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1. 发明申请

US20160146539A1 Substrate Transfer System and Heat Treatment Apparatus Using Same 有权
标题翻译：基板转印系统和使用其的热处理装置
公开(公告)号：US20160146539A1
公开(公告)日：2016-05-26
申请号：US14948673
申请日：2015-11-23
申请人： TOKYO ELECTRON LIMITED
发明人： Koyu HASEGAWA , Kyoko IKEDA
IPC分类号： F27D3/00
CPC分类号： F27D3/0084 , F27D2003/0086 , H01L21/47 , H01L21/67017 , H01L21/67178 , H01L21/67766 , H01L21/67781
摘要： A substrate transfer system includes a substrate transfer part capable of transferring a substrate while holding the substrate, an elevating mechanism including a support axis extending in an upper-lower direction and being capable of moving the substrate transfer part along the support axis within a predetermined range, a first exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis above an upper limit of the predetermined range, a second exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis below a lower limit of the predetermined range, and an exhaust part connected such that exhaust is available through the first exhaust port and the second exhaust port.
摘要翻译：基板转印系统包括能够在保持基板的同时转印基板的基板转印部件，包括沿上下方向延伸的支撑轴线并能够将基板转印部件沿着支撑轴线移动到预定范围内的升降机构位于从所述支撑轴线上的支撑轴线和所述支撑轴线附近的支撑轴线上方的位置的位置处的第一排气口，其高于所述预定范围的上限;第二排气口，位于从所述支撑轴承中的至少一个位置并且靠近所述支撑轴线低于所述预定范围的下限，并且排气部分连接成使得可通过所述第一排气口和所述第二排气口排出废气。

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