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    • 1. 发明授权
    • Production of transfer material
    • 生产转印材料
    • US4389473A
    • 1983-06-21
    • US203265
    • 1980-11-03
    • Simon L. ScruttonWilliam F. G. MarwickDavid R. Wilson
    • Simon L. ScruttonWilliam F. G. MarwickDavid R. Wilson
    • G03C5/00B41M3/12B44C1/165G03C1/00G03C11/12G03F7/004G03F7/016G03C1/90
    • G03F7/016B41M3/12G03C11/12Y10S430/11
    • Transfer material is prepared by applying to a substrate a layer of a photosensitive material which is insoluble but swellable in the solvent used to develop the image and whose adhesion to the substrate increases on exposure to light, imagewise exposing the material and developing the so-exposed material by treatment with a solvent fully to remove unexposed material from the substrate and, if necessary, treating the remaining areas of the exposed material to render them transferable from the substrate. In this manner the full thickness of the photosensitive material layer may be retained in the final transfer material. In particular, adhesive material may be applied to the layer photosensitive material before imagewise exposure, and the adhesive coated material imagewise exposed and developed to remove photosensitive material and adhesive in the non-exposed areas only to leave adhesive coated image indicia.
    • 转移材料是通过向基材施加一层感光材料,该感光材料在用于显影图像的溶剂中不溶但可溶胀,并且其对基材的粘合性在曝光时增加,成像曝光材料并显影出如此曝光 通过用溶剂完全处理以从基底去除未曝光材料的材料,并且如果需要,处理暴露材料的剩余区域以使其能够从基底转移。 以这种方式,感光材料层的全部厚度可以保留在最终转印材料中。 特别地,可以在成像曝光之前将粘合剂材料施加到层感光材料上,并且将成像曝光和显影的粘合剂涂覆材料去除非曝光区域中的感光材料和粘合剂,仅留下粘合剂涂覆的图像标记。
    • 2. 发明授权
    • Production of transfer material
    • 生产转印材料
    • US4254211A
    • 1981-03-03
    • US959145
    • 1978-11-09
    • Simon L. ScruttonWilliam F. G. MarwickDavid R. Wilson
    • Simon L. ScruttonWilliam F. G. MarwickDavid R. Wilson
    • G03C5/00B41M3/12B44C1/165G03C1/00G03C11/12G03F7/004G03F7/016C03C5/00
    • G03F7/016B41M3/12G03C11/12Y10S430/11
    • Transfer material is prepared by applying to a substrate a layer of a photosensitive material which is insoluble but swellable in the solvent used to develop the image and whose adhesion to the substrate increases on exposure to light, imagewise exposing the material and developing the so-exposed material by treatment with a solvent fully to remove unexposed material from the substrate and, if necessary, treating the remaining areas of the exposed material to render them transferable from the substrate. In this manner the full thickness of the photosensitive material layer may be retained in the final transfer material. In particular, adhesive material may be applied to the layer photosensitive material before imagewise exposure, and the adhesive coated material imagewise exposed and developed to remove photosensitive material and adhesive in the non-exposed areas only to leave adhesive coated image indicia.
    • 转移材料是通过向基材施加一层感光材料,该感光材料在用于显影图像的溶剂中不溶但可溶胀,并且其对基材的粘合性在曝光时增加,成像曝光材料并显影出如此曝光 通过用溶剂完全处理以从基底去除未曝光材料的材料,并且如果需要,处理暴露材料的剩余区域以使其能够从基底转移。 以这种方式,感光材料层的全部厚度可以保留在最终转印材料中。 特别地,可以在成像曝光之前将粘合剂材料施加到层感光材料上,并且将成像曝光和显影的粘合剂涂覆材料去除非曝光区域中的感光材料和粘合剂,仅留下粘合剂涂覆的图像标记。