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1. 发明授权

US08420168B2 Delivery device for deposition 有权
标题翻译：用于沉积的输送装置
公开(公告)号：US08420168B2
公开(公告)日：2013-04-16
申请号：US13466507
申请日：2012-05-08
申请人： Roger S. Kerr , David H. Levy , James T. Murray
发明人： Roger S. Kerr , David H. Levy , James T. Murray
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： B05B1/005 , C23C16/45551 , C23C16/45574 , Y10T29/494 , Y10T29/49432 , Y10T29/49826 , Y10T137/0318 , Y10T137/87249
摘要： A delivery device for thin-film material deposition has at least first, second, and third inlet ports for receiving a common supply for a first, a second and a third gaseous material, respectively. Each of the first, second, and third elongated emissive channels allow gaseous fluid communication with one of corresponding first, second, and third inlet ports. The delivery device can be formed from apertured plates, superposed to define a network of interconnecting supply chambers and directing channels for routing each of the gaseous materials from its corresponding inlet port to a corresponding plurality of elongated emissive channels. The delivery device comprises a diffusing channel formed by a relief pattern between facing plates. Also disclosed is a process for thin film deposition. Finally, more generally, a flow diffuser and a corresponding method of diffusing flow is disclosed.
摘要翻译：用于薄膜材料沉积的递送装置具有至少第一，第二和第三入口端口，用于分别接收用于第一，第二和第三气态材料的共同供应。第一，第二和第三细长发射通道中的每一个允许与对应的第一，第二和第三入口端口之一的气态流体连通。输送装置可以由孔板形成，叠加以形成互连供应室的网络，并且引导通道用于将每个气态材料从其相应的入口端口路由到相应的多个细长的发射通道。输送装置包括由相对板之间的浮雕图案形成的扩散通道。还公开了一种用于薄膜沉积的方法。最后，更一般地，公开了一种流扩散器和相应的扩散流的方法。

2. 发明申请

US20090081366A1 DELIVERY DEVICE FOR DEPOSITION 有权
标题翻译：递送装置用于沉积
公开(公告)号：US20090081366A1
公开(公告)日：2009-03-26
申请号：US11861402
申请日：2007-09-26
申请人： Roger S. Kerr , David H. Levy , James T. Murray
发明人： Roger S. Kerr , David H. Levy , James T. Murray
IPC分类号： C23C16/00 , B21D51/38 , F17D1/02
CPC分类号： B05B1/005 , C23C16/45551 , C23C16/45574 , Y10T29/494 , Y10T29/49432 , Y10T29/49826 , Y10T137/0318 , Y10T137/87249
摘要： A delivery device for thin-film material deposition has at least first, second, and third inlet ports for receiving a common supply for a first, a second and a third gaseous material, respectively. Each of the first, second, and third elongated emissive channels allow gaseous fluid communication with one of corresponding first, second, and third inlet ports. The delivery device can be formed from apertured plates, superposed to define a network of interconnecting supply chambers and directing channels for routing each of the gaseous materials from its corresponding inlet port to a corresponding plurality of elongated emissive channels. The delivery device comprises a diffusing channel formed by a relief pattern between facing plates. Also disclosed is a process for thin film deposition. Finally, more generally, a flow diffuser and a corresponding method of diffusing flow is disclosed.
摘要翻译：用于薄膜材料沉积的递送装置具有至少第一，第二和第三入口端口，用于分别接收用于第一，第二和第三气态材料的共同供应。第一，第二和第三细长发射通道中的每一个允许与对应的第一，第二和第三入口端口之一的气态流体连通。输送装置可以由孔板形成，叠加以形成互连供应室的网络，并且引导通道用于将每个气态材料从其相应的入口端口路由到相应的多个细长的发射通道。输送装置包括由相对板之间的浮雕图案形成的扩散通道。还公开了一种用于薄膜沉积的方法。最后，更一般地，公开了一种流扩散器和相应的扩散流的方法。

3. 发明申请

US20120219712A1 DELIVERY DEVICE FOR DEPOSITION 有权
标题翻译：递送装置用于沉积
公开(公告)号：US20120219712A1
公开(公告)日：2012-08-30
申请号：US13466507
申请日：2012-05-08
申请人： Roger S. Kerr , David H. Levy , James T. Murray
发明人： Roger S. Kerr , David H. Levy , James T. Murray
IPC分类号： C23C16/455 , F15D1/02 , B23P11/00
CPC分类号： B05B1/005 , C23C16/45551 , C23C16/45574 , Y10T29/494 , Y10T29/49432 , Y10T29/49826 , Y10T137/0318 , Y10T137/87249
摘要： A delivery device for thin-film material deposition has at least first, second, and third inlet ports for receiving a common supply for a first, a second and a third gaseous material, respectively. Each of the first, second, and third elongated emissive channels allow gaseous fluid communication with one of corresponding first, second, and third inlet ports. The delivery device can be formed from apertured plates, superposed to define a network of interconnecting supply chambers and directing channels for routing each of the gaseous materials from its corresponding inlet port to a corresponding plurality of elongated emissive channels. The delivery device comprises a diffusing channel formed by a relief pattern between facing plates. Also disclosed is a process for thin film deposition. Finally, more generally, a flow diffuser and a corresponding method of diffusing flow is disclosed.
摘要翻译：用于薄膜材料沉积的递送装置具有至少第一，第二和第三入口端口，用于分别接收用于第一，第二和第三气态材料的共同供应。第一，第二和第三细长发射通道中的每一个允许与对应的第一，第二和第三入口端口之一的气态流体连通。输送装置可以由孔板形成，叠加以限定互连供应室的网络，并且引导通道，用于将每个气态材料从其对应的入口端口路由到相应的多个细长的发射通道。输送装置包括由相对板之间的浮雕图案形成的扩散通道。还公开了一种用于薄膜沉积的方法。最后，更一般地，公开了一种流扩散器和相应的扩散流的方法。

4. 发明授权

US08211231B2 Delivery device for deposition 有权
标题翻译：用于沉积的输送装置
公开(公告)号：US08211231B2
公开(公告)日：2012-07-03
申请号：US11861402
申请日：2007-09-26
申请人： Roger S. Kerr , David H. Levy , James T. Murray
发明人： Roger S. Kerr , David H. Levy , James T. Murray
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： B05B1/005 , C23C16/45551 , C23C16/45574 , Y10T29/494 , Y10T29/49432 , Y10T29/49826 , Y10T137/0318 , Y10T137/87249
摘要： A delivery device for thin-film material deposition has at least first, second, and third inlet ports for receiving a common supply for a first, a second and a third gaseous material, respectively. Each of the first, second, and third elongated emissive channels allow gaseous fluid communication with one of corresponding first, second, and third inlet ports. The delivery device can be formed from apertured plates, superposed to define a network of interconnecting supply chambers and directing channels for routing each of the gaseous materials from its corresponding inlet port to a corresponding plurality of elongated emissive channels. The delivery device comprises a diffusing channel formed by a relief pattern between facing plates. Also disclosed is a process for thin film deposition. Finally, more generally, a flow diffuser and a corresponding method of diffusing flow is disclosed.
摘要翻译：用于薄膜材料沉积的递送装置具有至少第一，第二和第三入口端口，用于分别接收用于第一，第二和第三气态材料的共同供应。第一，第二和第三细长发射通道中的每一个允许与对应的第一，第二和第三入口端口之一的气态流体连通。输送装置可以由孔板形成，叠加以限定互连供应室的网络，并且引导通道，用于将每个气态材料从其对应的入口端口路由到相应的多个细长的发射通道。输送装置包括由相对板之间的浮雕图案形成的扩散通道。还公开了一种用于薄膜沉积的方法。最后，更一般地，公开了一种流扩散器和相应的扩散流的方法。

5. 发明申请

US20100248423A1 DELIVERY DEVICE COMPRISING GAS DIFFUSER FOR THIN FILM DEPOSITION 审中-公开
标题翻译：包含气体扩散器用于薄膜沉积的输送装置
公开(公告)号：US20100248423A1
公开(公告)日：2010-09-30
申请号：US12813552
申请日：2010-06-11
申请人： Shelby F. Nelson , David H. Levy , Roger S. Kerr
发明人： Shelby F. Nelson , David H. Levy , Roger S. Kerr
IPC分类号： H01L21/36 , C23C16/455 , C23C16/40
CPC分类号： C23C16/45551 , B33Y80/00 , C23C16/4412 , C23C16/45517 , C23C16/45519 , C23C16/45559 , C23C16/45568 , C23C16/45574 , C23C16/54
摘要： A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed.
摘要翻译：公开了一种在衬底上沉积薄膜材料的方法，包括同时引导一系列气体流从薄膜沉积系统的输送头的输出面朝向衬底的表面，并且其中一系列气体流动包括至少第一反应性气体材料，惰性吹扫气体和第二反应性气态材料，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应。还公开了能够进行这种处理的系统。

6. 发明授权

US07789961B2 Delivery device comprising gas diffuser for thin film deposition 有权
标题翻译：输送装置包括用于薄膜沉积的气体扩散器
公开(公告)号：US07789961B2
公开(公告)日：2010-09-07
申请号：US11620740
申请日：2007-01-08
申请人： Shelby F. Nelson , David H. Levy , Roger S. Kerr
发明人： Shelby F. Nelson , David H. Levy , Roger S. Kerr
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/45551 , B33Y80/00 , C23C16/4412 , C23C16/45517 , C23C16/45519 , C23C16/45559 , C23C16/45568 , C23C16/45574 , C23C16/54
摘要： A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed.
摘要翻译：公开了一种在衬底上沉积薄膜材料的方法，包括同时引导一系列气体流从薄膜沉积系统的输送头的输出面朝向衬底的表面，并且其中一系列气体流动包括至少第一反应性气体材料，惰性吹扫气体和第二反应性气态材料，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应。还公开了能够进行这种处理的系统。

7. 发明授权

US08182608B2 Deposition system for thin film formation 有权
标题翻译：薄膜形成沉积系统
公开(公告)号：US08182608B2
公开(公告)日：2012-05-22
申请号：US11861420
申请日：2007-09-26
申请人： Roger S. Kerr , David H. Levy
发明人： Roger S. Kerr , David H. Levy
IPC分类号： C23C16/00
CPC分类号： H01L21/67173 , B33Y80/00 , C23C16/45551 , C23C16/45563 , C23C16/54 , C30B25/14 , C30B35/00 , H01L21/6719 , H01L21/68
摘要： An apparatus for maintaining the alignment or positional relationship between at least two coating modules in an ALD system, the apparatus comprising a plurality of coating modules in a coating section, at least a first bar and a second bar for supporting the coating modules, and at least a first bar mounting structure and a second bar mounting structure for supporting the bars, wherein each of the coating modules are supported by the first bar and the second bar, and wherein the combination of the at least two coating modules and the first bar and the second bar define a coating section profile for the output faces of the coating modules. Also disclosed is a process for making such apparatus.
摘要翻译：一种用于维持ALD系统中的至少两个涂覆模块之间的对准或位置关系的装置，该装置包括涂覆部分中的多个涂覆模块，至少第一条和用于支撑涂覆模块的第二条，以及在至少第一杆安装结构和用于支撑杆的第二杆安装结构，其中每个涂覆模块由第一杆和第二杆支撑，并且其中至少两个涂层模块与第一杆和第二条形状限定了用于涂层模块的输出面的涂层部分轮廓。还公开了制造这种装置的方法。

8. 发明申请

US20110097492A1 FLUID DISTRIBUTION MANIFOLD OPERATING STATE MANAGEMENT SYSTEM 审中-公开
标题翻译：流体分配管理操作状态管理系统
公开(公告)号：US20110097492A1
公开(公告)日：2011-04-28
申请号：US12606238
申请日：2009-10-27
申请人： Roger S. Kerr , James E. Sutton , David H. Levy
发明人： Roger S. Kerr , James E. Sutton , David H. Levy
IPC分类号： C23C16/44 , C23C16/52
CPC分类号： C23C16/4401 , C23C16/4412 , C23C16/45551 , C23C16/45574 , C23C16/52 , C23C16/545 , Y10T137/8593
摘要： A fluid conveyance system for thin film material deposition is provided. A first fluid distribution manifold includes an output face that includes a plurality of elongated slots. The plurality of elongated slots include a source slot and an exhaust slot. A gas source is in fluid communication with the source slot. The gas source is configured to provide a gas to the output face of the distribution manifold. A gas receiving chamber is in fluid communication with the exhaust slot. The gas receiving chamber is configured to collect the gas provided to the output face of the distribution manifold through the exhaust slot. A sensor positioned to sense a parameter of the gas traveling from the gas source to the gas receiving chamber. A controller is connected in electrical communication with the sensor. The controller is configured to modify an operating parameter of the conveyance system based on data received from the sensor.
摘要翻译：提供了用于薄膜材料沉积的流体输送系统。第一流体分配歧管包括包括多个细长槽的输出面。多个细长槽包括源槽和排气槽。气源与源槽流体连通。气源被配置为向分配歧管的输出面提供气体。气体接收室与排气槽流体连通。气体接收室构造成通过排气槽收集设置在分配歧管的输出面上的气体。定位成感测从气体源传播到气体接收室的气体的参数的传感器。控制器与传感器电连接。控制器被配置为基于从传感器接收的数据来修改传送系统的操作参数。

9. 发明申请

US20090078204A1 DEPOSITION SYSTEM FOR THIN FILM FORMATION 有权
标题翻译：薄膜形成沉积系统
公开(公告)号：US20090078204A1
公开(公告)日：2009-03-26
申请号：US11861420
申请日：2007-09-26
申请人： Roger S. Kerr , David H. Levy
发明人： Roger S. Kerr , David H. Levy
IPC分类号： C23C16/00
CPC分类号： H01L21/67173 , B33Y80/00 , C23C16/45551 , C23C16/45563 , C23C16/54 , C30B25/14 , C30B35/00 , H01L21/6719 , H01L21/68
摘要： An apparatus for maintaining the alignment or positional relationship between at least two coating modules in an ALD system, the apparatus comprising a plurality of coating modules in a coating section, at least a first bar and a second bar for supporting the coating modules, and at least a first bar mounting structure and a second bar mounting structure for supporting the bars, wherein each of the coating modules are supported by the first bar and the second bar, and wherein the combination of the at least two coating modules and the first bar and the second bar define a coating section profile for the output faces of the coating modules. Also disclosed is a process for making such apparatus.
摘要翻译：一种用于维持ALD系统中的至少两个涂覆模块之间的对准或位置关系的装置，该装置包括涂覆部分中的多个涂覆模块，至少第一条和用于支撑涂覆模块的第二条，以及在至少第一杆安装结构和用于支撑杆的第二杆安装结构，其中每个涂覆模块由第一杆和第二杆支撑，并且其中至少两个涂层模块与第一杆和第二条形状限定涂层模块的输出面的涂层部分轮廓。还公开了制造这种装置的方法。

10. 发明申请

US20080166884A1 DELIVERY DEVICE COMPRISING GAS DIFFUSER FOR THIN FILM DEPOSITION 有权
标题翻译：包含气体扩散器用于薄膜沉积的输送装置
公开(公告)号：US20080166884A1
公开(公告)日：2008-07-10
申请号：US11620740
申请日：2007-01-08
申请人： Shelby F. Nelson , David H. Levy , Roger S. Kerr
发明人： Shelby F. Nelson , David H. Levy , Roger S. Kerr
IPC分类号： C23C16/00 , H01L21/02
CPC分类号： C23C16/45551 , B33Y80/00 , C23C16/4412 , C23C16/45517 , C23C16/45519 , C23C16/45559 , C23C16/45568 , C23C16/45574 , C23C16/54
摘要： A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed.
摘要翻译：公开了一种在衬底上沉积薄膜材料的方法，包括同时引导一系列气体流从薄膜沉积系统的输送头的输出面朝向衬底的表面，并且其中一系列气体流动包括至少第一反应性气体材料，惰性吹扫气体和第二反应性气态材料，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应。还公开了能够进行这种处理的系统。

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