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    • 10. 发明申请
    • FLUORINE GAS PRODUCTION DEVICE
    • US20210395901A1
    • 2021-12-23
    • US17279670
    • 2019-10-07
    • SHOWA DENKO K.K.
    • Yohsuke FUKUCHINozomi KUSUMOTOHiroshi KOBAYASHI
    • C25B1/245C25B13/00C25B9/19C25B9/65C25B11/02C25B11/046
    • There is provided a fluorine gas production device in which, even when an electrolytic solution containing hydrogen fluoride is electrolyzed at a high current density, a recombination reaction in the electrolytic solution and a recombination reaction in gas phase parts of an anode chamber and a cathode chamber are less likely to occur and the electrolytic solution can be electrolyzed with high current efficiency to produce fluorine gas. The fluorine gas production device includes an electrolytic cell (1), a partition wall (7) extending downward in the vertical direction from the ceiling surface inside the electrolytic cell (1) to partition the electrolytic cell (1) into an anode chamber (12) and a cathode chamber (14), an anode (3), and a cathode (5). The lower end of the partition wall (7) is immersed in the electrolytic solution (10) and a length (H) in the vertical direction of a portion immersed in the electrolytic solution (10) of the partition wall (7) is 10% or more and 30% or less of the distance from the bottom surface inside the electrolytic cell (1) to the liquid level of the electrolytic solution (10). The cathode (5) is completely immersed in the electrolytic solution (10) and the upper end of the cathode (5) is arranged at a lower position in the vertical direction relative to the lower end of the partition wall (7). The anode 3 is partially exposed from the liquid level of the electrolytic solution (10).