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1. 发明授权

US5248886A Processing system 失效
标题翻译：加工系统
公开(公告)号：US5248886A
公开(公告)日：1993-09-28
申请号：US842421
申请日：1992-02-27
申请人： Teruo Asakawa , Tetsu Osawa , Noboru Hosaka
发明人： Teruo Asakawa , Tetsu Osawa , Noboru Hosaka
IPC分类号： B65G49/00 , C23C14/56 , C30B35/00 , H01J37/317 , H01L21/00 , H01L21/265 , H01L21/677
CPC分类号： H01L21/67069 , C30B35/005 , H01L21/67201 , H01L21/67213 , H01L21/67259 , H01L21/67745
摘要： Load lock chambers having a function of detecting positional deviation of wafers are provided in a process chamber of an ion injection apparatus, two on a carrying-in side, and two on a carrying-out side. One load lock chamber on the carrying-in side and one on the carrying-out side are used as a standby. Carrying-in carrying-out members and are outside of the process chamber. Two transfer members are in the process chamber. A dummy wafer stage is formed at a position which can be accessed by the transfer members. Wafers are transferred from load stages by the carrying-in member via the load lock chambers to the process chamber through a double operation line. Loading a wafer on the turn table and unloading a wafer therefrom can be performed simultaneously by operations of the transfer members and. The wafers are similarly carried out of the apparatus in a double operation line. At this time, dummy wafers in the process chamber can be used, if necessary.

2. 发明授权

US5357115A Processing method for wafers 失效
标题翻译：晶圆加工方法
公开(公告)号：US5357115A
公开(公告)日：1994-10-18
申请号：US109733
申请日：1993-08-20
申请人： Teruo Asakawa , Tetsu Osawa , Noboru Hosaka
发明人： Teruo Asakawa , Tetsu Osawa , Noboru Hosaka
IPC分类号： B65G49/00 , C23C14/56 , C30B35/00 , H01J37/317 , H01L21/00 , H01L21/265 , H01L21/677 , H01J37/20
CPC分类号： H01L21/67069 , C30B35/005 , H01L21/67201 , H01L21/67213 , H01L21/67259 , H01L21/67745
摘要： Load lock chambers having a function of detecting positional deviation of wafers are provided in a process chamber of an ion injection apparatus, two on a carrying-in side, and two on a carrying-out side. One load lock chamber on the carrying-in side and one on the carrying-out side are used as a standby. Carrying-in and carrying-out members are outside of the process chamber. Two transfer members are in the process chamber. A dummy wafer stage is formed at a position which can be accessed by the transfer members. Wafers are transferred from load stages by the carrying-in member via the load lock chambers to the process chamber through a double operation line. Loading a wafer on the turn table and unloading a wafer therefrom can be performed simultaneously by operations of the transfer members and. The wafers are similarly carried out of the apparatus in a double operation line. At this time, dummy wafers in the process chamber can be used, if necessary.
摘要翻译：具有检测晶片位置偏差功能的加载锁定室设置在离子注入装置的处理室中，两个位于输入侧，两个位于输出侧。使用侧的一个装载锁定室和一个在进出侧的装载锁定室用作备用。携带和携带成员在处理室之外。两个转移构件位于处理室中。虚设晶片台形成在能够被转印部件访问的位置。晶片从负载阶段通过承载构件经由负载锁定室通过双重操作线路传送到处理室。将转盘上的晶片装载并卸载晶片可以通过转印部件的操作同时进行。晶圆类似地在双重操作线中由设备执行。此时，如果需要，可以使用处理室中的虚设晶片。

3. 发明授权

US06285102B1 Drive mechanism having a gas bearing operable under a negative pressure environment 失效
标题翻译：具有可在负压环境下操作的气体轴承的驱动机构
公开(公告)号：US06285102B1
公开(公告)日：2001-09-04
申请号：US09541720
申请日：2000-04-03
申请人： Takaaki Matsuoka , Teruo Asakawa
发明人： Takaaki Matsuoka , Teruo Asakawa
IPC分类号： B65G4907
CPC分类号： F16C29/025 , F16C32/06 , H01L21/67742 , H01L21/67745
摘要： A drive mechanism provides a friction free movement of a movable member operated under a negative pressure environment. A gas bearing arrangement movably supports the movable element relative to a stationary element. The gas bearing arrangement is configured to be operated under the negative pressure environment inside the chamber. A drive arrangement drives the movable element from outside the chamber.
摘要翻译：驱动机构提供在负压环境下操作的可动构件的无摩擦运动。气体轴承装置相对于静止元件可移动地支撑可移动元件。气体轴承装置构造成在室内的负压环境下操作。驱动装置从室外驱动可移动元件。

4. 发明授权

US6013112A Relay apparatus for relaying object to be treated 失效
标题翻译：用于中继待处理物体的继电器
公开(公告)号：US6013112A
公开(公告)日：2000-01-11
申请号：US927563
申请日：1997-09-09
申请人： Yoji Iizuka , Teruo Asakawa
发明人： Yoji Iizuka , Teruo Asakawa
IPC分类号： B65G49/07 , H01L21/673 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67303 , H01L21/67781 , Y10T29/41
摘要： A relay apparatus according to the invention is provided for transferring to-be-treated objects between a transfer mechanism for carrying the objects into and out of a treatment chamber, and a cassette containing the objects. The relay apparatus comprises a transfer unit including holding portions for each holding a corresponding one of the objects from below, the transfer unit transferring the objects between the cassette and a transfer position at which the objects are transferred to the transfer mechanism, while holding the object with the holding portions, and a stopper located in the transfer position for adjusting positions of edge portions of all the objects held by the holding portions of the transfer means, thereby preventing the objects from moving horizontally relative to the holding portions.
摘要翻译：根据本发明的中继设备被提供用于在用于将物体搬入和移出处理室的传送机构和包含物体的盒子之间传送待处理物体。中继装置包括一个传送单元，它包括保持部分，每个保持部分从下方保持对应的一个物体，传送单元将物体在盒子之间传送到传送位置，在该传送位置将物体传送到传送机构，同时保持物体保持部分和位于转移位置的止动件，用于调节由转印装置的保持部分保持的所有物体的边缘部分的位置，从而防止物体相对于保持部分水平移动。

5. 发明授权

US5460684A Stage having electrostatic chuck and plasma processing apparatus using same 失效
标题翻译：具有静电卡盘和使用其的等离子体处理装置的阶段
公开(公告)号：US5460684A
公开(公告)日：1995-10-24
申请号：US160842
申请日：1993-12-03
申请人： Hiroaki Saeki , Teruo Asakawa , Noboru Masuoka , Masaki Kondo
发明人： Hiroaki Saeki , Teruo Asakawa , Noboru Masuoka , Masaki Kondo
IPC分类号： C23C16/458 , H01L21/683 , C23F1/02 , C23C14/50 , C23C16/52
CPC分类号： H01L21/6831 , C23C16/4586 , H01L21/6833
摘要： The plasma etching apparatus for a semiconductor wafer includes a susceptor provided in the vacuum process chamber. An electrostatic chuck for attracting and holding the wafer is provided on the susceptor. The electrostatic chuck comprises a chuck electrode provided on the susceptor via an insulative layer. The chuck electrode is connected to the positive terminal of the DC power supply via a switch. The chuck electrode is coated with a resistive layer, and the wafer is placed directly on the resistive layer. The resistive layer exhibits an electric resistivity of 1.times.10.sup.10 .OMEGA..multidot.cm to 1.times.10.sup.12 .OMEGA..multidot.cm in a temperature range for etching. The resistive layer is formed to have such a surface roughness that a center line average hight falls within a range of 0.1 to 1.5 .mu.m. When the potential of the positive terminal of the DC power supply is applied to the chuck electrode, and the wafer is grounded via plasma, a contact potential difference is created between the surface of the resistive layer and the rear surface of the wafer, generating an electrostatic attractive force, so that the wafer is attracted and held by the resistive layer.
摘要翻译：用于半导体晶片的等离子体蚀刻装置包括设置在真空处理室中的基座。用于吸引和保持晶片的静电卡盘设置在基座上。静电卡盘包括通过绝缘层设置在基座上的卡盘电极。卡盘电极通过开关连接到直流电源的正极端子。卡盘电极涂覆有电阻层，晶片直接放置在电阻层上。在蚀刻的温度范围内，电阻层的电阻率为1×10 10欧米伽xcm至1×10 12欧米伽×厘米。电阻层形成为具有中心线平均高度在0.1〜1.5μm的范围内的表面粗糙度。当直流电源的正端子的电位施加到卡盘电极并且晶片通过等离子体接地时，在电阻层的表面和晶片的后表面之间产生接触电位差，从而产生静电吸引力，使得晶片被电阻层吸引并保持。

6. 发明授权

US5435683A Load-lock unit and wafer transfer system 失效
标题翻译：加载锁定单元和晶片传输系统
公开(公告)号：US5435683A
公开(公告)日：1995-07-25
申请号：US294761
申请日：1994-08-23
申请人： Tetsu Oosawa , Teruo Asakawa , Kenji Nebuka , Hiroo Ono
发明人： Tetsu Oosawa , Teruo Asakawa , Kenji Nebuka , Hiroo Ono
IPC分类号： B65G47/80 , H01L21/00 , H01L21/677 , H01L21/68 , B65G1/06
CPC分类号： H01L21/67126 , H01L21/67745 , H01L21/681 , Y10S414/136 , Y10S414/137 , Y10S414/139
摘要： A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened so as to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a holding mechanism, disposed in the load-lock chamber for holding the wafer, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting mechanism for detecting a positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.
摘要翻译：负载锁定单元设置在第一和第二气氛之间，用于存储从第一气氛转移的晶片，并从第一气氛中被阻挡，然后设置在至少基本上类似于第二气氛的气氛中，并打开以便与第二气氛通信，以将晶片转移到第二气氛。负载锁定单元包括：装载锁定室，保持机构，设置在用于保持晶片的装载锁定室中;旋转机构，用于使由保持机构保持的晶片旋转;以及错误检测机构，用于检测位置基于通过在正在旋转的晶片上照射光而获得的数据，晶片的中心的误差和晶片的取向误差。

7. 发明授权

US4525659A Positioning stage having a vibration suppressor 失效
标题翻译：具有振动抑制器的定位台
公开(公告)号：US4525659A
公开(公告)日：1985-06-25
申请号：US429278
申请日：1982-09-30
申请人： Issei Imahashi , Teruo Asakawa
发明人： Issei Imahashi , Teruo Asakawa
IPC分类号： G05D3/00 , F16F15/03 , B64C17/06
CPC分类号： F16F15/03
摘要： A first stage adapted to be moved in predetermined directions by a first driving device is provided in a machine base supported from a foundation by an intermediary of resilient means. This first stage is provided a second stage adapted to be moved in the directions at right angles to the directions of movement of the first stage by a second driving device. Upon movement of these respective stages, vibration of the machine base is excited by reaction forces exerted upon the machine base as a result of acceleration and deceleration. These reaction forces are offset by resistive forces generated by first and second force generators respectively. The first and second force generators establish an electromagnetic coupling between the foundation and the machine base. The first force generator is made to act against the first driving device, and the second force generator is made to act against the second driving device, in such manner that the first and second force generators generate forces directed in the opposite directions to and having substantially the same magnitudes as the reaction forces exerted upon the machine base by the first and second driving devices, respectively. This occurs simultaneously with energization of the corresponding driving devices and effectively suppresses vibration of the machine base.
摘要翻译：通过第一驱动装置适于在预定方向上移动的第一阶段设置在通过弹性装置的中间从基座支撑的机器基座中。该第一阶段设置有第二阶段，其适于通过第二驱动装置在与第一阶段的运动方向成直角的方向上移动。在这些各个阶段的运动中，由于加速和减速，机器基座的振动被施加在机器基座上的反作用力激发。这些反作用力分别由第一和第二力发生器产生的阻力抵消。第一和第二力发生器在基座和机座之间建立电磁耦合。第一力发生器被制成用于抵靠第一驱动装置作用，并且第二力发生器被制成作用在第二驱动装置上，使得第一和第二力发生器产生相反方向的力并且基本上与由第一和第二驱动装置分别施加在机器基座上的反作用力相同的大小。这与相应的驱动装置的通电同时发生，并且有效地抑制了机器基座的振动。

8. 发明授权

US09696711B2 Processing instructing device, processing instructing method, computer program and processing device 有权
公开(公告)号：US09696711B2
公开(公告)日：2017-07-04
申请号：US14232980
申请日：2012-07-12
申请人： Teruo Asakawa , Hirofumi Yamaguchi , Supika Mashiro , Toshihiko Iijima , Hirokazu Narisawa , Kou Fujimura
发明人： Teruo Asakawa , Hirofumi Yamaguchi , Supika Mashiro , Toshihiko Iijima , Hirokazu Narisawa , Kou Fujimura
IPC分类号： G06F19/00 , G04F1/00 , H01L21/00 , G05B19/402 , G05B19/418
CPC分类号： G05B19/402 , G05B19/41865 , G05B2219/2609 , G05B2219/32078 , G05B2219/32272 , G05B2219/32277 , G05B2219/32311 , G05B2219/49202 , Y02P90/14 , Y02P90/20 , Y02P90/28 , Y02P90/285
摘要： A processing indicating device to improve the efficiency of processing on an object. The device includes a first communication unit which communicates information with a plurality of processing devices for processing the object and a second communication unit which communicates information with a conveyance controlling device controlling conveying of the object to the plurality of processing devices. An arrival time predicting unit predicts on the basis of information received by the second communication unit, the time when the conveying device arrives at one of the processing devices. In addition, a finish time predicting unit receives information and predicts the time when the processing on the object in the one processing device finishes. A processing indicating unit causes processing control information that orders the execution of device state improvement treatment to be transmitted to the one processing device on the basis of the predicted respective times.

9. 发明申请

US20140358271A1 PROCESSING INSTRUCTING DEVICE, PROCESSING INSTRUCTING METHOD, COMPUTER PROGRAM AND PROCESSING DEVICE 有权
标题翻译：处理指令装置，处理指令方法，计算机程序和处理装置
公开(公告)号：US20140358271A1
公开(公告)日：2014-12-04
申请号：US14232980
申请日：2012-07-12
申请人： Teruo Asakawa , Hirofumi Yamaguchi , Supika Mashiro , Toshihiko Iijima , Hirokazu Narisawa , Kou Fujimura
发明人： Teruo Asakawa , Hirofumi Yamaguchi , Supika Mashiro , Toshihiko Iijima , Hirokazu Narisawa , Kou Fujimura
IPC分类号： G05B19/402
CPC分类号： G05B19/402 , G05B19/41865 , G05B2219/2609 , G05B2219/32078 , G05B2219/32272 , G05B2219/32277 , G05B2219/32311 , G05B2219/49202 , Y02P90/14 , Y02P90/20 , Y02P90/28 , Y02P90/285
摘要： A processing indicating device to improve the efficiency of processing on an object. The device includes a first communication unit which communicates information with a plurality of processing devices for processing the object and a second communication unit which communicates information with a conveyance controlling device controlling conveying of the object to the plurality of processing devices. An arrival time predicting unit predicts on the basis of information received by the second communication unit, the time when the conveying device arrives at one of the processing devices. In addition, a finish time predicting unit receives information and predicts the time when the processing on the object in the one processing device finishes. A processing indicating unit causes processing control information that orders the execution of device state improvement treatment to be transmitted to the one processing device on the basis of the predicted respective times.
摘要翻译：一种处理指示装置，用于提高对物体的处理效率。该装置包括：第一通信单元，其与多个用于处理该对象的处理装置进行通信;第二通信单元，其与传送控制装置通信信息，该输送控制装置控制对该多个处理装置的传送。到达时间预测单元基于由第二通信单元接收的信息，传送设备到达处理设备之一的时间来预测。此外，完成时间预测单元接收信息并预测在一个处理设备中的对象的处理完成的时间。处理指示单元基于预测的各个时间，使得命令执行设备状态改善处理的处理控制信息被发送到一个处理设备。

10. 发明申请

US20140018955A1 PRODUCTION EFFICIENCY IMPROVING APPARATUS, PRODUCTION EFFICIENCY IMPROVING METHOD, AND COMPUTER PROGRAM 有权
标题翻译：生产效率改善装置，生产效率改进方法和计算机程序
公开(公告)号：US20140018955A1
公开(公告)日：2014-01-16
申请号：US14004120
申请日：2012-03-09
申请人： Teruo Asakawa , Makoto Yamamoto , Akira Machida , Masaaki Kawaguchi
发明人： Teruo Asakawa , Makoto Yamamoto , Akira Machida , Masaaki Kawaguchi
IPC分类号： G05B19/418
CPC分类号： G05B19/4189 , G05B19/41865 , G05B2219/31372 , H01L21/67276 , Y02P90/12 , Y02P90/20 , Y02P90/28
摘要： A production efficiency improving apparatus includes a first communicating means for communicating information with a plurality of processing apparatuses that process objects, and a second communicating means for communicating conveyance control information, with a conveyance system comprising conveyance apparatuses for conveying the objects between the plurality of processing apparatuses. A means for predicting, on the basis of information communicated by the first communicating means, the conveying timing at which the processing apparatus needs to send out processed objects, and the conveying timing at which the processing apparatus needs to bring in unprocessed objects. A generating means generates the control information such that the conveyance apparatus will arrive at the processing apparatus that is the destination of the communication of information at the predicted timing predicted by the means for predicting.
摘要翻译：一种生产效率提高装置包括：第一通信装置，用于与处理物体的多个处理装置进行信息通信;以及第二通信装置，用于传送传送控制信息;传送系统，包括用于在多个处理之间传送对象的传送装置设备。一种用于根据第一通信装置传送的信息，预测处理装置需要发送处理对象的传送定时以及处理装置需要引入未处理对象的传送定时的装置。发生装置产生控制信息，使得输送装置将到达作为通过预测装置预测的预测定时的信息通信的目的地的处理装置。

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