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1. 发明授权

US06918821B2 Materials and methods for low pressure chemical-mechanical planarization 失效
标题翻译：低压化学机械平面化的材料和方法
公开(公告)号：US06918821B2
公开(公告)日：2005-07-19
申请号：US10704982
申请日：2003-11-12
申请人： Sudhakar Balijepalli , Dale J. Aldrich , Laura A. Grier , Michael E. Mills
发明人： Sudhakar Balijepalli , Dale J. Aldrich , Laura A. Grier , Michael E. Mills
IPC分类号： B24B37/04 , B24B49/16 , B24B53/007 , B24B1/00
CPC分类号： B24B53/017 , B24B49/16
摘要： Provided are materials and methods for the chemical mechanical planarization of material layers using a down force of less than about 2.5 psi while maintaining a material removal rate generally similar to that obtained using higher down forces while simultaneously improving the selectivity of the process with respect to a primary material formed over a barrier material. The materials and methods disclosed herein are suitable for use in meatallization operations during semiconductor device fabrication, in particular in processes in which the primary material is a softer metal such as copper and the barrier material is a harder material such as a metal nitride.
摘要翻译：提供了用于使用小于约2.5psi的向下力的材料层的化学机械平坦化的材料和方法，同时保持材料去除速率通常类似于使用较高下推力获得的材料去除速率，同时提高该方法相对于在阻挡材料上形成的主要材料。本文公开的材料和方法适用于半导体器件制造期间的肉食化操作，特别是在主要材料是诸如铜的较软金属的过程中，并且阻挡材料是较硬的材料，例如金属氮化物。

2. 发明授权

US06910951B2 Materials and methods for chemical-mechanical planarization 失效
标题翻译：化学机械平面化的材料和方法
公开(公告)号：US06910951B2
公开(公告)日：2005-06-28
申请号：US10370781
申请日：2003-02-24
申请人： Sudhakar Balijepalli , Dale J. Aldrich , Laura A. Grier
发明人： Sudhakar Balijepalli , Dale J. Aldrich , Laura A. Grier
IPC分类号： B24B37/04 , B24B1/00
CPC分类号： B24B37/245 , B24B37/042 , B24B53/017
摘要： Provided are materials and methods for the chemical mechanical planarization of material layers such as oxide or metal formed on semiconductor substrates during the manufacture of semiconductor devices using a fixed abrasive planarization pad having an open cell foam structure from which free abrasive particles are produced by conditioning and combined with a carrier liquid to form an in situ slurry on the polishing surface of the planarization pad that, in combination with relative motion between the semiconductor substrate and the planarization pad, tends to remove the material layer from the surface of the semiconductor substrate. Depending on the composition of the material layer, the rate of material removal from the semiconductor substrate may be controlled by manipulating the pH or the oxidizer content of the carrier liquid.
摘要翻译：提供了在使用具有开孔形成泡沫结构的固定研磨平坦化垫的半导体器件制造期间，在半导体衬底上形成的诸如氧化物或金属的材料层，例如氧化物或金属的化学机械平坦化的材料和方法，通过调节而产生游离磨粒，与载体液体结合以在平坦化焊盘的抛光表面上形成原位浆料，结合半导体衬底和平坦化焊盘之间的相对运动，倾向于从半导体衬底的表面去除材料层。根据材料层的组成，可以通过操纵载体液体的pH或氧化剂含量来控制从半导体衬底去除材料的速率。

3. 发明授权

US07066801B2 Method of manufacturing a fixed abrasive material 失效
标题翻译：制造固定磨料的方法
公开(公告)号：US07066801B2
公开(公告)日：2006-06-27
申请号：US10369628
申请日：2003-02-21
申请人： Sudhakar Balijepalli , Dale J. Aldrich , Laura A. Grier , Bedri Erdem , Gregory F. Meyers
发明人： Sudhakar Balijepalli , Dale J. Aldrich , Laura A. Grier , Bedri Erdem , Gregory F. Meyers
IPC分类号： B24D11/00
CPC分类号： B24D18/00 , B24D3/32 , B24D13/147
摘要： Provided is a method for manufacturing a fixed abrasive material suitable for use in CMP planarization pads from an aqueous polymer dispersion that also includes abrasive particles that involves frothing the polymer dispersion, applying the froth to a substrate, mold or carrier and curing the froth to form a fixed abrasive material having an open cell structure containing between about 5 and 85 wt % abrasive particles and a dry density of about 350 kg/m3 to 1200 kg/m3.
摘要翻译：本发明提供了一种从含水聚合物分散体制造适合于CMP平坦化焊盘的固定研磨材料的方法，所述聚合物分散体还包括包含起泡聚合物分散体的磨料颗粒，将泡沫施加到基材，模具或载体上并固化泡沫以形成具有包含约5-85重量％的磨料颗粒和约350kg / m 3至1200kg / m 3的干密度的开孔结构的固定磨料。。

4. 发明申请

US20110015292A1 PREPOLYMERS MADE FROM NATURAL OIL BASED POLYOLS 审中-公开
标题翻译：从天然油基聚合物制备的聚合物
公开(公告)号：US20110015292A1
公开(公告)日：2011-01-20
申请号：US12933284
申请日：2009-03-20
申请人： Bindushree Radhakrishnan , William A. Koonce , Laura A. Grier , Dwight D. Latham
发明人： Bindushree Radhakrishnan , William A. Koonce , Laura A. Grier , Dwight D. Latham
IPC分类号： C08G18/00 , C07C269/02 , C07F7/08 , C07D303/02 , C07C309/00 , C08J9/00
CPC分类号： C08G18/4891 , C08G18/12 , C08G18/4812 , C08G18/4841 , C08G18/7671 , C08G18/307
摘要： A prepolymer and products made from the preopolymer is described. The prepolymer includes the reaction product of at least one isocyanate and at least one natural oil based polyol. The natural oil based polyol includes at least two natural oil moieties separated by a molecular structure having an average of at least about 19 ether groups between any 2 of the natural oil moieties or by a polyether molecular structure having an equivalent weight of at least about 480.
摘要翻译：描述了由预聚物制成的预聚物和产物。预聚物包括至少一种异氰酸酯和至少一种天然油基多元醇的反应产物。基于天然油的多元醇包括至少两个天然油部分，其分子结构在任何2个天然油部分之间平均具有至少约19个醚基团，或通过具有至少约480当量重量的聚醚分子结构。

5. 发明授权

US5491174A Process for preparation of polyurethanes utilizing novel catalysts 失效
标题翻译：利用新型催化剂制备聚氨酯的方法
公开(公告)号：US5491174A
公开(公告)日：1996-02-13
申请号：US418918
申请日：1995-04-07
申请人： Laura A. Grier , Paul L. Neill , Ralph D. Priester , Larry W. Mobley , Kenneth W. Skaggs , Robert B. Turner
发明人： Laura A. Grier , Paul L. Neill , Ralph D. Priester , Larry W. Mobley , Kenneth W. Skaggs , Robert B. Turner
IPC分类号： C08G18/16 , C08G18/24 , D06N3/14 , D06N7/00 , B05D7/26 , C08J9/04
CPC分类号： C08G18/242 , C08G18/161 , D06N3/14 , D06N7/0086 , D06N7/0089 , C08G2101/0008 , C08G2101/0016 , C08G2101/0025 , C08G2105/02 , C08G2105/06 , C08G2410/00 , D06N2203/068 , D06N2205/045 , D06N2205/20 , Y10S521/901 , Y10S521/902
摘要： Novel catalyst compositions comprising complexes of tin(IV) salts and amine compounds are used to prepare polyurethanes, polyureas, polycarbodiimides and polyisocyanurates. The complexes, which preferably employ primary amines, allow delay of gelation until they dissociate under certain reaction conditions. The complexes can be prepared neat or in situ in an active hydrogen containing formulation component. The complexes serve to delay gelation of the formulation because they can be prepared to be relatively stable to moisture and will predictably dissociate upon heating, either as a result of the exothermic nature of the reaction being catalyzed or with application of an external heat source. The catalyst compositions are particularly useful for preparation of carpet underlay and in other applications requiring significant delay prior to gelation.
摘要翻译：使用包含锡（IV）盐和胺化合物的复合物的新型催化剂组合物来制备聚氨酯，聚脲，聚碳二亚胺和聚异氰脲酸酯。优选使用伯胺的络合物允许延迟凝胶化，直到它们在某些反应条件下解离。络合物可以在含活性氢的制剂组分中纯净或原位制备。该配合物用于延缓制剂的凝胶化，因为它们可以被制备成对水分相对稳定，并且由于反应的放热性质被催化或外加热源的加热，可以预测地在加热下解离。催化剂组合物特别可用于制备地毯底层和在凝胶化之前需要显着延迟的其它应用。

6. 发明授权

US09032692B2 Polyurethane based insulated glass sealant 有权
标题翻译：聚氨酯绝缘玻璃密封剂
公开(公告)号：US09032692B2
公开(公告)日：2015-05-19
申请号：US13878380
申请日：2011-11-10
申请人： Bindushree Radhakrishnan , Laura A. Grier , Syed Z. Mahdi
发明人： Bindushree Radhakrishnan , Laura A. Grier , Syed Z. Mahdi
IPC分类号： E04B1/66 , E04C2/54 , E06B3/00 , B32B37/12 , C09J175/04 , C03C27/10 , C08G18/28 , C08G18/36 , C08G18/77 , C08G18/78 , C08G18/79
CPC分类号： E04B1/66 , B32B37/12 , C03C27/10 , C08G18/289 , C08G18/36 , C08G18/778 , C08G18/7831 , C08G18/797 , C08G2190/00 , C09J175/04 , Y10T428/31551 , Y10T428/31601
摘要： Embodiments of the invention include insulated units and methods of producing the insulating units. The insulating units include a first surface, a structural seal disposed on at least portions of the first surface, and a second surface disposed on the structural seal. The structural seal includes the reaction product of at least one first isocyanate, at least one isocyanate reactive side, and at least one adhesion promoter including a reaction product of at least one secondary aminoalkoxy silane and at least one second isocyanate.
摘要翻译：本发明的实施例包括绝缘单元和绝缘单元的制造方法。绝缘单元包括第一表面，设置在第一表面的至少部分上的结构密封件和设置在结构密封件上的第二表面。结构密封包括至少一种第一异氰酸酯，至少一种异氰酸酯反应性侧和至少一种包含至少一种仲氨基烷氧基硅烷和至少一种第二异氰酸酯的反应产物的粘合促进剂的反应产物。

7. 发明申请

US20130216840A1 POLYURETHANE BASED INSULATED GLASS SEALANT 有权
标题翻译：基于聚氨酯的绝缘玻璃密封剂
公开(公告)号：US20130216840A1
公开(公告)日：2013-08-22
申请号：US13878380
申请日：2011-11-10
申请人： Bindushree Radhakrishnan , Laura A. Grier , Syed Z. Mahdi
发明人： Bindushree Radhakrishnan , Laura A. Grier , Syed Z. Mahdi
IPC分类号： E04B1/66 , B32B37/12
CPC分类号： E04B1/66 , B32B37/12 , C03C27/10 , C08G18/289 , C08G18/36 , C08G18/778 , C08G18/7831 , C08G18/797 , C08G2190/00 , C09J175/04 , Y10T428/31551 , Y10T428/31601
摘要： Embodiments of the invention include insulated units and methods of producing the insulating units. The insulating units include a first surface, a structural seal disposed on at least portions of the first surface, and a second surface disposed on the structural seal. The structural seal includes the reaction product of at least one first isocyanate, at least one isocyanate reactive side, and at least one adhesion promoter including a reaction product of at least one secondary aminoalkoxy silane and at least one second isocyanate.
摘要翻译：本发明的实施例包括绝缘单元和绝缘单元的制造方法。绝缘单元包括第一表面，设置在第一表面的至少部分上的结构密封件和设置在结构密封件上的第二表面。结构密封包括至少一种第一异氰酸酯，至少一种异氰酸酯反应性侧和至少一种包含至少一种仲氨基烷氧基硅烷和至少一种第二异氰酸酯的反应产物的粘合促进剂的反应产物。

8. 发明申请

US20120253001A1 Polyurethane-Based Sealant for Insulated Glass Units 审中-公开
标题翻译：用于绝缘玻璃单元的聚氨酯密封胶
公开(公告)号：US20120253001A1
公开(公告)日：2012-10-04
申请号：US13517389
申请日：2010-11-15
申请人： Bindushree Radhakrishnan , Dwight D. Latham , Laura A. Grier , William A. Koonce , Matthias Schaefer , Paul D. Ries
发明人： Bindushree Radhakrishnan , Dwight D. Latham , Laura A. Grier , William A. Koonce , Matthias Schaefer , Paul D. Ries
IPC分类号： C08G18/32 , C08G18/34
CPC分类号： C09K3/1021 , C08G18/10 , C08G18/36 , C08G18/4288 , C08G18/4891 , C08G18/6674 , C08G2190/00 , C08K5/10 , C08G18/664 , C08L75/04
摘要： Insulated glass units are sealed with polyurethane made using a natural oil-based polyol (NOBP). In one embodiment the NOBP is made using a monol-rich monomer containing high levels of mono-hydroxy functional fatty acid methyl esters. Insulated glass sealants based on these compounds provide enhanced resistance to UV and oxidative degradation as compared to conventional products while still providing the required barrier and mechanical properties.
摘要翻译：绝缘玻璃单元使用天然油基多元醇（NOBP）制成的聚氨酯密封。在一个实施方案中，使用含有高含量单羟基官能脂肪酸甲酯的单醇富含单体制备NOBP。与常规产品相比，基于这些化合物的绝缘玻璃密封剂提供了对UV和氧化降解的增强的抗性，同时仍然提供所需的屏障和机械性能。

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