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    • 3. 发明授权
    • Non-volatile memory devices having charge storage layers at intersecting locations of word lines and active regions
    • 在字线和有源区域的相交位置处具有电荷存储层的非易失性存储器件
    • US08610192B2
    • 2013-12-17
    • US13173759
    • 2011-06-30
    • Won-Cheol JeongSu-Jin AhnYoon-Moon Park
    • Won-Cheol JeongSu-Jin AhnYoon-Moon Park
    • H01L29/76H01L29/788
    • H01L27/11568H01L27/115H01L27/11521H01L29/66833H01L29/792
    • A non-volatile memory device can include a plurality of parallel active regions that are defined by a plurality of device isolation layers formed on a semiconductor substrate, where each of the plurality of parallel active regions extends in a first direction and has a top surface and sidewalls. A plurality of parallel word lines can extend in a second direction and cross over the plurality of parallel active regions at intersecting locations. A plurality of charge storage layers can be disposed at the intersecting locations between the plurality of parallel active regions and the plurality of parallel word lines. Each of the plurality of charge storage layers at the intersecting locations can have a first side and a second side that is parallel to the second direction and can have a first length, a third side and a fourth side that are parallel to the first direction and can have a second length, where the first length is less than the second length.
    • 非易失性存储器件可以包括由形成在半导体衬底上的多个器件隔离层限定的多个平行有源区,其中多个平行有源区中的每一个在第一方向上延伸并且具有顶表面和 侧壁 多个平行字线可以在第二方向上延伸并且在交叉位置处跨越多个平行的有效区域。 多个电荷存储层可以设置在多个平行有源区和多个平行字线之间的交叉位置处。 在交叉位置处的多个电荷存储层中的每一个可以具有平行于第二方向的第一侧和第二侧,并且可以具有平行于第一方向的第一长度,第三侧和第四侧, 可以具有第二长度,其中第一长度小于第二长度。
    • 7. 发明授权
    • Phase change memory devices and their methods of fabrication
    • 相变存储器件及其制造方法
    • US08120005B2
    • 2012-02-21
    • US12544104
    • 2009-08-19
    • Jae-Hyun ParkJae-Hee OhSe-Ho LeeWon-Cheol Jeong
    • Jae-Hyun ParkJae-Hee OhSe-Ho LeeWon-Cheol Jeong
    • H01L45/00
    • H01L45/144H01L27/2409H01L27/2463H01L45/06H01L45/1233H01L45/126H01L45/1666
    • In an embodiment, a phase change memory device includes a semiconductor substrate of a first conductivity type and a first interlayer insulating layer disposed on the semiconductor substrate. A hole penetrates the first interlayer insulating layer. A first and a second semiconductor pattern are sequentially stacked in a lower region of the hole. A cell electrode is provided on the second semiconductor pattern. The cell electrode has a lower surface than a top surface of the first interlayer insulating layer. A confined phase change material pattern fills the hole on the cell electrode. An upper electrode is disposed on the phase change material pattern. The phase change material pattern in the hole is self-aligned with the first and second semiconductor patterns by the hole. A method of fabricating the phase change memory device is also provided.
    • 在一个实施例中,相变存储器件包括第一导电类型的半导体衬底和设置在半导体衬底上的第一层间绝缘层。 一个孔穿透第一层间绝缘层。 第一和第二半导体图案顺序地堆叠在孔的下部区域中。 电池电极设置在第二半导体图案上。 电池电极具有比第一层间绝缘层的顶表面更低的表面。 限制的相变材料图案填充电池电极上的孔。 上电极设置在相变材料图案上。 孔中的相变材料图案通过孔与第一和第二半导体图案自对准。 还提供了制造相变存储器件的方法。
    • 9. 发明授权
    • Twin-cell semiconductor memory devices
    • 双电池半导体存储器件
    • US07577016B2
    • 2009-08-18
    • US11094948
    • 2005-03-31
    • Won-Cheol JeongJae-Hyun Park
    • Won-Cheol JeongJae-Hyun Park
    • G11C11/00
    • G11C11/1675G11C11/161G11C11/1659G11C11/1673
    • Twin cell type semiconductor memory devices are provided that include a plurality of main bit lines and a plurality of reference bit lines. Each of the reference bit lines correspond to respective ones of the main bit lines to form a plurality of bit line pairs. A plurality of sense amplifiers are provided that are electrically connected to a respective one of the plurality of bit line pairs. At least one of the plurality of main bit lines or the plurality of reference bit lines is interposed between the main bit line and the corresponding reference bit line of each bit line pair. At least some of the main bit lines may cross respective ones of the reference bit lines in a sense amplifier region of the semiconductor memory device that contains the plurality of sense amplifiers.
    • 提供了包括多个主位线和多个参考位线的双电池型半导体存储器件。 每个参考位线对应于主位线中的相应位线以形成多个位线对。 提供多个读出放大器,其电连接到多个位线对中的相应一个。 多个主位线或多个参考位线中的至少一个被插入在每个位线对的主位线和对应的参考位线之间。 至少一些主位线可以在包含多个读出放大器的半导体存储器件的读出放大器区域中交叉相应的参考位线。