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1. 发明授权

US08668775B2 Machine CVD shower head 失效
标题翻译：机器CVD淋浴头
公开(公告)号：US08668775B2
公开(公告)日：2014-03-11
申请号：US12058380
申请日：2008-03-28
申请人： Vahid S. Moshtagh , Jeffrey C. Ramer
发明人： Vahid S. Moshtagh , Jeffrey C. Ramer
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/4584 , C23C16/45504 , C23C16/45508 , C23C16/45572 , C23C16/45574 , C23C16/45589 , C30B25/14 , C30B29/406
摘要： A shower head for a chemical vapor deposition chamber can have a housing, a plurality of bosses formed upon the housing, and an inside cover. The bosses can have bores formed therethrough. The inside cover can be attached to the bosses and can have apertures formed therein such that the apertures are generally contiguous with the bores. The housing, the bosses, and the inside cover cooperate to communicate water through the shower head. The water can cool the shower head to a temperature that is substantially lower than the temperature of other parts of the chemical vapor deposition chamber, e.g., the susceptor thereof.
摘要翻译：用于化学气相沉积室的喷头可以具有壳体，形成在壳体上的多个凸起和内盖。老板可以有穿孔的孔。内盖可以附接到凸台并且可以具有形成在其中的孔，使得孔通常与孔邻接。房屋，老板和内盖合作，通过淋浴头进行通水。水可以将喷淋头冷却到比化学气相沉积室的其它部分（例如其基座）的温度基本上低的温度。

2. 发明申请

US20090241833A1 DRILLED CVD SHOWER HEAD 有权
标题翻译：钻孔CVD淋浴头
公开(公告)号：US20090241833A1
公开(公告)日：2009-10-01
申请号：US12165269
申请日：2008-06-30
申请人： Vahid S. Moshtagh , Jeffrey C. Ramer
发明人： Vahid S. Moshtagh , Jeffrey C. Ramer
IPC分类号： C23C16/00 , B23P17/00 , F28D15/00
CPC分类号： C23C16/4584 , C23C16/45504 , C23C16/45508 , C23C16/45574 , C23C16/45589 , C30B25/14 , C30B29/406 , Y10T29/49401
摘要： A shower head for a chemical vapor deposition chamber can comprise a plurality of first injectors for a first reactant gas and a plurality of second injectors for a second reactant gas. The first and second injectors can be interspersed among one another so as to enhance control of the mixing and delivery of reactant gases within the chemical deposition chamber. Cooling water can be communicated through a plurality of gun drilled bores formed intermediate injectors of the shower head. In this manner, enhanced control of the mixing and delivery of reactant gases can be provided.
摘要翻译：用于化学气相沉积室的喷头可以包括用于第一反应气体的多个第一喷射器和用于第二反应气体的多个第二喷射器。第一和第二注射器可以彼此散布，以便增强对化学沉积室内的反应气体的混合和输送的控制。冷却水可以通过形成喷淋头的中间喷射器的多个喷枪钻孔来连通。以这种方式，可以提供对反应气体的混合和输送的增强的控制。

3. 发明申请

US20090107403A1 BRAZED CVD SHOWER HEAD 失效
标题翻译： BRAZED CVD淋浴头
公开(公告)号：US20090107403A1
公开(公告)日：2009-04-30
申请号：US12058380
申请日：2008-03-28
申请人： Vahid S. Moshtagh , Jeffrey C. Ramer
发明人： Vahid S. Moshtagh , Jeffrey C. Ramer
IPC分类号： C23C16/00
CPC分类号： C23C16/4584 , C23C16/45504 , C23C16/45508 , C23C16/45572 , C23C16/45574 , C23C16/45589 , C30B25/14 , C30B29/406
摘要： A shower head for a chemical vapor deposition chamber can have a housing, a plurality of bosses formed upon the housing, and an inside cover. The bosses can have bores formed therethrough. The inside cover can be attached to the bosses and can have apertures formed therein such that the apertures are generally contiguous with the bores. The housing, the bosses, and the inside cover cooperate to communicate water through the shower head. The water can cool the shower head to a temperature that is substantially lower than the temperature of other parts of the chemical vapor deposition chamber, e.g., the susceptor thereof.
摘要翻译：用于化学气相沉积室的喷头可以具有壳体，形成在壳体上的多个凸起和内盖。老板可以有穿孔的孔。内盖可以附接到凸台并且可以具有形成在其中的孔，使得孔通常与孔邻接。房屋，老板和内盖合作，通过淋浴头进行通水。水可以将喷淋头冷却到比化学气相沉积室的其它部分（例如其基座）的温度基本上低的温度。

4. 发明授权

US08216419B2 Drilled CVD shower head 有权
标题翻译：钻孔CVD淋浴头
公开(公告)号：US08216419B2
公开(公告)日：2012-07-10
申请号：US12165269
申请日：2008-06-30
申请人： Vahid S. Moshtagh , Jeffrey C. Ramer
发明人： Vahid S. Moshtagh , Jeffrey C. Ramer
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： C23C16/4584 , C23C16/45504 , C23C16/45508 , C23C16/45574 , C23C16/45589 , C30B25/14 , C30B29/406 , Y10T29/49401
摘要： A shower head for a chemical vapor deposition chamber can comprise a plurality of first injectors for a first reactant gas and a plurality of second injectors for a second reactant gas. The first and second injectors can be interspersed among one another so as to enhance control of the mixing and delivery of reactant gases within the chemical deposition chamber. Cooling water can be communicated through a plurality of gun drilled bores formed intermediate injectors of the shower head. In this manner, enhanced control of the mixing and delivery of reactant gases can be provided.
摘要翻译：用于化学气相沉积室的喷头可以包括用于第一反应气体的多个第一喷射器和用于第二反应气体的多个第二喷射器。第一和第二注射器可以彼此散布，以便增强对化学沉积室内的反应气体的混合和输送的控制。冷却水可以通过形成喷淋头的中间喷射器的多个喷枪钻孔来连通。以这种方式，可以提供对反应气体的混合和输送的增强的控制。

5. 发明申请

US20110089437A1 CROSS FLOW CVD REACTOR 有权
标题翻译：交流CVD反应器
公开(公告)号：US20110089437A1
公开(公告)日：2011-04-21
申请号：US12978842
申请日：2010-12-27
申请人： Vahid S. Moshtagh , Heng Liu , Jeffery Ramer , Michael Solomensky
发明人： Vahid S. Moshtagh , Heng Liu , Jeffery Ramer , Michael Solomensky
IPC分类号： H01L33/00 , C23C16/455
CPC分类号： C23C16/4412 , C23C16/45504 , C23C16/45574 , C23C16/4584 , C30B25/02 , C30B25/14 , C30B29/40 , C30B29/406
摘要： A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The rectangular inlet duct and the rectangular outlet duct can facilitate laminar flow of reactant gases over a susceptor. Movable partitions can be configured to define a plurality of zones within the chamber. Each zone can contain a different reactant gas, concentration of reactant gas, and/or flow rate of reactant gas. Enhanced laminar flow can be provided, undesirable depletion of reactant gas can be mitigated, and enhanced control of reactant gases can be facilitated.
摘要翻译：交叉流化学气相沉积室可以包括具有大致矩形横截面的入口管道和具有大致矩形横截面的出口管道。矩形入口管道和矩形出口管道可以促进反应气体在基座上的层流。活动隔板可以被配置为在腔室内限定多个区域。每个区域可以包含不同的反应气体，反应气体的浓度和/或反应气体的流速。可以提供增强的层流，可以减轻反应气体的不期望的消耗，并且可以促进反应气体的增强控制。

6. 发明申请

US20110063837A1 LED ARRAY MODULE AND LED ARRAY MODULE FRAME 审中-公开
标题翻译： LED阵列模块和LED阵列模块
公开(公告)号：US20110063837A1
公开(公告)日：2011-03-17
申请号：US12883978
申请日：2010-09-16
申请人： Alexander RIZKIN , Robert Tudhope , Keith Scott , Vahid S. Moshtagh
发明人： Alexander RIZKIN , Robert Tudhope , Keith Scott , Vahid S. Moshtagh
IPC分类号： F21V7/00 , F21S4/00
CPC分类号： F21V19/001 , F21V29/70 , F21Y2105/10 , F21Y2115/10
摘要： A solid state light emitter module frame includes a supporting member, legs, and arms. The supporting member is configured to support a reflector. The legs are coupled to the supporting member. The arms are coupled to the supporting member and extend inwardly towards an inner edge of the supporting member. Each of the arms has an attachment mechanism for attaching to an solid state light emitter array.
摘要翻译：固态光发射器模块框架包括支撑构件，腿和臂。支撑构件被构造成支撑反射器。腿连接到支撑构件。臂连接到支撑构件并向内延伸到支撑构件的内边缘。每个臂具有用于附接到固态光发射器阵列的附接机构。

7. 发明申请

US20130121006A1 Low profile heat sink with attached LED light source 有权
公开(公告)号：US20130121006A1
公开(公告)日：2013-05-16
申请号：US13373347
申请日：2011-11-12
申请人： Vahid S. Moshtagh
发明人： Vahid S. Moshtagh
IPC分类号： F21V29/00 , H05K13/00
CPC分类号： F21S8/085 , F21K9/90 , F21S8/086 , F21V3/00 , F21V29/713 , F21V29/74 , F21V29/75 , F21V29/763 , F21V29/83 , F21V31/005 , F21W2131/103 , F21Y2105/10 , F21Y2115/10 , Y10T29/49002
摘要： An LED light source with an attached heat sink includes larger fins, smaller fins, a mounting platform and light emitting diodes attached to the mounting platform. The larger fins are oriented parallel to the smaller fins. The larger fins are integrally formed with a first base, and the smaller fins are integrally formed with a second base. The bottom surface of the second base contacts the larger fins, which are more than twice as tall as the smaller fins. There are more than twice as many smaller fins than larger fins per distance perpendicular to the fins. Ducts are formed between the larger fins and the bottom surface of the second base. Intake holes pass through the first base into each duct near the end of the duct that is blocked by an end wall. The mounting platform with the LEDs is attached to the bottom of the first base.

8. 发明申请

US20110069503A1 Shape Forming Heat Sink With Flexible Heat Rod 有权
标题翻译：形状形成散热器带柔性热棒
公开(公告)号：US20110069503A1
公开(公告)日：2011-03-24
申请号：US12909802
申请日：2010-10-21
申请人： Vahid S. Moshtagh
发明人： Vahid S. Moshtagh
IPC分类号： F21V29/00 , B23P19/04 , H05K7/20
CPC分类号： F21V29/70 , F21V29/004 , F21W2131/103 , F21Y2115/10 , Y10T29/49826
摘要： A conforming heat dissipating structure transfers heat to an irregular surface from a heat source mounted on its bottom surface. The heat dissipating structure includes an open container filled with metal shavings and balls covered by a flexible retainer. The shavings and balls beneath the flexible retainer are pressed against the irregular surface and conform to its irregular shape. In one application, light emitting diodes are mounted to the bottom of the heat dissipating structure, and the shavings are compressed against the inside cover of a street light. A flexible heat rod enables heat to be transferred over a flexible path from a heat source on one heat dissipating structure to a heat sink pressed against another heat dissipating structure. The many strands that make up the flexible heat rod are spread out inside each open container and are pressed between the metallic shavings to achieve a good thermal contact.
摘要翻译：符合要求的散热结构将热量从安装在其底表面上的热源传递到不规则表面。散热结构包括一个开放的容器，其中填充有金属屑和由柔性保持器覆盖的球。柔性保持架下方的刨削和滚珠压在不规则表面上并符合其不规则形状。在一个应用中，发光二极管安装在散热结构的底部，并且刨花被压靠在路灯的内盖上。柔性热棒使得热量能够通过柔性路径从一个散热结构上的热源转移到压靠另一个散热结构的散热片上。构成柔性热棒的许多线分散在每个开放的容器内部并且被压在金属屑之间以实现良好的热接触。

9. 发明授权

US08628217B2 Low profile heat sink with attached LED light source 有权
标题翻译：带有附带LED光源的低调散热片
公开(公告)号：US08628217B2
公开(公告)日：2014-01-14
申请号：US13373347
申请日：2011-11-12
申请人： Vahid S. Moshtagh
发明人： Vahid S. Moshtagh
IPC分类号： F21V29/00
CPC分类号： F21S8/085 , F21K9/90 , F21S8/086 , F21V3/00 , F21V29/713 , F21V29/74 , F21V29/75 , F21V29/763 , F21V29/83 , F21V31/005 , F21W2131/103 , F21Y2105/10 , F21Y2115/10 , Y10T29/49002
摘要： An LED light source with an attached heat sink includes larger fins, smaller fins, a mounting platform and light emitting diodes attached to the mounting platform. The larger fins are oriented parallel to the smaller fins. The larger fins are integrally formed with a first base, and the smaller fins are integrally formed with a second base. The bottom surface of the second base contacts the larger fins, which are more than twice as tall as the smaller fins. There are more than twice as many smaller fins than larger fins per distance perpendicular to the fins. Ducts are formed between the larger fins and the bottom surface of the second base. Intake holes pass through the first base into each duct near the end of the duct that is blocked by an end wall. The mounting platform with the LEDs is attached to the bottom of the first base.
摘要翻译：具有附接散热器的LED光源包括较大的散热片，较小的散热片，安装平台和连接到安装平台的发光二极管。较大的翅片平行于较小的翅片定向。较大的翅片与第一基座一体地形成，并且较小的翅片与第二底座一体地形成。第二底座的底表面与较大的翅片接触，它们比较小的翅片高两倍以上。与散热片垂直的距离比每个距离的翅片要小一倍以上。管道形成在较大翅片和第二基座的底表面之间。进气孔穿过第一基座进入管道端部附近的每个管道，其被端壁堵塞。具有LED的安装平台连接到第一基座的底部。

10. 发明申请

US20090096349A1 CROSS FLOW CVD REACTOR 审中-公开
标题翻译：交流CVD反应器
公开(公告)号：US20090096349A1
公开(公告)日：2009-04-16
申请号：US12259787
申请日：2008-10-28
申请人： Vahid S. Moshtagh , Heng Liu , Jeffery Ramer , Michael Solomensky
发明人： Vahid S. Moshtagh , Heng Liu , Jeffery Ramer , Michael Solomensky
IPC分类号： H01J1/63 , C23C16/455
CPC分类号： C23C16/4412 , C23C16/45504 , C23C16/45574 , C23C16/4584 , C30B25/02 , C30B25/14 , C30B29/40 , C30B29/406
摘要： A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The rectangular inlet duct and the rectangular outlet duct can facilitate laminar flow of reactant gases over a susceptor. Movable partitions can be configured to define a plurality of zones within the chamber. Each zone can contain a different reactant gas, concentration of reactant gas, and/or flow rate of reactant gas. Enhanced laminar flow can be provided, undesirable depletion of reactant gas can be mitigated, and enhanced control of reactant gases can be facilitated.
摘要翻译：交叉流化学气相沉积室可以包括具有大致矩形横截面的入口管道和具有大致矩形横截面的出口管道。矩形入口管道和矩形出口管道可以促进反应气体在基座上的层流。活动隔板可以被配置为在腔室内限定多个区域。每个区域可以包含不同的反应气体，反应气体的浓度和/或反应气体的流速。可以提供增强的层流，可以减轻反应气体的不期望的消耗，并且可以促进反应气体的增强控制。

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