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热词
    • 4. 发明授权
    • Method of fabricating electrodes with narrow gap therebetween
    • 制造间隙窄的电极的方法
    • US4275144A
    • 1981-06-23
    • US114833
    • 1980-01-24
    • Lawrence L. Buhl
    • Lawrence L. Buhl
    • G02F1/035G03F7/00H03C7/00B05D3/06
    • H03C7/00G02F1/035G03F7/0035
    • High speed, integrated optical directional coupler modulators utilize spaces of the order of one micron between waveguides. While one micron delineation of the waveguides can be readily obtained using conformable mask exposure techniques, diffraction effects become significant using thick glass masks required to delineate the electrodes. To overcome this problem, a two-process electrode fabrication procedure is employed. In accordance with the procedure a first pair of electrodes are deposited by a lithographic process. However, this yields a gap between electrodes that is wider than the desired gap. To reduce this distance, the process is repeated with the gap forming region of the mask laterally displaced. The result yields an electrode pattern with the desired spacing and thickness.
    • 高速集成的光学定向耦合器调制器利用波导之间的一微米级的空间。 虽然可以使用适形的掩模曝光技术容易地获得波导的一微米描绘,但是使用描绘电极所需的厚玻璃掩模,衍射效应变得显着。 为了克服这个问题,采用了双过程电极的制造方法。 根据该程序,通过光刻工艺沉积第一对电极。 然而,这产生比期望的间隙宽的电极之间的间隙。 为了减小该距离,在掩模的间隙形成区域横向移位的情况下重复该过程。 结果产生具有所需间隔和厚度的电极图案。