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1. 发明申请

US20090135510A1 REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD 审中-公开
标题翻译：反射投影光学系统，曝光装置，装置制造方法，投影方法和曝光方法
公开(公告)号：US20090135510A1
公开(公告)日：2009-05-28
申请号：US12323274
申请日：2008-11-25
申请人： Takuro Ono , Hiroshi Chiba , Hideki Komatsuda
发明人： Takuro Ono , Hiroshi Chiba , Hideki Komatsuda
IPC分类号： G02B17/06
CPC分类号： G03F7/70233 , G03F7/702
摘要： A reflective projection optical system comprises a first optical unit having at least one reflecting optical element, and a second optical unit having at least one reflecting optical element. A focal point on the second surface side of the first optical unit approximately agrees with a focal point on the first surface side of the second optical unit. An angle between a normal to the first surface and a principal ray of the illumination beam incident to the first surface is larger than a value of arcsine of a numerical aperture on the first surface side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam incident to the first surface.
摘要翻译：反射投影光学系统包括具有至少一个反射光学元件的第一光学单元和具有至少一个反射光学元件的第二光学单元。第一光学单元的第二表面侧上的焦点大致与第二光学单元的第一表面侧上的焦点一致。入射到第一表面的第一表面的法线与照明光束的主光线之间的角度大于反射投影光学系统的第一表面侧的数值孔径的反正弦值。投影光学系统中的所有光学元件位于限定入射到第一表面的照明光束的外边缘的光线组的延伸表面的外侧。

2. 发明授权

US09195069B2 Illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：照明光学装置，曝光装置和装置的制造方法
公开(公告)号：US09195069B2
公开(公告)日：2015-11-24
申请号：US11783561
申请日：2007-04-10
申请人： Hirohisa Tanaka , Hideki Komatsuda
发明人： Hirohisa Tanaka , Hideki Komatsuda
IPC分类号： G03B27/54 , G03B27/44 , G03B27/72 , G03B27/32 , G02B27/09 , G03F7/20 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G02B27/0905 , G02B27/0961 , G02B27/0972 , G03F7/70108 , G03F7/70208 , G03F7/70275 , G03F7/70283
摘要： An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.
摘要翻译：照明光学装置具有：分束构件，其将入射光束分成第一光束和第二光束，以形成第一照明区域和第二照明区域;第一导光光学系统，其将第一光束引导到第一照明区域和将第二光束引导到第二照明区域的第二导光光学系统与第一照明区域分离。

3. 发明申请

US20090040493A1 ILLUMINATION OPTICAL SYSTEM, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：照明光学系统，照明光学装置，曝光装置和装置制造方法
公开(公告)号：US20090040493A1
公开(公告)日：2009-02-12
申请号：US12170236
申请日：2008-07-09
申请人： Hideki Komatsuda
发明人： Hideki Komatsuda
IPC分类号： G03B27/54
CPC分类号： G03F7/702
摘要： An illumination optical apparatus includes a light source, which supplies illumination light including a wavelength of 5 nm to 50 nm, and an illumination optical system, which guides the illumination light to an illuminated surface. The illumination optical system includes an aperture angle restriction member and a condenser optical system, which is arranged in an optical path between the aperture restriction member and the illuminated surface to guide light beam from the aperture angle restriction member to the illuminated surface. A rotation axis of an arcuate-shape of an illumination region formed on the illuminated surface is located outside an opening of the aperture angle restriction member. The condenser optical system includes a plurality of reflection surfaces. Among the plurality of reflection surfaces, the reflection surface closest to the illuminated surface along the optical path includes a concave shape. When, for example, applied to an EUVL exposure apparatus, the illumination optical apparatus illuminates a reflective mask, serving as the illumination plane, without a plane mirror in the optical path between the illumination optical system and the mask.
摘要翻译：照明光学装置包括提供包括5nm至50nm的波长的照明光的光源和将照明光引导到照明表面的照明光学系统。照明光学系统包括孔径限制构件和聚光镜系统，其设置在孔径限制构件和被照射表面之间的光路中，以将来自孔径角度限制构件的光束引导到被照射的表面。形成在被照射面上的照明区域的弧形的旋转轴位于孔径角限制部件的开口的外侧。聚光镜系统包括多个反射面。在多个反射面中，沿着光路最靠近被照射面的反射面包括凹形。例如，当EUVL曝光装置被应用时，照明光学装置在照明光学系统和掩模之间的光路中照射作为照明平面的反射掩模，而没有平面镜。

4. 发明授权

US07483122B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07483122B2
公开(公告)日：2009-01-27
申请号：US11984192
申请日：2007-11-14
申请人： Hideki Komatsuda , Tomowaki Takahashi , Masayuki Suzuki
发明人： Hideki Komatsuda , Tomowaki Takahashi , Masayuki Suzuki
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/7025 , G02B17/0657 , G03F7/70233
摘要： A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.
摘要翻译：投影光学系统是其中视野区域和成像区域与光轴间隔开的反射系统，其中到达图像平面上的每个点的光的数值孔径与图像高度无关，并且一个方向提供用于限定投影光学系统的数值孔径的孔径光阑，并且孔径光阑设置有预定形状的开口部分，其中到达预定区域内的各点的光的数值孔径在预定的范围内基本均匀即相对于彼此垂直的两个方向的尺寸彼此不同的形状。限定孔径部分的预定形状，以补偿由于设置在孔径光阑和不能满足的光阑的图像之间的部分光学系统而在预定区域内到达各点的光的数值孔径的不均匀性的影响期望的投射关系。

5. 发明申请

US20070242249A1 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20070242249A1
公开(公告)日：2007-10-18
申请号：US11712957
申请日：2007-03-02
申请人： Yuichi Shibazaki , Hideki Komatsuda
发明人： Yuichi Shibazaki , Hideki Komatsuda
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70466
摘要： The present invention provides an exposure method which illuminates each of patterns, to be subjected to double exposure, on entire surfaces thereof in optimal illumination conditions respectively, and which performs the exposure with high throughput. Upon transferring a pattern of a reticle onto a wafer by the scanning exposure method, first and second pattern areas are formed in advance on the reticle to be adjacent in the scanning direction, and when the first and second pattern areas simultaneously pass across a field of a projection optical system, the first pattern area is illuminated in a first illumination condition by using a first illumination slit of which width in the scanning direction is gradually narrowed, and the second pattern area is illuminated in a second illumination condition by using a second illumination slit of which width in the scanning direction is gradually widened, to thereby expose the wafer.
摘要翻译：本发明提供了一种曝光方法，其分别在最佳照明条件下照亮其整个表面上的每个图案，进行双重曝光，并以高生产量进行曝光。在通过扫描曝光方法将掩模版图案转印到晶片上之后，预先在掩模版上形成第一和第二图案区域，以在扫描方向上相邻，并且当第一和第二图案区域同时穿过投影光学系统，通过使用其中扫描方向宽度逐渐变窄的第一照明狭缝，在第一照明条件下照亮第一图案区域，并且通过使用第二照明在第二照明条件下照亮第二图案区域在扫描方向上的宽度的狭缝逐渐变宽，从而使晶片露出。

6. 发明授权

US07023523B2 Exposure system and exposure method 有权
标题翻译：曝光系统和曝光方法
公开(公告)号：US07023523B2
公开(公告)日：2006-04-04
申请号：US11177141
申请日：2005-07-07
申请人： Hideki Komatsuda
发明人： Hideki Komatsuda
IPC分类号： G03B27/42
CPC分类号： G03F7/70066 , G03F7/702 , G03F7/70283 , G03F7/70358
摘要： Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.
摘要翻译：曝光系统具有这样的结构，其中场挡板位于反射型掩模附近，但令人满意地最小化对投影光学系统的图像形成性能的不利影响。系统将掩模图案精确地传送到感光基片上。该系统包括照射形成规定图案的反射型掩模（M）的照明光学系统（1,2）。投影光学系统在感光基板（W）上形成掩模图案的图像。掩模和基板相对于投影光学系统在规定的方向上移动，以将掩模图案投射到曝光光敏基片上。照明光学系统具有位于掩模附近的场停止件（19），其限定掩模上的照明区域。掩模和场停止之间的间隔满足规定的条件关系。

7. 发明申请

US20050264789A1 Exposure system and exposure method 有权
标题翻译：曝光系统和曝光方法
公开(公告)号：US20050264789A1
公开(公告)日：2005-12-01
申请号：US11177141
申请日：2005-07-07
申请人： Hideki Komatsuda
发明人： Hideki Komatsuda
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70066 , G03F7/702 , G03F7/70283 , G03F7/70358
摘要： Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.
摘要翻译：曝光系统具有这样的结构，其中场挡板位于反射型掩模附近，但令人满意地最小化对投影光学系统的图像形成性能的不利影响。系统将掩模图案精确地传送到感光基片上。该系统包括照射形成规定图案的反射型掩模（M）的照明光学系统（1,2）。投影光学系统在感光基板（W）上形成掩模图案的图像。掩模和基板相对于投影光学系统在规定的方向上移动，以将掩模图案投射到曝光光敏基片上。照明光学系统具有位于掩模附近的场停止件（19），其限定掩模上的照明区域。掩模和场停止之间的间隔满足规定的条件关系。

8. 发明授权

US06665051B2 Illumination system and exposure apparatus and method 失效
公开(公告)号：US06665051B2
公开(公告)日：2003-12-16
申请号：US10208033
申请日：2002-07-31
申请人： Hideki Komatsuda
发明人： Hideki Komatsuda
IPC分类号： G03B2754
CPC分类号： G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70233 , G03F7/70358
摘要： An exposure apparatus that exposes an image of a pattern of a mask onto a photosensitive substrate with EUV radiation, and includes a radiation source unit and an exposure apparatus body unit. The exposure apparatus body unit includes an optical integrator, a mirror arranged in an optical path between the radiation source unit and the optical integrator, a detector arranged in an optical path of the exposure apparatus body unit, and a controller which is connected to the detector and which controls an inclination of the mirror based on an output from the detector. In addition, the radiation source unit and the exposure apparatus body unit are installed independently.

9. 发明授权

US09760012B2 Illumination device 有权
公开(公告)号：US09760012B2
公开(公告)日：2017-09-12
申请号：US14236742
申请日：2012-07-31
申请人： Hideki Komatsuda
发明人： Hideki Komatsuda
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70058 , G03F7/70075 , G03F7/70091
摘要： An illumination optical system that illuminates a target surface includes a first deflector, a second deflector, and an optical integrator. The first deflector is arranged on a first face crossing an optical path of light from a light source and has a period in a first direction defined on the first face. The second deflector is arranged on a second face crossing an optical path of light from the first deflector and has a period in a second direction defined on the second face. The optical integrator has a plurality of wavefront division facets arrayed on a third face crossing an optical axis of light from the second deflector. At least one of the first and second deflectors rotates about an optical axis of the illumination optical system or about an axis parallel to the optical axis in order to adjust a pattern of an illumination distribution.

10. 发明授权

US08780328B2 Illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：照明光学装置，曝光装置和装置的制造方法
公开(公告)号：US08780328B2
公开(公告)日：2014-07-15
申请号：US12703270
申请日：2010-02-10
申请人： Hideki Komatsuda
发明人： Hideki Komatsuda
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70066 , G03F7/702 , G03F7/70233
摘要： There is disclosed a illumination optical apparatus for illuminating a second surface optically conjugate with a first surface via a reflection type original plate which can be arranged on the first surface, the illumination optical apparatus comprising: a first partial field stop arranged to define a first outer edge of a illumination region which is to be formed on the second surface, in order to limit a light beam traveling toward the first surface; and a second partial field stop arranged to define a second outer edge of the illumination region, in order to limit a light beam reflecting from the reflection type original plate which can be arranged on the first surface, wherein a first distance between the first partial field stop and the first surface is set to be larger than a second distance between the second partial field stop and the first surface.
摘要翻译：公开了一种照明光学装置，用于通过能够布置在第一表面上的反射型原版照射与第一表面光学共轭的第二表面，该照明光学装置包括：第一局部场停止件，其被布置为限定第一外部要形成在第二表面上的照明区域的边缘，以便限制朝向第一表面行进的光束; 以及第二局部场阻挡器，其布置成限定所述照明区域的第二外边缘，以便限制从可布置在所述第一表面上的所述反射型原版反射的光束，其中所述第一部分场并且所述第一表面被设定为大于所述第二局部位置挡块与所述第一表面之间的第二距离。

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