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1. 发明授权

US06533894B2 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition 失效
公开(公告)号：US06533894B2
公开(公告)日：2003-03-18
申请号：US10043544
申请日：2002-01-10
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
IPC分类号： C23F100
CPC分类号： H01J37/32174 , C23C16/505 , H01J37/32082 , H01J37/321 , Y10S438/961
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In accordance with a preferred implementation, a reaction chamber includes first and second electrodes operably associated therewith. A single RF power generator is connected to an RF power splitter which splits the RF power and applies the split power to both the first and second electrodes. Preferably, power which is applied to both electrodes is in accordance with a power ratio as between electrodes which is other than a 1:1 ratio. In accordance with one preferred aspect, the reaction chamber comprises part of a parallel plate PECVD system. In accordance with another preferred aspect, the reaction chamber comprises part of an inductive coil PECVD system. The power ratio is preferably adjustable and can be varied. One manner of effecting a power ratio adjustment is to vary respective electrode surface areas. Another manner of effecting the adjustment is to provide a power splitter which enables the output power thereof to be varied. PECVD processing methods are described as well.

2. 发明授权

US06705246B2 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition 有权
标题翻译： RF功率等离子体增强化学气相沉积反应器和实现等离子体增强化学气相沉积的方法
公开(公告)号：US06705246B2
公开(公告)日：2004-03-16
申请号：US10047382
申请日：2002-01-14
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
IPC分类号： C23C1600
CPC分类号： H01J37/32174 , C23C16/505 , H01J37/32082 , H01J37/321 , Y10S438/961
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In accordance with a preferred implementation, a reaction chamber includes first and second electrodes operably associated therewith. A single RF power generator is connected to an RF power splitter which splits the RF power and applies the split power to both the first and second electrodes. Preferably, power which is applied to both electrodes is in accordance with a power ratio as between electrodes which is other than a 1:1 ratio. In accordance with one preferred aspect, the reaction chamber comprises part of a parallel plate PECVD system. In accordance with another preferred aspect, the reaction chamber comprises part of an inductive coil PECVD system. The power ratio is preferably adjustable and can be varied. One manner of effecting a power ratio adjustment is to vary respective electrode surface areas. Another manner of effecting the adjustment is to provide a power splitter which enables the output power thereof to be varied. PECVD processing methods are described as well.
摘要翻译：描述了等离子体增强化学气相沉积（PECVD）反应器及其实现方法。根据优选的实施方案，反应室包括与其可操作地相关联的第一和第二电极。单个RF功率发生器连接到RF功率分配器，RF功率分配器分离RF功率并将分裂功率施加到第一和第二电极。优选地，施加到两个电极的功率与不同于1:1的电极之间的功率比一致。根据一个优选方面，反应室包括平行板PECVD系统的一部分。根据另一个优选的方面，反应室包括感应线圈PECVD系统的一部分。功率比优选是可调节的并且可以变化。实现功率比调整的一种方式是改变各个电极表面积。实现调整的另一种方式是提供能够改变输出功率的功率分配器。还描述了PECVD处理方法。

3. 发明授权

US06235646B1 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition 有权
标题翻译： RF功率等离子体增强化学气相沉积反应器和实现等离子体增强化学气相沉积的方法
公开(公告)号：US06235646B1
公开(公告)日：2001-05-22
申请号：US09670982
申请日：2000-09-26
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
IPC分类号： H01L2131
CPC分类号： H01J37/32174 , C23C16/505 , H01J37/32082 , H01J37/321 , Y10S438/961
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In accordance with a preferred implementation, a reaction chamber includes first and second electrodes operably associated therewith. A single RF power generator is connected to an RF power splitter which splits the RF power and applies the split power to both the first and second electrodes. Preferably, power which is applied to both electrodes is in accordance with a power ratio as between electrodes which is other than a 1:1 ratio. In accordance with one preferred aspect, the reaction chamber comprises part of a parallel plate PECVD system. In accordance with another preferred aspect, the reaction chamber comprises part of an inductive coil PECVD system. The power ratio is preferably adjustable and can be varied. One manner of effecting a power ratio adjustment is to vary respective electrode surface areas. Another manner of effecting the adjustment is to provide a power splitter which enables the output power thereof to be varied. PECVD processing methods are described as well.
摘要翻译：描述了等离子体增强化学气相沉积（PECVD）反应器及其实现方法。根据优选的实施方案，反应室包括与其可操作地相关联的第一和第二电极。单个RF功率发生器连接到RF功率分配器，RF功率分配器分离RF功率并将分裂功率施加到第一和第二电极两者。优选地，施加到两个电极的功率与不同于1:1的电极之间的功率比一致。根据一个优选方面，反应室包括平行板PECVD系统的一部分。根据另一个优选的方面，反应室包括感应线圈PECVD系统的一部分。功率比优选是可调节的并且可以变化。实现功率比调整的一种方式是改变各个电极表面积。实现调整的另一种方式是提供能够改变输出功率的功率分配器。还描述了PECVD处理方法。

4. 发明授权

US06227141B1 RF powered plasma enhanced chemical vapor deposition reactor and methods 有权
标题翻译：射频等离子体增强化学气相沉积反应器和方法
公开(公告)号：US06227141B1
公开(公告)日：2001-05-08
申请号：US09597659
申请日：2000-06-19
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith
IPC分类号： C23C1600
CPC分类号： H01J37/32174 , H01J37/32165
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In a preferred implementation, a PECVD reactor includes a processing chamber having a first electrode therewithin. A second electrode is disposed within the chamber and is configured for supporting at least one semiconductor workpiece for processing. A first RF power source delivers RF power of a first frequency to the first electrode. A second RF power source delivers RF power of a second frequency to the second electrode. Preferably the first and second frequencies are different from one another, and even more preferably, the first frequency is greater than the second frequency. The preferred reactor includes a thermocouple which provides temperature information relative to one of the electrodes. According to a preferred implementation, the power loop developed by the first RF power source is grounded interiorly of the chamber in a manner which reduces if not eliminates interference with other reactor components including the thermocouple.
摘要翻译：描述了等离子体增强化学气相沉积（PECVD）反应器及其实现方法。在优选的实施方案中，PECVD反应器包括其中具有第一电极的处理室。第二电极设置在室内并且被配置为支撑至少一个半导体工件用于处理。第一RF电源将第一频率的RF功率提供给第一电极。第二RF电源将第二频率的RF功率提供给第二电极。优选地，第一和第二频率彼此不同，并且甚至更优选地，第一频率大于第二频率。优选的反应器包括提供相对于一个电极的温度信息的热电偶。根据优选实施方案，由第一RF电源开发的功率回路以室内接地，其方式如果不消除对包括热电偶的其它反应器部件的干扰，则减小。

5. 发明授权

US6112697A RF powered plasma enhanced chemical vapor deposition reactor and methods 失效
标题翻译：射频等离子体增强化学气相沉积反应器和方法
公开(公告)号：US6112697A
公开(公告)日：2000-09-05
申请号：US26566
申请日：1998-02-19
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith
IPC分类号： C23C16/509 , C23C16/505 , H01J37/32 , H01L21/205 , H05H1/46 , C23C16/00 , H05H1/00
CPC分类号： H01J37/32174 , H01J37/32165
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In a preferred implementation, a PECVD reactor includes a processing chamber having a first electrode therewithin. A second electrode is disposed within the chamber and is configured for supporting at least one semiconductor workpiece for processing. A first RF power source delivers RF power of a first frequency to the first electrode. A second RF power source delivers RF power of a second frequency to the second electrode. Preferably the first and second frequencies are different from one another, and even more preferably, the first frequency is greater than the second frequency. The preferred reactor includes a thermocouple which provides temperature information relative to one of the electrodes. According to a preferred implementation, the power loop developed by the first RF power source is grounded interiorly of the chamber in a manner which reduces if not eliminates interference with other reactor components including the thermocouple.
摘要翻译：描述了等离子体增强化学气相沉积（PECVD）反应器及其实现方法。在优选的实施方案中，PECVD反应器包括其中具有第一电极的处理室。第二电极设置在室内并且被配置为支撑至少一个半导体工件用于处理。第一RF电源将第一频率的RF功率提供给第一电极。第二RF电源将第二频率的RF功率提供给第二电极。优选地，第一和第二频率彼此不同，并且甚至更优选地，第一频率大于第二频率。优选的反应器包括提供相对于一个电极的温度信息的热电偶。根据优选实施方案，由第一RF电源开发的功率回路以室内接地，其方式如果不消除对包括热电偶的其它反应器部件的干扰，则减小。

6. 发明授权

US06395128B2 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition 失效
公开(公告)号：US06395128B2
公开(公告)日：2002-05-28
申请号：US09026042
申请日：1998-02-19
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
IPC分类号： H05H100
CPC分类号： H01J37/32174 , C23C16/505 , H01J37/32082 , H01J37/321 , Y10S438/961
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In accordance with a preferred implementation, a reaction chamber includes first and second electrodes operably associated therewith. A single RF power generator is connected to an RF power splitter which splits the RF power and applies the split power to both the first and second electrodes. Preferably, power which is applied to both electrodes is in accordance with a power ratio as between electrodes which is other than a 1:1 ratio. In accordance with one preferred aspect, the reaction chamber comprises part of a parallel plate PECVD system. In accordance with another preferred aspect, the reaction chamber comprises part of an inductive coil PECVD system. The power ratio is preferably adjustable and can be varied. One manner of effecting a power ratio adjustment is to vary respective electrode surface areas. Another manner of effecting the adjustment is to provide a power splitter which enables the output power thereof to be varied. PECVD processing methods are described as well.

7. 发明授权

US6159867A RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition 有权
公开(公告)号：US6159867A
公开(公告)日：2000-12-12
申请号：US378132
申请日：1999-08-19
申请人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
发明人： Sujit Sharan , Gurtej S. Sandhu , Paul Smith , Mei Chang
IPC分类号： H05H1/46 , C23C16/505 , H01J37/32 , H01L21/205 , H01L21/31 , C23F1/02 , H01L21/469
CPC分类号： H01J37/32174 , C23C16/505 , H01J37/32082 , H01J37/321 , Y10S438/961
摘要： Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In accordance with a preferred implementation, a reaction chamber includes first and second electrodes operably associated therewith. A single RF power generator is connected to an RF power splitter which splits the RF power and applies the split power to both the first and second electrodes. Preferably, power which is applied to both electrodes is in accordance with a power ratio as between electrodes which is other than a 1:1 ratio. In accordance with one preferred aspect, the reaction chamber comprises part of a parallel plate PECVD system. In accordance with another preferred aspect, the reaction chamber comprises part of an inductive coil PECVD system. The power ratio is preferably adjustable and can be varied. One manner of effecting a power ratio adjustment is to vary respective electrode surface areas. Another manner of effecting the adjustment is to provide a power splitter which enables the output power thereof to be varied. PECVD processing methods are described as well.

8. 发明申请

US20180047429A1 STREAMING DIGITAL MEDIA BOOKMARK CREATION AND MANAGEMENT 审中-公开
公开(公告)号：US20180047429A1
公开(公告)日：2018-02-15
申请号：US15673641
申请日：2017-08-10
申请人： Paul Smith
发明人： Paul Smith
IPC分类号： G11B27/34 , G11B27/031 , H04N21/845 , H04N21/472 , H04N21/84
摘要： A user can quickly and efficiently create, edit, search, playback and share bookmarks in one or more videos that are pre-recorded or being recorded or streaming live. The bookmark includes reference to a portion of the video for an amount of time. The bookmark portions may not include a specified end time. The bookmark may include the source of the video, a start time of the bookmarked portion of the video stream or file, a length of the referenced video portion, and content such as text, emoticons, or other content received from a user that creates, edits, or manages the bookmark. The bookmarks may be grouped together into a set of bookmarks, thereby forming an edit of the original streaming or pre-recorded videos when played sequentially, wherein the edit includes a set of bookmarked video portions (bookmarked videos) taken from one or more particular live streaming or pre-recorded videos.

9. 发明授权

US09743977B2 Medical devices with multiple degrees of freedom and related methods of use 有权
公开(公告)号：US09743977B2
公开(公告)日：2017-08-29
申请号：US13747047
申请日：2013-01-22
申请人： Paul Smith , Eric K. Litscher , Samuel Raybin , John B. Golden , Michael E. Zupkofska
发明人： Paul Smith , Eric K. Litscher , Samuel Raybin , John B. Golden , Michael E. Zupkofska
IPC分类号： A61B17/00 , A61B17/28 , A61B18/14 , A61B17/32 , A61B17/34 , A61B34/00 , A61B17/29 , A61B18/00
CPC分类号： A61B18/1477 , A61B17/320016 , A61B17/3478 , A61B18/1492 , A61B34/71 , A61B2017/00269 , A61B2017/2927 , A61B2018/0091 , A61B2018/1425 , A61B2217/007 , A61B2218/002
摘要： Embodiments of the disclosure are directed to a medical device. The medical device may include a shaft having a proximal end and a distal end. A positioning mechanism may be disposed adjacent the distal end of the shaft. The positioning mechanism may include an outer member and an inner member coupled to an end-effector. The outer member may be pivotably attached to the distal end of the shaft and the inner member may be pivotably attached to the outer member.

10. 发明授权

US09645091B2 Specimen sample collection device and test system 有权
公开(公告)号：US09645091B2
公开(公告)日：2017-05-09
申请号：US13165769
申请日：2011-06-21
申请人： Paul D. Slowey , James Wickstead , Keith Seritella , Brian Forbes , John Ennis , Richard Herrig , Jason Giddings , Paul Smith
发明人： Paul D. Slowey , James Wickstead , Keith Seritella , Brian Forbes , John Ennis , Richard Herrig , Jason Giddings , Paul Smith
IPC分类号： G01N21/75 , G01N21/84
CPC分类号： G01N21/8483 , G01N2201/0221 , Y10T436/11
摘要： A portable, hand-held electro-optical reader and specimen sample collector is provided, including an absorbent pad, one or more test strips contained in the collector handle to provide observable results through a window, the handle insertable into the reader for immediate recording and analysis. The system includes means to automatically provide subject and test specific data with the test results and retain samples for later verification analysis.

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