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1. 发明授权

US4758640A Vinylsilyl group-containing monodisperse polymeric compound and a method for the preparation thereof 失效
标题翻译：含有乙烯基甲硅烷基的单分散高分子化合物及其制备方法
公开(公告)号：US4758640A
公开(公告)日：1988-07-19
申请号：US861739
申请日：1986-05-07
申请人： Teruo Fujimoto , Minoru Takamizawa , Akira Yamamoto , Toshinobu Ishihara
发明人： Teruo Fujimoto , Minoru Takamizawa , Akira Yamamoto , Toshinobu Ishihara
IPC分类号： C08F30/00 , C08F2/04 , C08F2/06 , C08F4/46 , C08F4/50 , C08F30/08 , C08F290/00 , C08F299/00 , C08F299/08 , G03C5/08 , G03F7/004 , G03F7/038 , G03F7/075 , C08F230/08
CPC分类号： G03F7/0758 , C08F30/08
摘要： The invention provides a novel polymeric compound having crosslinkability by irradiation with actinic rays, e.g. ultraviolet light, and useful as a polymeric base ingredient of a negative type photoresist composition with high sensitivity and resistance against dry etching. The polymer is obtained by the anionic living polymerization of a vinylsilyl group-containing styrene derivative of the formulaCH.sub.2 .dbd.CH--C.sub.6 H.sub.4 --CH.sub.2).sub.n SiR.sub.2 --CH.dbd.CH.sub.2,in which R is a monovalent hydrocarbon group, e.g. methyl and phenyl, and n is an integer of 0 to 3, in a specific solvent in the presence of a specific polymerization initiator so that the polymerization takes place only at the styrenic vinyl groups leaving the silicon-bonded vinyl groups unpolymerized. Quite unexpectedly, the polymer has a very uniform monodisperse distribution of the molecular weight.
摘要翻译：本发明提供了通过用光化射线照射具有交联性的新型聚合物，例如紫外光，并且可用作具有高灵敏度和抗干蚀刻性的负型光致抗蚀剂组合物的聚合基底成分。该聚合物通过式CH 2 = CH-C 6 H 4 -CH 2）n SiR 2 -CH = CH 2的含乙烯基甲硅烷基的苯乙烯衍生物的阴离子活性聚合获得，其中R是一价烃基，例如，甲基和苯基，n为0〜3的整数，在特定的溶剂中，在特定的聚合引发剂的存在下，仅在苯乙烯基的乙烯基上进行聚合，离开与硅键合的乙烯基未聚合。非常出人意料地，聚合物具有非常均匀的单分散分子量分布。

2. 发明授权

US4727172A Method for the preparation of an organosiloxane oligomer and a novel organosiloxane oligomer thereby 失效
标题翻译：由此制备有机硅氧烷低聚物和新型有机硅氧烷低聚物的方法
公开(公告)号：US4727172A
公开(公告)日：1988-02-23
申请号：US905576
申请日：1986-09-09
申请人： Akira Yamamoto , Minoru Takamizawa , Toshinobu Ishihara , Tadao Kurosaki
发明人： Akira Yamamoto , Minoru Takamizawa , Toshinobu Ishihara , Tadao Kurosaki
IPC分类号： C07F7/08
CPC分类号： C07F7/0852 , C07F7/0874
摘要： An efficient method is proposed for the preparation of an organosiloxane oligomer represented by the general formula YSi(R.sup.1).sub.n (--O--SiR.sub.3).sub.3-n, in which each of the groups denoted by R and R.sup.1 is a halogen-substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms, Y is a hydrogen atom or a monovalent group selected from methyl, phenyl, vinyl, chloromethyl and 3-(meth)acryloxypropyl groups and n is zero, 1 or 2, by the reaction of an organosilicon halomagnesium salt of the formula R.sub.3 Si--O--MgX, in which X is a halogen atom, and an organosilane compound of the general formula YSi(R.sup.1).sub.n (Z).sub.3-n, in which Z is a halogen atom or a lower alkoxy group. In particular, tetrasiloxane compounds represented by the general formula Y.sup.1 Si[--O--Si(CH.sub.3).sub.2 (CH.sub.2 CH.sub.2 CF.sub.3)].sub.3, in which Y.sup.1 is a hydrogen atom, chloromethyl group or 3-methacryloxypropyl group, are each a novel compound not known in the prior art.
摘要翻译：提出了制备由通式YSi（R1）n（-O-SiR 3）3-n表示的有机硅氧烷低聚物的有效方法，其中由R和R 1表示的每个基团是卤素取代或未取代的具有1至8个碳原子的一价烃基，Y是氢原子或选自甲基，苯基，乙烯基，氯甲基和3-（甲基）丙烯酰氧基丙基的一价基团，并且n为0,1或2，通过其中X为卤素原子的式R3Si-O-MgX的有机硅卤镁盐和通式YSi（R1）n（Z）3-n的有机硅烷化合物，其中Z为卤素原子或低级烷氧基。特别地，由通式Y1Si [-O-Si（CH3）2（CH2CH2CF3）] 3表示的四硅氧烷化合物，其中Y 1为氢原子，氯甲基或3-甲基丙烯酰氧基丙基，均为未知的新化合物现有技术

3. 发明授权

US4649185A Contact lens comprising trimethylvinylsilane polymer 失效
标题翻译：隐形眼镜包括三甲基乙烯基硅烷聚合物
公开(公告)号：US4649185A
公开(公告)日：1987-03-10
申请号：US798757
申请日：1985-11-15
申请人： Minoru Takamizawa , Akira Yamamoto , Toshinobu Ishihara , Shigehiro Nagura
发明人： Minoru Takamizawa , Akira Yamamoto , Toshinobu Ishihara , Shigehiro Nagura
IPC分类号： C08F30/00 , C08F30/08 , C08G77/00 , C08G77/42 , G02B1/04 , G02C7/04
CPC分类号： C08F30/08 , G02B1/043
摘要： The contact lens of the invention is shaped of a poly(trimethylvinylsilane) resin having an average molecular weight of at least 200,000 or a copolymer based thereon. The contact lens has a very high oxygen permeability comparable to conventional transparent silicone rubbers so as to ensure a long time of continued wearing of the lens on the cornea with no adverse physiological influences and the material still has much better mechanical workability for precision shaping into a lens form than the transparent silicone rubbers.
摘要翻译：本发明的隐形眼镜成型为平均分子量至少为200,000的聚（三甲基乙烯基硅烷）树脂或基于其的共聚物。隐形眼镜具有与传统的透明硅橡胶相当的非常高的氧透过率，以便确保镜片在角膜上持续磨损的长时间，没有不利的生理影响，并且该材料仍然具有更好的机械加工性，用于精确成形为透镜形式比透明硅橡胶。

4. 发明授权

US4869747A Method for growth acceleration of plants 失效
标题翻译：植物生长加速的方法
公开(公告)号：US4869747A
公开(公告)日：1989-09-26
申请号：US651599
申请日：1984-09-17
申请人： Hiroshi Yoshioka , Akira Yamamoto , Minoru Takamizawa , Toshinobu Ishihara
发明人： Hiroshi Yoshioka , Akira Yamamoto , Minoru Takamizawa , Toshinobu Ishihara
IPC分类号： A01N55/00 , A01N55/10
CPC分类号： A01N55/00
摘要： A novel method for accelerating growth of a plant in agriculture and forestry is proposed in which an organosilicon compound .omega.-carboxyalkylsilicon sesquioxide, e.g. 2-carboxyethylsilicon sesquioxide, of the unit formulaHOOC(CH.sub.2).sub.n SiO.sub.1.5,in which n is a positive integer of 1 to 4, is applied to the plant directly or to the soil in which the plant is growing. The metal salts or complexes of the above compound as well as the precursor compounds thereof readily convertible to the silsesquioxide compound by hydrolysis are also effective.
摘要翻译：提出了一种用于加速农业和林业中植物生长的新方法，其中有机硅化合物ω-羧甲基硅氧烷倍半氧化物，例如，其中n为1〜4的正整数的单元式HOOC（CH 2）n SiO 1.5的2-羧乙基硅氧烷倍半氧化物直接施用于植物或植物生长的土壤。上述化合物的金属盐或络合物及其通过水解容易地转化为二氧化硅化合物的前体化合物也是有效的。

5. 发明授权

US4539417A Poly(dimethylsilmethylene) methylacetylene compound and a method for the preparation thereof 失效
标题翻译：聚（二甲基亚甲硅烷基）甲基乙炔化合物及其制备方法
公开(公告)号：US4539417A
公开(公告)日：1985-09-03
申请号：US658597
申请日：1984-10-09
申请人： Minoru Takamizawa , Akira Yamamoto , Toshinobu Ishihara , Mistuyoshi Ohshima
发明人： Minoru Takamizawa , Akira Yamamoto , Toshinobu Ishihara , Mistuyoshi Ohshima
IPC分类号： C08G77/00 , C07F7/08 , C08G77/48 , C08G77/60
CPC分类号： C07F7/0809 , C08G77/60
摘要： The invention provides a novel organosilicon compound poly(dimethylsilmethylene) methylacetylene compound of the formula MeC.tbd.C--SiMe.sub.2 --CH.sub.2 --SiMe.sub.2).sub.n Me, in which Me is a methyl group and n is a positive integer of 1 to 25. The compound is synthesized by reacting a propynylmagnesium halide of the formula MeC.tbd.CMgX, in which X is a halogen atom, or (propynyl dimethylsilyl)methylmagnesium chloride of the formula MeC.tbd.C--SiMe.sub.2 --CH.sub.2 MgCl with chloromethyl dimethyl chlorosilane in the presence of metallic magnesium and hydrolyzing the reaction product. Specifically, 1-propynyl-1,1,3,3,3-pentamethyl disilmethylene, i.e. the inventive compound with n=1, is synthesized by reacting (propynyl dimethylsilyl)methylmagnesium chloride with trimethyl chlorosilane.
摘要翻译：本发明提供了一种新颖的有机硅化合物，具有式MeC 3BOND C-SiMe2-CH2-SiMe2）nMe的聚（二甲基亚甲硅烷基）甲基乙炔化合物，其中Me是甲基，n是1至25的正整数。该化合物被合成通过在金属镁的存在下使式MeC 3BOND CMgX（其中X是卤素原子）的丙炔基卤化镁或式MeC 3BOND C-SiMe2-CH2MgCl的（丙炔基二甲基甲硅烷基）甲基氯化镁与氯甲基二甲基氯硅烷反应，并水解反应产物。具体地，1-丙炔基-1,1,3,3,3-五甲基二亚甲基，即n = 1的本发明化合物，通过（丙炔基二甲基甲硅烷基）甲基氯化镁与三甲基氯硅烷反应合成。

6. 发明授权

US4588832A Method for the preparation of a 1-alkynylsilyl compound 失效
标题翻译： 1-炔基甲硅烷基化合物的制备方法
公开(公告)号：US4588832A
公开(公告)日：1986-05-13
申请号：US682267
申请日：1984-12-17
申请人： Toshinobu Ishihara , Akira Yamamoto , Minoru Takamizawa
发明人： Toshinobu Ishihara , Akira Yamamoto , Minoru Takamizawa
IPC分类号： C07F7/08
CPC分类号： C07F7/0827
摘要： The invention provides a novel and economical route for the synthetic preparation of a 1-alkynyl trihydrocarbyl silane compound. The method comprises the steps of reacting metallic sodium with a hydrocarbyl-substituted acetylene or allene compound to form a substituted sodium acetylide and reacting the acetylide with a trihydrocarbyl monohalogenosilane in the reaction mixture which is admixed with a polar organic solvent such as dimethylformamide.
摘要翻译：本发明提供了用于合成制备1-炔基三烃基硅烷化合物的新颖且经济的途径。所述方法包括使金属钠与烃基取代的乙炔或二烯化合物反应以形成取代的乙炔化钠，并将该乙炔化物与三烃基一卤代硅烷反应在与极性有机溶剂如二甲基甲酰胺混合的反应混合物中。

7. 发明授权

US4593112A Method for the preparation of a tert-hydrocarbyl silyl compound 失效
标题翻译：制备叔烃基甲硅烷基化合物的方法
公开(公告)号：US4593112A
公开(公告)日：1986-06-03
申请号：US723669
申请日：1985-04-16
申请人： Minoru Takamizawa , Toshinobu Ishihara , Akira Yamamoto
发明人： Minoru Takamizawa , Toshinobu Ishihara , Akira Yamamoto
IPC分类号： C07F7/12 , C07F7/08 , C07F7/16
CPC分类号： C07F7/16 , C07F7/0896
摘要： A tert-hydrocarbyl, e.g. tert-butyl, silyl compound can be synthesized easily according to the method of the invention in which a tert-hydrocarbylmagnesium halide as a Grignard reagent is reacted with a silane compound having at least one silicon-bonded hydrogen atom and at least one silicon-bonded halogen atom simultaneously in a molecule in a suitable organic solvent so that the halogen atom in the latter reactant is replaced with the tert-hydrocarbyl group in the former reactant to give the desired tert-hydrocarbyl silyl compound in a high yield without the safety problem in the conventional method using a tert-alkyl lithium as the reactant.
摘要翻译：叔烃基，例如可以根据本发明的方法容易地合成叔丁基甲硅烷基化合物，其中作为格氏试剂的叔烃基卤化镁与具有至少一个与硅键合的氢原子的硅烷化合物和至少一个硅键合的硅烷化合物反应卤素原子在合适的有机溶剂中在分子中同时进行，使得后一反应物中的卤素原子被前反应物中的叔烃基取代，以高产率得到所需的叔烃基甲硅烷基化合物，而没有安全问题使用叔烷基锂作为反应物的常规方法。

8. 发明授权

US4636454A Method for the preparation of a patterned photoresist layer and a photoresist composition therefor 失效
标题翻译：用于制备图案化光致抗蚀剂层及其光致抗蚀剂组合物的方法
公开(公告)号：US4636454A
公开(公告)日：1987-01-13
申请号：US753604
申请日：1985-07-10
申请人： Teruo Fujimoto , Takeo Kazama , Minoru Takamizawa , Akira Yamamoto
发明人： Teruo Fujimoto , Takeo Kazama , Minoru Takamizawa , Akira Yamamoto
IPC分类号： G03F7/004 , C08F30/00 , C08F30/08 , G03F7/038 , G03F7/075 , H01L21/027 , G03C1/52 , G03C1/71 , G03C5/16
CPC分类号： G03F7/0758 , C08F30/08
摘要： The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formulaCH.sub.2 .dbd.CH--C.sub.6 H.sub.4 --SiMe.sub.2 --CR.sup.1 .dbd.CR.sup.2 R.sup.3,in which Me is a methyl group and R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom, methyl group or ethyl group, at least one of the R.sup.1, R.sup.2 and R.sup.3 being not a hydrogen atom, to cause the polymerization only at the styrenic double bond, the other double bond in the same molecule remaining unpolymerized. By virtue of the high density of the double bonds in the polymer molecules, the photoresist composition is highly sensitive to irradiation with actinic rays and capable of giving a patterned photoresist layer having excellent resolving power and resistance against dry etching.
摘要翻译：本发明的负性光致抗蚀剂组合物作为其聚合物组分包含通过由通式CH 2 = CH-C 6 H 4 -SiMe 2 -CR 1 = 1表示的乙烯基苯基取代的乙烯基二甲基硅烷化合物的阴离子活性聚合获得的聚合物， CR2R3，其中Me是甲基，R1，R2和R3各自是氢原子，甲基或乙基，R1，R2和R3中的至少一个不是氢原子，仅在苯乙烯双键，同一分子中的另一个双键保持未聚合。由于聚合物分子中双键的高密度，光致抗蚀剂组合物对光化射线的照射高度敏感，并且能够提供具有优异的分辨能力和抗干蚀刻性能的图案化光致抗蚀剂层。

9. 发明授权

US4689267A Composite hollow fiber 失效
标题翻译：复合中空纤维
公开(公告)号：US4689267A
公开(公告)日：1987-08-25
申请号：US759308
申请日：1985-07-26
申请人： Minoru Takamizawa , Akira Yamamoto , Shigehiro Nagura
发明人： Minoru Takamizawa , Akira Yamamoto , Shigehiro Nagura
IPC分类号： B01D53/22 , B01D69/08 , B01D69/12 , B01D71/44 , D01F6/00 , D01F6/26 , B01D59/10 , D02G3/00
CPC分类号： B01D69/08 , B01D69/12 , B01D71/44 , Y10T428/2935 , Y10T428/2962 , Y10T428/2965 , Y10T428/2967 , Y10T428/2969 , Y10T428/2975
摘要： This invention provides a composite hollow fiber comprising a porous hollow fiber substrate and a coating layer formed on at least one of the outer surface and the inner surface of said substrate. The coating layer comprises a polymer having at least one of the structural units represented by the formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom or a lower alkyl group; R.sup.2, R.sup.3 and R.sup.4, which may be identical or different, represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 8 carbon atoms or a monovalent silicon-containing organic group.This composite hollow fiber is excellent in gas permeability and gas separation performance and has high heat resistance, humidity resistance and mechanical strength.
摘要翻译：本发明提供了一种复合中空纤维，其包括多孔中空纤维基材和形成在所述基材的外表面和内表面中的至少一个上的涂层。涂层包含具有式（I）表示的至少一个结构单元的聚合物：其中R 1表示氢原子或低级烷基; R2，R3和R4可以相同或不同，表示氢原子，碳原子数为1〜8的一价烃基或一价含硅有机基团。该复合中空纤维的气体渗透性和气体分离性能优异，并且具有高耐热性，耐湿性和机械强度。

10. 发明授权

US4728431A Pervaporation method for separating liquids in mixture 失效
标题翻译：用于分离混合物中液体的渗透蒸发法
公开(公告)号：US4728431A
公开(公告)日：1988-03-01
申请号：US771985
申请日：1985-09-03
申请人： Shigehiro Nagura , Minoru Takamizawa , Akira Yamamoto
发明人： Shigehiro Nagura , Minoru Takamizawa , Akira Yamamoto
IPC分类号： B01D61/36 , B01D71/44 , D01F6/00 , D01F6/26 , B01D13/00
CPC分类号： B01D61/362 , B01D63/02 , B01D71/44
摘要： The efficiency of the pervaporation method for the separation or enrichment of liquids in mixture, e.g. water and ethyl alcohol, can be greatly improved when the partitioning membrane is made of a polymeric composition comprising a specific organosilyl-substituted polyenic polymer composed of the monomeric moieties represented by the general formula ##STR1## in which R.sup.1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms and the groups denoted by R are each independently a hydrogen atom, a monovalent hydrocarbon group having 1 to 8 carbon atoms or a silicon-containing organic group such as those represented by the general formula --CH.sub.2 --SiMe.sub.2 R.sup.2, Me being a methyl group and R.sup.2 being a lower alkyl group having 1 to 4 carbon atoms. The performance and durability of the membrane can be further improved when the polymeric composition is a polymer blend of the above described polyenic polymer and a poly(trimethyl vinyl silane).
摘要翻译：用于分离或富集混合物中的液体的渗透蒸发方法的效率，例如当分隔膜由包含由通式“IMAGE”表示的单体部分组成的特定有机甲硅烷基取代的多烯聚合物的聚合物组合物中可以大大改善，其中R 1是氢原子或烷基具有1至4个碳原子的基团和由R表示的基团各自独立地为氢原子，具有1至8个碳原子的一价烃基或含硅的有机基团，例如由通式-CH 2 -SiMe 2 R 2表示的基团， Me为甲基，R2为碳原子数1〜4的低级烷基。当聚合物组合物是上述多元聚合物与聚（三甲基乙烯基硅烷）的聚合物共混物时，可以进一步改善膜的性能和耐久性。

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