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1. 发明申请

US20090220889A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN 有权
标题翻译：光敏树脂组合物和形成图案的方法
公开(公告)号：US20090220889A1
公开(公告)日：2009-09-03
申请号：US12092701
申请日：2006-10-10
申请人： Kazufumi Sato , Yasushi Fujii , Hisanobu Harada , Koji Yonemura , Isamu Takagi , Daisuke Kawana , Tomotaka Yamada , Toshikazu Takayama
发明人： Kazufumi Sato , Yasushi Fujii , Hisanobu Harada , Koji Yonemura , Isamu Takagi , Daisuke Kawana , Tomotaka Yamada , Toshikazu Takayama
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0757
摘要： A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.
摘要翻译：具有淬火功能和令人满意的长期稳定性的感光性树脂组合物，特别是可以防止由于储存期间随着时间的变化而引起的敏感性异常（从给定的灵敏度变化）; 以及从组合物形成图案的方法。抗蚀剂组合物含有作为主要成分的含有硅氧烷或倍半硅氧烷聚合物等的含硅聚合物的基础树脂，该组合物含有作为猝灭剂的特定锍化合物代替含氮化合物。

2. 发明授权

US08216763B2 Photosensitive resin composition and method of forming pattern 有权
标题翻译：感光树脂组合物及其形成方法
公开(公告)号：US08216763B2
公开(公告)日：2012-07-10
申请号：US12092701
申请日：2006-10-10
申请人： Kazufumi Sato , Yasushi Fujii , Hisanobu Harada , Koji Yonemura , Isamu Takagi , Daisuke Kawana , Tomotaka Yamada , Toshikazu Takayama
发明人： Kazufumi Sato , Yasushi Fujii , Hisanobu Harada , Koji Yonemura , Isamu Takagi , Daisuke Kawana , Tomotaka Yamada , Toshikazu Takayama
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0757
摘要： A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.
摘要翻译：具有淬火功能和令人满意的长期稳定性的感光性树脂组合物，特别是可以防止由于储存期间随着时间的变化而引起的敏感性异常（从给定的灵敏度变化）; 以及从组合物形成图案的方法。抗蚀剂组合物含有作为主要成分的含有硅氧烷或倍半硅氧烷聚合物等的含硅聚合物的基础树脂，该组合物含有特定的锍化合物代替含氮化合物作为猝灭剂。

3. 发明申请

US20060292488A1 Composition for formation of antireflection film, and antireflection film in which the same is used 审中-公开
标题翻译：用于形成防反射膜的组合物和使用其的抗反射膜
公开(公告)号：US20060292488A1
公开(公告)日：2006-12-28
申请号：US11446763
申请日：2006-06-05
申请人： Toshikazu Takayama , Yasushi Fujii , Hisanobu Harada , Koji Yonemura , Isamu Takagi , Daisuke Kawana , Kazufumi Sato
发明人： Toshikazu Takayama , Yasushi Fujii , Hisanobu Harada , Koji Yonemura , Isamu Takagi , Daisuke Kawana , Kazufumi Sato
IPC分类号： C08G77/26 , G03C1/00
CPC分类号： C08G77/20 , C08G77/14 , G03F7/0757 , G03F7/091
摘要： A composition for formation of an antireflection film having an excellent etching resistant characteristic and ability to prevent reflection of short-wavelength light (absorption ability of short-wavelength light) as well as excellent time dependent stability, and an antireflection film in which the same is used, are provided. A composition for formation of an antireflection film including a siloxane compound having a light-absorbing group and a crosslinking group, the siloxane compound being blocked with a capping group, is provided. By thus blocking the siloxane compound with a capping group, time dependent stability can be improved without deteriorating etching resistance, and ability to prevent reflection.
摘要翻译：用于形成具有优异的耐蚀刻特性和防止短波长光的反射（短波长光的吸收能力）以及优异的时间依赖稳定性的抗反射膜的组合物和其中相同的抗反射膜使用，提供。提供了一种用于形成包含具有光吸收基团和交联基团的硅氧烷化合物的抗反射膜的组合物，该硅氧烷化合物被封端基封端。通过这样用封端基封端硅氧烷化合物，可以提高时间依赖性的稳定性，而不会降低耐腐蚀性，防止反射的能力。

4. 发明申请

US20080312400A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM 审中-公开
标题翻译：用于形成电阻膜的组合物和耐下漆膜
公开(公告)号：US20080312400A1
公开(公告)日：2008-12-18
申请号：US12137483
申请日：2008-06-11
申请人： Naoki YAMASHITA , Daisuke Kawana , Hisanobu Harada , Koji Yonemura
发明人： Naoki YAMASHITA , Daisuke Kawana , Hisanobu Harada , Koji Yonemura
IPC分类号： G03F7/004 , C08G77/28 , C08G77/04
CPC分类号： G03F7/091 , C08G77/28 , C08L83/08 , G03F7/0752
摘要： A composition for forming a resist underlayer film of the present invention is capable of forming a resist underlayer film which has a good matching property with a resist, by including a siloxane polymer component having a repeating unit which contains a monovalent organic group containing a sulfur atom. Thus, the composition of the resist layer film capable of forming a resist underlayer film which has a good matching property with a resist is realized.
摘要翻译：用于形成本发明的抗蚀剂下层膜的组合物能够通过包含具有含有含有硫原子的一价有机基团的重复单元的硅氧烷聚合物组分，形成与抗蚀剂具有良好匹配性的抗蚀剂下层膜。因此，实现了能够形成与抗蚀剂具有良好匹配性能的抗蚀剂下层膜的抗蚀剂层膜的组成。

5. 发明授权

US08289488B2 Fringe-field switching mode liquid crystal display device and method of manufacturing the same 有权
标题翻译：边缘场切换模式液晶显示装置及其制造方法
公开(公告)号：US08289488B2
公开(公告)日：2012-10-16
申请号：US12490785
申请日：2009-06-24
申请人： Koji Yonemura , Yasuhiro Morii
发明人： Koji Yonemura , Yasuhiro Morii
IPC分类号： G02F1/1343 , G02F1/1337
CPC分类号： G02F1/134363 , G02F2001/134318 , G02F2201/122 , G02F2201/40
摘要： A liquid crystal display device includes an alignment layer having an alignment direction inclined at an angle α where 0°
摘要翻译：一种液晶显示装置，包括：取向膜，其取向方向相对于栅极线的延伸方向以0°<α<90°的角度α倾斜，像素电极和与该像素相对设置的公共电极电极，其间具有绝缘层。像素电极和公共电极中的一个具有用于与像素电极和公共电极中的另一个一起产生与液晶的边缘电场的狭缝。狭缝包括位于对准方向或垂直于取向方向的方向的第一狭缝和分别以角度±θ倾斜的多个第二狭缝和多个第三狭缝; 相对于第一狭缝。

6. 发明申请

US20090029291A1 POSITIVE RESIST COMPOSITION FOR THIN-FILM IMPLANTATION PROCESS AND METHOD FOR FORMING RESIST PATTERN 有权
标题翻译：薄膜植入方法的积极抵抗组合物及其形成阻力图的方法
公开(公告)号：US20090029291A1
公开(公告)日：2009-01-29
申请号：US11815205
申请日：2006-02-01
申请人： Takako Suzuki , Ken Tanaka , Koji Yonemura , Shoichi Fujita
发明人： Takako Suzuki , Ken Tanaka , Koji Yonemura , Shoichi Fujita
IPC分类号： G03C1/73 , G03F7/20
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/106
摘要： A positive resist composition for a thin-film implantation process of the present invention includes: a resin component (A) with an acid-dissociable dissolution inhibiting group, whose alkali solubility increases by the action of an acid; an acid generator component (B) which generates an acid by irradiation with radiation; and a compound (C) having a radiation absorbing ability, wherein said resin component (A) comprises a structural unit (a1) derived from a hydroxystyrene and a structural unit (a2) obtained by substituting the hydrogen atom in a hydroxyl group of said structural unit (a1) with an acid-dissociable dissolution inhibiting group, and said acid-dissociable dissolution inhibiting group contains an acid-dissociable dissolution inhibiting group (II) represented by the following general formula (II) as a main component.
摘要翻译：本发明的薄膜注入方法的正型抗蚀剂组合物包括：具有酸解离溶解抑制基团的树脂组分（A），其碱溶解度通过酸的作用而增加; 通过辐射照射产生酸的酸发生剂组分（B）; 和具有放射线吸收能力的化合物（C），其中所述树脂组分（A）包含衍生自羟基苯乙烯的结构单元（a1）和通过将所述结构的羟基中的氢原子取代而获得的结构单元（a2）单元（a1）与酸解离溶解抑制基团，所述酸解离溶解抑制基团含有以下通式（II）表示的酸解离溶解抑制基团（II）作为主要成分。

7. 发明申请

US20070279572A1 LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20070279572A1
公开(公告)日：2007-12-06
申请号：US11758852
申请日：2007-06-06
申请人： Koji Yonemura
发明人： Koji Yonemura
IPC分类号： G02F1/1339
CPC分类号： G02F1/1339 , G02F1/134363 , G02F2001/133311 , G02F2001/133519 , G02F2201/48
摘要： A liquid crystal display device includes an electrode substrate having a pixel electrode and a counter electrode, a counter substrate placed opposite to the electrode substrate, a sealing material formed frame-like surrounding a display area to attach the electrode substrate and the counter substrate, and liquid crystals placed in a space created by the electrode substrate, the counter substrate and the sealing material. The liquid crystal display device also includes an overcoat layer formed on a surface of the counter substrate facing the liquid crystals and placed in the display area. An end of the overcoat layer is located on the inward side with respect to the outer end of the sealing material.
摘要翻译：液晶显示装置包括具有像素电极和对置电极的电极基板，与电极基板相对设置的对置基板，围绕显示区域形成的框状的密封材料，以附着电极基板和对置基板，以及放置在由电极基板，对置基板和密封材料形成的空间中的液晶。液晶显示装置还包括形成在面对液晶的对置基板的表面上的外涂层，并且放置在显示区域中。外涂层的端部相对于密封材料的外端位于内侧。

8. 发明申请

US20090310072A1 LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20090310072A1
公开(公告)日：2009-12-17
申请号：US12481744
申请日：2009-06-10
申请人： Yasuhiro MORII , Koji Yonemura
发明人： Yasuhiro MORII , Koji Yonemura
IPC分类号： G02F1/1337 , G02F1/1343
CPC分类号： G02F1/133753 , G02F1/134363 , G02F1/1393 , G02F2001/133757
摘要： A liquid crystal display device includes a gate line placed on an array substrate, a pixel electrode in a comb teeth shape, a common electrode in a comb teeth shape that generates an in-plane electric field with the pixel electrode, an alignment layer that has an alignment direction inclined at a predetermined rubbing angle β with respect to a vertical direction perpendicular to the gate line, and two sections (upper pixel and lower pixel) where a direction of response of liquid crystals is different. The comb teeth of the pixel electrode and the common electrode are inclined at a predetermined electrode angle α with respect to the vertical direction in each of the two sections, and the electrode angle α and the rubbing angle β satisfy conditions of |α|>|β| and 90°−|α−β|≧45° in each of the two sections.
摘要翻译：一种液晶显示装置，包括放置在阵列基板上的栅极线，梳齿状的像素电极，与像素电极一起生成面内电场的梳齿形状的公共电极，具有相对于垂直于栅极线的垂直方向以预定的摩擦角β倾斜的对准方向以及液晶的响应方向不同的两个部分（上部像素和下部像素）。像素电极和公共电极的梳齿相对于两个部分中的每个部分中的垂直方向以预定的电极角度α倾斜，并且电极角度α和摩擦角β满足条件|α| | | beta | 和90° - |α-β|> = 45°。

9. 发明授权

US08717524B2 Liquid crystal display device and method of manufacturing the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US08717524B2
公开(公告)日：2014-05-06
申请号：US13489837
申请日：2012-06-06
申请人： Koji Yonemura , Yasuhiro Morii
发明人： Koji Yonemura , Yasuhiro Morii
IPC分类号： G02F1/1343 , G02F1/1337
CPC分类号： G02F1/134363 , G02F2001/134318 , G02F2201/122 , G02F2201/40
摘要： A liquid crystal display device includes an alignment layer having an alignment direction inclined at an angle α where 0°
摘要翻译：一种液晶显示装置，包括：取向膜，其取向方向相对于栅极线的延伸方向以0°<α<90°的角度α倾斜，像素电极和与该像素相对设置的公共电极电极，其间具有绝缘层。像素电极和公共电极中的一个具有用于与像素电极和公共电极中的另一个一起产生与液晶的边缘电场的狭缝。狭缝包括位于对准方向或垂直于取向方向的方向的第一狭缝和分别以角度±θ倾斜的多个第二狭缝和多个第三狭缝; 相对于第一狭缝。

10. 发明授权

US08187789B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08187789B2
公开(公告)日：2012-05-29
申请号：US12428133
申请日：2009-04-22
申请人： Koji Yonemura , Makiko Irie , Hideo Hada
发明人： Koji Yonemura , Makiko Irie , Hideo Hada
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A positive resist composition, including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) includes a structural unit (a1) derived from a hydroxystyrene, and a structural unit (a2) containing an acid dissociable, dissolution inhibiting group; and the component (B) includes an acid generator (B1) composed of a compound represented by the general formula (b1) shown below: [Chemical Formula 1] X-Q1-Y1—SO3−A+ (b1) (in the formula, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms which may contain a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may contain a substituent; X represents a hydrocarbon group of 3 to 30 carbon atoms which may contain a substituent; and A+ represents an organic cation).
摘要翻译：一种正型抗蚀剂组合物，包括在酸作用下在碱性显影液中显示出增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中组分（A）包括由羟基苯乙烯衍生的结构单元（a1）和含有酸解离的溶解抑制基团的结构单元（a2）组分（B）包括由以下通式（b1）表示的化合物构成的酸产生剂（B1）：[化学式1] X-Q1-Y1-SO3-A +（b1）（式中， Q1表示含有氧原子的二价连接基团; Y1表示可以含有取代基的1〜4个碳原子的亚烷基或可含有取代基的1〜4个碳原子的氟化亚烷基; X表示 3〜30个可含有取代基的碳原子; A +表示有机阳离子）。

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