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1. 发明授权

US06084664A Method of and apparatus for inspecting reticle for defects 有权
标题翻译：用于检查掩模版的缺陷的方法和装置
公开(公告)号：US06084664A
公开(公告)日：2000-07-04
申请号：US184003
申请日：1998-11-02
申请人： Shunichi Matsumoto , Hiroaki Shishido
发明人： Shunichi Matsumoto , Hiroaki Shishido
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G03F1/32 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66 , G01N21/00
CPC分类号： G01N21/94 , G01N21/956 , G01N21/95607 , G01N21/95623 , G03F1/84
摘要： A reticle inspecting apparatus for inspecting a reticle for defects has a transparent or translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system is capable of separating the gathered light by direction of illumination using detectors, and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates data concerning defects on the basis of the output signals of the detectors and displays the calculated data on a display.
摘要翻译：用于检查用于缺陷的掩模版的掩模版检查装置具有透明或半透明的基板，形成在基板的前表面上的电路图案，以及在基板的前表面上由透光膜形成的移相器。在该装置中，检测光学系统被设置成不会直接聚集反射光并直接透射光，以分散散射光和被散射和衍射的衍射光。该检测光学系统能够通过使用检测器的照明方向分离收集的光，并且分别设置在傅里叶变换平面上的空间滤波器，以截取由电路图案的直边衍射的光，以便在检测器上形成聚光的图像。具有信号处理单元的信号处理系统基于检测器的输出信号来计算关于缺陷的数据，并将计算出的数据显示在显示器上。

2. 发明授权

US5539514A Foreign particle inspection apparatus and method with front and back illumination 失效
标题翻译：具有前后照明的外来颗粒检查装置及方法
公开(公告)号：US5539514A
公开(公告)日：1996-07-23
申请号：US269379
申请日：1994-06-30
申请人： Hiroaki Shishido , Shunichi Matsumoto
发明人： Hiroaki Shishido , Shunichi Matsumoto
IPC分类号： G01N21/94 , G01N21/956 , G01N21/00
CPC分类号： G01N21/956 , G01N21/94
摘要： A method of inspecting a phase shift reticle comprising a transparent or translucent substrate, a circuit pattern of an opaque film formed on the front surface of the substrate and a pattern of a transparent or translucent film formed on the front surface of the substrate comprises: obliquely projecting a front illuminating light beam on the front surface of the substrate by a front illuminating system; concentrating scattered light scattered by the surface of the substrate and the surfaces of the patterns, obliquely projecting a back illuminating light beam on the back surface of the substrate by a back illuminating system, concentrating transmitted-and-diffracted light transmitted and diffracted by the substrate and the patterns; intercepting the scattered light scattered by the patterns and the transmitted-and-diffracted light transmitted and diffracted by the patterns with spatial filters disposed on Fourier transform planes, focusing the scattered light and the transmitted-and-diffracted light transmitted by the spatial filters on detectors; and comparing detection signals provided by the detectors to see if there are any foreign particles on the phase shift reticle.
摘要翻译：检查包括透明或半透明基板的相移掩模版的方法，形成在基板的前表面上的不透明膜的电路图案和形成在基板的前表面上的透明或半透明膜的图案包括：通过前照明系统将前照明光束投影在基板的前表面上; 集中由基板表面和图案表面散射的散射光，通过后照明系统将后照明光束倾斜地投射在基板的背面上，集中由基板透射和衍射的透射衍射光和模式; 截取由图案散射的散射光和通过布置在傅立叶变换平面上的空间滤光片通过图案传输和衍射的透射衍射光，将散射光和由空间滤光器透射的透射衍射光聚焦在检测器 ; 并比较由检测器提供的检测信号，以查看相移掩模版上是否存在任何异物。

3. 发明授权

US06064477A Method of and apparatus for inspecting reticle for defects 失效
标题翻译：用于检查掩模版的缺陷的方法和装置
公开(公告)号：US06064477A
公开(公告)日：2000-05-16
申请号：US644740
申请日：1996-05-10
申请人： Shunichi Matsumoto , Hiroaki Shishido
发明人： Shunichi Matsumoto , Hiroaki Shishido
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G03F1/32 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： G01N21/94 , G01N21/956 , G01N21/95607 , G01N21/95623 , G03F1/84
摘要： A reticle inspecting apparatus for inspecting a reticle for defects has a transparent of translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system enables separation of the gathered light by direction of illumination using detectors and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates defects on the basis of the output signals of the detectors and displays the calculated data on a display.
摘要翻译：用于检查掩模版用于缺陷的掩模版检查装置具有透光性的基板，形成在基板的前表面的电路图案，以及在基板的前表面上由透光膜形成的移相器。在该装置中，检测光学系统被设置成不会直接聚集反射光并直接透射光，以分散散射光和被散射和衍射的衍射光。该检测光学系统能够使用分别设置在傅立叶变换平面上的检测器和空间滤光器的照明方向来分离收集的光以截取由电路图案的直边衍射的光，从而在检测器上形成聚光的图像。具有信号处理单元的信号处理系统基于检测器的输出信号计算缺陷，并将计算出的数据显示在显示器上。

4. 发明授权

US08512916B2 Photomask blank, photomask, and method for manufacturing photomask blank 有权
公开(公告)号：US08512916B2
公开(公告)日：2013-08-20
申请号：US12935766
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto , Morio Hosoya
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto , Morio Hosoya
IPC分类号： G03F1/26 , G03F1/46 , G03F1/50 , G03F1/58
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： A photomask blank for producing a photomask to which an ArF excimer laser light is applied. The blank includes a light transmissive substrate on which a thin film having a multilayer structure is provided. The thin film has a light-shielding film in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order. The light-shielding layer comprises chromium and nitrogen, and the chromium content is more than 50 atomic %. The front-surface antireflection layer and the back-surface antireflection layer each has an amorphous structure made of a material comprising chromium, nitrogen, oxygen and carbon. The chromium content ratio of the front-surface antireflection layer and the back-surface antireflection layer is 40 atomic % or less. A first sum of nitrogen content and oxygen content of the back-surface antireflection layer is less than a second sum of nitrogen content and oxygen content of the front-surface antireflection layer.

5. 发明授权

US08304147B2 Photomask blank, photomask, and method for manufacturing photomask blank 有权
标题翻译：光掩模坯料，光掩模以及制造光掩模坯料的方法
公开(公告)号：US08304147B2
公开(公告)日：2012-11-06
申请号：US12935517
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
IPC分类号： G03F1/20
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the back-surface antireflection layer is made of a film containing a metal and has a first etching rate; the front-surface antireflection layer is made of a film containing a metal and has a third etching rate; the light-shielding layer is made of a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the light-shielding layer is 30% or less of the thickness of the entire light-shielding film.
摘要翻译：本发明提供一种用于制造施加了ArF准分子激光的光掩模的光掩模坯料，其中：在透光基板上设置有遮光膜; 遮光膜具有层叠结构，其中背面防反射层，遮光层和前表面抗反射层从靠近透光基板的一侧依次层叠; 整个遮光膜的厚度为60nm以下; 背面抗反射层由含有金属的膜制成，具有第一蚀刻速率; 前表面抗反射层由含有金属的膜制成，具有第三蚀刻速率; 遮光层由含有与背面防反射层或前表面防反射层中所含的金属相同的金属的膜制成，并且具有比第一蚀刻速率和第三蚀刻速率低的第二蚀刻速率 ; 遮光层的厚度为整个遮光膜的厚度的30％以下。

6. 发明申请

US20110104592A1 PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK 有权
标题翻译： PHOTOMASK BLANK，PHOTOMASK和制造光电隔离层的方法
公开(公告)号：US20110104592A1
公开(公告)日：2011-05-05
申请号：US12935517
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
IPC分类号： G03F1/00
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the back-surface antireflection layer is made of a film containing a metal and has a first etching rate; the front-surface antireflection layer is made of a film containing a metal and has a third etching rate; the light-shielding layer is made of a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the light-shielding layer is 30% or less of the thickness of the entire light-shielding film.
摘要翻译：本发明提供一种用于制造施加了ArF准分子激光的光掩模的光掩模坯料，其中：在透光基板上设置有遮光膜; 遮光膜具有层叠结构，其中背面防反射层，遮光层和前表面抗反射层从靠近透光基板的一侧依次层叠; 整个遮光膜的厚度为60nm以下; 背面抗反射层由含有金属的膜制成，具有第一蚀刻速率; 前表面抗反射层由含有金属的膜制成，具有第三蚀刻速率; 遮光层由含有与背面防反射层或前表面防反射层中所含的金属相同的金属的膜制成，并且具有比第一蚀刻速率和第三蚀刻速率低的第二蚀刻速率 ; 遮光层的厚度为整个遮光膜的厚度的30％以下。

7. 发明申请

US20070052955A1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20070052955A1
公开(公告)日：2007-03-08
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

8. 发明授权

US07132669B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07132669B2
公开(公告)日：2006-11-07
申请号：US11184981
申请日：2005-07-20
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：一种检查装置和方法，包括利用发射紫外激光束的激光源，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和用于照射具有偏振状态的样本的物镜，并且通过物镜减少紫外激光束的相干性。检测光学系统包括成像透镜和用于检测通过照明光学系统由紫外线激光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

9. 发明申请

US20060063335A1 Semiconductor device 有权
公开(公告)号：US20060063335A1
公开(公告)日：2006-03-23
申请号：US10967657
申请日：2004-10-19
申请人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
发明人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
IPC分类号： H01L21/336 , H01L21/3205
CPC分类号： H01L29/7813 , H01L29/0619 , H01L29/0634 , H01L29/0692 , H01L29/0696 , H01L29/4238 , H01L29/66348 , H01L29/7397 , H01L29/7811 , H01L29/872
摘要： A technique for improving a ruggedness of a transistor against breakdown is provided. In a transistor of the present invention, a height of filling regions is higher than that of buried regions, so that a withstanding voltage of the filling regions is higher than that of the buried regions. Therefore, since avalanche breakdown occurs in an active region, causing an avalanche breakdown current to flow through the active region having a large area, current concentration does not occur. As a result, a ruggedness of an element against breakdown is increased.

10. 发明授权

US06921905B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US06921905B2
公开(公告)日：2005-07-26
申请号：US10947262
申请日：2004-09-23
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： Inspection apparatus and method in which laser source emits a laser beam and a coherence of the laser beam emitted from the laser source is reduced by a coherence reducer. A detector detects light from the sample irradiated with the coherence reduced laser beam and a processor processes a signal outputted from the detector and detects a defect on the sample. The coherence reducer has an optical path which includes a plurality of at least one of optical fibers and glass rods.
摘要翻译：激光源发射激光束的检查装置和方法，并且通过相干减少器减少从激光源发射的激光束的相干性。检测器检测来自用相干减少的激光束照射的样品的光，处理器处理从检测器输出的信号，并检测样品上的缺陷。相干减光器具有包括光纤和玻璃棒中的至少一个的光路。

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