会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • System for detecting minute particles on or above a substrate
    • 用于检测基板上或上方的微小颗粒的系统
    • US5008558A
    • 1991-04-16
    • US373801
    • 1989-06-29
    • Masao KoshinakaMinoru AkiyamaHitoshi TanakaToshimasa Tomoda
    • Masao KoshinakaMinoru AkiyamaHitoshi TanakaToshimasa Tomoda
    • G01N21/88G01N15/02G01N15/14G01N21/89G01N21/94G01N21/95G01N21/956H01L21/66
    • G01N21/94G01N2015/0238G01N2021/8909G01N2021/945G01N21/9501
    • A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate for a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles. The measuring apparatus comprises a laser beam scanning mechanism for irradiating a measuring space with a laser beam the angular position of which is minutely modulated at a predetermined frequency, a photodetector which receives light scattered by a fine particle and converts the received light into an electrical signal, and a signal processor which extracts from the electrical signal output by the photodetector a signal component whose frequency is the same as or double that of a modulating signal for the minute scanning with the laser beam and which has a constant phase difference in terms of time with respect to the modulating signal. Thus, it is possible to measure fine particles with high sensitivity without substantially disturbing the environment inside the process unit or the process itself.
    • 一种微粒测量装置,被设计用于测量附着在用于形成膜,蚀刻,清洁等的处理单元中的用于半导体器件的基板的表面的细颗粒,以及悬浮在基板表面上方的空间中的细颗粒 使用由这些细颗粒引起的激光束的散射。 该测量装置包括:激光束扫描机构,用于以预定频率微调其角度位置的激光束照射测量空间;光电检测器,其接收由微粒散射的光并将接收的光转换成电信号 以及信号处理器,其从由光电检测器输出的电信号中提取频率与用于用激光束进行微小扫描的调制信号的频率相同或者是两倍的信号分量,并且其在时间上具有恒定的相位差 相对于调制信号。 因此,可以以高灵敏度测量细颗粒,而基本上不会干扰处理单元内的环境或过程本身。
    • 5. 发明授权
    • Fine-particle measuring apparatus
    • 细颗粒测量仪
    • US5030842A
    • 1991-07-09
    • US540893
    • 1990-06-20
    • Masao KoshinakaMinoru AkiyamaToshimasa Tomoda
    • Masao KoshinakaMinoru AkiyamaToshimasa Tomoda
    • G01N21/88G01N15/02G01N15/14G01N21/21G01N21/47G01N21/94G01N21/95G01N21/956H01L21/66
    • G01N15/0205G01N21/94G01N2015/145G01N21/21G01N21/47G01N21/9501
    • A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate of a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles. The measuring apparatus comprises a laser light phase modulator for generating two laser beams which have the same wavelength and the phase difference between which is modulated at a predetermined frequency, an optical system which causes the two laser beams to intersect each other within a space containing the fine particles being the objects of measurement, a photodetector which receives light scattered by any of the fine particles in the region which the two laser beams intersect, and converts the received light into an electrical signal, and a signal processor which extracts from the electrical signal based on the scattered light of a signal component whose frequency is the same as or double that of a phase modulating signal for the modulation effected in the laser beam phase modulator and which has a constant phase difference with respect to the phase modulating signal. Thus, it is possible to measure fine particles with high spatial resolving power without substantially disturbing the environment inside the process unit or the process itself.
    • 一种微粒测量装置,设计用于测量附着在半导体器件的基板的表面上的细颗粒,该半导体器件的基板的表面设置在用于形成膜,蚀刻,清洁等的处理单元中,以及悬浮在基板表面上方的空间中的细颗粒 使用由这些细颗粒引起的激光束的散射。 测量装置包括激光相位调制器,用于产生具有相同波长的两个激光束,并且其相位差以预定频率被调制;使得两个激光束在包含该两个激光束的空间内彼此相交的光学系统 作为测量对象的微粒子,接收由两个激光束相交的区域中的任何细颗粒散射的光并将接收的光转换为电信号的光检测器,以及从电信号中提取的信号处理器 基于在激光束相位调制器中进行的调制的相位调制信号的频率相同或相反的信号分量的散射光,并且相对于相位调制信号具有恒定的相位差。 因此,可以测量具有高空间分辨能力的细颗粒,而基本上不会干扰处理单元内的环境或过程本身。
    • 7. 发明授权
    • Inspection device for detecting defects in a periodic pattern on a
semiconductor wafer
    • 用于检测半导体晶片周期性图案中的缺陷的检查装置
    • US5170063A
    • 1992-12-08
    • US661140
    • 1991-02-27
    • Yoko MiyazakiHitoshi TanakaNobuyuki KosakaToshimasa Tomoda
    • Yoko MiyazakiHitoshi TanakaNobuyuki KosakaToshimasa Tomoda
    • G01N21/88G01N21/956G03H1/00G06T1/00
    • G01N21/95623G03H1/00
    • An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam is guided to a semiconductor wafer having a periodic pattern thereon by mirrors and a beam expander. The light scattered from the specimen is collected by a lens on a photographic plate. The reference beam is guided to the photographic plate via a second beam expander and another mirror. The intensity of the reference beam is adjusted to a level at which the reference beams interferes on the photographic plate with the light scattered from defects in the periodic pattern and collected by the lens. Thus, a hologram of the defects in the pattern is recorded on the photographic plate. After development, the photographic plate is returned to its original position and used to form a holographic image of the defects with a transmitted regeneration light beam.
    • 用于检测半导体晶片周期性图案中的缺陷的检查装置包括激光振荡器。 在曝光过程中,从激光振荡器发射的光被分成目标光束和参考光束。 目标光束通过反射镜和光束扩展器被引导到其上具有周期性图案的半导体晶片。 从样本散射的光由照相板上的透镜收集。 参考光束通过第二光束扩展器和另一个反射镜被引导到照相板。 参考光束的强度被调整到参考光束干涉照相板的水平,其中光从周期性图案中的缺陷散射并由透镜收集。 因此,图案上的缺陷的全息图被记录在照相板上。 在显影之后,照相板返回其原始位置,并用于通过发射的再生光束形成缺陷的全息图像。
    • 10. 发明授权
    • Measurement apparatus employing radiation
    • 使用辐射的测量装置
    • US4885759A
    • 1989-12-05
    • US124558
    • 1987-11-24
    • Toshimasa TomodaShinji BadonoMasaki Komaru
    • Toshimasa TomodaShinji BadonoMasaki Komaru
    • G01N23/08G01N23/12
    • G01N23/12G01N23/08
    • A measuring apparatus for measuring a physical property of a substance using radiation has a source of radiation for irradiating the substance, a radiation detector which is disposed on the opposite side of the substance from the radiation source, a mask for allowing radiaton to enter the radiation detector only along n prescribed pathways, and a signal processing and calculating device for calculating the physical property of the substance based on the radiation which is incident upon the radiation detector. The mask has n different mask patterns each comprising a plurality of pattern elements which allow the passage of radiation and which can be positioned between the substance and the radiation detector in alignment with the radiation pathways.
    • 用于使用辐射测量物质的物理性质的测量装置具有用于照射物质的辐射源,设置在与辐射源相反的物质的相反侧的辐射检测器,用于允许辐射进入辐射的掩模 检测器仅沿着n个规定的路径,以及信号处理和计算装置,用于基于入射在辐射检测器上的辐射来计算物质的物理性质。 掩模具有n个不同的掩模图案,每个掩模图案包括允许辐射通过的多个图案元件,并且其可以位于物质和辐射检测器之间,与辐射路径对准。