyen , Hamid Tavassoli , Surajit Kumar , Shahid Rauf
发明人： Kallol Bera , Xiaoping Zhou , Douglas A. Buchberger, Jr. , Andrew Nguyen , Hamid Tavassoli , Surajit Kumar , Shahid Rauf
IPC分类号： F25B29/00 , F28F3/12 , F28F13/00
CPC分类号： F28F3/12 , F28F2013/001
摘要： Apparatus for controlling the thermal uniformity of a substrate. In some embodiments, the thermal uniformity of the substrate is controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate is controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate includes a substrate support having a support surface to support a substrate thereon. A plurality of flow paths having a substantially equivalent fluid conductance are disposed within the substrate support to flow a heat transfer fluid beneath the support surface.
摘要翻译：用于控制基板的热均匀性的装置。在一些实施例中，将基板的热均匀性控制得更均匀。在一些实施例中，基板的热均匀性被控制为以期望的图案不均匀。在一些实施例中，用于控制衬底的热均匀性的装置包括具有用于在其上支撑衬底的支撑表面的衬底支撑件。具有基本相当的流体电导的多个流动路径设置在基板支撑件内，以使传热流体在支撑表面下方流动。

9. 发明申请

US20140202267A1 METHODS OF ATTACHING A MODULE ON WAFER SUBSTRATE 有权
标题翻译：连接晶片上的模块的方法
公开(公告)号：US20140202267A1
公开(公告)日：2014-07-24
申请号：US13797112
申请日：2013-03-12
申请人： Vaibhaw Vishal , Andrew Nguyen , Kristopher K. Hearn , Mei Sun
发明人： Vaibhaw Vishal , Andrew Nguyen , Kristopher K. Hearn , Mei Sun
IPC分类号： H05K7/00
CPC分类号： H01L21/67248 , Y10T29/53
摘要： Aspects of the present disclosure describe an attachment device for mounting a module to a substrate comprises a module leg with two ends and a module foot. One end of the module leg is configured to be attached to a bottom surface of the module and the other end of the module leg is configured to be attached to the module foot. At least a portion of the module foot is configured to be attached to the substrate. Also a portion of a surface area of the module foot is configured to be exposed outside of an area covered by the module. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：本公开的方面描述了用于将模块安装到基板的附接装置，包括具有两端的模块腿和模块脚。模块腿的一端构造成附接到模块的底表面，并且模块腿的另一端构造成附接到模块脚。模块脚的至少一部分被配置成附接到基底。模块脚的表面区域的一部分也被配置为暴露在由模块覆盖的区域的外部。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

10. 发明授权

US08633423B2 Methods and apparatus for controlling substrate temperature in a process chamber 有权
标题翻译：用于控制处理室中的衬底温度的方法和装置
公开(公告)号：US08633423B2
公开(公告)日：2014-01-21
申请号：US13097822
申请日：2011-04-29
申请人： Xing Lin , Douglas A. Buchberger, Jr. , Xiaoping Zhou , Valentin Todorow , Andrew Nguyen , Anchel Sheyner
发明人： Xing Lin , Douglas A. Buchberger, Jr. , Xiaoping Zhou , Valentin Todorow , Andrew Nguyen , Anchel Sheyner
IPC分类号： H05B1/00 , H01L21/683
CPC分类号： H05B6/105 , H01L21/67109 , H01L21/6831
摘要： Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.
摘要翻译：本文提供了在处理期间控制基板的温度的方法和装置。在一些实施例中，用于保持和控制衬底温度的装置可以包括电介质材料的圆盘; 设置在靠近所述圆盘的表面的所述圆盘中的电极，待保持基板的电极; 以及多个加热器元件，其布置在圆盘中并且布置成同心环以提供独立的温度控制区。

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