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1. 发明申请

US20060218971A1 Synthetic quartz glass and process for producing a quartz glass body 审中-公开
标题翻译：合成石英玻璃和生产石英玻璃体的方法
公开(公告)号：US20060218971A1
公开(公告)日：2006-10-05
申请号：US11350286
申请日：2006-02-09
申请人： Rolf Martin , Gordon von der Goenna , Ute Natura
发明人： Rolf Martin , Gordon von der Goenna , Ute Natura
IPC分类号： C03B19/06 , C03C3/06
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1469 , C03B2201/07 , C03B2201/20 , C03B2201/21 , C03C2201/11 , C03C2201/21 , C03C2201/23 , G03F1/60 , Y02P40/57
摘要： The invention relates to a synthetic quartz glass that can be produced by direct precipitation by means of flame hydrolysis of a silicon precursor, especially a chlorine-containing silicon precursor, which quartz glass when irradiated with laser pulses at a wavelength of 193 nm at an energy density (H) of up to H=1.5 mJ/cm2 and at a repetition frequency of the laser pulses of up to R=4 kHz is characterized by the following properties: in the range of energy densities of up to 1.5 mJ/cm2, the equilibrium absorption of quartz glass rises sublinearly with the energy density for all repetition frequencies of the laser pulses; the dependency of the equilibrium absorption on the repetition frequency of the laser pulses is sublinear; and the relationship of equilibrium absorption and energy density (H) can be described as a function of H1.7; the H2 content being at least 0.2·1018 molecules/cm3. Other aspects of the invention relate to a process for producing such a synthetic quartz glass.
摘要翻译：本发明涉及一种合成石英玻璃，其可以通过使用硅前体，特别是含氯的硅前体进行火焰水解直接沉淀来制备，该石英玻璃在能量为193nm的激光脉冲下照射时，高达H = 1.5mJ / cm 2的密度（H）和高达R = 4kHz的激光脉冲的重复频率的特征在于以下特性：在能量密度范围内高达1.5mJ / cm 2，石英玻璃的平衡吸收与激光脉冲的所有重复频率的能量密度成线性上升; 平衡吸收对激光脉冲重复频率的依赖性是亚线性的; 平衡吸收和能量密度（H）的关系可以描述为H <1.7的函数; H 2含量为至少0.2×10 18分子/ cm 3。本发明的其它方面涉及一种生产这种合成石英玻璃的方法。

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