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    • 10. 发明授权
    • Semiconductor device
    • 半导体器件
    • US09570445B2
    • 2017-02-14
    • US14339948
    • 2014-07-24
    • Semiconductor Energy Laboratory Co., Ltd.
    • Kazuaki Ohshima
    • H01L27/108H01L27/105H01L27/06H01L27/092H01L27/12H03K19/00H03K19/177
    • H01L27/105H01L27/0605H01L27/0688H01L27/092H01L27/108H01L27/1203H03K19/0013H03K19/1776H03K19/17772
    • A semiconductor device having a novel structure is provided. The semiconductor device includes a first p-type transistor, a second n-type transistor, a third transistor, and a fourth transistor. One of a source and a drain of the third transistor is connected to a wiring supplying first potential, and the other is connected to one of a source and a drain of the first transistor. One of a source and a drain of the second transistor is connected to the other of the source and the drain of the first transistor, and the other is connected to one of a source and a drain of the fourth transistor. The other of the source and the drain of the fourth transistor is connected to a wiring supplying second potential lower than the first potential. An oxide semiconductor material is used in channel formation regions of the third transistor and the fourth transistor.
    • 提供具有新颖结构的半导体器件。 半导体器件包括第一p型晶体管,第二n型晶体管,第三晶体管和第四晶体管。 第三晶体管的源极和漏极之一连接到提供第一电位的布线,另一个连接到第一晶体管的源极和漏极之一。 第二晶体管的源极和漏极之一连接到第一晶体管的源极和漏极中的另一个,另一个连接到第四晶体管的源极和漏极之一。 第四晶体管的源极和漏极中的另一个连接到提供低于第一电位的第二电位的布线。 在第三晶体管和第四晶体管的沟道形成区域中使用氧化物半导体材料。