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1. 发明申请

US20050018284A1 Two axis stage for microscope 有权
标题翻译：显微镜两轴平台
公开(公告)号：US20050018284A1
公开(公告)日：2005-01-27
申请号：US10825131
申请日：2004-04-16
申请人： Shuichi Nakagawa , Eiichi Seya
发明人： Shuichi Nakagawa , Eiichi Seya
IPC分类号： G01N23/225 , G02B21/26 , H01J37/20 , H01L21/68
CPC分类号： G02B21/26
摘要： A two axis stage for microscopes that is thin, has reduced vibration, and is adapted for increased stage transportation speeds is capable of being disposed inside a chamber without changing a floor-projected area. The XY stage comprises a base 1, an X table 2 that can be moved in an X direction on the base 1 by an X feed screw 7, and a Y table 3 that is supported on the X table 2 and movable in a Y direction. A third table 4 is disposed on the base 1, the third table being movable in the Y direction by a Y-feed screw 8 positioned on the base 1. Additionally, a slide unit 14 is disposed on the third table 4, the slide unit 14 being movable in the X direction and connected with the Y table 3.
摘要翻译：用于显微镜的双轴平台，具有减小的振动，并且适于增加平台传送速度能够设置在室内而不改变地面投影面积。 XY台包括基座1，可以通过X馈送螺钉7在基座1上沿X方向移动的X台2和支撑在X台2上并可沿Y方向移动的Y台3 。第三台4设置在基座1上，第三工作台可以通过位于基座1上的Y形进给螺钉8在Y方向上移动。此外，滑动单元14设置在第三工作台4上，滑动单元 14可沿X方向移动并与Y台3连接。

2. 发明授权

US06943945B2 Two axis state for microscope 有权
标题翻译：显微镜双轴状态
公开(公告)号：US06943945B2
公开(公告)日：2005-09-13
申请号：US10825131
申请日：2004-04-16
申请人： Shuichi Nakagawa , Eiichi Seya
发明人： Shuichi Nakagawa , Eiichi Seya
IPC分类号： G01N23/225 , G02B21/26 , H01J37/20 , H01L21/68
CPC分类号： G02B21/26
摘要： A two axis stage for microscopes that is thin, has reduced vibration, and is adapted for increased stage transportation speeds is capable of being disposed inside a chamber without changing a floor-projected area. The XY stage comprises a base 1, an X table 2 that can be moved in an X direction on the base 1 by an X feed screw 7, and a Y table 3 that is supported on the X table 2 and movable in a Y direction. A third table 4 is disposed on the base 1, the third table being movable in the Y direction by a Y-feed screw 8 positioned on the base 1. Additionally, a slide unit 14 is disposed on the third table 4, the slide unit 14 being movable in the X direction and connected with the Y table 3.
摘要翻译：用于显微镜的双轴平台，具有减小的振动，并且适于增加平台传送速度能够设置在室内而不改变地面投影面积。 XY台包括基座1，可以通过X馈送螺钉7在基座1上沿X方向移动的X台2和支撑在X台2上并可沿Y方向移动的Y台3 。第三台4设置在基座1上，第三台可以通过位于基座1上的Y形进给螺钉8沿Y方向移动。此外，滑动单元14设置在第三工作台4上，滑动单元14可沿X方向移动并与Y工作台3连接。

3. 发明授权

US07514683B2 Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US07514683B2
公开(公告)日：2009-04-07
申请号：US11655275
申请日：2007-01-19
申请人： Kazuma Tanii , Yuji Kasai , Katsuhiro Sasada , Eiichi Seya
发明人： Kazuma Tanii , Yuji Kasai , Katsuhiro Sasada , Eiichi Seya
IPC分类号： H01J37/28
CPC分类号： G01N23/2251 , H01J37/28 , H01J2237/004 , H01J2237/216 , H01J2237/24564
摘要： Disclosed is a scanning electron microscope capable of performing speedy focusing by automatically measuring an electrostatic voltage of a surface of a wafer inside a specimen chamber in an accurate, and easy speedy manner, the wafer assuming different electrostatic voltages inside and outside the specimen chamber. The scanning electron microscope that controls optical systems measures an electrostatic voltage of the specimen according to an electrostatic capacitance between the both parts of the divided electrode plate, by dividing an electrode plate into two parts and switching potentials of electrodes obtained by the division with each other, an electrostatic voltage of the specimen based on an electrostatic capacitance between the both parts of the divided electrode plate. The electrode plate is used for applying a retarding voltage and arranged over a specimen.
摘要翻译：公开了一种扫描电子显微镜，其能够以准确且容易的方式自动测量样品室内的晶片表面的静电电压，从而在晶片内部和外部具有不同的静电电压来进行快速聚焦。控制光学系统的扫描电子显微镜通过将电极板分成两部分并通过彼此分割获得的电极的切换电位来测量根据分隔电极板的两个部分之间的静电电容的样品的静电电压基于分割电极板的两个部分之间的静电电容的试样的静电电压。电极板用于施加延迟电压并且布置在试样上。

4. 发明授权

US06794663B2 Method and apparatus for specimen fabrication 有权
公开(公告)号：US06794663B2
公开(公告)日：2004-09-21
申请号：US10699853
申请日：2003-11-04
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21G500
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

5. 发明授权

US07897936B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07897936B2
公开(公告)日：2011-03-01
申请号：US11822386
申请日：2007-07-05
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21K1/00
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
摘要翻译：相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品通过转动样品台来控制切片。

6. 发明申请

US20080211349A1 Stage Mechanism, Electron Microscope Having the Stage Mechanism and Method of Controlling Positioning of Stage Mechanism 失效
标题翻译：舞台机制，具有阶段机制的电子显微镜和控制舞台机构定位的方法
公开(公告)号：US20080211349A1
公开(公告)日：2008-09-04
申请号：US12038358
申请日：2008-02-27
申请人： Eiichi Seya , Takashi Nagamatsu
发明人： Eiichi Seya , Takashi Nagamatsu
IPC分类号： H01L41/09 , H01J37/26 , H02N2/00
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20264 , H01J2237/20278 , H02N2/0025 , H02N2/026 , H02N2/028
摘要： An electron microscope stage mechanism capable of performing high-accuracy positioning while limiting vibration and drift. An ultrasonic motor is used in a stage drive mechanism, and a fixing mechanism capable of increasing stop stiffness is combined integrally with the motor. That is, a structure in which a piezoelectric actuator of the fixing mechanism is mounted in a pre-load mechanism together with the ultrasonic motor is used. When the stage is fixed by the fixing mechanism after acceleration, deceleration and positioning of the stage performed by the drive mechanism, the piezoelectric actuators positioned on opposite sides of the stage are extended to press the stage.
摘要翻译：一种能够在限制振动和漂移的同时执行高精度定位的电子显微镜载物台机构。在舞台驱动机构中使用超声波马达，并且与马达一体地组合能够增加止动刚度的固定机构。也就是说，使用将固定机构的压电致动器与超声波马达一起安装在预加载机构中的结构。当通过驱动机构进行加速，减速和定位后，通过固定机构固定载物台时，位于载物台相对两侧的压电致动器被延伸以压下载物台。

7. 发明授权

US5562800A Wafer transport method 失效
标题翻译：晶圆输送方式
公开(公告)号：US5562800A
公开(公告)日：1996-10-08
申请号：US308442
申请日：1994-09-19
申请人： Yoshio Kawamura , Yoshifumi Kawamoto , Fumihiko Uchida , Kenichi Mizuishi , Natsuki Yokoyama , Eiichi Murakami , Yoshinori Nakayama , Eiichi Seya
发明人： Yoshio Kawamura , Yoshifumi Kawamoto , Fumihiko Uchida , Kenichi Mizuishi , Natsuki Yokoyama , Eiichi Murakami , Yoshinori Nakayama , Eiichi Seya
IPC分类号： B65G49/00 , B65G49/07 , H01L21/00 , H01L21/02 , H01L21/027 , H01L21/677
CPC分类号： H01L21/67748 , H01L21/67167 , H01L21/6719 , H01L21/67196 , H01L21/67742 , Y10S414/135 , Y10S414/139 , Y10S438/935
摘要： A wafer transport method includes the steps of preparing a semiconductor process equipment having a transport chamber and a process chamber. An interface means connects the transport chamber to the process chamber. A transport means transports a semiconductor wafer from the transport chamber to the process chamber by way of the interface means. The transport means mounting a substrate is inserted into a communicating corridor including a supply means and an exhaust means. The substrate is transported while performing the supply and exhaust by sequentially controlling a supply shutoff means, an exhaust shutoff means, and a communicating shutoff means according to the position of a conductance part formed of a gap between the transport means and the communicating corridor. Thus, the substrate is transported at a high throughput without contamination of the substrate while keeping the different atmospheric conditions for the transport chamber and the process chamber, thereby manufacturing a semiconductor device with high performance capabilities.
摘要翻译：晶片输送方法包括准备具有输送室和处理室的半导体工艺设备的步骤。接口装置将输送室连接到处理室。传送装置通过接口装置将半导体晶片从传送室传送到处理室。安装基板的输送装置被插入到包括供给装置和排气装置的通信走廊中。通过根据由输送装置和通信走廊之间的间隙形成的电导部分的位置依次控制供给切断装置，排气关闭装置和通信切断装置，在进行供给和排出的同时运送基板。因此，在保持输送室和处理室的不同大气条件的同时，以高通量输送基板而不污染基板，从而制造具有高性能的半导体器件。

8. 发明授权

US08796651B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US08796651B2
公开(公告)日：2014-08-05
申请号：US12929396
申请日：2011-01-20
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21G5/00
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
摘要翻译：相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品通过转动样品台来控制切片。

9. 发明授权

US07791043B2 Stage mechanism, electron microscope having the stage mechanism and method of controlling positioning of stage mechanism 失效
标题翻译：舞台机制，具有阶段机制的电子显微镜和控制舞台机构定位的方法
公开(公告)号：US07791043B2
公开(公告)日：2010-09-07
申请号：US12038358
申请日：2008-02-27
申请人： Eiichi Seya , Takashi Nagamatsu
发明人： Eiichi Seya , Takashi Nagamatsu
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20264 , H01J2237/20278 , H02N2/0025 , H02N2/026 , H02N2/028
摘要： An electron microscope stage mechanism capable of performing high-accuracy positioning while limiting vibration and drift. An ultrasonic motor is used in a stage drive mechanism, and a fixing mechanism capable of increasing stop stiffness is combined integrally with the motor. That is, a structure in which a piezoelectric actuator of the fixing mechanism is mounted in a pre-load mechanism together with the ultrasonic motor is used. When the stage is fixed by the fixing mechanism after acceleration, deceleration and positioning of the stage performed by the drive mechanism, the piezoelectric actuators positioned on opposite sides of the stage are extended to press the stage.
摘要翻译：一种能够在限制振动和漂移的同时执行高精度定位的电子显微镜载物台机构。在舞台驱动机构中使用超声波马达，并且与马达一体地组合能够增加止动刚度的固定机构。也就是说，使用将固定机构的压电致动器与超声波马达一起安装在预加载机构中的结构。当通过驱动机构进行加速，减速和定位后，通过固定机构固定载物台时，位于载物台相对两侧的压电致动器被延伸以压下载物台。

10. 发明授权

US5420436A Methods for measuring optical system, and method and apparatus for exposure using said measuring method 失效
标题翻译：用于测量光学系统的方法，以及使用所述测量方法进行曝光的方法和装置
公开(公告)号：US5420436A
公开(公告)日：1995-05-30
申请号：US155857
申请日：1993-11-23
申请人： Eiichi Seya , Massaaki Ito , Soichi Katagiri , Tsuneo Terasawa , Minoru Hidaka , Eiji Takeda , Norio Saitou
发明人： Eiichi Seya , Massaaki Ito , Soichi Katagiri , Tsuneo Terasawa , Minoru Hidaka , Eiji Takeda , Norio Saitou
IPC分类号： G01M11/02 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/00 , G01B9/02
CPC分类号： G03F7/70233
摘要： A technique and exposure apparatus measures, with a high degree of accuracy, figure and placement errors of individual optical elements constituting optics embedded inside of an exposure apparatus or the like, with the optics kept in an embedded state as they are. The system measures the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed. Optimal displacements of reflective surfaces constituting the optics are then found by calculation based on the measured distribution of wave-front distortions. Finally, the positions of the reflective surfaces are corrected in accordance with the calculated optimal displacements. The positions of the reflective surfaces are corrected by individually controlling displacements output by a plurality of actuators attached to each reflective surface and by mechanically modifying appropriate portions of the reflective surfaces.
摘要翻译：技术和曝光装置以高度精确度的方式测量构成放置在曝光装置内部的光学元件的各个光学元件的图形和放置误差，其中光学器件保持处于嵌入状态。该系统在改变光源的位置和观察到的光学元件的曝光场内的图像点的同时测量光学器件中的波前失真的分布。然后通过基于波前失真的测量分布的计算来找到构成光学器件的反射表面的最佳位移。最后，根据计算出的最佳位移校正反射面的位置。通过单独地控制由附接到每个反射表面的多个致动器输出的位移以及通过机械地改变反射表面的适当部分来校正反射表面的位置。

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