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1. 发明授权

US08617799B2 Post arrays and methods of making the same 失效
标题翻译：发布数组和制作相同的方法
公开(公告)号：US08617799B2
公开(公告)日：2013-12-31
申请号：US12563683
申请日：2009-09-21
申请人： Robert Koefer , Sheng Liu , Thomas Tombler
发明人： Robert Koefer , Sheng Liu , Thomas Tombler
IPC分类号： G02B3/00 , G03F7/20
CPC分类号： G03F7/40 , G02B3/0018 , G03F7/0005
摘要： In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees.
摘要翻译：通常，在一个方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，掩模特征具有包括凹陷诱导掩模特征的掩模材料的质量传递以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。通常，在另一方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，引起掩模材料的质量传递掩模特征以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。第一层由无定形材料构成，第一结构是具有约60度至约80度范围内的基底侧壁角度的柱。

2. 发明申请

US20100075262A1 POST ARRAYS AND METHODS OF MAKING THE SAME 失效
标题翻译：后阵列及其制作方法
公开(公告)号：US20100075262A1
公开(公告)日：2010-03-25
申请号：US12563683
申请日：2009-09-21
申请人： Robert Koefer , Sheng Liu , Thomas Tombler
发明人： Robert Koefer , Sheng Liu , Thomas Tombler
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , G02B3/0018 , G03F7/0005
摘要： In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees.
摘要翻译：通常，在一个方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，掩模特征具有包括凹陷诱导掩模特征的掩模材料的质量传递以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。通常，在另一方面，本发明的特征在于一种方法，其包括在第一层的表面上形成掩模材料层，图案化掩模材料的层以获得掩模特征，引起掩模材料的质量传递掩模特征以获得修改的掩模特征，以及将修改的掩模特征的轮廓传递到第一层中以形成第一结构。第一层由无定形材料构成，第一结构是具有约60度至约80度范围内的基底侧壁角度的柱。

3. 发明授权

US08506827B2 Short pitch metal gratings and methods for making the same 有权
标题翻译：短节距金属光栅及其制作方法
公开(公告)号：US08506827B2
公开(公告)日：2013-08-13
申请号：US12563824
申请日：2009-09-21
申请人： Qihong Wu , Sheng Liu , Xu Zhang , Shiaw-wen Tai , Xiaohua Du , Thomas Tombler
发明人： Qihong Wu , Sheng Liu , Xu Zhang , Shiaw-wen Tai , Xiaohua Du , Thomas Tombler
IPC分类号： C23F1/02
CPC分类号： G02B5/3058
摘要： Methods for forming a metal grating include providing a first grating including a plurality of grating lines formed from a dielectric material, each grating having a pair of sidewalls, facing sidewalls of adjacent grating lines being separated by corresponding trenches, the grating lines and trenches forming a grating surface; forming a layer of a metal on the grating surface, where the metal layer has a constant thickness and conforms to the grating surface; and removing portions of the metal layer between sidewalls of adjacent grating lines of the first grating to form a metal grating having grating lines formed from the metal, the grating lines of the metal grating corresponding to the portions of the metal layer adjacent the sidewalls of the grating lines of the first grating. The metal grating has a pitch of 200 nm or less, a depth of 50 nm or more, and the grating lines of the metal grating have an aspect ratio of 10-to-1 or more.
摘要翻译：用于形成金属光栅的方法包括提供包括由电介质材料形成的多个格栅线的第一光栅，每个光栅具有一对侧壁，其相对的光栅线的侧壁由相应的沟槽分开，所述光栅线和沟槽形成光栅表面; 在光栅表面上形成金属层，其中金属层具有恒定的厚度并符合光栅表面; 以及去除所述第一光栅的相邻光栅线的侧壁之间的所述金属层的部分以形成具有由所述金属形成的光栅线的金属光栅，所述金属光栅的光栅线对应于邻近所述金属层的侧壁的所述金属层的所述部分第一光栅的光栅线。金属光栅的间距为200nm以下，深度为50nm以上，金属光栅的光栅线的纵横比为10比1以上。

4. 发明申请

US20100072170A1 SHORT PITCH METAL GRATINGS AND METHODS FOR MAKING THE SAME 有权
标题翻译：短路金属镀层及其制造方法
公开(公告)号：US20100072170A1
公开(公告)日：2010-03-25
申请号：US12563824
申请日：2009-09-21
申请人： Qihong Wu , Sheng Liu , Xu Zhang , Shiaw-wen Tai , Xiaohua Du , Thomas Tombler
发明人： Qihong Wu , Sheng Liu , Xu Zhang , Shiaw-wen Tai , Xiaohua Du , Thomas Tombler
IPC分类号： C23F1/02
CPC分类号： G02B5/3058
摘要： Methods for forming a metal grating include providing a first grating including a plurality of grating lines formed from a dielectric material, each grating having a pair of sidewalls, facing sidewalls of adjacent grating lines being separated by corresponding trenches, the grating lines and trenches forming a grating surface; forming a layer of a metal on the grating surface, where the metal layer has a constant thickness and conforms to the grating surface; and removing portions of the metal layer between sidewalls of adjacent grating lines of the first grating to form a metal grating having grating lines formed from the metal, the grating lines of the metal grating corresponding to the portions of the metal layer adjacent the sidewalls of the grating lines of the first grating. The metal grating has a pitch of 200 nm or less, a depth of 50 nm or more, and the grating lines of the metal grating have an aspect ratio of 10-to-1 or more.
摘要翻译：用于形成金属光栅的方法包括提供包括由电介质材料形成的多个格栅线的第一光栅，每个光栅具有一对侧壁，其相对的光栅线的侧壁由相应的沟槽分开，所述光栅线和沟槽形成光栅表面在光栅表面上形成金属层，其中金属层具有恒定的厚度并符合光栅表面; 以及去除所述第一光栅的相邻光栅线的侧壁之间的所述金属层的部分以形成具有由所述金属形成的光栅线的金属光栅，所述金属光栅的光栅线对应于邻近所述金属层的侧壁的所述金属层的所述部分第一光栅的光栅线。金属光栅的间距为200nm以下，深度为50nm以上，金属光栅的光栅线的纵横比为10比1以上。

5. 发明申请

US20050059429A1 Inter-communication mobile phone set 审中-公开
标题翻译：互通手机套
公开(公告)号：US20050059429A1
公开(公告)日：2005-03-17
申请号：US10662413
申请日：2003-09-16
申请人： Sheng Liu , Sheng Liu
发明人： Sheng Liu , Sheng Liu
IPC分类号： H04M1/05 , H04M1/21 , H04M1/725 , H04M1/00
CPC分类号： H04M1/72513 , H04M1/05 , H04M1/21
摘要： An inter-communication mobile phone set comprises a main phone, a SIM card and a plurality of sub-phones. The main phone is one of a multi-user main phone, a personal main phone, and an in-car main phone; the multi-user main phone, personal main phone and in-car main phone searching for sub-phones automatically and the frequencies thereof so that signals of the main phone and sub-phones can inter-communicate to one another. The main phone is connected to other main phone through a SIM card. The sub-phone has a type selected from one of a simple type, a pen-form sub-phone, a neck-tie form phone, a watch form sub-phone, a breast-suspending sub-phone, an ear-phone form sub-phone, a hat form sub-phone. The sub-phone is built in one of a portable audio, a translator, a notebook computer, a PDA, a personal computer expansion card, a pocket, a game machine, a camera.
摘要翻译：一种互通式移动电话机包括主电话机，SIM卡和多个子电话机。主要手机是多用户主要手机，个人主要手机和车载主要手机之一，多用户主电话，个人主电话和车内主要手机自动搜索子电话及其频率，使得主电话和子电话的信号可以相互通信。主要手机通过SIM卡连接到其他主要手机。子电话具有从简单类型，笔式子电话，领带形式电话，表格子电话，挂号子电话，耳机形式之一中选择的类型子手机，帽子形式的分机。子电话内置在便携式音频，翻译器，笔记本电脑，PDA，个人计算机扩展卡，口袋，游戏机，照相机之一中。

6. 发明申请

US20050279449A1 Positioning method in manufacturing process of electronic elements 审中-公开
公开(公告)号：US20050279449A1
公开(公告)日：2005-12-22
申请号：US10872003
申请日：2004-06-21
申请人： Sheng Liu , Sheng Liu
发明人： Sheng Liu , Sheng Liu
IPC分类号： H05K13/04 , B32B31/00
CPC分类号： H05K13/0469
摘要： A positioning method in the manufacturing process of electronic elements comprises the steps of: dropping positioning glue on a working table; drying the positioning glue; placing a work piece upon the positioning glue so as to fix the work piece; performing other processes; checking whether the positioning glue is available; if yes, repeating the process for another work piece; and if not, cleaning the positioning glue from the work piece and repeating the process for the work piece.

7. 发明申请

US20050257884A1 Positioning method in manufacturing process of electronic elements 审中-公开
标题翻译：电子元件制造过程中的定位方法
公开(公告)号：US20050257884A1
公开(公告)日：2005-11-24
申请号：US10851960
申请日：2004-05-24
申请人： Sheng Liu , Sheng Liu
发明人： Sheng Liu , Sheng Liu
IPC分类号： H05K13/04 , B32B31/00
CPC分类号： H05K13/0469
摘要： A positioning method in the manufacturing process of electronic elements comprises the steps of: dropping positioning glue on a working table; drying the positioning glue; placing a work piece upon the positioning glue so as to fix the work piece; performing other processes; checking whether the positioning glue is available; if yes, repeating the process for another work piece; and if not, cleaning the positioning glue from the work piece and repeating the process for the work piece.
摘要翻译：电子元件制造过程中的定位方法包括以下步骤：将定位胶放在工作台上; 干燥定位胶; 将工件放置在定位胶上以固定工件; 执行其他过程; 检查定位胶是否可用; 如果是的话，重复进行另一件作业; 如果没有，则从工件清洁定位胶，并重复工件的处理。

8. 发明授权

US10576499B2 Ultrasonic phased array probe using PCB as matching layer 有权
公开(公告)号：US10576499B2
公开(公告)日：2020-03-03
申请号：US15445479
申请日：2017-02-28
申请人： Sheng Liu , Ronald Keller
发明人： Sheng Liu , Ronald Keller
IPC分类号： B06B1/06 , H05K1/03 , H01L41/22 , H01L41/09 , H05K1/02 , H05K1/11 , G01N29/24 , G01N29/32 , G01N29/26
摘要： Disclosed is a flexible ultrasonic transducer in which a single layer serves dual function as both a matching layer and a flexible circuit for making electrical connections, and there is no separate matching layer. Also disclosed is a method of assembling the flexible transducer.

9. 发明申请

US20120051459A1 INTERFERENCE ELIMINATION METHOD AND DATA TRANSMITTING APPARATUS 有权
标题翻译：干扰消除方法和数据传输装置
公开(公告)号：US20120051459A1
公开(公告)日：2012-03-01
申请号：US13293774
申请日：2011-11-10
申请人： Sheng Liu
发明人： Sheng Liu
IPC分类号： H04L25/49
CPC分类号： H04L25/03343 , H04B7/0413 , H04B7/0617 , H04L2025/03426
摘要： An interference elimination method provided herein includes: the ith transmitter of a group transmitters obtains an interference vector of each user, where: the interference vector of the kth user is Hkiwim; obtains at least L−N linear combinations for each user, wherein: the linear combination includes linear combinations of aligned interference vectors and linear combinations of N−Lk interference vectors, N is the number of receiving antennas of the user, and L is a sum of the signal flows of all users; the pre-coding vectors of all transmitters is obtained according to the linear combinations of all users; and the signals pre-coded using the pre-coding vectors are sent. Accordingly, a data transmitting apparatus is provided herein.
摘要翻译：本文提供的干扰消除方法包括：组发射机的第i个发射机获取每个用户的干扰矢量，其中：第k个用户的干扰矢量是Hkiwim; 为每个用户获得至少L-N个线性组合，其中：线性组合包括对齐干扰矢量的线性组合和N-Lk个干扰矢量的线性组合，N是用户的接收天线的数量，L是总和的所有用户的信号流; 根据所有用户的线性组合获得所有发射机的预编码向量; 并且发送使用预编码矢量预编码的信号。因此，本文提供了一种数据发送装置。

10. 发明申请

US20110310691A1 Multi-Port Memory Using Single-Port Memory Cells 失效
标题翻译：使用单端口存储单元的多端口存储器
公开(公告)号：US20110310691A1
公开(公告)日：2011-12-22
申请号：US13153392
申请日：2011-06-04
申请人： Ting Zhou , Ephrem Wu , Sheng Liu , Hyuck Jin Kwon
发明人： Ting Zhou , Ephrem Wu , Sheng Liu , Hyuck Jin Kwon
IPC分类号： G11C8/16
CPC分类号： G11C8/16 , G06F12/06 , G11C7/1075 , Y02D10/13
摘要： A memory operative to provide multi-port functionality includes multiple single-port memory cells forming a first memory array. The first memory array is organized into multiple memory banks, each of the memory banks comprising a corresponding subset of the single-port memory cells. The memory further includes a second memory array including multiple multi-port memory cells and is operative to track status information of data stored in corresponding locations in the first memory array. At least one cache memory is connected with the first memory array and is operative to store data for resolving concurrent read and write access conflicts in the first memory array. The memory includes a controller operative: to receive the status information and to determine a validity of data stored in the first memory array as a function of the status information; to control a manner in which data is stored in the memory for avoiding data overflow in the cache memory; and to resolve concurrent read and write access conflicts in the first memory array during the same memory cycle.
摘要翻译：可操作以提供多端口功能的存储器包括形成第一存储器阵列的多个单端口存储器单元。第一存储器阵列被组织成多个存储器组，每个存储器组包括单端口存储器单元的相应子集。存储器还包括包括多个多端口存储器单元的第二存储器阵列，并且可操作以跟踪存储在第一存储器阵列中相应位置中的数据的状态信息。至少一个高速缓存存储器与第一存储器阵列连接，并且可操作地存储用于解决第一存储器阵列中的并发读和写访问冲突的数据。存储器包括控制器，其操作：接收状态信息并根据状态信息确定存储在第一存储器阵列中的数据的有效性; 以控制数据存储在存储器中以避免高速缓冲存储器中的数据溢出的方式; 并在同一个内存周期内解决第一个内存阵列中的并发读写访问冲突。

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