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    • 6. 发明授权
    • Thin film semiconductor device
    • 薄膜半导体器件
    • US06204519B1
    • 2001-03-20
    • US08813541
    • 1997-03-07
    • Shunpei YamazakiToshiji HamataniTakeshi Fukada
    • Shunpei YamazakiToshiji HamataniTakeshi Fukada
    • H01L2904
    • H01L27/1222H01L27/1214H01L27/1274H01L29/66765H01L29/78618H01L29/78669H01L29/78678H01L29/78696Y10S438/908
    • A thin film semiconductor device comprising a substrate having an insulating surface, gate electrodes disposed on the insulating surface, gate insulating films disposed on upper portions of the gate electrodes, and thin film semiconductors disposed on the gate insulating films and including channel forming regions, source regions and drain regions. Two kinds of thin film semiconductor unit are disposed on the substrate. A first thin film semiconductor unit includes the thin film semiconductor of polycrystal, an insulating film covering an upper portion of the channel forming region, impurity semiconductor films doped with trivalent or pentavalent impurities and covering the source region and the drain region, and conductive films disposed on the impurity semiconductor films. A second thin film semiconductor unit includes the thin film semiconductor of amorphous, and other components similar to the first thin film semiconductor unit.
    • 一种薄膜半导体器件,包括具有绝缘表面的衬底,设置在绝缘表面上的栅极电极,设置在栅极电极的上部的栅极绝缘膜,以及设置在栅极绝缘膜上并且包括沟道形成区域的源极 区域和排水区域。 两种薄膜半导体单元设置在基板上。 第一薄膜半导体单元包括多晶薄膜半导体,覆盖沟道形成区的上部的绝缘膜,掺杂有三价或五价杂质的杂质半导体膜,并覆盖源极区和漏极区,以及设置导电膜 在杂质半导体膜上。 第二薄膜半导体单元包括非晶体的薄膜半导体和类似于第一薄膜半导体单元的其它部件。