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1. 发明授权

US08702251B2 Light-collecting heliostat using flat mirrors 有权
标题翻译：采用平面镜的收集定日镜
公开(公告)号：US08702251B2
公开(公告)日：2014-04-22
申请号：US13498456
申请日：2011-04-11
申请人： Sang-Nam Lee , Jong-Kyu Kim , Yong-Heack Kang
发明人： Sang-Nam Lee , Jong-Kyu Kim , Yong-Heack Kang
IPC分类号： G02B5/10
CPC分类号： F24S23/77 , F24S30/452 , Y02E10/47
摘要： Disclosed is a light-collecting heliostat using flat mirrors of enhanced light-collecting efficiency. The gradients of low-price flat mirrors are adjusted when reflecting sunlight by the heliostat equipped with the flat mirrors, thereby causing reflection focal areas having the same size as each of the mirrors to overlap, in the same number as the number of the reflective plates constituting the heliostat, on a heat collecting unit of collecting lights, so that a high temperature light-collecting focal area with a uniform temperature distribution is obtained.
摘要翻译：公开了使用具有增强的聚光效率的平反射镜的集光定日镜。在装有平面镜的定日镜反射阳光的同时调整低价平面镜的梯度，从而使具有与每个反射镜相同尺寸的反射焦点重叠，与反射板的数量相同在收集灯的集热单元上形成定日镜，从而获得具有均匀温度分布的高温聚光聚焦区域。

2. 发明申请

US20120182635A1 LIGHT-COLLECTING HELIOSTAT USING FLAT MIRRORS 有权
标题翻译：使用平面镜的光收集HELIOSTAT
公开(公告)号：US20120182635A1
公开(公告)日：2012-07-19
申请号：US13498456
申请日：2011-04-11
申请人： Sang-Nam Lee , Jong-Kyu Kim , Yong-Heack Kang
发明人： Sang-Nam Lee , Jong-Kyu Kim , Yong-Heack Kang
IPC分类号： G02B5/10
CPC分类号： F24S23/77 , F24S30/452 , Y02E10/47
摘要： Disclosed is a light-collecting heliostat using flat mirrors of enhanced light-collecting efficiency. The gradients of low-price flat mirrors are adjusted when reflecting sunlight by the heliostat equipped with the flat mirrors, thereby causing reflection focal points having the same size as each of the mirrors to overlap, in the same number as the number of the reflective plates constituting the heliostat, on a heat collecting unit of collecting lights, so that a high temperature light-collecting focal point with a uniform temperature distribution is obtained.
摘要翻译：公开了使用具有增强的聚光效率的平反射镜的集光定日镜。通过装有平面镜的定日镜反射阳光来调整低价平面镜的梯度，从而使具有与每个反射镜相同尺寸的反射焦点重叠，数量与反射板数目相同在收集灯的集热单元上形成定日镜，从而获得具有均匀温度分布的高温聚光焦点。

3. 发明申请

US20120042870A1 HOT BLAST HEATER USING SOLAR ENERGY 审中-公开
标题翻译：使用太阳能的热式加热器
公开(公告)号：US20120042870A1
公开(公告)日：2012-02-23
申请号：US12971577
申请日：2010-12-17
申请人： Sang-Hoon LIM , Yong-Heack Kang , Nam-Chun Baek , Jong-Kyu Kim , Hyun-Jin Lee
发明人： Sang-Hoon LIM , Yong-Heack Kang , Nam-Chun Baek , Jong-Kyu Kim , Hyun-Jin Lee
IPC分类号： F24J2/00 , F24J2/04
CPC分类号： F24D19/109 , F24D15/02 , F24D2200/14 , F24H3/00 , F24H3/04 , F24S23/00 , F24S30/20 , F24S90/00 , Y02B10/20 , Y02E10/40
摘要： A hot blast heater capable of heating air using solar energy and providing hot air for daily life is provided. The hot blast heater includes a chamber, a lifting part, a control part and a pump. The chamber is configured to form an accommodation space to accommodate air, has an inlet/an outlet which are formed through a lower part and an upper part of the chamber, respectively, such that indoor air is received through the inlet and air inside the chamber is discharged through the outlet, and is formed using light passing material or thermal conductive material. The lifting part is installed lengthwise along two facing sides of the window to lift the chamber such that the air inside the chamber is heated through sunlight or solar heat introduced through the window. The control part controls operations of the lifting part. The pump is installed at the outlet of the chamber to forcedly discharge the heated air inside the chamber to an indoor space. The air discharged through the outlet serves as hot blast used to warm indoor air.
摘要翻译：提供一种能够使用太阳能加热空气并为日常生活提供热空气的热风加热器。热风加热器包括腔室，提升部件，控制部件和泵。所述室被构造成形成容纳空气的容纳空间，具有分别通过所述室的下部和上部形成的入口/出口，使得室内空气通过所述入口和所述室内的空气被接收通过出口排出，并且使用光通过材料或导热材料形成。提升部分沿着窗的两个相对的侧面纵向安装以提升室，使得室内的空气通过阳光或通过窗户引入的太阳能热量被加热。控制部控制提升部的动作。泵安装在室的出口处，以将室内的加热空气强制排放到室内空间。通过出口排出的空气用作室内空气的热风。

4. 发明授权

US10431459B2 Methods of fabricating semiconductor device 有权
公开(公告)号：US10431459B2
公开(公告)日：2019-10-01
申请号：US15668689
申请日：2017-08-03
申请人： Woohyun Lee , Sang-Kuk Kim , Jong-Kyu Kim , Yil-hyung Lee , Jongsoon Park , Hyeji Yoon
发明人： Woohyun Lee , Sang-Kuk Kim , Jong-Kyu Kim , Yil-hyung Lee , Jongsoon Park , Hyeji Yoon
IPC分类号： H01L21/033 , H01L21/311 , H01L21/687
摘要： An etching target layer is formed on a substrate. An upper mask layer is formed on the etching target layer. A plurality of preliminary mask patterns is formed on the upper mask layer. The plurality of preliminary mask patterns is arranged at a first pitch. Two neighboring preliminary mask patterns of the plurality of preliminary mask patterns define a preliminary opening. An ion beam etching process is performed on the upper mask layer using the plurality of preliminary mask patterns as an etch mask to form a first preliminary-interim-mask pattern and a pair of second preliminary-interim-mask patterns. The first preliminary-interim-mask pattern is formed between one of the pair of second preliminary-interim-mask patterns and the other of the pair of second preliminary-interim-mask patterns.

5. 发明授权

US10403473B2 Ion beam etching devices 有权
公开(公告)号：US10403473B2
公开(公告)日：2019-09-03
申请号：US15198416
申请日：2016-06-30
申请人： Han-Na Cho , Jong-Kyu Kim , Hyuk Kim , Jongchul Park
发明人： Han-Na Cho , Jong-Kyu Kim , Hyuk Kim , Jongchul Park
IPC分类号： H01J37/32
摘要： An ion beam etching device comprises: an ion source configured to generate ions; a grid on a side of the ion source, the grid configured to accelerate the generated ions to generate an ion beam; a process chamber configured to have an etching process using the ion beam performed therein; and a variable magnetic field application part adjacent to the process chamber, the variable magnetic field application part configured to apply a variable magnetic field.

6. 发明授权

US10002905B2 Data storage devices 有权
公开(公告)号：US10002905B2
公开(公告)日：2018-06-19
申请号：US15431234
申请日：2017-02-13
申请人： Jongsoon Park , Sang-Kuk Kim , Jong-Kyu Kim , Jongchul Park , Woohyun Lee , Yil-hyung Lee
发明人： Jongsoon Park , Sang-Kuk Kim , Jong-Kyu Kim , Jongchul Park , Woohyun Lee , Yil-hyung Lee
IPC分类号： H01L43/00 , H01L27/22 , H01L43/02 , H01L43/08 , G11C11/16 , H01L43/10
CPC分类号： H01L27/222 , G11C11/161 , H01L43/02 , H01L43/08 , H01L43/10 , H01L43/12
摘要： Data storage devices are provided. A data storage device includes a dielectric layer on a substrate. The data storage device includes a plurality of data storage structures on the dielectric layer. The data storage device includes a conductive material on the dielectric layer. Moreover, the data storage device includes an insulation layer on the conductive material.

7. 外观设计

USD693873S1 Printer 有权
公开(公告)号：USD693873S1
公开(公告)日：2013-11-19
申请号：US29426323
申请日：2012-07-03
申请人： Naoto Fukasawa , Jong-Kyu Kim , Seung-Wook Jeong
设计人： Naoto Fukasawa , Jong-Kyu Kim , Seung-Wook Jeong

8. 外观设计

USD692477S1 Printer 有权
公开(公告)号：USD692477S1
公开(公告)日：2013-10-29
申请号：US29418382
申请日：2012-04-16
申请人： Jong-Kyu Kim , Seung-Wook Jeong , Min-Chul Kim
设计人： Jong-Kyu Kim , Seung-Wook Jeong , Min-Chul Kim

9. 外观设计

USD624956S1 Copy machine 有权
公开(公告)号：USD624956S1
公开(公告)日：2010-10-05
申请号：US29316754
申请日：2009-10-29
申请人： Ji-Sang Park , Hoon-Tae Kim , Jong-Kyu Kim
设计人： Ji-Sang Park , Hoon-Tae Kim , Jong-Kyu Kim

10. 发明申请

US20090117723A1 Methods of forming a conductive pattern in semiconductor devices and methods of manufacturing semiconductor devices having a conductive pattern 审中-公开
标题翻译：在半导体器件中形成导电图案的方法和制造具有导电图案的半导体器件的方法
公开(公告)号：US20090117723A1
公开(公告)日：2009-05-07
申请号：US12287945
申请日：2008-10-15
申请人： Jong-Kyu Kim , Bum-Soo Kim , Jong-Heui Song , Sang-Sup Jeong , Sung-Gil Choi , Kuk-Han Yoon
发明人： Jong-Kyu Kim , Bum-Soo Kim , Jong-Heui Song , Sang-Sup Jeong , Sung-Gil Choi , Kuk-Han Yoon
IPC分类号： H01L21/28 , H01L21/283
CPC分类号： H01L29/42324 , H01L21/02071 , H01L21/31122 , H01L21/31138 , H01L21/32139 , H01L27/11521 , H01L29/40114
摘要： In a method of forming a conductive pattern in a semiconductor device, a conductive layer including a metal is formed on a substrate. A mask including carbon is provided on the conductive layer, and the conductive pattern is formed on the substrate by etching the conductive layer using the mask as an etching mask. The mask is removed from the conductive pattern by an oxygen plasma ashing process. An oxidized portion of the conductive pattern is reduced. The conductive pattern may have a desired resistance by reducing the oxidized portion to improve electrical characteristics and reliability of the semiconductor device.
摘要翻译：在半导体器件中形成导电图案的方法中，在衬底上形成包括金属的导电层。在导电层上设置包含碳的掩模，并且通过使用掩模作为蚀刻掩模蚀刻导电层，在基板上形成导电图案。通过氧等离子体灰化处理将掩模从导电图案中去除。导电图案的氧化部分减少。导电图案可以通过减少氧化部分而具有期望的电阻，以改善半导体器件的电特性和可靠性。

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