专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080113511A1 Method of forming fine patterns using double patterning process 有权
标题翻译：使用双重图案化工艺形成精细图案的方法
公开(公告)号：US20080113511A1
公开(公告)日：2008-05-15
申请号：US11730264
申请日：2007-03-30
申请人： Sang-joon Park , Yong-hyun Kwon , Jun Seo , Sung-il Cho , Chang-jin Kang , Jae-kyu Ha
发明人： Sang-joon Park , Yong-hyun Kwon , Jun Seo , Sung-il Cho , Chang-jin Kang , Jae-kyu Ha
IPC分类号： H01L21/311
CPC分类号： H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76816 , H01L21/76897
摘要： A double pattern method of forming a plurality of contact holes in a material layer formed on a substrate is disclosed. The method forms a parallel plurality of first hard mask patterns separated by a first pitch in a first direction on the material layer, a self-aligned parallel plurality of second hard mask patterns interleaved with the first hard mask patterns and separated from the first hard mask patterns by a buffer layer to form composite mask patterns, and a plurality of upper mask patterns in a second direction intersecting the first direction to mask selected portions of the buffer layer in conjunction with the composite mask patterns. The method then etches non-selected portions of the buffer layer using the composite hard mask patterns and the upper mask patterns as an etch mask to form a plurality of hard mask holes exposing selected portions of the material layer, and then etches the selected portions of the material layer to form the plurality of contact holes.
摘要翻译：公开了一种在形成在基板上的材料层中形成多个接触孔的双重图案方法。该方法形成在材料层上沿第一方向以第一间距分开的平行多个第一硬掩模图案，与第一硬掩模图案交错并与第一硬掩模分离的自对准并行多个第二硬掩模图案通过缓冲层形成图案以形成复合掩模图案，以及与第一方向相交的第二方向的多个上掩模图案，以与复合掩模图案一起掩蔽缓冲层的选定部分。然后，该方法使用复合硬掩模图案和上掩模图案作为蚀刻掩模蚀刻缓冲层的未选择部分，以形成暴露材料层的选定部分的多个硬掩模孔，然后蚀刻所选择的部分所述材料层形成所述多个接触孔。

2. 发明授权

US07531449B2 Method of forming fine patterns using double patterning process 有权
标题翻译：使用双重图案化工艺形成精细图案的方法
公开(公告)号：US07531449B2
公开(公告)日：2009-05-12
申请号：US11730264
申请日：2007-03-30
申请人： Sang-joon Park , Yong-hyun Kwon , Jun Seo , Sung-il Cho , Chang-jin Kang , Jae-kyu Ha
发明人： Sang-joon Park , Yong-hyun Kwon , Jun Seo , Sung-il Cho , Chang-jin Kang , Jae-kyu Ha
IPC分类号： H01L21/4763
CPC分类号： H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76816 , H01L21/76897
摘要： A double pattern method of forming a plurality of contact holes in a material layer formed on a substrate is disclosed. The method forms a parallel plurality of first hard mask patterns separated by a first pitch in a first direction on the material layer, a self-aligned parallel plurality of second hard mask patterns interleaved with the first hard mask patterns and separated from the first hard mask patterns by a buffer layer to form composite mask patterns, and a plurality of upper mask patterns in a second direction intersecting the first direction to mask selected portions of the buffer layer in conjunction with the composite mask patterns. The method then etches non-selected portions of the buffer layer using the composite hard mask patterns and the upper mask patterns as an etch mask to form a plurality of hard mask holes exposing selected portions of the material layer, and then etches the selected portions of the material layer to form the plurality of contact holes.
摘要翻译：公开了一种在形成在基板上的材料层中形成多个接触孔的双重图案方法。该方法形成在材料层上沿第一方向以第一间距分开的平行多个第一硬掩模图案，与第一硬掩模图案交错并与第一硬掩模分离的自对准并行多个第二硬掩模图案通过缓冲层形成图案以形成复合掩模图案，以及与第一方向相交的第二方向的多个上掩模图案，以与复合掩模图案一起掩蔽缓冲层的选定部分。然后，该方法使用复合硬掩模图案和上掩模图案作为蚀刻掩模蚀刻缓冲层的未选择部分，以形成暴露材料层的选定部分的多个硬掩模孔，然后蚀刻所选择的部分所述材料层形成所述多个接触孔。

3. 发明授权

US07723191B2 Method of manufacturing semiconductor device having buried gate 有权
标题翻译：制造具有掩埋栅极的半导体器件的方法
公开(公告)号：US07723191B2
公开(公告)日：2010-05-25
申请号：US12000496
申请日：2007-12-13
申请人： Eun-young Kang , Jun Seo , Jae-seung Hwang , Sung-il Cho , Yong-hyun Kwon
发明人： Eun-young Kang , Jun Seo , Jae-seung Hwang , Sung-il Cho , Yong-hyun Kwon
IPC分类号： H01L21/336
CPC分类号： H01L21/823456 , H01L21/823481 , H01L27/105 , H01L27/1052
摘要： A method of manufacturing a semiconductor device having buried gates may include forming a stacked structure of sequentially stacked first mask patterns and second mask patterns with equal widths to expose active regions and isolation regions of a semiconductor substrate. After forming reduced first mask patterns by decreasing the width only of the first mask patterns, trenches may be formed in the active regions and the isolation regions by etching the exposed portions of the semiconductor substrate using the second mask patterns as an etch mask. Then, gate insulating films may be formed on inner walls of the trenches in the active regions, and a conductive material may be buried into the trenches in the active regions and the isolation regions to form gates.
摘要翻译：制造具有掩埋栅极的半导体器件的方法可以包括形成具有相等宽度的顺序层叠的第一掩模图案和第二掩模图案的叠层结构，以暴露半导体衬底的有源区和隔离区。在通过仅减小第一掩模图案的宽度来形成减小的第一掩模图案之后，可以通过使用第二掩模图案作为蚀刻掩模蚀刻半导体衬底的暴露部分来在有源区域和隔离区域中形成沟槽。然后，栅极绝缘膜可以形成在有源区域中的沟槽的内壁上，并且导电材料可以被埋入有源区域和隔离区域中的沟槽中以形成栅极。

4. 发明申请

US20080146002A1 Method of manufacturing semiconductor device having buried gate 有权
标题翻译：制造具有掩埋栅极的半导体器件的方法
公开(公告)号：US20080146002A1
公开(公告)日：2008-06-19
申请号：US12000496
申请日：2007-12-13
申请人： Eun-young Kang , Jun Seo , Jae-seung Hwang , Sung-il Cho , Yong-hyun Kwon
发明人： Eun-young Kang , Jun Seo , Jae-seung Hwang , Sung-il Cho , Yong-hyun Kwon
IPC分类号： H01L21/76
CPC分类号： H01L21/823456 , H01L21/823481 , H01L27/105 , H01L27/1052
摘要： A method of manufacturing a semiconductor device having buried gates may include forming a stacked structure of sequentially stacked first mask patterns and second mask patterns with equal widths to expose active regions and isolation regions of a semiconductor substrate. After forming reduced first mask patterns by decreasing the width only of the first mask patterns, trenches may be formed in the active regions and the isolation regions by etching the exposed portions of the semiconductor substrate using the second mask patterns as an etch mask. Then, gate insulating films may be formed on inner walls of the trenches in the active regions, and a conductive material may be buried into the trenches in the active regions and the isolation regions to form gates.
摘要翻译：制造具有掩埋栅极的半导体器件的方法可以包括形成具有相等宽度的顺序层叠的第一掩模图案和第二掩模图案的叠层结构，以暴露半导体衬底的有源区和隔离区。在通过仅减小第一掩模图案的宽度来形成减小的第一掩模图案之后，可以通过使用第二掩模图案作为蚀刻掩模蚀刻半导体衬底的暴露部分来在有源区域和隔离区域中形成沟槽。然后，栅极绝缘膜可以形成在有源区域中的沟槽的内壁上，并且导电材料可以被埋入有源区域和隔离区域中的沟槽中，以形成栅极。

5. 发明授权

US07749902B2 Methods of manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US07749902B2
公开(公告)日：2010-07-06
申请号：US11825272
申请日：2007-06-05
申请人： Hyun-chul Kim , Sung-il Cho , Jae-seung Hwang , Jun Sen , Yong-hyun Kwon
发明人： Hyun-chul Kim , Sung-il Cho , Jae-seung Hwang , Jun Sen , Yong-hyun Kwon
IPC分类号： H01L21/44 , H01L21/302 , H01L21/461 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： H01L21/31144 , H01L21/0337 , H01L21/0338 , Y10S438/942 , Y10S438/946 , Y10S438/947
摘要： Provided is a method of manufacturing a semiconductor device using double patterning. The method includes: forming a first material layer pattern having recesses in a first direction on an object layer and a second material layer pattern formed on the first material layer pattern; selectively etching the second material layer pattern and the first material layer pattern in a direction perpendicular to the first direction to form an etching mask; and etching the object layer to form minute patterns.
摘要翻译：提供了使用双重图案化制造半导体器件的方法。该方法包括：在物体层上形成具有沿第一方向的凹陷的第一材料层图案和形成在第一材料层图案上的第二材料层图案; 在与第一方向垂直的方向上选择性蚀刻第二材料层图案和第一材料层图案以形成蚀刻掩模; 并蚀刻目标层以形成微小的图案。

6. 发明申请

US20080194108A1 Methods of manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20080194108A1
公开(公告)日：2008-08-14
申请号：US11825272
申请日：2007-06-05
申请人： Hyun-chul Kim , Sung-il Cho , Jae-seung Hwang , Jun Sen , Yong-hyun Kwon
发明人： Hyun-chul Kim , Sung-il Cho , Jae-seung Hwang , Jun Sen , Yong-hyun Kwon
IPC分类号： H01L21/311
CPC分类号： H01L21/31144 , H01L21/0337 , H01L21/0338 , Y10S438/942 , Y10S438/946 , Y10S438/947
摘要： Provided is a method of manufacturing a semiconductor device using double patterning. The method includes: forming a first material layer pattern having recesses in a first direction on an object layer and a second material layer pattern formed on the first material layer pattern; selectively etching the second material layer pattern and the first material layer pattern in a direction perpendicular to the first direction to form an etching mask; and etching the object layer to form minute patterns.
摘要翻译：提供了使用双重图案化制造半导体器件的方法。该方法包括：在物体层上形成具有沿第一方向的凹陷的第一材料层图案和形成在第一材料层图案上的第二材料层图案; 在与第一方向垂直的方向上选择性蚀刻第二材料层图案和第一材料层图案以形成蚀刻掩模; 并蚀刻目标层以形成微小的图案。

7. 发明授权

US07267046B2 Bread maker 失效
标题翻译：面包机
公开(公告)号：US07267046B2
公开(公告)日：2007-09-11
申请号：US10805477
申请日：2004-03-22
申请人： Jae-ryong Park , Yong-hyun Kwon , Chul Kim , Tae-uk Lee , Han-jun Sung , Jang-woo Lee , Dong-bin Lim
发明人： Jae-ryong Park , Yong-hyun Kwon , Chul Kim , Tae-uk Lee , Han-jun Sung , Jang-woo Lee , Dong-bin Lim
IPC分类号： A47J27/62 , A47J37/01
CPC分类号： A21B7/005
摘要： A bread maker including a main body forming an oven compartment; upper and lower kneading drums spaced from each other in upper and lower parts inside the oven compartment to hold opposite ends of a mixing bag, respectively, and to wind opposite ends of the mixing bag is provided. Further, a pair of tray members is disposed between the upper and lower kneading drums facing each other to form a slit to pass the mixing bag therethrough. The bread maker also includes tray holder members to be combined with opposite ends of a pair of tray members; a pair of guides mounted on inner sidewalls of the oven compartment facing each other to slidably guide the tray holder members by being slidingly combined with the tray holder members; and a shock absorber between the tray holder member and the guide. Accordingly, the shock absorber between the guide and the tray holder member prevents the tray holder member from minute movement while placed in the guide. Consequently, noise occurring due to direct contract of the guides with the tray holder members can be prevented, thereby providing the user with an improved and reliable bread maker.
摘要翻译：一种面包机，包括形成烘箱的主体; 上部和下部捏合桶分别在烘箱室内的上部和下部彼此间隔开，以分别保持混合袋的相对两端，并且提供了混合袋的相对端。此外，一对托盘构件设置在彼此面对的上和下捏合桶之间以形成狭缝以使混合袋通过。面包机还包括与一对托盘构件的相对端组合的盘托架构件; 一对引导件，其安装在彼此面对的烤箱室的内侧壁上，以通过与托盘保持器构件滑动地组合来可滑动地引导托盘保持器构件; 以及在托盘保持器构件和引导件之间的减震器。因此，引导件和托盘保持器构件之间的减震器防止托架保持器构件在放置在引导件中时微小移动。因此，可以防止由于导向件与托盘保持器构件的直接收缩而产生的噪音，从而为用户提供改进和可靠的面包机。

8. 发明授权

US07168362B2 Bread maker and control method thereof 失效
标题翻译：面包机及其控制方法
公开(公告)号：US07168362B2
公开(公告)日：2007-01-30
申请号：US10390012
申请日：2003-03-18
申请人： Yong-hyun Kwon , Dong-bin Lim , Jang-woo Lee
发明人： Yong-hyun Kwon , Dong-bin Lim , Jang-woo Lee
IPC分类号： A21B1/00
CPC分类号： A21B7/005
摘要： A bread maker including a main body forming an oven compartment; a pair of kneading drums inside the oven compartment, each kneading drum having a holding part holding opposite ends of a mixing bag filled with bread ingredients; a drum driving part rotating the kneading drums in clockwise and counterclockwise directions to knead dough contained in the mixing bag; and a controller controlling the drum driving part to separate the mixing bag from the holding part of a first one of the kneading drums and wind the mixing bag on a second one of the kneading drums after kneading the dough, and to rotate the second one of the kneading drums in a releasing direction opposite the winding direction after the mixing bag is wound on the second one of the kneading drums to unwind the mixing bag from the second one of the kneading drums.
摘要翻译：一种面包机，包括形成烘箱的主体; 一个在烘箱室内的捏捏桶，每个搅拌桶具有保持部分，该保持部分保持充满面包成分的混合袋的相对端; 滚筒驱动部分，使捏捏滚筒沿顺时针和逆时针方向旋转，以捏合混合袋中所含的面团; 以及控制所述滚筒驱动部分的控制器，以将所述混合袋与所述捏合滚筒中的第一个的所述保持部分分离，并且在捏合所述面团之后将所述混合袋卷绕在所述捏合滚筒中的第二个上，捏合桶在混合袋之后沿与卷绕方向相反的释放方向缠绕在第二个捏合滚筒上，以从第二个捏合滚筒中解开混合袋。

9. 发明申请

US20060151467A1 Cooking apparatus 失效
标题翻译：烹饪器具
公开(公告)号：US20060151467A1
公开(公告)日：2006-07-13
申请号：US11189794
申请日：2005-07-27
申请人： Seong-deog Jang , Han-seong Kang , Yong-hyun Kwon , Chul Kim , Han-jun Sung , Dae-sung Han , Tae-euk Lee
发明人： Seong-deog Jang , Han-seong Kang , Yong-hyun Kwon , Chul Kim , Han-jun Sung , Dae-sung Han , Tae-euk Lee
IPC分类号： H05B3/68
CPC分类号： A47J37/0709 , A47J37/0676
摘要： A cooking apparatus which prevents a top casing thereof from being heated by heat transmitted from an electric heater. The cooking apparatus having a grill part to cook food thereon, and a electric heater to cook the food, includes a grill housing having a main casing including an opening part coupled with the grill part, providing the electric heater thereon, and a top casing coupled with an upper side circumferential area of the main casing with the center to the opening part, and the top casing including a plurality of top casing units separately provided.
摘要翻译：一种烹饪设备，其防止顶部壳体被来自电加热器的热量加热。具有烹饪食物的格栅部分的烹饪设备和用于烹饪食物的电加热器包括格栅壳体，其具有主壳体，该主壳体包括与格栅部分连接的开口部分，在其上提供电加热器，以及顶部壳体，其中主壳体的上侧周向区域与中心到开口部分，并且顶部壳体包括分开设置的多个顶部壳体单元。

10. 发明授权

US07335388B2 Bread maker and method of controlling the same 失效
标题翻译：面包机和控制方法
公开(公告)号：US07335388B2
公开(公告)日：2008-02-26
申请号：US10805351
申请日：2004-03-22
申请人： Jae-ryong Park , Yong-hyun Kwon , Chul Kim , Tae-uk Lee , Han-jun Sung , Jang-woo Lee , Dong-bin Lim
发明人： Jae-ryong Park , Yong-hyun Kwon , Chul Kim , Tae-uk Lee , Han-jun Sung , Jang-woo Lee , Dong-bin Lim
IPC分类号： A21D6/00 , A23C3/00 , A23C9/14
CPC分类号： A21B7/005 , Y02P60/83
摘要： A bread maker including a main body having an oven compartment with a front opening, a door to open and close the front opening of the oven compartment, a pair of kneading drums spaced apart from each other inside the oven compartment and winding a mixing bag filled with ingredients for bread thereon, a drum driver driving the kneading drums to rotate, a heater heating the inside of the oven compartment, and a heater driver driving the heater to operate. The bread maker includes a door sensor sensing whether the door is open or closed; and a controller controlling the drum driver and the heater driver to suspend the kneading drum and the heater, respectively, when the door sensor senses that the door is open. With this configuration, the bread maker and a method of controlling the same, suspends heaters and kneading drums when a door is open while the bread maker operates, thereby increasing safety and decreasing loss of heat and electrical energy.
摘要翻译：一种面包机，包括具有前开口的烤箱室的主体，用于打开和关闭烤箱隔室前部开口的门，一对在烘箱室内彼此间隔开的捏合桶，并且缠绕混合袋用于面包的成分，驱动搅拌滚筒旋转的滚筒驱动器，加热炉室内部的加热器和驱动加热器操作的加热器驱动器。面包机包括门传感器，用于检测门是打开还是关闭; 以及当门传感器感测到门打开时，控制器分别控制鼓驱动器和加热器驱动器以分别悬架捏合鼓和加热器。利用这种构造，面包机和面包机的控制方法在面包机操作时门打开时暂停加热器和揉搓鼓，从而增加安全性并减少热量和电能的损失。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式