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1. 发明申请

US20090299655A1 SYSTEMS AND METHODS FOR DETERMINING TWO OR MORE CHARACTERISTICS OF A WAFER 有权
标题翻译：用于确定波形的两个或更多特征的系统和方法
公开(公告)号：US20090299655A1
公开(公告)日：2009-12-03
申请号：US12128426
申请日：2008-05-28
申请人： Stephen Biellak , Daniel Kavaldjiev
发明人： Stephen Biellak , Daniel Kavaldjiev
IPC分类号： G06F19/00 , G01N21/47
CPC分类号： H01L22/12 , G01N21/9501 , G01N2021/8825 , H01L2924/0002 , H01L2924/00
摘要： Systems and methods for determining two or more characteristics of a wafer are provided. The two or more characteristics include a characteristic of the wafer that is spatially localized in at least one dimension and a characteristic of the wafer that is not spatially localized in two dimensions.
摘要翻译：提供了用于确定晶片的两个或多个特性的系统和方法。两个或更多个特征包括在至少一个维度上空间定位的晶片的特性和晶片在两维空间上不局限的特征。

2. 发明申请

US20130016346A1 Wafer Inspection 有权
标题翻译：晶圆检验
公开(公告)号：US20130016346A1
公开(公告)日：2013-01-17
申请号：US13544954
申请日：2012-07-09
申请人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak
发明人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak
IPC分类号： G01N21/956
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要： Systems configured to inspect a wafer are provided.
摘要翻译：提供了配置用于检查晶片的系统。

3. 发明授权

US08269960B2 Computer-implemented methods for inspecting and/or classifying a wafer 有权
标题翻译：用于检查和/或分类晶片的计算机实现的方法
公开(公告)号：US08269960B2
公开(公告)日：2012-09-18
申请号：US12179260
申请日：2008-07-24
申请人： Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
发明人： Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
IPC分类号： G01N21/00
CPC分类号： H01L22/12 , G01N21/9501 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods for inspecting and/or classifying a wafer are provided. One computer-implemented includes detecting defects on a wafer using one or more defect detection parameters, which are determined based on a non-spatially localized characteristic of the wafer that is determined using output responsive to light scattered from the wafer generated by an inspection system. Another computer-implemented method includes classifying a wafer based on a combination of a non-spatially localized characteristic of the wafer determined using output responsive to light scattered from the wafer generated by an inspection system and a spatially localized characteristic of the wafer determined using the output.
摘要翻译：提供了用于检查和/或分类晶片的计算机实现的方法。一种计算机实现的包括使用一个或多个缺陷检测参数来检测晶片上的缺陷，所述缺陷检测参数是基于使用响应于由检查系统产生的晶片散射的光的输出而确定的晶片的非空间局部特征确定的。另一种计算机实现的方法包括基于使用响应于由检查系统产生的晶片散射的光的输出确定的晶片的非空间局部化特性和使用输出确定的晶片的空间局部化特性的组合来分类晶片。

4. 发明授权

US08169613B1 Segmented polarizer for optimizing performance of a surface inspection system 有权
标题翻译：分段偏振器，用于优化表面检测系统的性能
公开(公告)号：US08169613B1
公开(公告)日：2012-05-01
申请号：US12618620
申请日：2009-11-13
申请人： Stephen Biellak , Daniel Kavaldjiev
发明人： Stephen Biellak , Daniel Kavaldjiev
IPC分类号： G01J4/00
CPC分类号： G01J1/0422 , G01J1/0429 , G01N21/8806 , G01N21/9501 , G02B5/3025 , G02B5/3075
摘要： A polarizing device may be used with sample inspection system having one or more collection systems that receive scattered radiation from a region on a sample surface and direct it to a detector. The polarizing device disposed between the collection system(s) and the detector. The polarizing device may include a plurality of polarizing sections. The sections may be characterized by different polarization characteristics. The polarizing device is configured to transmit scattered radiation from defects to the detector and to block noise from background sources that do not share characteristics with scattered radiation from the defects from reaching the detector while, maximizing a capture rate for the defects the detector at a less than optimal signal-to-noise ratio.
摘要翻译：可以使用具有一个或多个收集系统的样本检查系统的偏振装置，其接收来自样品表面上的区域的散射辐射并将其引导到检测器。设置在收集系统和检测器之间的偏振装置。偏振装置可以包括多个偏振部分。这些部分可以具有不同的偏振特性。偏振装置被配置为将来自缺陷的散射辐射传输到检测器并且阻止来自背景源的噪声，其不与来自缺陷的散射辐射共享特征以到达检测器，同时使检测器的缺陷的捕获率最小化比最佳信噪比。

5. 发明授权

US09279774B2 Wafer inspection 有权
标题翻译：晶圆检查
公开(公告)号：US09279774B2
公开(公告)日：2016-03-08
申请号：US13544954
申请日：2012-07-09
申请人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
发明人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.
摘要翻译：提供了配置用于检查晶片的系统。一个系统包括照明子系统，该照明子系统配置成在晶片上同时形成多个照明区域，其中每个区域之间基本上没有照明通量。该系统还包括扫描子系统，被配置为扫描晶片上的多个照明区域。另外，该系统包括一个收集子系统，该收集子系统配置成同时并分别将从每个区域散射的光分别映射到两个或更多个传感器上。选择两个或更多个传感器的特征，使得散射光不被成像到两个或更多个传感器之间的间隙中。两个或多个传感器响应散射光产生输出。该系统还包括被配置为使用两个或更多个传感器的输出来检测晶片上的缺陷的计算机子系统。

6. 发明授权

US08629384B1 Photomultiplier tube optimized for surface inspection in the ultraviolet 有权
标题翻译：光电倍增管优化用于紫外线的表面检测
公开(公告)号：US08629384B1
公开(公告)日：2014-01-14
申请号：US12910230
申请日：2010-10-22
申请人： Stephen Biellak , Daniel Kavaldjiev , Stuart Friedman
发明人： Stephen Biellak , Daniel Kavaldjiev , Stuart Friedman
IPC分类号： H01J40/14 , H01J40/00 , H01J40/06
CPC分类号： H01J43/28
摘要： Disclosed herein is a PhotoMultiplier Tube (PMT) designed for use with a surface inspection system such as the Surfscan system, which operates at 266 nm wavelength. The inventive PMT is high efficiency, low noise, and low gain, a combination of features that is specific to the application and contrary to the features of PMT's in the art. The inventive PMT is designed to be tuned to a specific narrow band wavelength of incident light, thereby optimizing the QE at that wavelength. It is further designed to combine a small number of dynodes each having substantially higher secondary electron gain than typical dynodes. By designing the PMT in this way, the excess noise factor is dramatically reduced, yielding a much improved S/N, while still maintaining the overall PMT gain in the lower range suitable for use in a surface inspection system.
摘要翻译：本文公开了一种设计用于诸如Surfscan系统的表面检查系统的光电倍增管（PMT），其在266nm波长下操作。本发明的PMT具有高效率，低噪声和低增益，这是特定于应用并且与本领域的PMT的特征相反的特征的组合。本发明的PMT被设计成调谐到入射光的特定窄带波长，从而优化该波长处的QE。它还被设计成组合少量的具有比典型倍增电极具有显着更高的二次电子增益的倍增电极。通过以这种方式设计PMT，过多的噪声系数大大降低，产生了大大改善的S / N，同时仍将PMT增益保持在适用于表面检测系统的较低范围内。

7. 发明授权

US08520208B1 Segmented polarizer for optimizing performance of a surface inspection system 有权
标题翻译：分段偏振器，用于优化表面检测系统的性能
公开(公告)号：US08520208B1
公开(公告)日：2013-08-27
申请号：US13429213
申请日：2012-03-23
申请人： Stephen Biellak , Daniel Kavaldjiev
发明人： Stephen Biellak , Daniel Kavaldjiev
IPC分类号： G01J4/00
CPC分类号： G01J1/0422 , G01J1/0429 , G01N21/8806 , G01N21/9501 , G02B5/3025 , G02B5/3075
摘要： A polarizing device may be used with sample inspection system having one or more collection systems that receive scattered radiation from a region on a sample surface and direct it to a detector. The polarizing device disposed between the collection system(s) and the detector. The polarizing device may include a plurality of polarizing sections. The sections may be characterized by different polarization characteristics. The polarizing device is configured to transmit scattered radiation from defects to the detector and to block noise from background sources that do not share characteristics with scattered radiation from the defects from reaching the detector while maximizing a capture rate for the defects the detector at a less than optimal signal-to-noise ratio.
摘要翻译：可以使用具有一个或多个收集系统的样本检查系统的偏振装置，其接收来自样品表面上的区域的散射辐射并将其引导到检测器。设置在收集系统和检测器之间的偏振装置。偏振装置可以包括多个偏振部分。这些部分可以具有不同的偏振特性。偏振装置被配置为将来自缺陷的散射辐射传输到检测器并阻止来自不同于来自缺陷的散射辐射的特征的背景源的噪声到达检测器，同时最大化检测器的缺陷的捕获率小于最佳信噪比。

8. 发明授权

US08294887B1 Fast laser power control with improved reliability for surface inspection 有权
标题翻译：快速激光功率控制，提高了表面检测的可靠性
公开(公告)号：US08294887B1
公开(公告)日：2012-10-23
申请号：US12841319
申请日：2010-07-22
申请人： Stephen Biellak , Daniel Kavaldjiev , George J. Kren , Anatoly Romanovsky , Christian Wolters
发明人： Stephen Biellak , Daniel Kavaldjiev , George J. Kren , Anatoly Romanovsky , Christian Wolters
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/95607 , G01N2021/8822 , G01N2201/069
摘要： An inspection system may include, but is not limited to: an illumination subsystem for directing light to an inspection specimen comprising: a power attenuator subsystem configured for altering the power level of a light beam emitted by the illumination subsystem; and a power attenuation control subsystem configured to provide control signals to the power attenuator subsystem according to a detected level of light scattering by the inspection specimen upon illumination by the illumination subsystem. A method for scatterometry inspection may include, but is not limited to: directing light having a power level to an inspection specimen from a light source; detecting light scattered from the specimen; and modifying a power level of one or more intermediate light beams within the light source according to a level of light scattering by the specimen upon illumination by the light source.
摘要翻译：检查系统可以包括但不限于：用于将光引导到检查样本的照明子系统，包括：功率衰减器子系统，被配置为改变由照明子系统发射的光束的功率电平; 以及功率衰减控制子系统，被配置为根据所述照明子系统照明时检测样本的检测到的光散射水平向所述功率衰减子系统提供控制信号。用于散射检查的方法可以包括但不限于：将来自光源的具有功率水平的光引导到检查样本; 检测从样品散射的光; 以及根据光源照射时样品的光散射水平来修改光源内的一个或多个中间光束的功率电平。

9. 发明授权

US07912658B2 Systems and methods for determining two or more characteristics of a wafer 有权
标题翻译：用于确定晶片的两个或多个特性的系统和方法
公开(公告)号：US07912658B2
公开(公告)日：2011-03-22
申请号：US12128426
申请日：2008-05-28
申请人： Stephen Biellak , Daniel Kavaldjiev
发明人： Stephen Biellak , Daniel Kavaldjiev
IPC分类号： G06F19/00
CPC分类号： H01L22/12 , G01N21/9501 , G01N2021/8825 , H01L2924/0002 , H01L2924/00
摘要： Systems and methods for determining two or more characteristics of a wafer are provided. The two or more characteristics include a characteristic of the wafer that is spatially localized in at least one dimension and a characteristic of the wafer that is not spatially localized in two dimensions.
摘要翻译：提供了用于确定晶片的两个或多个特性的系统和方法。两个或更多个特征包括在至少一个维度上空间定位的晶片的特性和晶片在两维空间上不局限的特征。

10. 发明申请

US20100060888A1 COMPUTER-IMPLEMENTED METHODS FOR INSPECTING AND/OR CLASSIFYING A WAFER 有权
标题翻译：用于检查和/或分类WAFER的计算机实现方法
公开(公告)号：US20100060888A1
公开(公告)日：2010-03-11
申请号：US12179260
申请日：2008-07-24
申请人： Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
发明人： Juergen Reich , Louis Vintro , Prasanna Dighe , Andrew Steinbach , Daniel Kavaldjiev , Stephen Biellak
IPC分类号： G01N21/88 , B07C5/02
CPC分类号： H01L22/12 , G01N21/9501 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods for inspecting and/or classifying a wafer are provided. One computer-implemented includes detecting defects on a wafer using one or more defect detection parameters, which are determined based on a non-spatially localized characteristic of the wafer that is determined using output responsive to light scattered from the wafer generated by an inspection system. Another computer-implemented method includes classifying a wafer based on a combination of a non-spatially localized characteristic of the wafer determined using output responsive to light scattered from the wafer generated by an inspection system and a spatially localized characteristic of the wafer determined using the output.
摘要翻译：提供了用于检查和/或分类晶片的计算机实现的方法。一种计算机实现的包括使用一个或多个缺陷检测参数来检测晶片上的缺陷，所述缺陷检测参数是基于使用响应于由检查系统产生的晶片散射的光的输出而确定的晶片的非空间局部特征确定的。另一种计算机实现的方法包括基于使用响应于由检查系统产生的晶片散射的光的输出确定的晶片的非空间局部化特性和使用输出确定的晶片的空间局部化特性的组合来分类晶片。

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