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1. 发明授权

US06636367B2 Projection exposure device 失效
公开(公告)号：US06636367B2
公开(公告)日：2003-10-21
申请号：US09955921
申请日：2001-09-19
申请人： Ulrich Drodofsky , Nils Dieckmann , Martin Antoni , Hans-Joachim Miesner
发明人： Ulrich Drodofsky , Nils Dieckmann , Martin Antoni , Hans-Joachim Miesner
IPC分类号： G02B702
CPC分类号： G03F7/70133 , G03F7/70141
摘要： A projection exposure device (1), in particular for micro-lithography, serves to produce an image of an object (2) in an image plane (11) positioned in an object plane (10). For this reason the projection exposure device (1) has a radiation source (4) emitting projection radiation (5). Illumination optics (6) are positioned between the radiation source (4) and the object plane (10) and projection optics (8) are positioned between the object plane (10) and the image plane (11). A detection device (30) is provided to measure the illumination angle distribution of the projection radiation (5) in a field plane (10). This communicates via at least one control device (34, 18) with at least one manipulator (20, 45, 47). The latter serves to move at least one optical component (7, 41) within the projection ray path (5, 9). The illumination angle distribution changes as a result of the controlled movement of the optical component (7, 41). This can therefore be adjusted depending on the measurement result and for example adapted to the object structure.

2. 发明授权

US07329886B2 EUV illumination system having a plurality of light sources for illuminating an optical element 有权
标题翻译： EUV照明系统具有用于照射光学元件的多个光源
公开(公告)号：US07329886B2
公开(公告)日：2008-02-12
申请号：US10755846
申请日：2004-01-12
申请人： Wolfgang Singer , Martin Antoni , Nils Dieckmann , Dirk Rothweiler , Jörg Schultz
发明人： Wolfgang Singer , Martin Antoni , Nils Dieckmann , Dirk Rothweiler , Jörg Schultz
IPC分类号： G21K5/04
CPC分类号： G21K5/04 , B82Y10/00 , G03F7/7005 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00
摘要： There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.
摘要翻译：提供照明系统。照明系统包括第一光源和第二光源，每个光源用于提供波长<= 193nm的光和光学元件。第一光源照亮光学元件的第一区域，第二光源照亮光学元件的第二区域。

3. 发明授权

US07977651B2 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07977651B2
公开(公告)日：2011-07-12
申请号：US12547135
申请日：2009-08-25
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G01T1/20 , A61N5/00
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译：提供了一种用于投影曝光装置的投影物镜，该投影曝光装置具有用于发射具有波长＆nlE; 193nm的主射线的电磁辐射的主光源。投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

4. 发明授权

US07400699B2 Illumination system with raster elements of different sizes 失效
标题翻译：具有不同尺寸光栅元素的照明系统
公开(公告)号：US07400699B2
公开(公告)日：2008-07-15
申请号：US10040717
申请日：2002-01-07
申请人： Wolfgang Singer , Wilhelm Ulrich , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Ulrich , Martin Antoni
IPC分类号： G21K5/04 , G21K1/06 , G03B27/42 , G03B27/72 , G02B27/10
CPC分类号： G21K1/06 , G03F7/70075 , G03F7/70083 , G03F7/702 , G03F7/70233
摘要： There is provided an illumination system for lithography with wavelengths of ≦193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the first raster elements each have an x-direction and a y-direction with an aspect ratio, and at least two of the first raster elements have aspect ratios of different magnitude.
摘要翻译：提供了一种波长<= 193mn的光刻照明系统。该系统包括第一光学元件，其被分成第一光栅元件并位于第一平面中。第一平面限定x方向和y方向，第一光栅元件各自具有x方向和具有纵横比的y方向，并且至少两个第一光栅元素具有不同大小的纵横比。

5. 发明授权

US07091505B2 Collector with fastening devices for fastening mirror shells 有权
标题翻译：带紧固装置的收集器用于固定镜壳
公开(公告)号：US07091505B2
公开(公告)日：2006-08-15
申请号：US10775037
申请日：2004-02-09
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： G21G5/00 , A61N5/00
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译：提供了沿着扫描方向以扫描模式操作的投影曝光系统。投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。镜壳基本上围绕公共旋转轴线旋转对称。紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。

6. 发明授权

US06947124B2 Illumination system particularly for microlithography 失效
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US06947124B2
公开(公告)日：2005-09-20
申请号：US10381625
申请日：2001-09-28
申请人： Martin Antoni , Wolfgang Singer , Johannes Wangler
发明人： Martin Antoni , Wolfgang Singer , Johannes Wangler
IPC分类号： G03F7/20 , G21K1/06 , G03B27/54 , G03B27/42 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06
摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements are rectangular. The field is a segment of an annulus, and the second optical component includes a first field mirror with negative optical power for shaping the field to the segment of the annulus and a second field mirror with positive optical power. Each of a plurality of rays intersects the first field mirror with an incidence angle greater than 70° and each of the plurality of rays intersects the second field mirror with an incidence angle of less than 25°.
摘要翻译：提供了一种用于微波光刻的照明系统，其波长<= 193nm。照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在图像平面中的场上的多个图像。多个第一光栅元件是矩形的。该场是环的一段，并且第二光学部件包括具有负光学功率的第一场反射镜，用于将场成形为环形部分，以及具有正光焦度的第二场反射镜。多个光线中的每一个与第一场反射镜相交，入射角大于70°，并且多个光线中的每一个与第二场反射镜相交，入射角小于25°。

7. 发明授权

US07592598B2 Illumination system particularly for microlithography 失效
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07592598B2
公开(公告)日：2009-09-22
申请号：US12257910
申请日：2008-10-24
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G02B27/14 , G02B5/30 , G02B17/00
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译：提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

8. 发明申请

US20090015812A1 ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY 审中-公开
标题翻译：照明系统特别适用于微晶
公开(公告)号：US20090015812A1
公开(公告)日：2009-01-15
申请号：US12212926
申请日：2008-09-18
申请人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G03B27/54
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
摘要翻译：提供了一种用于沿着扫描方向进行扫描器微光刻的照明系统，其中发射波长<= 193nm的光源。照明系统包括多个光栅元件。将多个光栅元件成像为照明系统的图像平面，以产生部分地叠加在图像平面中的场上的多个图像。该场在扫描方向上定义非矩形强度分布。

9. 发明申请

US20080042079A1 Collector with fastening devices for fastening mirror shells 审中-公开
标题翻译：带紧固装置的收集器用于固定镜壳
公开(公告)号：US20080042079A1
公开(公告)日：2008-02-21
申请号：US11974718
申请日：2007-10-16
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.
摘要翻译：提供了一种包括包含在第一空间中的第一光学子系统和包含在第二空间中的第二光学子系统的系统。第一和第二空间由选自隔膜和阀门的结构分开。

10. 发明授权

US07321126B2 Collector with fastening devices for fastening mirror shells 有权
标题翻译：带紧固装置的收集器用于固定镜壳
公开(公告)号：US07321126B2
公开(公告)日：2008-01-22
申请号：US11416447
申请日：2006-05-02
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
IPC分类号： A61N5/00
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译：提供了沿着扫描方向以扫描模式操作的投影曝光系统。投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。镜壳基本上围绕公共旋转轴线旋转对称。紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。

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