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1. 发明申请

US20080186468A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080186468A1
公开(公告)日：2008-08-07
申请号：US12000092
申请日：2007-12-07
申请人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
发明人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
IPC分类号： G03B27/54
CPC分类号： H01L21/0274 , G03F7/70091 , G03F7/705
摘要： A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.
摘要翻译：提出了一种用于配置光刻设备的照明源的方法。该方法包括将照明源分为像素组，每个像素组包括一个或多个照明源点; 选择照射形状以露出图案，所述照明形状由至少一个像素组形成; 作为照明源中的像素组的状态变化的结果，创建修改的照明形状的像素组的状态的变化，迭代地计算光刻度量; 并根据迭代计算结果调整照明形状。

2. 发明授权

US08576377B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08576377B2
公开(公告)日：2013-11-05
申请号：US12000092
申请日：2007-12-07
申请人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
发明人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
IPC分类号： G03B27/54 , G03B27/68 , G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： H01L21/0274 , G03F7/70091 , G03F7/705
摘要： A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.
摘要翻译：提出了一种用于配置光刻设备的照明源的方法。该方法包括将照明源分为像素组，每个像素组包括一个或多个照明源点; 选择照射形状以露出图案，所述照明形状由至少一个像素组形成; 作为照明源中的像素组的状态变化的结果，创建修改的照明形状的像素组的状态的变化，迭代地计算光刻度量; 并根据迭代计算结果调整照明形状。

3. 发明授权

US09563135B2 Process tuning with polarization 有权
标题翻译：极化过程调谐
公开(公告)号：US09563135B2
公开(公告)日：2017-02-07
申请号：US13239034
申请日：2011-09-21
申请人： Steven George Hansen , Heine Melle Mulder , Tsann-Bim Chiou
发明人： Steven George Hansen , Heine Melle Mulder , Tsann-Bim Chiou
IPC分类号： G03B27/68 , G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.
摘要翻译：一种用于配置光刻设备的照明源的方法，所述方法包括将照明源分为像素组，每个像素组包括照明源的光瞳平面中的一个或多个照明源点; 改变每个像素组的偏振态，并确定由偏振状态改变导致的多个临界尺度中的每一个的增量效应; 使用所确定的增量效应来计算所述多个关键尺寸中的每一个的第一多个灵敏度系数; 选择初始照明源; 使用所计算的第一多个灵敏度系数来迭代地计算作为偏振态的变化的结果的光刻度量，所述初始照明源中的像素组的偏振状态的改变创建修改的照明源; 并根据迭代计算结果调整初始照明源。

4. 发明申请

US20130044302A1 Lithographic Apparatus and Method 审中-公开
标题翻译：平版印刷设备和方法
公开(公告)号：US20130044302A1
公开(公告)日：2013-02-21
申请号：US13550561
申请日：2012-07-16
申请人： Heine Melle MULDER , Steven George Hansen , Thijs Johan Henry Hollink
发明人： Heine Melle MULDER , Steven George Hansen , Thijs Johan Henry Hollink
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70091
摘要： A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.
摘要翻译：光刻设备包括照明系统，图案形成装置和投影系统。照明系统提供辐射束。图案形成装置在其横截面中赋予具有图案的辐射束。衬底保持器支撑衬底。投影系统将图案化的辐射束投射到基板的目标部分上。该装置至少在使用中被构造和布置，以使用具有在第一方向上的亮场强度分布的辐射将图案成像到基板上; 以及基本上垂直于第一方向的第二方向上的暗场强度分布。

5. 发明授权

US09116439B2 Illumination system and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：US09116439B2
公开(公告)日：2015-08-25
申请号：US13051384
申请日：2011-03-18
申请人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
发明人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70116
摘要： An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
摘要翻译：公开了一种照明系统，其具有偏振构件，该偏振构件包括可移动成与辐射束至少部分交叉的第一和第二偏振修正器，使得各个偏振修正器对至少部分光束施加修改的偏振。所述照明系统还包括可独立控制的反射元件的阵列，其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器，被配置为控制所述第一和第二偏振调节剂的运动，使得所述第一和第二偏振调节剂与辐射束的不同部分。

6. 发明申请

US20110228247A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译：照明系统和平面设备
公开(公告)号：US20110228247A1
公开(公告)日：2011-09-22
申请号：US13051384
申请日：2011-03-18
申请人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
发明人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70116
摘要： An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
摘要翻译：公开了一种照明系统，其具有偏振构件，该偏振构件包括可移动到与辐射束至少部分交叉的第一和第二偏振修正器，使得各个偏振修正器将修改的偏振应用于至少部分光束。所述照明系统还包括可独立控制的反射元件的阵列，其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器，被配置为控制所述第一和第二偏振调节剂的运动，使得所述第一和第二偏振调节剂与辐射束的不同部分。

7. 发明授权

US09213783B2 Source mask optimization to reduce stochastic effects 有权
标题翻译：源掩码优化来减少随机效应
公开(公告)号：US09213783B2
公开(公告)日：2015-12-15
申请号：US13719135
申请日：2012-12-18
申请人： Steven George Hansen
发明人： Steven George Hansen
IPC分类号： G06F17/50 , G03F7/20 , G03F1/70
CPC分类号： G06F17/5068 , G03F1/70 , G03F7/70125 , G03F7/70433 , G03F7/70441 , G06F17/50
摘要： Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.
摘要翻译：本文公开了一种用于改进光刻工艺的计算机实现的方法，用于使用光刻投影设备将设计布局的一部分成像到基板上成像，该方法包括定义多变量成本函数，多变量成本函数是函数的光刻过程的随机效应。

8. 发明授权

US07016017B2 Lithographic apparatus and method for optimizing an illumination source using isofocal compensation 有权
标题翻译：平版印刷设备和使用异焦点补偿优化照明光源的方法
公开(公告)号：US07016017B2
公开(公告)日：2006-03-21
申请号：US10716439
申请日：2003-11-20
申请人： Steven George Hansen
发明人： Steven George Hansen
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32 , G06F17/50 , G03C5/00
CPC分类号： G03F7/705 , G03F7/701 , G03F7/70108
摘要： A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using isofocal compensation, the lithographic apparatus including an illuminator, a projection system and a mask having at least one pattern to be printed on a substrate. This method includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, calculating a metric representing variation of the separate responses for individual source points with defocus and adjusting an illumination arrangement based on analysis of the metric.
摘要翻译：一种用于通过使用异焦点补偿的计算机模拟来优化光刻设备的照明条件的方法，所述光刻设备包括具有至少一种待印刷图案的照明器，投影系统和掩模。该方法包括定义要印刷在基板上的光刻图案，选择仿真模型，选择照明器的光瞳平面中的源点的网格，为各个源点计算单独的响应，每个响应代表一个使用仿真模型的单个或一系列模拟，计算表示具有散焦的各个源点的单独响应的变化的度量，并且基于度量的分析来调整照明布置。

9. 发明授权

US08043797B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08043797B2
公开(公告)日：2011-10-25
申请号：US11115386
申请日：2005-04-27
申请人： Steven George Hansen
发明人： Steven George Hansen
IPC分类号： G03F9/00 , G03B27/42 , G03B27/54 , G03B27/32
CPC分类号： G03F7/70283 , G03F1/32 , G03F1/36 , G03F7/70091 , G03F7/70125 , G03F7/70433
摘要： A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase shift mask using a multipole illumination that includes an on-axis component and an off-axis component, the mask pattern including non-printing assist features configured for a pitch larger than twice a minimum pitch of the mask pattern, and projecting an image of the illuminated mask pattern onto the substrate.
摘要翻译：提出了将掩模图案的图像通过间距范围转印到基底上的方法。在一个实施例中，该方法包括使用包括轴上分量和离轴分量的多极照明照亮衰减的相移掩模的掩模图案，该掩模图案包括配置用于间距大于掩模图案的最小间距的两倍，并将照射的掩模图案的图像投影到基板上。

10. 发明授权

US07471375B2 Correction of optical proximity effects by intensity modulation of an illumination arrangement 失效
标题翻译：通过照明装置的强度调制校正光学邻近效应
公开(公告)号：US07471375B2
公开(公告)日：2008-12-30
申请号：US11353234
申请日：2006-02-14
申请人： Jozef Maria Finders , Luis Alberto Colina Santamaria Colina , Steven George Hansen
发明人： Jozef Maria Finders , Luis Alberto Colina Santamaria Colina , Steven George Hansen
IPC分类号： G03B27/54 , G03B27/42 , G03B27/72 , G03C5/00
CPC分类号： G03F7/70191 , G03F7/70108
摘要： A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.
摘要翻译：提出了一种用于利用光刻设备将图案形成装置图案光学传递到基板上的方法。该方法包括调整相对于第二照明形状的第一照明形状的强度，第一和第二照明形状分别在光刻设备的照明系统的光瞳平面内限定第一照明区域和第二照明区域，同时保持第一和第二照明区域基本恒定，并且以第一和第二照明形状照亮图案形成装置图案。

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