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    • 1. 发明授权
    • Method of manufacturing photovoltaic device
    • 制造光伏器件的方法
    • US4755475A
    • 1988-07-05
    • US15691
    • 1987-02-17
    • Seiichi KiyamaYasuaki YamamotoHideki ImaiYutaka Hirono
    • Seiichi KiyamaYasuaki YamamotoHideki ImaiYutaka Hirono
    • H01L27/142H01L31/0224H01L31/18
    • H01L31/022425H01L31/046H01L31/0463Y02E10/50Y10S148/093Y10S148/153Y10S438/94
    • A method of manufacturing a photovoltaic device, in which a plurality of photoelectric conversion elements comprising a first electrode layer, a semiconductive layer and a second electrode layer are laminatedly arranged on an insulative surface of a substrate and said photoelectric conversion elements are electrically connected in series with each other, comprising a step of dividedly arranging the first electrode layer on the surface of the substrate, a step of coating the semiconductive layer on the surface of the substrate including the upper surface of the divided first electrode layer, a step of coating the second electrode layer on the semiconductive layer, and a step of dividing the semiconductive layer and/or the second electrode layer in order to define each element by irradiating energy-beams on the semiconductive layer and/or the second electrode layer. The formation of a low resistance layer in the semiconductive layer and a residual molten second electrode layer can be prevented by using energy-beams having an energy-distribution substantially uniform over the entire irradiated zone. In addition, short-circuits between the adjacent photoelectric conversion elements can be prevented.
    • 一种制造光电器件的方法,其中包括第一电极层,半导体层和第二电极层的多个光电转换元件被层叠地布置在基板的绝缘表面上,并且所述光电转换元件串联电连接 彼此包括在基板的表面上分割配置第一电极层的步骤,在包含分割的第一电极层的上表面的基板的表面上涂布半导体层的工序, 第二电极层,以及分隔半导电层和/或第二电极层以便通过在半导体层和/或第二电极层上照射能量束来限定每个元件的步骤。 通过使用在整个照射区域上具有基本均匀的能量分布的能量束,可以防止在半导体层中形成低电阻层和剩余熔融的第二电极层。 此外,可以防止相邻光电转换元件之间的短路。
    • 2. 发明授权
    • Photovoltaic device
    • 光伏装置
    • US4981525A
    • 1991-01-01
    • US308390
    • 1989-02-09
    • Seiichi KiyamaHiroshi HosokawaYutaka Hirono
    • Seiichi KiyamaHiroshi HosokawaYutaka Hirono
    • H01L27/142H01L31/0392H01L31/078
    • H01L31/03921H01L31/046H01L31/0463H01L31/0465H01L31/078Y02E10/50
    • A metallic insulative substrate having its surface coated with an insulative layer, on which a large number of photoelectric converter elements are electrically connected to each other in series by connecting the first back electrode layer of one of photoelectric converter elements adjoining each other with the second back electrode layer of the other. Accordingly, electrical connection of these electrode layers in series does not affect the effective area used for photoelectric conversion. This constitution also improves heat resistance of the insulative substrate. Electrical contact of the transparent light-receiving electrode layer) and the second back electrode layer is achieved via contact holes each having a diameter identical to the diameter of those of the insulative and semiconductive layers. As a result, a sufficient insulative distance is provided between the transparent electrode layer and the first back electrode layer so that occurrence of accidental shortcircuit can be securely prevented.
    • 一种金属绝缘基板,其表面涂有绝缘层,多个光电转换元件通过将彼此相邻的一个光电转换元件的第一背面电极层与第二个背面连接而彼此电连接, 电极层的另一面。 因此,串联的这些电极层的电连接不影响用于光电转换的有效面积。 该结构也提高了绝缘基板的耐热性。 透明受光电极层的电接触)和第二背面电极层的接触孔通过直径与绝缘层和半导体层的直径相同的直径来实现。 结果,在透明电极层和第一背面电极层之间设置了足够的绝缘距离,从而能够可靠地防止意外的短路的发生。
    • 3. 发明授权
    • Dry-etching method
    • 干蚀刻法
    • US5024724A
    • 1991-06-18
    • US423535
    • 1989-10-16
    • Yutaka HironoSeiichi KiyamaMasato Osumi
    • Yutaka HironoSeiichi KiyamaMasato Osumi
    • C23F4/02H01L21/321H01L21/3213
    • C23F4/02H01L21/32105H01L21/32136
    • The present invention relates to a novel dry-etching method for patterning a metallic film, whose surface is provided with an oxidized film, into an optional configuration by the use of the oxidized film. After drawing etching patterns of the metallic film by irradiating energy beam to the oxidized film formed on the surface of the metallic film, the dry-etching method according to the present invention causes the metallic film to expose itself to either radicals of reactive gas or to etching gas, and then selectively removes the area of metallic film in correspondence to the beam irradiated area of the oxidized film by applying chemical etching, thus eventually allowing the metallic film to be patterned into an optional configuration, without incuring physical damage to the etching face of the metallic film.
    • 本发明涉及通过使用氧化膜将具有氧化膜的金属膜图案化成可选构造的新型干法蚀刻方法。 在通过将能量束照射到形成在金属膜的表面上的氧化膜来蚀刻金属膜的图案之后,根据本发明的干式蚀刻方法使金属膜自身暴露于反应气体的自由基或 蚀刻气体,然后通过施加化学蚀刻来选择性地去除与氧化膜的射束照射区域相对应的金属膜的区域,从而最终使金属膜被图案化成可选择的构造,而不会对蚀刻面造成物理损伤 的金属膜。
    • 4. 发明授权
    • Color recognition camera
    • 彩色识别相机
    • US06803956B1
    • 2004-10-12
    • US09591990
    • 2000-06-12
    • Yutaka Hirono
    • Yutaka Hirono
    • H04N314
    • H04N9/045
    • A color-recognition camera comprises a red-green-blue CCD-imaging device that provides an analog RGB-video signal. A set of three analog-to-digital converters convert the analog RGB-video signal into a digital RGB-video signal. A digital comparator tests the digital RGB-video signal pixel-by-pixel for a match against a color setpoint. If a match occurs, a pixel with a particular color represented by the color setpoint has been recognized and a “hit” is output. A pixel address counter provides a pixel address output each time a “hit” is registered. The number of hits per video frame are accumulated, and a color-match area magnitude value is output for each frame. Alternatively, neural networks are used to indicate hits when a pixel in the video image comes close enough to the color setpoint value. Just how close can be “learned” by the neural network.
    • 彩色识别摄像机包括提供模拟RGB视频信号的红绿蓝CCD成像装置。 一组三个模拟 - 数字转换器将模拟RGB视频信号转换为数字RGB视频信号。 数字比较器逐像素测试数字RGB视频信号,以匹配颜色设定点。 如果发生匹配,则已经识别出具有由颜色设定点表示的特定颜色的像素,并且输出“命中”。 像素地址计数器在每次注册“命中”时提供像素地址输出。 累积每个视频帧的命中数,并为每一帧输出一个颜色匹配区域幅度值。 或者,当视频图像中的像素接近于颜色设定值时,神经网络用于指示命中。 神经网络可以“学习”多么接近。